EP0926708A3 - Méthode et appareil pour le traitement de plaquettes semiconductrices - Google Patents
Méthode et appareil pour le traitement de plaquettes semiconductrices Download PDFInfo
- Publication number
- EP0926708A3 EP0926708A3 EP98310683A EP98310683A EP0926708A3 EP 0926708 A3 EP0926708 A3 EP 0926708A3 EP 98310683 A EP98310683 A EP 98310683A EP 98310683 A EP98310683 A EP 98310683A EP 0926708 A3 EP0926708 A3 EP 0926708A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- wafer
- warpage
- electrostatic chuck
- clamping
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 235000012431 wafers Nutrition 0.000 title abstract 16
- 238000000034 method Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000005299 abrasion Methods 0.000 abstract 1
- 230000001419 dependent effect Effects 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/996,576 US5872694A (en) | 1997-12-23 | 1997-12-23 | Method and apparatus for determining wafer warpage for optimized electrostatic chuck clamping voltage |
US996576 | 1997-12-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0926708A2 EP0926708A2 (fr) | 1999-06-30 |
EP0926708A3 true EP0926708A3 (fr) | 2003-08-20 |
Family
ID=25543076
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98310683A Withdrawn EP0926708A3 (fr) | 1997-12-23 | 1998-12-23 | Méthode et appareil pour le traitement de plaquettes semiconductrices |
Country Status (6)
Country | Link |
---|---|
US (1) | US5872694A (fr) |
EP (1) | EP0926708A3 (fr) |
JP (1) | JPH11251420A (fr) |
KR (1) | KR100592524B1 (fr) |
CN (1) | CN1150608C (fr) |
TW (1) | TW416182B (fr) |
Families Citing this family (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6113165A (en) * | 1998-10-02 | 2000-09-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Self-sensing wafer holder and method of using |
US6452291B1 (en) * | 1999-07-01 | 2002-09-17 | Voyan Technology | Reduction of switching transients via large signal/small signal thresholding |
JP2002009140A (ja) * | 2000-06-22 | 2002-01-11 | Mitsubishi Electric Corp | 静電チャック装置 |
JP4634581B2 (ja) * | 2000-07-06 | 2011-02-16 | キヤノンアネルバ株式会社 | スパッタリング方法、表面処理方法、スパッタリング装置及び表面処理装置 |
EP1184894B1 (fr) * | 2000-08-29 | 2007-11-21 | Qimonda Dresden GmbH & Co. oHG | Procédé d'opération d'un suscepteur pour des plaquettes semiconductrices |
US6403322B1 (en) | 2001-03-27 | 2002-06-11 | Lam Research Corporation | Acoustic detection of dechucking and apparatus therefor |
JP3639546B2 (ja) * | 2001-07-25 | 2005-04-20 | 株式会社日立国際電気 | 基板処理装置及び半導体装置の製造方法 |
US7198276B2 (en) * | 2003-10-24 | 2007-04-03 | International Business Machines Corporation | Adaptive electrostatic pin chuck |
US6950176B1 (en) * | 2004-01-12 | 2005-09-27 | Advanced Micro Devices, Inc. | Method and system for monitoring EUV lithography mask flatness |
US20050174665A1 (en) * | 2004-02-09 | 2005-08-11 | Xiaofeng Zhang | Electrical current measurements at head-disk interface |
JP2005353988A (ja) * | 2004-06-14 | 2005-12-22 | Canon Inc | 板状体搬送方法、搬送装置及び露光装置 |
US7452793B2 (en) * | 2005-03-30 | 2008-11-18 | Tokyo Electron Limited | Wafer curvature estimation, monitoring, and compensation |
US7292428B2 (en) * | 2005-04-26 | 2007-11-06 | Applied Materials, Inc. | Electrostatic chuck with smart lift-pin mechanism for a plasma reactor |
CN100383413C (zh) * | 2006-04-21 | 2008-04-23 | 上海大学 | 单体太阳电池在线测试用防碎、防粘连移栽吸盘 |
US20080084650A1 (en) * | 2006-10-04 | 2008-04-10 | Applied Materials, Inc. | Apparatus and method for substrate clamping in a plasma chamber |
JP2008116354A (ja) * | 2006-11-06 | 2008-05-22 | Nec Electronics Corp | 反り測定システム、成膜システム、及び反り測定方法 |
DE102006057075A1 (de) * | 2006-11-30 | 2008-06-05 | Friedrich-Schiller-Universität Jena | Verfahren und Vorrichtung zur Messung der Form eines Wafer-Chucks |
US8149562B2 (en) * | 2007-03-09 | 2012-04-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | System for decharging a wafer or substrate after dechucking from an electrostatic chuck |
US7957827B2 (en) * | 2007-12-27 | 2011-06-07 | United Microelectronics Corp. | Method of controlling statuses of wafers |
US7558045B1 (en) * | 2008-03-20 | 2009-07-07 | Novellus Systems, Inc. | Electrostatic chuck assembly with capacitive sense feature, and related operating method |
JP2010123810A (ja) * | 2008-11-20 | 2010-06-03 | Ulvac Japan Ltd | 基板保持装置及び基板温度制御方法 |
US7957118B2 (en) * | 2009-04-30 | 2011-06-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multi-zone electrostatic chuck and chucking method |
JP5412270B2 (ja) | 2009-12-28 | 2014-02-12 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡 |
CN103066000B (zh) * | 2011-10-19 | 2015-11-25 | 中芯国际集成电路制造(上海)有限公司 | 晶圆承载设备及晶圆承载的方法 |
CN103065997B (zh) * | 2011-10-19 | 2015-08-05 | 中芯国际集成电路制造(上海)有限公司 | 晶圆承载设备及晶圆承载的方法 |
US8709528B2 (en) * | 2011-12-28 | 2014-04-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer processing method and system using multi-zone chuck |
KR101273921B1 (ko) | 2013-01-16 | 2013-06-12 | (주)코셈 | 정전용량 센서 어레이 패널을 이용한 콜렛의 수평도 및 압력 측정 시스템 |
JP6180909B2 (ja) * | 2013-12-06 | 2017-08-16 | 東京エレクトロン株式会社 | 距離を求める方法、静電チャックを除電する方法、及び、処理装置 |
US9891266B2 (en) * | 2014-02-25 | 2018-02-13 | Taiwan Semiconductor Manufacturing Co., Ltd. | Test circuit and method |
WO2015169616A1 (fr) | 2014-05-06 | 2015-11-12 | Asml Netherlands B.V. | Support de substrat, procédé de chargement d'un substrat sur un emplacement de support de substrat, appareil lithographique et procédé de fabrication de dispositif |
CN104900576A (zh) * | 2015-05-27 | 2015-09-09 | 上海华力微电子有限公司 | 一种静电吸盘静电吸力分布的调节方法 |
JP6924196B2 (ja) * | 2016-01-19 | 2021-08-25 | インテヴァック インコーポレイテッド | 基板製造用のパターンチャック |
JP6462614B2 (ja) * | 2016-03-16 | 2019-01-30 | 東芝メモリ株式会社 | パターン精度検出装置及び加工システム |
KR102644272B1 (ko) | 2016-10-31 | 2024-03-06 | 삼성전자주식회사 | 정전척 어셈블리 |
US10879094B2 (en) * | 2016-11-23 | 2020-12-29 | Applied Materials, Inc. | Electrostatic chucking force measurement tool for process chamber carriers |
US11114327B2 (en) * | 2017-08-29 | 2021-09-07 | Applied Materials, Inc. | ESC substrate support with chucking force control |
US10692749B2 (en) * | 2017-12-05 | 2020-06-23 | Axcelis Technologies, Inc. | Method to provide consistent electrostatic clamping through real time control of electrostatic charge deposition in an electrostatic chuck |
JP7101029B2 (ja) * | 2018-04-12 | 2022-07-14 | 東京エレクトロン株式会社 | 静電チャック、基板処理装置、及び、基板保持方法 |
JP7246154B2 (ja) * | 2018-10-02 | 2023-03-27 | 東京エレクトロン株式会社 | プラズマ処理装置及び静電吸着方法 |
KR20210090267A (ko) | 2018-12-20 | 2021-07-19 | 에이에스엠엘 네델란즈 비.브이. | 정전식 클램프를 포함하는 오브젝트 테이블 |
SG11202107929RA (en) * | 2019-02-06 | 2021-08-30 | Applied Materials Inc | Method and tool for electrostatic chucking |
CN113557597A (zh) | 2019-03-08 | 2021-10-26 | 应用材料公司 | 用于基板处理腔室的吸附工艺和系统 |
JP7108585B2 (ja) * | 2019-08-16 | 2022-07-28 | 日本特殊陶業株式会社 | 保持装置 |
CN110556332B (zh) * | 2019-10-14 | 2022-11-08 | 长江存储科技有限责任公司 | 静电吸附装置及晶圆吸附方法 |
JP7449198B2 (ja) | 2020-08-20 | 2024-03-13 | 株式会社日立ハイテク | 荷電粒子ビーム装置 |
JP6902215B1 (ja) * | 2020-12-14 | 2021-07-14 | 日新イオン機器株式会社 | イオン注入装置 |
US11562918B2 (en) * | 2021-01-07 | 2023-01-24 | Advanced Energy Industries, Inc. | Wafer chucking monitor using high frequency injected AC signal |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5732629A (en) * | 1980-08-07 | 1982-02-22 | Seiko Epson Corp | Mask aligner |
JPS59208741A (ja) * | 1983-05-12 | 1984-11-27 | Mitsubishi Electric Corp | 半導体ウエ−ハ用吸着チヤツク装置 |
JPH06163674A (ja) * | 1992-11-18 | 1994-06-10 | Hitachi Ltd | 試料保持装置のモニタ方法 |
JPH07211768A (ja) * | 1994-01-13 | 1995-08-11 | Hitachi Ltd | 静電吸着装置の保持状態確認方法 |
US5535090A (en) * | 1994-03-03 | 1996-07-09 | Sherman; Arthur | Electrostatic chuck |
JPH08191098A (ja) * | 1995-01-09 | 1996-07-23 | Hitachi Ltd | 静電吸着装置 |
WO1998057359A1 (fr) * | 1997-06-11 | 1998-12-17 | Applied Materials, Inc. | Procede et dispositif pour la detection de plaquettes |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1988009054A1 (fr) * | 1987-05-06 | 1988-11-17 | Labtam Limited | Mandrin electrostatique utilisant une excitation de champ a courant alternatif |
US5325261A (en) * | 1991-05-17 | 1994-06-28 | Unisearch Limited | Electrostatic chuck with improved release |
US5202748A (en) * | 1991-06-07 | 1993-04-13 | Litel Instruments | In situ process control system for steppers |
US5436790A (en) * | 1993-01-15 | 1995-07-25 | Eaton Corporation | Wafer sensing and clamping monitor |
US5642298A (en) * | 1994-02-16 | 1997-06-24 | Ade Corporation | Wafer testing and self-calibration system |
US5515167A (en) * | 1994-09-13 | 1996-05-07 | Hughes Aircraft Company | Transparent optical chuck incorporating optical monitoring |
-
1997
- 1997-12-23 US US08/996,576 patent/US5872694A/en not_active Expired - Fee Related
-
1998
- 1998-12-22 JP JP10365077A patent/JPH11251420A/ja active Pending
- 1998-12-23 EP EP98310683A patent/EP0926708A3/fr not_active Withdrawn
- 1998-12-23 CN CNB981116620A patent/CN1150608C/zh not_active Expired - Fee Related
- 1998-12-23 KR KR1019980057480A patent/KR100592524B1/ko not_active IP Right Cessation
-
1999
- 1999-01-19 TW TW087121521A patent/TW416182B/zh not_active IP Right Cessation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5732629A (en) * | 1980-08-07 | 1982-02-22 | Seiko Epson Corp | Mask aligner |
JPS59208741A (ja) * | 1983-05-12 | 1984-11-27 | Mitsubishi Electric Corp | 半導体ウエ−ハ用吸着チヤツク装置 |
JPH06163674A (ja) * | 1992-11-18 | 1994-06-10 | Hitachi Ltd | 試料保持装置のモニタ方法 |
JPH07211768A (ja) * | 1994-01-13 | 1995-08-11 | Hitachi Ltd | 静電吸着装置の保持状態確認方法 |
US5535090A (en) * | 1994-03-03 | 1996-07-09 | Sherman; Arthur | Electrostatic chuck |
JPH08191098A (ja) * | 1995-01-09 | 1996-07-23 | Hitachi Ltd | 静電吸着装置 |
WO1998057359A1 (fr) * | 1997-06-11 | 1998-12-17 | Applied Materials, Inc. | Procede et dispositif pour la detection de plaquettes |
Non-Patent Citations (5)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 006, no. 099 (E - 111) 8 June 1982 (1982-06-08) * |
PATENT ABSTRACTS OF JAPAN vol. 009, no. 069 (E - 305) 29 March 1985 (1985-03-29) * |
PATENT ABSTRACTS OF JAPAN vol. 018, no. 477 (E - 1602) 6 September 1994 (1994-09-06) * |
PATENT ABSTRACTS OF JAPAN vol. 1995, no. 11 26 December 1995 (1995-12-26) * |
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 11 29 November 1996 (1996-11-29) * |
Also Published As
Publication number | Publication date |
---|---|
JPH11251420A (ja) | 1999-09-17 |
KR19990063358A (ko) | 1999-07-26 |
CN1150608C (zh) | 2004-05-19 |
TW416182B (en) | 2000-12-21 |
KR100592524B1 (ko) | 2006-08-30 |
EP0926708A2 (fr) | 1999-06-30 |
CN1230774A (zh) | 1999-10-06 |
US5872694A (en) | 1999-02-16 |
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Owner name: INTERNATIONAL BUSINESS MACHINESCORPORATION Owner name: INFINEON TECHNOLOGIES AG |
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