EP1093534B1 - Procede pour enlever des couches de substance dure - Google Patents
Procede pour enlever des couches de substance dure Download PDFInfo
- Publication number
- EP1093534B1 EP1093534B1 EP99920529A EP99920529A EP1093534B1 EP 1093534 B1 EP1093534 B1 EP 1093534B1 EP 99920529 A EP99920529 A EP 99920529A EP 99920529 A EP99920529 A EP 99920529A EP 1093534 B1 EP1093534 B1 EP 1093534B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- hard substance
- substance coating
- hard
- layer
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/19—Iron or steel
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/20—Other heavy metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/24—Cleaning or pickling metallic material with solutions or molten salts with neutral solutions
Definitions
- the present invention relates to processes for stripping hard material layers, except TiN, of cemented carbide substrates according to claims 1 and 2, respectively.
- a hard material layer we mean a layer of an oxide, nitride, carbide, carbonitride or carbooxinitride of at least one element of groups 4, 5, 6, 13, 14 according to the "New Notation from IUPAC", for example according to " CRC Handbook of Chemistry and Physics, "CRC Press, 77th Edition," Periodic Table of Elements ", wherein the hard material layers of the aforementioned materials in H 2 O 2 containing solutions are poorly soluble . This hard materials TiN is excluded.
- the thickness of the intermediate layer is substantially less than that of the functional hard material layer.
- the intermediate layer thickness d z is, for example: 0 . 01 microns ⁇ d z ⁇ 0 . 5 microns . preferably 0 . 01 microns ⁇ d z ⁇ 0 . 3 microns . especially preferred 0 . 01 microns ⁇ d z ⁇ 0 . 2 microns ,
- the hard material layer comprises a CrC-, CrN, CrCN or a WC-C layer.
- the hard material layer comprises a TiAlN and / or TiCrN layer, wherein in a very particularly preferred Embodiment, the hard material layer comprises a TiAlN layer, more preferably, is a TiAlN layer.
- the processes are preferably used on hard material layers having a layer thickness of at least 2 ⁇ m.
- the solution used is preferably a hydrogen peroxide solution, preferably with at most 50% by weight of hydrogen peroxide, more preferably with at most 20% by weight of hydrogen peroxide.
- this solution further preferably NaOH is added, this preferably with at most 5 wt.%, Particularly preferably with at most 0.5 wt.%.
- the solution used except water, exclusively Wassenstoffperoxid, preferably with the stated wt.%, And NaOH, also preferably with the stated wt.%, And at least one of the mentioned substances di-sodium oxalate, K-Na Tartrate tetrahydrate, also preferably in the indicated concentration.
- Carbide indexable inserts were coated with a layer package TiN / TiAlN.
- the TiN intermediate layer had a thickness of 0.5 .mu.m, the total thickness of the package was 4 .mu.m.
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Chemically Coating (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Claims (12)
- Procédé pour enlever des couches de substance dure, en dehors du TiN, sur des substrats en métal dur, selon lequel il est prévu entre la couche de substance dure et le substrat en métal dur une couche intermédiaire de TiN, d'une épaisseur qui est nettement inférieure à celle de la couche de substance dure, et on dissout quasiment uniquement la couche intermédiaire de TiN sélectivement à travers les pores de la couche de substance dure, indépendamment de la couche de substance dure, et on élimine ainsi cette dernière, et on utilise pour cela une solution aqueuse qui contient :- du peroxyde d'hydrogène,- de l'oxalate disodique,- de l'hydroxyde de sodium.
- Procédé pour enlever des couches de substance dure, en dehors du TiN, sur des substrats en métal dur, selon lequel il est prévu entre la couche de substance dure et le substrat en métal dur une couche intermédiaire de TiN, d'une épaisseur qui est nettement inférieure à celle de la couche de substance dure, et on dissout quasiment uniquement la couche intermédiaire de TiN sélectivement à travers les pores de la couche de substance dure, indépendamment de la couche de substance dure, et on élimine ainsi cette dernière, et on utilise pour cela une solution aqueuse qui contient :- du peroxyde d'hydrogène,- du tétrahydrate de tartrate de K et de Na,- de l'hydroxyde de sodium.
- Procédé selon la revendication 1, caractérisé en ce que la couche de substance dure comprend une couche du type
avecEx : numéro d'élément n=x de l'un des groupes 4, 5, 6, 13, 14 de la classification périodique de la "new notation" selon IUPAC,X : au moins un élément du groupe N, C, O,n : paramètre constant, avec n≥2, de préférence n=2. - Procédé selon la revendication 3, caractérisé en ce que les éléments Ex (1≤x≤n) comprennent l'aluminium et/ou le silicium et/ou le chrome et/ou le bore.
- Procédé selon l'une des revendications 1 à 4, caractérisé en ce que la couche de substance dure comprend ou est de préférence constituée par une couche de CrC, CrN, CrCN ou WC-C.
- Procédé selon l'une des revendications 1 à 5, caractérisé en ce que la couche de substance dure comprend une couche de TiAlN et/ou TiCrN.
- Procédé selon l'une des revendications 1 à 6, caractérisé en ce que la couche de substance dure comprend une couche de TiAlN, de préférence est constituée par une couche de TiAlN.
- Procédé selon l'une des revendications 1 à 7, caractérisé en ce qu'on utilise la solution avec au maximum 50 % en poids de peroxyde d'hydrogène, en particulier avec au maximum 20 % en poids de peroxyde d'hydrogène.
- Procédé selon la revendication 8, caractérisé en ce qu'on utilise NaOH à raison de 5,0 % en poids au maximum, de préférence 0,5 % en poids au maximum, dans la solution.
- Procédé selon la revendication 8 ou 9, caractérisé en ce qu'on ajoute à la solution la substance constituée par l'oxalate disodique ou le tétrahydrate de tartrate de K et de Na à raison de 5 % en poids au maximum.
- Procédé selon les revendications 8, 9 et 10, caractérisé en ce que la solution, à part l'eau, contient uniquement les substances mentionnées.
- Procédé selon l'une des revendications 1 à 11, l'épaisseur de la couche de substance dure étant d'au moins 2 µm.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH126998 | 1998-06-11 | ||
CH126998 | 1998-06-11 | ||
CH140498 | 1998-07-01 | ||
CH140498 | 1998-07-01 | ||
PCT/CH1999/000234 WO1999064646A1 (fr) | 1998-06-11 | 1999-05-31 | Procede pour enlever des couches de substance dure |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP06101455 Division | 2006-02-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1093534A1 EP1093534A1 (fr) | 2001-04-25 |
EP1093534B1 true EP1093534B1 (fr) | 2007-12-26 |
Family
ID=25687165
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP99920529A Expired - Lifetime EP1093534B1 (fr) | 1998-06-11 | 1999-05-31 | Procede pour enlever des couches de substance dure |
Country Status (5)
Country | Link |
---|---|
US (1) | US6706122B2 (fr) |
EP (1) | EP1093534B1 (fr) |
JP (1) | JP4824163B2 (fr) |
DE (1) | DE59914591D1 (fr) |
WO (1) | WO1999064646A1 (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7077918B2 (en) | 2004-01-29 | 2006-07-18 | Unaxis Balzers Ltd. | Stripping apparatus and method for removal of coatings on metal surfaces |
US7611588B2 (en) * | 2004-11-30 | 2009-11-03 | Ecolab Inc. | Methods and compositions for removing metal oxides |
DE102005049249B4 (de) * | 2005-10-14 | 2018-03-29 | MTU Aero Engines AG | Verfahren zur Entschichtung eines Gasturbinenbauteils |
DE102010046372A1 (de) | 2010-09-24 | 2012-03-29 | Oerlikon Trading Ag, Trübbach | Verfahren zum Entschichten von Werkstücken |
ES2875760T3 (es) | 2018-09-18 | 2021-11-11 | Rena Tech Austria Gmbh | Procedimiento para eliminar un recubrimiento de materia dura |
KR20240060723A (ko) * | 2021-09-30 | 2024-05-08 | 엔테그리스, 아이엔씨. | 제거가능한 코팅을 갖는 물품 및 관련 방법 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4889589A (en) * | 1986-06-26 | 1989-12-26 | United Technologies Corporation | Gaseous removal of ceramic coatings |
JPS6320489A (ja) * | 1986-07-12 | 1988-01-28 | Tadanobu Okubo | めつきの剥離方法 |
JP2736771B2 (ja) * | 1986-10-13 | 1998-04-02 | 恭伸 秋本 | 金 型 |
CA2071944C (fr) * | 1990-10-19 | 1998-02-03 | Jiinjen Albert Sue | Solution decapante et methode utilisee pour faire disparaitre un revetement de compose de titane d'un metal de base |
DE4101843C1 (en) * | 1991-01-23 | 1992-04-02 | Eifeler Werkzeuge Gmbh, 4000 Duesseldorf, De | Hard tool coating for economy - by stripping using tetra:sodium di:phosphate soln. and hydrogen peroxide |
DE4110595C1 (en) * | 1991-04-02 | 1992-11-26 | Thyssen Edelstahlwerke Ag, 4000 Duesseldorf, De | Wet-chemical removal of hard coatings from workpiece surfaces - comprises using hydrogen peroxide soln. stabilised by complex former e.g. potassium-sodium tartrate-tetra:hydrate |
JP2597931B2 (ja) * | 1991-08-19 | 1997-04-09 | 株式会社不二越 | 高速度工具鋼のチタンコーティング被膜の除去剤 |
JP2946911B2 (ja) * | 1992-02-06 | 1999-09-13 | セイコーエプソン株式会社 | 装飾部材の製造方法 |
JPH0649659A (ja) * | 1992-08-04 | 1994-02-22 | Shikoku Electric Power Co Inc | 耐環境・耐摩耗性被覆材料 |
JPH06340961A (ja) * | 1993-03-24 | 1994-12-13 | Sumitomo Metal Mining Co Ltd | 医療用部材 |
DE4339502C2 (de) * | 1993-11-24 | 1999-02-25 | Thoene Carl Stefan | Entschichtungslösung zum naßchemischen Entfernen von Hartstoffschichten und Verfahren zu deren Anwendung |
JP3460287B2 (ja) * | 1994-01-21 | 2003-10-27 | 住友電気工業株式会社 | 耐摩耗性に優れた表面被覆部材 |
DE59811875D1 (de) * | 1997-11-10 | 2004-09-30 | Unaxis Trading Ag Truebbach | Verfahren zum entschichten von körpern |
-
1999
- 1999-05-31 JP JP2000553634A patent/JP4824163B2/ja not_active Expired - Lifetime
- 1999-05-31 WO PCT/CH1999/000234 patent/WO1999064646A1/fr active IP Right Grant
- 1999-05-31 EP EP99920529A patent/EP1093534B1/fr not_active Expired - Lifetime
- 1999-05-31 DE DE59914591T patent/DE59914591D1/de not_active Expired - Lifetime
-
2000
- 2000-12-07 US US09/735,723 patent/US6706122B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1093534A1 (fr) | 2001-04-25 |
JP2002517615A (ja) | 2002-06-18 |
WO1999064646A1 (fr) | 1999-12-16 |
DE59914591D1 (de) | 2008-02-07 |
JP4824163B2 (ja) | 2011-11-30 |
US20010013356A1 (en) | 2001-08-16 |
US6706122B2 (en) | 2004-03-16 |
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