EP0769202B1 - Flüssigmetallionenquelle - Google Patents

Flüssigmetallionenquelle Download PDF

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Publication number
EP0769202B1
EP0769202B1 EP95920933A EP95920933A EP0769202B1 EP 0769202 B1 EP0769202 B1 EP 0769202B1 EP 95920933 A EP95920933 A EP 95920933A EP 95920933 A EP95920933 A EP 95920933A EP 0769202 B1 EP0769202 B1 EP 0769202B1
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EP
European Patent Office
Prior art keywords
liquid metal
ion source
metal ion
source according
point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP95920933A
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English (en)
French (fr)
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EP0769202A1 (de
Inventor
Jacques Gierak
Gérard Jacques BEN ASSAYAG
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
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Centre National de la Recherche Scientifique CNRS
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Publication of EP0769202A1 publication Critical patent/EP0769202A1/de
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Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H01J27/22—Metal ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

Definitions

  • the present invention relates to the field sources of liquid metal ions, in which ions are produced from a filler metal which covers a refractory metal tip.
  • the emissive zone is of the order of a few nm 2 for an emission current of approximately 2 ⁇ A.
  • This type of source has the advantages of on the one hand simplicity and on the other hand compactness since the graphite tip has a diameter about 0.8 mm, for a length of 2 mm.
  • WO 86/06210 describes another type of ion source, comprising a tip and an element heating in the form of a ribbon. A hole in the ribbon heater allows molten liquid to flow into tip direction.
  • the present invention seeks to resolve the problems mentioned above.
  • Its object is a source of metal ions liquid comprising a cylindrical rod made of a material conductor and refractory extended by a point in refractory material, intended to be covered with a liquid filler metal, characterized in that the assembly constituted by the cylindrical rod and the point passes through a tank made of a material conductive and refractory, the area where the rod is engaged in the reservoir ensuring electrical contact between the rod and the tank, and in that the tank is in contact with a conductive filament, the rod cylindrical, reservoir and conductive filament thus being connected in series from the electrical point of view.
  • Such a constitution for an ion source made of liquid metal helps limit energy intake necessary for optimal functioning of the source.
  • production of a heating only in a very localized area limited to the part of the cylindrical rod near the tip, at tank and tungsten filament.
  • the element more resistive of the circuit thus formed is the part cylindrical of the rod, which when crossed by a current of 5 amperes, by Joule effect, reached a temperature of 700 ° C near its end.
  • the power consumed is limited to less than 10 Watts.
  • the set is an assembly and a much less delicate positioning than in sources of liquid metal ions known in the art prior. Finally, the mechanical stability is clearly improved. The use of a tank allows by elsewhere to increase the supply of liquid metal and, therefore, the lifetime of the source.
  • the rod and the point form a single and same room
  • the stem and tip can be graphite.
  • the graphite tip is covered with a titanium film.
  • the tip is covered a metallic bonding layer of the same type as liquid metal intended for use with the source.
  • the bonding layer can not only cover the tip, but also part of the tank.
  • the liquid metal intended for covering the graphite tip is, for example, aluminum
  • a tip surface treatment improves its wettability by liquid aluminum.
  • the second has the advantage of allow a very homogeneous aluminum film to be obtained across the entire tip. Indeed, the processing of graphite tip surface by film deposition titanium does not allow wetting homogeneous tip with aluminum film: we actually obtains aluminum island formation at the surface of the graphite tip and it results that the function of bringing aluminum to the point is very disturbed. The emitted current is then unstable and very difficult to keep constant over long periods.
  • the second treatment promotes a share the contribution function of the metal to be ionized towards the apex of the point, and on the other hand allows to increase the quantity of filler metal stored.
  • the stream ion obtained during the production of aluminum ions is even more stable over time.
  • the cylindrical rod and the tip are mechanically adjusted with tight tolerances to inside the area planned for their passage in the tank.
  • This adjustment has the following advantage. While the source is operating, it is possible than hot spots, other than those located at near the tip, appear on the stem cylindrical, on the other side of the tank with respect to The point. So if there is some play between the cylindrical rod and the reservoir, the liquid metal there introduces and goes up towards these hot spots, starting which it can evaporate, which shortens the duration of source life. The adjustment, without any play of the rod inside the tank, helps to remedy this disadvantage.
  • Figure 2 illustrates a particular mode of production of a liquid metal ion source according to the present invention.
  • This source consists of a rod conductive comprising a cylindrical part 10 and a point, the latter itself being made up of a part or conical end 12 and part cylindrical 13.
  • the cylindrical part 10 is constituted of a conductive and refractory material.
  • the graphite is well suited for an application to a source of light metal ions, such as aluminum. But this does not exclude the employment of others materials, such as for example tungsten.
  • the stem, in its cylindrical part 10, can have, in the case graphite, a diameter of the order of a few tenths of a millimeter, for example 0.5 mm, and a length between 5 and 20 mm, for example 15 mm.
  • a single pencil type "HB" was used, which gave full satisfaction.
  • the end 12 of the tip is cut in cone shape, half angle at the top having a value between 48 and 50 °, for example 49 °, by mechanical polishing in two stages.
  • the tip is placed in rotation, inclined by about 49.5 °, and it is brought into contact with a plane that will machine the part conical.
  • the cone is outlined on an average roughness surface, around 30 ⁇ m.
  • the finishing is carried out on a surface of low roughness, for example a few microns.
  • the tip that is to say the set made up by the cylindrical part 13 and the conical end 12 has a total length of between 5 and 10 mm, the cylindrical part 13 having a length of a few mm (for example 3 mm).
  • the assembly forms a single piece.
  • the rod is introduced into a reservoir 14, two examples of which are illustrated more specifically in Figures 3a and 3b.
  • the reservoir designated by the references 14-1 and 14-2 has a shape having substantially a symmetry of revolution around an axis passing through the part 10.
  • an opening cylindrical 19, inside the tank allows the passage, but also the maintenance of the rod in a fixed position and contributes to the mechanical stability of all.
  • the tank 14-2 has a recessed part 18, in the form of chamfer. The purpose of this recess is to allow increase the liquid metal capacity of the tank.
  • An interior recess 17 makes it possible to reduce the volume of material used for the tank.
  • the tank is made up of a conductive and refractory material. If the rod 10 is made of graphite, just choose for example the graphite as material for the tank.
  • a particularly graphite form advantageous is vitreous carbon.
  • glassy carbon has a waterproof structure with closed pores.
  • the tip is made of carbon glassy, its longevity will be extended and the resistivity will be improved. Furthermore the tip alone can always be cut electrochemically.
  • Rod 10 being used as a conductor electric, there is, in principle, production of a heating in a very localized area, limited to the conical part 12, to the cylindrical part 13 and to the tank 14.
  • the temperature can reach a value greater than that of the temperature at the end of the rod, near the point 12, because in the vicinity of this point the presence of liquid metal helps to dissipate heat.
  • liquid metal can tend to spread thermally, along the stem, direction of hot spots, which results in gradually empty the tank and, therefore, decrease the autonomy of the source.
  • the reservoir 14 is electrically connected to a heating circuit.
  • This circuit can be constituted for example by a filament tungsten 16 wrapped around the base of the tank 14, on the side opposite to the point 12.
  • the ends of this filament are themselves connected to elements conductors 24, 26, such as for example plates tantalum.
  • the filament 16 is not in contact with the outer surface of the tank 14 but it's introduced into a groove cut into the surface of this tank. This limits the contact between the heating filament 16 and possible drops of liquid metal that could diffuse along the outer surface of the reservoir 14. Indeed, some liquid metals, especially aluminum, are extremely corrosive to metals.
  • the rod is held at its base by a clamp consisting of two jaws 28, 30 which has for on the one hand, to provide mechanical maintenance of the rod with maximum rigidity without weakening it, and secondly to ensure reliable electrical contact with the material of this rod, electrical contacts which allow the circulation of a current of approximately 6 A.
  • the heating circuit comprises the rod, with its cylindrical part 10 and its tip, the reservoir 14 and the filament 16. From the point of electrical view, all these elements are connected in series and the whole works under a tension floating supply of the order of a few volts.
  • the most resistive element of the circuit is the part cylindrical 10 of the rod, which, when it is crossed by a current of 5 A, reaches a temperature of 700 ° C by Joule effect.
  • the fact using the rod as a heating element allows limit the power consumed to approximately less than 10 Watts.
  • the assembly rests on a base 32, crossed by 3 threaded rods 27-1, 27-2, 27-3.
  • the threaded rod central 27-2 is extended by the jaws 28, 30; the lateral rods 27-1 and 27-3 are extended by fixing jaws 29-1 and 29-2 of the plates 26 and 24. All these elements (jaws, threaded rods) make part of the electrical circuit.
  • the structure which has just been described confers very good overall mechanical stability, and especially at point 12. This stabilizes the emissive area, at the apex of the tip, and make the source compatible with use in fields techniques where the precision required is extremely high, for example in electrostatic optics.
  • the source described is fully compatible with machines or systems already existing on which metal ion sources prior art liquids are suitable.
  • FIG. 4 Another embodiment of the rod is shown in Figure 4.
  • the rod passes through a reservoir 15.
  • the latter is similar to that described above in connection with FIG. 3b, except for the cylindrical opening 33 which has a larger diameter in its upper part than in its lower part, thus defining a shoulder 34.
  • the stem is still made up of a part cylindrical 35. It is extended by a point which itself consists of a conical part 37, of a cylindrical part 39 and a rim 41.
  • the rod 35 is significantly larger in diameter than in the first embodiment of the rod.
  • the cylindrical part 39 and the end 37 of the point have, them, substantially the same dimensions as before.
  • the part cylindrical and the tip consist of two different materials.
  • the rod is made of a conductive material and refractory, for example graphite. As in the first embodiment, it can be achieved by example from a pencil lead. She is introduced over part of the depth of the cylindrical opening 33, so as to be in contact with the tip.
  • the tip is made of a material refractory such as boron nitride or alumina. It is introduced so that the rim 41 rests on the shoulder 34 and it is in contact with the end of the cylindrical part 35.
  • the tip 37 is cut with a half angle at vertex between 48 and 50 ° (worth for example 49 °) by mechanical polishing using an abrasive such as example a diamond wheel.
  • This second embodiment can also be used in combination with a form tank similar to that described in connection with FIG. 3a, provided that the cylindrical opening is adapted to corresponding way (cylinder opening more wider in its upper part than in its part lower). What was said in the first embodiment, on mechanical adjustment with tight tolerances apply as well to this second embodiment.
  • the operation of the source is the same; he there is always electrical contact between the rod 35 and the tank 15 and the current flows from the rod to the tank and heating filament. This current produces a heating of the point by Joule effect.
  • a surface treatment has been described in the article by Bell et al. already cited above.
  • This treatment consists in depositing an aqueous solution of titanium powder on the tip. After drying, the point is brought under vacuum to a temperature of approximately 1700 ° C to melt the titanium.
  • This treatment is compatible with the structure of the source according to the present invention, as described above.
  • a variant of this surface treatment consists of depositing the titanium film by spraying before bringing it under vacuum to a temperature about 1700 ° C to melt it.
  • this surface treatment a significantly improved homogeneity of the aluminum film by compared to the homogeneity obtained in the case where the surface is treated with the method described above. This allows to have a good contribution function towards the apex of the point, and therefore an ion current more stable over time.
  • a third method of processing surfaces usable in the context of this invention consists in irradiating with an ion beam the tip and the tank to receive the metal filler liquid.
  • the ion beam is an aluminum ion beam.
  • the irradiation is carried out in a vacuum enclosure.
  • the Figure 5 shows schematically the implementation of the irradiation process.
  • the source whose end must be irradiated is shown on the right of the figure, in vertical position, supported by a support 40, which can pivot about a vertical axis, and which can also be moved in translation along three perpendicular directions of space.
  • This source can either be a source identical to the one we are trying to achieve, and to which we have already applied a similar treatment, either a source such as that described in the prior art, by example in the article by Bell et al., already cited above.
  • An extraction electrode 44 allows to accelerate the ions formed by the source 42 in the form of a beam 48 which passes through a window 46 made in electrode 44. This window has a extraction diaphragm 47.
  • the emitting point is brought to a variable high voltage, about 10-12 kV.
  • the assembly constituted by the extraction electrode 44 and the source 42 can be oriented according to three perpendicular directions of space.
  • the ion beam 48 has a conical shape, such as shown in Figure 4, and it's on the central axis of this beam that is distributed the maximum of the current. It is therefore advantageous to position the source 42 of such so that the part to be irradiated from source 38 located approximately on the central axis of the beam of ions 48.
  • the ion dose received by the source 38 during the treatment corresponds approximately to a surface dose of 10 18 ions / cm 2 , that is to say to an irradiation with a current of 2 ⁇ A for 1 hour.
  • the acceleration voltage imposed on the aluminum ions formed from the source 42 can vary between a few kilovolts and 20 kilovolts; it can be worth for example around 12 kilovolts.
  • each of the two stages described above depends on the current used in each step. With a current of a few microamps, the first stage has a duration of about 20 minutes; for a current of approximately 50 ⁇ A, the second stage lasts approximately 40 minutes.
  • a implantation step for ions and aggregates metallic already deposited on the surface it is possible to add to these two steps a implantation step for ions and aggregates metallic already deposited on the surface to be treated in the first two steps.
  • the source 42 emits a current of a few microamps, so as to emit a beam mainly comprising single ions, and few of aggregates.
  • These ions are accelerated under a voltage maximum (around 20 kilovolts), so that "sink" the aggregates deposited during the second stage, in the superficial part of the area which has been processed in the previous steps.
  • a protective sheet 50 such than for example a sheet of aluminum foil. This can be important, in case the liquid metal with which the source is intended to be used, may exhibit corrosion effects on parts source metal. This is particularly the case for aluminum which, in the liquid state, can easily corrode the parts of the heating system of the tank and tip outside of these, in particular the tungsten filament 16 (see FIG. 2).
  • This third treatment applicable to a source having the structure according to the invention can also be applicable to any type of source of liquid metal ions, in particular to a source having the structure described in the article by Bell et al., And illustrated in FIG. 1.
  • the wettability of graphite is improved compared to the treatment proposed by Bell et al. in the aforementioned article, since the latter leads to the formation of aluminum islands on the surface of the graphite tip.
  • the invention has been described in the context of the production of a source of aluminum ions.
  • the choice of this element is not limiting and the same structure and the same surface treatment can be used for any source of ions of another nature, for example for a source of boron.
  • the surface treatment will then consist in irradiating the source with a beam of boron ions, first of B + ions then of B n + aggregates.
  • Boron is, moreover, a corrosive element in the liquid state, like aluminum, and it is therefore preferable to limit the surface treatment to the tip 12 of graphite and to the "front" part of the reservoir 14.
  • Source structure according to this invention can also be used for the production of ions from other elements, in particular non-corrosive elements in the liquid state.
  • the beam obtained can be more or less rich in metallic aggregates of variable size. In makes this selection depends on the voltage applied to The point. For this reason, the entire source is brought to a high voltage of around 11 kV, the additional HV power supply being connected to the base of rod 10 (via jaws 28, 30 in the representation of Figure 2).
  • the modulation of high voltage leads to modulation of the current emitted by the tip, this current modulating at turn the size distribution of the aggregates issued.
  • the potential difference between the tip and the extraction electrode modulates, the kinetic energy of the emitted ions or aggregates.
  • the principle then consists in using interaction between an ion beam very energetic, focused in a spot of less than 0.1 micron, and a sample.
  • Incident ions will locally spray the surface of the sample, at the spot corresponding to the impact area.
  • Figure 6 is a photograph of a copper grid taken using an electron microscope, in which the electron gun of the microscope has been replaced by the source of aluminum ions.
  • the ion acceleration voltage is 12.5 keV
  • the emission current is 16 ⁇ A.
  • the wires 60, 62, 64 of the grid have a thickness of approximately 25 ⁇ m. To make such a shot, the grid must be irradiated with a very stable beam of Al + ions for approximately 1 min 30 seconds. This photograph therefore shows the very good stability, over time, of the current and of the beam of the source according to the invention.
  • FIG. 7 is a photograph of an etching carried out on GaAs by a beam of Al + ions of 20 keV of energy (current i ⁇ 11 ⁇ A). In this photo, 1 cm represents 100 nm.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)

Claims (18)

  1. Flüssigmetallionenquelle mit einer zylindrischen Stange (10, 35) aus einem leitfähigen und refraktären Material, verlängert durch eine Spitze (12, 13; 37, 39) aus refraktärem Material, dazu bestimmt, mit einem flüssigen Zusatzmetall bedeckt zu werden,
    dadurch gekennzeichnet,
    daß die durch die zylindrische Stange und die Spitze gebildete Einheit einen Speicher (14, 15) aus einem leitfähigen und refraktären Material durchquert, wobei die Zone (19, 33), wo die Stange sich innerhalb des Speichers befindet, einen elektrischen Kontakt zwischen der Stange und dem Speicher sicherstellt, und dadurch, daß der Speicher in Kontakt ist mit einem leitfähigen Faden bzw. Draht (16), wobei die zylindrische Stange, der Speicher und der Faden bzw. Draht in elektrischer Hinsicht in Serie geschaltet sind.
  2. Flüssigmetallionenquelle nach Anspruch 1, wobei die Stange (10) und die Spitze (12, 13) ein einziges Stück bilden.
  3. Flüssigmetallionenquelle nach Anspruch 2, wobei die Stange (10) und die Spitze (12, 13) aus Graphit sind.
  4. Flüssigmetallionenquelle nach Anspruch 3, wobei die Spitze (12, 13) mit einem Titanfilm überzogen ist.
  5. Flüssigmetallionenquelle nach Anspruch 1, wobei die Stange (35) aus einem anderen Material ist als die Spitze (37, 39).
  6. Flüssigmetallionenquelle nach Anspruch 5, wobei die Stange (35) aus Graphit ist.
  7. Flüssigmetallionenquelle nach einem der Ansprüche 5 oder 6, wobei die Spitze (37, 39) aus Aluminiumoxid oder Bornitrid ist.
  8. Flüssigmetallionenquelle nach Anspruch 1, wobei die Spitze (12, 13, 37, 39) mit einer metallischen Haftschicht von derselben Art wie das Flüssigmetall bedeckt ist, das mit der Quelle benutzt werden soll.
  9. Flüssigmetallionenquelle nach Anspruch 8, wobei die Haftschicht die Spitze und einen Teil (20, 31) des Speichers (14, 15) bedeckt.
  10. Flüssigmetallionenquelle nach einem der Ansprüche 8 oder 9, wobei die Haftschicht durch Ionenbeschuß erzeugt werden kann.
  11. Flüssigmetallionenquelle nach Anspruch 10, wobei der Ionenbeschuß zwei Schritte umfassen kann:
    einen Dekapier- bzw. Beizschritt, während dem man auf die zu bestrahlenden Teile der Ionenquelle einen einfachen Ionenstrahl richtet, der praktisch keine Aggregate enthält,
    einen zweiten Schritt, während dem man auf die zu bestrahlenden Teile der Quelle einen Ionenstrahl richtet, der im wesentlichen metallische Aggregate umfaßt.
  12. Flüssigmetallionenquelle nach Anspruch 11, wobei außerdem ein Implantationsschritt vorgesehen ist und die Teile der zu bestrahlenden Quelle mit einem Strahl beschossen werden, die hauptsächlich einfache, unter einer starken Spannung beschleunigte Ionen umfassen und wenig Aggregate.
  13. Flüssigmetallionenquelle nach einem der Ansprüche 6 oder 8 bis 12, wobei die Spitze (12, 13, 37, 39) aus glasigem Kohlenstoff ist.
  14. Flüssigmetallionenquelle nach einem der vorangehenden Ansprüche, wobei der Speicher (14, 15) aus glasigem Kohlenstoff ist.
  15. Flüssigmetallionenquelle nach einem der vorangehenden Ansprüche, wobei die Stange und die Spitze (10, 13; 35, 39) mechanisch mit engen Toleranzen im Innern der Zone (19; 33) justiert werden, die in dem Speicher (14; 15) für ihren Durchgang vorgesehen ist.
  16. Flüssigmetallionenquelle nach einem der vorangehenden Ansprüche, wobei der Speicher (14) eine Vertiefung (18) aufweist.
  17. Flüssigmetallionenquelle nach einem der vorangehenden Ansprüche, wobei der Heizfaden bzw. -draht (16) in einer Rille am Umfang des Speichers (14; 15) sitzt.
  18. Verfahren zur Herstellung eines Musters mit Hilfe einer Flüssigmetallionenquelle nach einem der vorangehenden Ansprüche, wobei ein Metallionenstrahl mit Hilfe dieser Quelle erzeugt und auf die Probe gerichtet wird.
EP95920933A 1994-07-07 1995-07-06 Flüssigmetallionenquelle Expired - Lifetime EP0769202B1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR9408395 1994-07-07
FR9408395A FR2722333B1 (fr) 1994-07-07 1994-07-07 Source d'ions de metaux liquides
PCT/FR1995/000903 WO1996002065A1 (fr) 1994-07-07 1995-07-06 Source d'ions de metaux liquides

Publications (2)

Publication Number Publication Date
EP0769202A1 EP0769202A1 (de) 1997-04-23
EP0769202B1 true EP0769202B1 (de) 1999-04-28

Family

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Application Number Title Priority Date Filing Date
EP95920933A Expired - Lifetime EP0769202B1 (de) 1994-07-07 1995-07-06 Flüssigmetallionenquelle

Country Status (6)

Country Link
US (1) US5936251A (de)
EP (1) EP0769202B1 (de)
JP (1) JPH10506497A (de)
DE (1) DE69509390T2 (de)
FR (1) FR2722333B1 (de)
WO (1) WO1996002065A1 (de)

Families Citing this family (9)

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Publication number Priority date Publication date Assignee Title
US5969470A (en) * 1996-11-08 1999-10-19 Veeco Instruments, Inc. Charged particle source
FR2823005B1 (fr) * 2001-03-28 2003-05-16 Centre Nat Rech Scient Dispositif de generation d'un faisceau d'ions et procede de reglage de ce faisceau
US7129513B2 (en) * 2004-06-02 2006-10-31 Xintek, Inc. Field emission ion source based on nanostructure-containing material
EP1622184B1 (de) * 2004-07-28 2011-05-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Emitter für eine Ionenquelle und Verfahren zu deren Herstellung
EP1622182B1 (de) 2004-07-28 2007-03-21 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Emitter für eine Ionenquelle und Verfahren zur dessen Herstellung
FR2892560B1 (fr) 2005-10-21 2008-06-27 Centre Nat Rech Scient Pointe, tete et dispositif de lecture/ecriture, et son utilisation, et procede de fabrication d'un tel dispositif
FR2897719B1 (fr) * 2006-02-20 2008-10-03 Centre Nat Rech Scient Installation et procede de nano-fabrication
US10672602B2 (en) * 2014-10-13 2020-06-02 Arizona Board Of Regents On Behalf Of Arizona State University Cesium primary ion source for secondary ion mass spectrometer
WO2016061057A1 (en) * 2014-10-13 2016-04-21 Arizona Board Of Regents, A Body Corporate Of The State Of Arizona, Acting For And On Behalf Of Arizona State University Cesium primary ion source for secondary ion mass spectrometer

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US4328667A (en) * 1979-03-30 1982-05-11 The European Space Research Organisation Field-emission ion source and ion thruster apparatus comprising such sources
US4318030A (en) * 1980-05-12 1982-03-02 Hughes Aircraft Company Liquid metal ion source
JPS5878557U (ja) * 1981-11-24 1983-05-27 株式会社日立製作所 電界放出型イオン源
US4638210A (en) * 1985-04-05 1987-01-20 Hughes Aircraft Company Liquid metal ion source
US4617203A (en) * 1985-04-08 1986-10-14 Hughes Aircraft Company Preparation of liquid metal source structures for use in ion beam evaporation of boron-containing alloys
JPS62259332A (ja) * 1985-10-23 1987-11-11 Nippon Denshi Zairyo Kk イオン発生装置
JP2807719B2 (ja) * 1990-04-04 1998-10-08 セイコーインスツルメンツ株式会社 集束イオンビーム装置の液体金属イオン源の動作方法
JP3315720B2 (ja) * 1992-06-18 2002-08-19 株式会社日立製作所 液体金属イオン源及び加熱洗浄方法

Also Published As

Publication number Publication date
DE69509390D1 (de) 1999-06-02
WO1996002065A1 (fr) 1996-01-25
EP0769202A1 (de) 1997-04-23
FR2722333B1 (fr) 1996-09-13
US5936251A (en) 1999-08-10
JPH10506497A (ja) 1998-06-23
FR2722333A1 (fr) 1996-01-12
DE69509390T2 (de) 1999-11-18

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