EP1013791B1 - Installation de projection à plasma - Google Patents

Installation de projection à plasma Download PDF

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Publication number
EP1013791B1
EP1013791B1 EP99810973A EP99810973A EP1013791B1 EP 1013791 B1 EP1013791 B1 EP 1013791B1 EP 99810973 A EP99810973 A EP 99810973A EP 99810973 A EP99810973 A EP 99810973A EP 1013791 B1 EP1013791 B1 EP 1013791B1
Authority
EP
European Patent Office
Prior art keywords
arrangement
treatment chamber
accordance
collecting shaft
base element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP99810973A
Other languages
German (de)
English (en)
Other versions
EP1013791A1 (fr
Inventor
Silvano Keller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Metco AG
Original Assignee
Sulzer Metco AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sulzer Metco AG filed Critical Sulzer Metco AG
Publication of EP1013791A1 publication Critical patent/EP1013791A1/fr
Application granted granted Critical
Publication of EP1013791B1 publication Critical patent/EP1013791B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/137Spraying in vacuum or in an inert atmosphere
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134Plasma spraying

Definitions

  • the invention relates to an arrangement for a with a treatment chamber and a plasma spraying device provided therein a plasma spraying device.
  • a plasma jet is generated by means of a plasmatron, in which the coating material to be applied to the substrate is melted.
  • This plasma jet can be at a very high velocity - up to the supersonic range into it.
  • Through the plasma jet is in the treatment chamber However, it generates a flow that adversely affects the purity of the surface of the substrate as well as the quality of the layer applied to the substrate can affect.
  • Such flow in the treatment chamber causes deposits such as Dust, powder grains, spray residues, etc. are whirled up. They sit down Deposits on the substrate surface solid and pollute them. In addition, get there the swirled deposits partly back into the coating jet from which they are carried away. In the coating jet they become Foreign particles are then heated and partially melted, allowing them together applied to the substrate with the actual coating material become. It is understood that the contamination of the substrate surface on the one hand adversely affects the adhesion of the layer to be applied and that on the other hand, the foreign particles melted in the plasma jet, the quality of adversely affect the layer applied to the substrate.
  • DE-A-3740498 shows an arrangement for a plasma spraying installation with a treatment chamber and a plasma spraying device arranged therein, the one at least partially in the interior of the treatment chamber arranged deflecting device, and a collecting shaft for Aspiration of spray dusts. It is therefore the object of the invention an arrangement in the preamble of the claim 1 type to improve such that the liability and / or the quality the layer applied to the substrate is improved.
  • the plasma sprayer intended for coating substrates (not shown) 2 is arranged in a treatment chamber 1. Below the treatment chamber 1, a collecting shaft 6 is provided. In the further are one Deflector 5, a coarse filter 10, two fine filters 14, 18, a vacuum pump 12, a circulating air blower 13 and a pneumatic cleaning device 23 shown.
  • the plasma sprayer 2 is on a multi-axis movable mechanism 3 within the substantially hollow cylindrical treatment chamber 1 arranged.
  • a deflection means provided basic element 7, which a passage opening 4 between the treatment chamber 1 and the Collecting shaft 6 leaves empty.
  • a substantially conical trained deflecting 8 arranged, with its tapered Top in the passage opening 4 of the base member 7 protrudes.
  • the collecting shaft 6 is connected to the coarse filter 10 via a first line 15.
  • a second conduit 16 leads to the suction side of the circulating air blower 13 and a third line 17 to the vacuum pump 12, wherein in both lines 16, 17 each have a fine filter 14, 18 is arranged.
  • From the print side of the circulating air blower 13 leads a line 16a back into the treatment chamber 1, wherein the conduit 16a opens in the region of the top in the treatment chamber 1.
  • gases from the Treatment chamber 1 are sucked, which first in the coarse filter 10 and after be freed of impurities in the fine filter 14.
  • the purified gases can be returned via the line 16 a back into the treatment chamber 1 become.
  • the vacuum pump 12 serves to evacuate the treatment chamber 1 and maintaining a certain negative pressure during the coating process. To open or close the connecting lines 15, 16 a, 17 If several slides 19, 20, 21 are provided.
  • a pneumatic cleaning device 23 provided to the treatment chamber 1 of loose deposits such as coating powder.
  • the cleaning device 23 has a supply line 25, which in a provided with a plurality of outflow openings blowpipe 24 opens.
  • the blow-off pipe 24 is disposed on the upper side of the movable mechanism 3.
  • As a gas for blowing away the deposits is preferably nitrogen or Argon used.
  • Fig. 2 shows in a perspective and partially transparent view, the basic Structure of the treatment chamber 1 together with the plasma sprayer 2 and arranged in the collecting shaft 6 basic element 7.
  • the basic element 7 forms part of a deflection device, generally designated by the reference numeral 5, which also additional, flow disturbing deflection in the form having arranged on the inside of the treatment chamber 1 baffles 27.
  • a rotatably supported Door provided, which, however, in favor of a clear presentation not is drawn.
  • the basic element 7 is mainly for catching excess coating material during the coating process. moreover Prevents the basic element 7 largely that trapped particles back can get into the treatment chamber.
  • the basic element causes 7 together with the deflector 8 and the baffles 27, that by the Coating jet of the plasma spray gun 2 caused interrupted gas flow and calms, so that it does not become an unwanted, circular orbiting Gas flow in the treatment chamber 1 comes.
  • the shell 30 of the base member 7 is on the inside with a plurality of obliquely provided below baffles 31, formed on the back of storage space become.
  • a vertically extending Sheet 29 is arranged, which with the door closed in between the inside the treatment chamber 1 and the outside of the shell 30 remaining Gap protrudes. This sheet 29 also serves to interrupt and calm the gas flow.
  • the above the base element 7 on the inner wall of Treatment chamber 1 arranged baffles 27 form on their backs also storage spaces.
  • Fig. 5 shows the base element 7 in a plan view. From this representation is in the essential oval design of the base element 7 and the course of the baffles 31 can be seen. The recess on the back of the base element 7 improves the freedom of movement of the mechanism 3 in the treatment chamber 1 (Fig. 1).
  • Fig. 6 shows the treatment chamber 1 again in a cross section, wherein schematically a spray jet 34 emerging from the plasma spray gun 2 is shown is.
  • the coating jet 34 is down against the Element 7 directed.
  • the coating jet 34 is in the base element. 7 deflected and divided by the central deflector 8 in the manner shown.
  • the storage space 32 behind the baffles 31 of the base member 7 are the in the coating jet 34 entrained coating particles in the base element 7 held back so that they no longer emerge upward from the base element 7 can.
  • the coating jet 34 is not vertically after, as shown here runs down, so prevent the arranged on the inner wall of the treatment chamber 1 Baffles also that a circular in the treatment chamber. 1 circulating gas flow can occur.
  • the vacuum pump 12 In the coating process, in the treatment chamber 1 maintained a certain negative pressure by the slide 20 in front of the vacuum pump 12 is open and by means of the vacuum pump 12 continuously through the Operation of the plasma sprayer 2 in the treatment chamber 1 passing gases be sucked off. With the extracted gases are also the excess Coating particles and other entrained in the gas flow or fluidized Particles removed from the treatment chamber 1. The bigger particles will be there taken from the coarse filter 10 and the smaller of the Feinflter 18. After this Coating operation, the pressure in the treatment chamber 1 normally raised to the outside of the treatment chamber 1 prevailing ambient pressure, leaving the door open and the coated substrate out of the treatment chamber 1 can be taken.
  • treatment chamber 1 for coating substrates can also be acted upon with a non-reactive, preferably inert gas.
  • the pneumatic cleaning device 23 is provided. Outside one Coating process 23 loose deposits by means of this cleaning device blown away in the treatment chamber 1 and into the collecting shaft. 6 to get promoted.
  • the cleaning device 23 is preferably through the circulating air blower 13 supported by the ones located in the treatment chamber Gas -Luft- continuously circulated, which entrained in the gas stream Particles in the coarse filter 10 and fine filter 14 are excreted. This revolution is maintained until a certain purity of the gases is reached is.
  • the blow-off tube 24 can also in different directions be pivoted so that the gas jet to specific areas of the treatment chamber 1 directed and the cleaning effect can be optimized.
  • the deflection arrangement 5 largely is prevented during operation of the plasma spray gun 2, in particular during the coating process, loose deposits such as dust, powder grains, Spray residues, etc. in the treatment chamber 1 and possibly stirred up from the coating jet be carried away.
  • Loose deposits are mainly in the collecting shaft 6 and / or excreted from the filters 10, 14, 16.
  • a pneumatic cleaning device 23 is provided by means of which Deposits blown away from the inside of the treatment chamber 1 and in the collection shaft 6 can be transported.
  • the described device is not only during the coating process prevents the swirling of deposits, but also, for example when a substrate is cleaned by means of the plasma sprayer or this in the Idling is operated.
  • this cleaning process which under the term "sputtering" is known, one of the plasmatron is transferred to the substrate Arc generated.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
  • Plasma Technology (AREA)

Claims (13)

  1. Agencement pour une installation de projection à plasma pourvue d'une chambre de traitement (1) et d'un appareil de projection à plasma (2) disposé dans celle-ci, où l'agencement présente une installation de déviation (5) disposée au moins partiellement dans l'espace intérieur de la chambre de traitement (1), qui est pourvue d'une pluralité de moyens déviant l'écoulement, lesdits moyens comprenant un élément de base (7) sous la forme d'une coque extérieure (30) diminuant vers le puits de recueillement (6), un élément de déviation (8) réalisé sensiblement en forme conique, faisant saillie dans une ouverture traversante (4) de l'élément de base (7) ainsi que des moyens de déviation additionnels (27) disposés dans l'espace intérieur de la chambre de traitement (1), caractérisé en ce qu'il est disposé d'une manière contiguë à la chambre de traitement (1) un puits de recueillement (6) verticalement en dessous de la chambre de traitement (1), et que l'installation de déviation (5) est prévue dans la zone de transition de la chambre de traitement (1) au puits de recueillement (6).
  2. Agencement selon la revendication 1, caractérisé en ce que l'élément de base (7) est disposé dans la zone de transition de la chambre de traitement (1) au puits de recueillement (6), et que l'élément de base (7) est muni d'éléments de guidage (31) et que subsiste au moins une ouverture traversante (4) entre la chambre de traitement (1) et le puits de recueillement (6).
  3. Agencement selon l'une des revendications 1 ou 2, caractérisé en ce que le côté supérieur de l'élément de base (7) dépasse du puits de recueillement (6).
  4. Agencement selon l'une des revendications précédentes, caractérisé en ce que l'élément de base (7), qui est réalisé comme coque extérieure (30) diminuant vers le puits de recueillement (6), présente à sa paroi intérieure plusieurs chicanes (31) s'étendant en biais vers le côté intérieur du puits de recueillement (6), qui forment au côté arrière des espaces de retenue (32).
  5. Agencement selon l'une des revendications précédentes, caractérisé en ce que la coque extérieure (30) possède une forme sensiblement ovale.
  6. Agencement selon l'une des revendications précédentes, caractérisé en ce que le puits de recueillement (6) est relié d'une manière pneumatique au côté aspiration d'une soufflerie (13) et/ou à une pompe de vide (12).
  7. Agencement selon la revendication 6, caractérisé en ce que le puits de recueillement (6) est relié à la soufflerie (13) par un conduit (15, 16) pourvu d'au moins un filtre (10, 14).
  8. Agencement selon l'une des revendications précédentes, caractérisé en ce que l'appareil de projection à plasma (2) est disposé verticalement au-dessus de l'élément de base (7).
  9. Agencement selon l'une des revendications précédentes, caractérisé en ce que l'appareil de projection à plasma (2) est disposé à un mécanisme mobile (3).
  10. Agencement selon l'une des revendications précédentes, caractérisé en ce qu'un dispositif de nettoyage pneumatique (23) est prévu au moyen duquel un flux de gaz peut être produit dans la chambre de traitement (1) de façon à convoyer des dépôts dans le puits de recueillement (6).
  11. Agencement selon la revendication 10, caractérisé en ce que le dispositif de nettoyage pneumatique (23) présente un tuyau de soufflage (24) muni d'une pluralité d'ouvertures d'écoulement.
  12. Agencement selon la revendication 11, caractérisé en ce que le tuyau de soufflage (24) est disposé au mécanisme mobile (3).
  13. Installation de projection à plasma, caractérisée en ce que celle-ci est pourvue d'un agencement réalisé selon l'une des revendications précédentes.
EP99810973A 1998-12-24 1999-10-27 Installation de projection à plasma Expired - Lifetime EP1013791B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH02568/98A CH697092A5 (de) 1998-12-24 1998-12-24 Anordnung für eine Plasmaspritzanlage.
CH256898 1998-12-24

Publications (2)

Publication Number Publication Date
EP1013791A1 EP1013791A1 (fr) 2000-06-28
EP1013791B1 true EP1013791B1 (fr) 2005-08-10

Family

ID=4236736

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99810973A Expired - Lifetime EP1013791B1 (fr) 1998-12-24 1999-10-27 Installation de projection à plasma

Country Status (7)

Country Link
US (1) US6357386B1 (fr)
EP (1) EP1013791B1 (fr)
JP (1) JP4637309B2 (fr)
CA (1) CA2289870C (fr)
CH (1) CH697092A5 (fr)
DE (1) DE59912388D1 (fr)
SG (1) SG85147A1 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10115376B4 (de) * 2001-03-28 2006-03-16 EISENMANN Fördertechnik GmbH & Co. KG Anlage zum Pulverlackieren von Gegenständen
FR2841904B1 (fr) * 2002-07-03 2004-08-20 Inst Nat Sante Rech Med Analogues de facteurs x clivables par la thrombine
ATE330327T1 (de) * 2002-07-23 2006-07-15 Iplas Gmbh Plasmareaktor zur durchführung von gasreaktionen und verfahren zur plasmagestützten umsetzung von gasen
CN100404206C (zh) * 2005-12-08 2008-07-23 北京北方微电子基地设备工艺研究中心有限责任公司 拆装半导体抽真空设备的方法
CH711291A1 (de) 2015-07-03 2017-01-13 Amt Ag Anordnung sowie Verfahren zum Beschichten von Werkstücken.
JP6477406B2 (ja) * 2015-10-14 2019-03-06 株式会社デンソー 溶射装置
CN109819660B (zh) * 2017-09-18 2022-05-03 林科泰克特伦多股份公司 等离子体喷涂装置和方法
CN113198643B (zh) * 2021-04-25 2022-04-22 浙江中聚材料有限公司 一种太阳能背板涂布装置

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Publication number Priority date Publication date Assignee Title
GB815804A (en) * 1956-07-06 1959-07-01 Plessey Co Ltd Improvements relating to masked spraying
US3100724A (en) * 1958-09-22 1963-08-13 Microseal Products Inc Device for treating the surface of a workpiece
DE1962698A1 (de) * 1969-12-13 1971-06-24 Buettner Schilde Haas Ag Spruehkabine
AU548915B2 (en) * 1983-02-25 1986-01-09 Toyota Jidosha Kabushiki Kaisha Plasma treatment
JPS62106658U (fr) * 1985-12-25 1987-07-08
US4689468A (en) * 1986-02-10 1987-08-25 Electro-Plasma, Inc. Method of and apparatus providing oxide reduction in a plasma environment
DE3704551C1 (en) * 1987-02-13 1988-05-11 Gema Ransburg Ag Spray coating system
US4775547A (en) * 1987-02-25 1988-10-04 General Electric Company RF plasma method of forming multilayer reinforced composites
DE3740498A1 (de) * 1987-11-30 1989-06-08 Matthaeus Heinz Dieter Vorrichtung zum thermischen beschichten von oberflaechen
JP2728264B2 (ja) * 1988-06-23 1998-03-18 トーカロ株式会社 通電性に優れるコンダクターロールの製造方法およびコンダクターロール
JPH02241564A (ja) * 1989-03-15 1990-09-26 Mitsubishi Heavy Ind Ltd 低圧溶射装置
JPH05179417A (ja) * 1991-12-27 1993-07-20 Nippon Steel Corp プラズマ溶射装置
JPH08199372A (ja) * 1995-01-26 1996-08-06 Nisshin Steel Co Ltd 傾斜機能材料の製法および装置
JPH08209322A (ja) * 1995-02-03 1996-08-13 Hitachi Ltd 水中構造物の耐食コーティング法
US5683517A (en) * 1995-06-07 1997-11-04 Applied Materials, Inc. Plasma reactor with programmable reactant gas distribution

Also Published As

Publication number Publication date
DE59912388D1 (de) 2005-09-15
SG85147A1 (en) 2001-12-19
CH697092A5 (de) 2008-04-30
CA2289870A1 (fr) 2000-06-24
JP4637309B2 (ja) 2011-02-23
JP2000239822A (ja) 2000-09-05
US6357386B1 (en) 2002-03-19
EP1013791A1 (fr) 2000-06-28
CA2289870C (fr) 2005-07-05

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