EP0675507B1 - Câble coaxial semi-rigide et méthode de fabrication - Google Patents

Câble coaxial semi-rigide et méthode de fabrication Download PDF

Info

Publication number
EP0675507B1
EP0675507B1 EP19950301962 EP95301962A EP0675507B1 EP 0675507 B1 EP0675507 B1 EP 0675507B1 EP 19950301962 EP19950301962 EP 19950301962 EP 95301962 A EP95301962 A EP 95301962A EP 0675507 B1 EP0675507 B1 EP 0675507B1
Authority
EP
European Patent Office
Prior art keywords
insulating layer
layer
coaxial cable
plated
semirigid coaxial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP19950301962
Other languages
German (de)
English (en)
Other versions
EP0675507A3 (fr
EP0675507A2 (fr
Inventor
Shuzo Fujita
Shunichi Yoshimura
Hiroshi Kitazawa
Naoki Katagiri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Totoku Electric Co Ltd
Original Assignee
Totoku Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Totoku Electric Co Ltd filed Critical Totoku Electric Co Ltd
Publication of EP0675507A2 publication Critical patent/EP0675507A2/fr
Publication of EP0675507A3 publication Critical patent/EP0675507A3/fr
Application granted granted Critical
Publication of EP0675507B1 publication Critical patent/EP0675507B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B11/00—Communication cables or conductors
    • H01B11/18—Coaxial cables; Analogous cables having more than one inner conductor within a common outer conductor
    • H01B11/1808—Construction of the conductors
    • H01B11/1817—Co-axial cables with at least one metal deposit conductor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B11/00—Communication cables or conductors
    • H01B11/18—Coaxial cables; Analogous cables having more than one inner conductor within a common outer conductor
    • H01B11/1834—Construction of the insulation between the conductors

Definitions

  • This invention relates to a semirigid coaxial cable and its method of manufacture, and more particularly to a semirigid coaxial cable used in high frequency circuit boards of electronic equipments such as telecommunication equipments and data processing equipments, and in signal transmission circuits of high frequency components, and to a method for manufacturing of said semirigid coaxial cable.
  • FIG. 11 shows an example of a conventional coaxial cable.
  • outer surface of a center conductor 1 is covered by an insulating layer 72 having a low permittivity.
  • Said insulating layer 72 is further surrounded by an outer conductor 73 formed by braiding or by transversely winding a plurality of fine metallic wires, or by winding metal foil around said insulating layer 72.
  • An external surface of said outer conductor 73 is covered by a protective cover layer 4 formed by hot extrusion of a material such as polyvinyl chloride (PVC) plastic.
  • PVC polyvinyl chloride
  • FIG. 12 shows an example of a conventional semirigid coaxial cable.
  • an insulating layer 62 having a low permittivity.
  • Said insulating layer 62 may be formed by hot extrusion of perfluoro alkyl (PFA) vinyl ether-tetrafluorethylene copolymer resin.
  • a metal pipe, such as a copper pipe, is provided closely to said insulating layer 62 to act as an outer conductor 63.
  • the conventional coaxial cable 10 mentioned above has openings in the outer conductor 73, due to which, its shielding characteristics become unsatisfactory.
  • insulated wire 60 is produced first and then inserted in a copper pipe with a comparatively large thickness.
  • the copper pipe is drawn using a die, to form an outer conductor 63, so that the insulated wire 60 and the copper pipe press firmly against each other.
  • the outside diameter of the insulated wire 60 and inside diameter of the copper pipe must be approximately same. This results in increased friction and insertion of the insulated wire 60 into the copper pipe becomes difficult.
  • the semirigid coaxial cable can only be manufactured in short (for example, about 30 meters) lengths.
  • the copper pipe has to be manufactured in a separate, independent process and needs to have perfect circularity, necessitating a large thickness (for example, about 0.30 mm). This thickness changes very slightly (for example, about 0.26 mm) even when the pipe is drawn, and the pipe is difficult to bend and difficult to wind up. Even for this reason, the semirigid coaxial cable can only be manufactured in short length. And by this short length, a protective cover layer cannot be formed efficiently. Therefore, there is generally no protective cover layer, and hence, the applications of the conventional semirigid coaxial cable are restricted.
  • the cable is subjected to very high stresses during drawing, which is likely to reduce dimensional accuracy. This leads to a problem of instability in high frequency transmission characteristics such as the characteristic impedance and the voltage standing wave ratio (VSWR).
  • VSWR voltage standing wave ratio
  • the lower limit of its finished diameter is restricted to about 0.6 mm. In other words, there is another problem that the manufacture of smaller diameter cables is difficult.
  • Coaxial cable in which the outer conductor of the conventional coaxial cable 10 is formed by electroplating, have been described in the unexamined Japanese patent publication no. 81938/1993. It has also been mentioned that, if fluororesin is used for the insulating layer in this cable, then, roughing the surface beforehand using Tetraetch (brand name, Junkosha Co.,Ltd.) is recommended for improving the adhesion with the copper plating.
  • Tetraetch brand name, Junkosha Co.,Ltd.
  • a method of roughing the surface of an insulating material by chemically etching with sodium metal has been described in the unexamined Japanese utility model publication no. 20014/1968.
  • the etching solutions mentioned above are not practically usable because of their high cost and the high risk involved in handling them.
  • the separation becomes difficult. Due to this, stripping the ends of the cable for making terminal connections becomes troublesome.
  • An aim of the present invention is to provide a semirigid coaxial cable which has good shielding characteristics, is possible to manufactured in long lengths, is possible to form a protective cover layer, has stable high frequency transmission characteristics, is possible to manufactured in small diameters, is possible to do electroless plating easier than doing electroless plating directly on the insulating material having a low permittivity and is possible to do ends stripping easily. It is an another aim of the present invention to offer a satisfactory method for manufacturing said semirigid coaxial cable.
  • this invention provides a semirigid coaxial cable wherein the outer conductor is provided with a protective cover layer on the outer surface conductor.
  • This invention provides a semirigid coaxial cable wherein said conductive metal layer is comprised of a copper-plated layer, a glossy copper-plated layer, and a strike plated nickel layer or a tin-plated layer.
  • This invention provides a semirigid coaxial cable wherein said first insulating layer is formed of fluororesin-based or polyolefine-based resins having a low permittivity.
  • This invention provides a semirigid coaxial cable wherein said second insulating layer is formed by hot-extruding a resin or by winding an insulating tape.
  • This invention provides a semirigid coaxial cable wherein thickness of said second insulating layer is 5 ⁇ m or more and less than 20% the thickness of said first insulating layer.
  • This invention provides a semirigid coaxial cable wherein diameter of said center conductor is 0.20 mm or less, and finished diameter of said semirigid coaxial cable is 0.90 mm or less.
  • This invention provides a method for manufacturing a semirigid coaxial cable comprising a covering process for first insulating layer, wherein outer surface of a center conductor is covered by insulating material having a low permittivity, a covering process for second insulating layer, wherein outer surface of said first insulating layer is covered by a resin which can be easily electroless-plated as compared to the material of said first insulating layer, an electroless plating process, wherein outer surface of said second insulating layer is covered by a electroless-plated anchoring metal layer, and an electroplating process, wherein outer surface of said electroless-plated anchoring metal layer is covered by a conductive metal layer.
  • this invention provides a method for manufacturing a semirigid coaxial cable comprising a covering process, wherein outer surface of said conductive metal layer is covered by a protective cover layer.
  • This invention provides a method for manufacturing a semirigid coaxial cable comprising a copper plating process for forming a copper-plated layer, a glossy copper plating process for forming a glossy copper-plated layer, and a strike plating process for forming a strike plated nickel layer or a tin plating process for forming a tin-plated layer.
  • This invention provides a method for manufacturing a semirigid coaxial cable comprising a heat treatment process after carrying out said electroplating process.
  • the reason for restricting the thickness of the second insulating layer to 5 ⁇ m or more is basically due to the fact that, 5 ⁇ m is almost the lowest limit of thickness achievable with the existing engineering techniques, moreover, for this thickness electroplating is possible and end stripping is easy. Furthermore, the thickness is restricted to less than 20% of the thickness of the first insulating layer to maintain the various characteristics of the coaxial cable which uses a low permittivity first insulating layer.
  • an outer conductor comprising successively of a electroless-plated anchoring metal layer and electro-plated conductive metal layer, is formed on outer surface of said second insulating layer. Since there are no openings in the outer conductor, the shielding characteristics are good. Furthermore, since the outer conductor is formed by electroless plating and electroplating, the insulated wire need not be inserted in a copper pipe. Moreover, since an outer conductor with a small (for instance, 0.10 mm) diameter is utilized, the semirigid coaxial cable can be easily bent and wound. And a large length of over 1,000 m can be manufactured.
  • the semirigid coaxial cable can be used in a wide range of applications.
  • the wire is not drawn, and only a liquid pressure is applied during the plating process, dimensional accuracy is not compromised, and stable high frequency transmission characteristics, such as characteristic impedance and voltage standing wave ratio are achieved.
  • manufacturing of semirigid coaxial cables having finished diameters of under 0.90 mm becomes possible.
  • said electro-plated conductive metal layer is made up of a copper-plated layer, a glossy copper-plated layer and a strike plated nickel layer or a tin-plated layer
  • adhesion of the outer conductor to the second insulating layer is enhanced because of the copper-plated layer and the anchoring metal layer
  • conductivity is improved because of the glossy copper-plated layer
  • corrosion resistance and solderability are enhanced because of the strike plated nickel layer or tin-plated layer. Therefore the mentioned composition is particularly preferable.
  • the first insulating layer is made of fluororesins having a low permittivity such as polytetrafluoroethylene (PTFE) resin, perfluoro alkyl (PFA) vinyl ether-tetrafluoroethylene copolymer resin, fluorinated ethylene propylene (FEP) copolymer resin, ethylene tetrafluoroethylene (ETFE) copolymer resin, or polyolefine-based resins such as polyethylene (PE) resin or polypropylene (PP) resin.
  • PTFE polytetrafluoroethylene
  • PFA perfluoro alkyl
  • FEP fluorinated ethylene propylene copolymer resin
  • ETFE ethylene tetrafluoroethylene copolymer resin
  • polyolefine-based resins such as polyethylene (PE) resin or polypropylene (PP) resin.
  • PE polyethylene
  • PP polypropylene
  • said second insulating layer is made of hot-extruded or tape wound layer
  • the semirigid coaxial cable becomes a good wire for use in the electronic equipments.
  • the second insulating layer is either formed by a thin tubing or winding a tape over the outer surface of the first insulating layer, the adhesion between the first and the second insulating layers is weak.
  • the adhesion between the second insulating layer and the electroless-plated anchoring metal layer, the adhesion between the electroless-plated anchoring metal layer and the electroplated conductive metal layer, and the adhesion between the electro-plated conductive metal layer and the protective cover layer are much stronger. Consequently, while stripping the ends of the semirigid coaxial cable using a stripper, an integral assembly of second insulating layer, outer conductor and protective cover layer can be stripped off easily from the first insulating layer.
  • the second insulating layer is formed of a resin that can be electroless-plated easily than the material of the first insulating layer. Because of this, an anchoring metal layer can be formed by electroless plating without roughing the surface of said second insulating layer. Furthermore, a conductive metal layer can be easily formed by electroplating over said anchoring metal layer to make the outer conductor. Consequently, said outer conductor has good adhesiveness, adequate thickness, and no stresses. Whereby a semirigid coaxial cable of good characteristics mentioned above can be manufactured.
  • the material of the second insulating layer is easier to elelectroless-plate than the first insulating layer, chemical etching of the surface using metallic sodium or the like becomes unnecessary.
  • the method for manufacturing the semirigid coaxial cable in the present invention if the coaxial cable is subjected to heat treatment after said conductive metal layer is provided, the flexibility of the semirigid coaxial cable can be enhanced.
  • FIG. 1 is a cross section view of a semirigid coaxial cable according to the first embodiment of the present invention.
  • FIG. 2 is the flow chart showing the method of manufacture of the semirigid coaxial cable of the present invention.
  • FIG. 3 to FIG. 8 are explanatory drawings of the processes for forming the outer conductor of the semirigid coaxial cable.
  • FIG. 9 is a sketch for explaining the stripping the end of the semirigid coaxial cable of the present invention.
  • FIG. 10 is a cross section view of a semirigid coaxial cable according to the second embodiment of the present invention.
  • FIG. 11 is an elevational view of an example of a conventional coaxial cable with a partial cutaway.
  • FIG. 12 is a cross section view of an example of a conventional semirigid coaxial cable.
  • FIG. 1 is a cross section view of a semirigid coaxial cable according to the first embodiment of the present invention.
  • This semirigid coaxial cable 5 comprises of a center conductor 1, a insulating layer 2, an outer conductor 3 and a protective cover layer 4 arranged in order, with an outside diameter of 0.93 mm, and has a length of greater than 1000 m.
  • the center conductor 1 is a silver-plated copper wire with an outside diameter of 0.20 mm.
  • the insulating layer 2 comprises of a 0.20 mm thick first insulating layer 2a made of calcined polytetrafluoroethylene (PTFE) resin, and a 0.015 mm thick second insulating layer 2b made of hot-extruded polyamide resin.
  • PTFE polytetrafluoroethylene
  • the outer conductor 3 comprises of a 2 ⁇ m thick anchoring metal layer 3a formed by electroless plating of Ni-P, and a 107 ⁇ m thick conductive metal layer 3b formed by electroplating.
  • the conductive metal layer 3b further comprises of a copper-plated layer 3c having a thickness of 5 ⁇ m, a glossy copper-plated layer 3d having a thickness of 100 ⁇ m, and a strike plated nickel layer 3e having a thickness of 2 ⁇ m.
  • the protective covering layer 4 is made of PVC resin and has a thickness of 0.041 mm.
  • FIG. 2 is a flow chart showing in detail the steps involved in the method for manufacturing a semirigid coaxial cable. The method of manufacture will be described by taking an example of manufacture of the above mentioned semirigid coaxial cable 5.
  • first insulating layer 2a In the covering process F1 for first insulating layer 2a, PTFE in paste form is extruded over the outer surface of the center conductor 1 made of silver plated copper wire with 0.20 mm diameter and calcinated, to provide the first insulating layer 2a of thickness 0.20 mm.
  • the covering process F2 for the second insulating layer 2b outer surface of said first insulating 2a is covered with a polyamide resin of thickness 0.015 mm by hot extrusion to form the second insulating layer 2b.
  • surface of the second insulating layer 2b is cleaned with alcohol in order to remove any foreign matter 30, such as oil, from said surface.
  • the surface of the second insulating layer 2b is washed in hot and ordinary water, then, stannous chloride (SnCl 2 ) is adsorbed (for sensitizing) on said surface and the wire is immersed in a solution of palladium chloride (PdCl 2 ), and further, as shown in FIG. 4, palladium (Pd) 31 is deposited on said surface by deoxidation (activating).
  • electroplating process F4 copper electroplating is carried out at a current density of 1 A/dm 2 for 20 minutes using a copper sulfate plating solution at 25° C, to form the copper-plated layer 3c, as shown in FIG. 6, having a thickness of 5 ⁇ m.
  • electroplating is carried out at a current density of 5 A/dm 2 for 90 minutes using a glossy copper sulfate plating solution at 25° C to form the glossy copper-plated layer 3d, as shown in FIG. 7, having a thickness of 100 ⁇ m.
  • the strike plated nickel layer 3e As shown in FIG. 8, having a thickness of 2 ⁇ m.
  • the conductive metal layer 3b comprising of the copper-plated layer 3c, the glossy copper-plated layer 3d and the strike plated nickel layer 3e is formed, the semirigid coaxial cable is ultrasonically cleaned and dried.
  • the protective covering layer 4 of thickness 0.041 mm is provided by extrusion of PVC resin.
  • FIG. 10 is a cross section view of a semirigid coaxial cable according to the second embodiment of the present invention.
  • This semirigid coaxial cable 6 comprises of a center conductor 1, a insulating layer 2 consisting of a first insulating layer 20a and a second insulating layer 20b, an outer conductor 3 and a protective covering layer 4 arranged in order, with an outside diameter of 0.72 mm, and has a length of greater than 1000 m.
  • the center conductor 1 is a silver-plated copper wire with an outside diameter of 0.10 mm.
  • the first insulating layer 20a is made of perfluoro alkyl vinyl (PFA) ether-tetrafluoroethylene copolymer resin, and has a thickness 0.10 mm.
  • PFA perfluoro alkyl vinyl
  • the second insulating layer 20b is a tape-wound layer of 0.01 mm thickness formed by double-winding polyester tape of thickness 0.005 mm and width 3 mm spirally over the first insulating layer 20a.
  • the outer conductor 3 comprises of a 1 ⁇ m thick anchoring metal layer 3a formed by electroless plating of Ni-P, and a 80 ⁇ m thick conductive metal layer 3b formed by electroplating.
  • the conductive metal layer 3b further comprises of a copper-plated layer 3c having a thickness of 5 ⁇ m, a glossy copper-plated layer 3d having a thickness of 73 ⁇ m, and a tin plated layer 3e having a thickness of 2 ⁇ m.
  • the protective covering layer 4 is made of PVC resin and has a thickness of 0.119 mm.
  • perfluoro alkyl vinyl (PFA) ether-tetrafluoroethylene copolymer resin in paste form is extruded over the outer surface of the center conductor 1, to provide the first insulating layer 20a of thickness 0.010 mm.
  • outer surface of said first insulating 20a is covered with a polyester tape of 0.005 mm thickness and 3 mm width by spirally winding the polyester tape two times to form the second insulating layer 20b.
  • the surface of the second insulating layer 20b is washed in hot and ordinary water, stannous chloride (SnCl 2 ) is adsorbed on said surface and the wire is immersed in a solution of palladium chloride (PdCl 2 ), and then palladium (Pd) is deposited on said surface by deoxidation.
  • electroless plating is carried out using electroless plating nickel-phosphorous (Ni-P) solution at 80 ° C, and Ni-P is deposited to form the anchoring metal layer 3a having a thickness of 1 ⁇ m. This is followed by ultrasonic cleaning.
  • the electroplating process F4 copper electroplating is carried out using a copper sulfate plating solution at 25° C, to form the copper-plated layer 3c having a thickness of 5 ⁇ m.
  • electroplating is carried out using a glossy copper sulfate plating solution at 25° C to form the glossy copper-plated layer 3d having a thickness of 73 ⁇ m.
  • electroplating is carried out at a current density of 5 A/dm 2 for 5 minutes using acid tin plating solution at 25° C, to form the tin-plated layer 3e having a thickness of 2 ⁇ m.
  • the conductive metal layer 3b comprising of the copper-plated layer 3c, the glossy copper-plated layer 3d and the tin-plated nickel layer 3e is formed, the semirigid coaxial cable is ultrasonically cleaned and dried.
  • the protective cover layer 4 of thickness 0.119 mm is provided by extrusion of PVC resin.
  • Ni-P electroless nickel-phosphorous
  • Ni-B nickel-boron
  • silver electroplating may be substituted to form the conductive metal layer 3b.
  • the semirigid coaxial cable and its method of manufacture of the present invention because the semirigid coaxial cable has a thin outer conductor without opening, the shielding characteristics of the semirigid coaxial cable are good. Furthermore, the coaxial cable can be easily bent or wound, and a length of cable exceeding 1,000 m can be manufactured. Since the semirigid coaxial cable has a protective covering layer which can be formed efficiently, it can be used in a wide range of applications. The dimensional accuracy is great, and high frequency transmission characteristics are stable. Manufacture of small diameter semirigid cables with a finished diameter of lower than 0.90 mm is possible. Electroless-plating on the first insulating layer can be effortlessly accomplished. Stripping of terminals becomes easy. In view of the advantages mentioned above, the semirigid coaxial cable can be effectively used in high frequency circuit boards of electronic equipments such as telecommunication equipments and data processing equipments, and in signal transmission circuits of high frequency components.
  • the outer conductor is made of a electroless-plated anchoring metal layer and a electro-plated conductive metal layer, and if said conductive metal layer is formed of a copper-plated layer, a glossy copper-plated layer and a strike plated nickel layer or a tin-plated layer, then the adhesiveness, conductivity, corrosion resistance, and solderability can be enhanced significantly.

Landscapes

  • Manufacturing Of Electric Cables (AREA)
  • Communication Cables (AREA)

Claims (11)

  1. Câble coaxial semi-rigide (5) comportant un conducteur central (1), une couche isolante (2) sur la surface extérieure dudit conducteur central (1) et un conducteur extérieur (3) sur la surface extérieure de ladite couche isolante (2),
    ladite couche isolante (2) étant constituée d'une première couche isolante (2a) réalisée en un matériau d'une faible permittivité, et d'une deuxième couche isolante (2b), sur la surface extérieure de ladite première couche isolante (2a), caractérisé en ce que ladite deuxième couche isolante est réalisée en une résine qui peut être facilement plaquée sans courant, comparée au matériau de ladite première couche isolante (2a) et
    ledit conducteur extérieur (3) est constitué d'une couche métallique d'ancrage (3a) plaquée sans courant et d'une couche métallique conductrice plaquée par électrodéposition (3b).
  2. Câble coaxial semi-rigide (5) selon la revendication 1, caractérisé en ce que ledit conducteur extérieur (3) est pourvu d'une couche protectrice de recouvrement (4) sur la surface extérieure.
  3. Câble coaxial semi-rigide (6) selon la revendication 1 ou la revendication 2, caractérisé en ce que ladite couche métallique conductrice (3b) est constituée d'une couche (3c) plaquée en cuivre, d'une couche brillante (3d) plaquée en cuivre et, d'une couche en nickel plaquée par dépôt amorce ou d'une couche plaquée en étain (3e).
  4. Câble coaxial semi-rigide (5) selon la revendication 1, ou la revendication 2, ou la revendication 3, caractérisé en ce que ladite première couche isolante (2a) est réalisée en des résines à base de fluororésine ou à base de polyoléfine ayant une permittivité réduite.
  5. Câble coaxial semi-rigide (5) selon la revendication 1, la revendication 2, la revendication 3 ou la revendication 4, caractérisé en ce que ladite deuxième couche isolante (2b) est formée par une extrusion à chaud d'une résine ou en enroulant une bande isolante sur ladite première couche isolante (2a).
  6. Câble coaxial semi-rigide (5) selon la revendication 1, la revendication 2, la revendication 3, la revendication 4 ou la revendication 5, caractérisé en ce que l'épaisseur de ladite deuxième couche isolante (2b) est de 5 µm ou plus et inférieure à 20% de l'épaisseur de ladite première couche isolante (2a).
  7. Câble coaxial semi-rigide (5) selon la revendication 1, la revendication 2, la revendication 3, la revendication 4, la revendication 5, ou la revendication 6, caractérisé en ce que le diamètre dudit conducteur central (1) est de 0,20 mm ou moins, et le diamètre final dudit câble coaxial semi-rigide (5) est de 0,90 mm ou moins.
  8. Procédé de fabrication d'un câble coaxial semi-rigide (5) comprenant un procédé de recouvrement de matériau isolant pour former une couche isolante (2) sur la surface extérieure d'un conducteur central (1), et un procédé de recouvrement de matériau conducteur pour former un matériau de conducteur extérieur (3) sur la surface extérieure de ladite couche isolante (2),
    ledit procédé de recouvrement de matériau isolant étant constitué d'un procédé de recouvrement (F1) pour la première couche isolante , où la surface extérieure dudit conducteur central (1) est recouverte par un matériau d'une permittivité réduite pour former une première couche isolante (2a), et d'un procédé de recouvrement (F2) pour la deuxième couche isolante, caractérisé en ce que la surface extérieure de ladite première couche isolante (2a) est recouverte par une résine qui peut être facilement plaquée sans courant, comparée au matériau de ladite première couche isolante (2a) pour former une deuxième couche isolante (2b) et
    ledit procédé de recouvrement de matériau conducteur étant constitué d'un procédé de plaquage sans courant (F3) où la surface extérieure de ladite deuxième couche isolante (2b) est recouverte par une couche métallique d'ancrage (3a) plaquée sans courant, et d'un procédé d'électrodéposition (F4), où une surface extérieure de ladite couche métallique d'ancrage déposée sans courant (3a) est recouverte par une couche métallique conductrice (3b).
  9. Procédé de fabrication d'un câble coaxial semi-rigide (5) selon la revendication 8, caractérisé en ce que ledit procédé d'électrodéposition (F4) est suivi d'un procédé de recouvrement extérieur (F5), où la surface extérieure de ladite couche métallique conductrice (3b) est recouverte par une couche protectrice de recouvrement (4).
  10. Procédé de fabrication d'un câble coaxial semi-rigide (5) selon la revendication 8 ou la revendication 9, caractérisé en ce que ledit procédé d'électrodéposition (F4) est constitué d'un procédé de déposition de cuivre pour former une couche déposée en cuivre (3c), d'un procédé de déposition de cuivre brillant pour former une couche brillante déposée en cuivre (3d) et
       d'un procédé de déposition par dépôt amorce pour former une couche déposée en nickel par dépôt amorce ou d'un procédé de déposition d'étain pour former une couche plaquée étain (3e).
  11. Procédé de fabrication d'un câble coaxial semi-rigide (5) selon la revendication 8, la revendication 9 ou la revendication 10, caractérisé en ce que ledit procédé d'électrodéposition (F4) est suivi d'un procédé de traitement thermique.
EP19950301962 1994-03-28 1995-03-23 Câble coaxial semi-rigide et méthode de fabrication Expired - Lifetime EP0675507B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP8237694 1994-03-28
JP82376/94 1994-03-28
JP6082376A JP2929161B2 (ja) 1994-03-28 1994-03-28 端末むきが容易なセミリジット同軸ケーブルおよびその製造方法

Publications (3)

Publication Number Publication Date
EP0675507A2 EP0675507A2 (fr) 1995-10-04
EP0675507A3 EP0675507A3 (fr) 1996-09-18
EP0675507B1 true EP0675507B1 (fr) 2000-06-14

Family

ID=13772872

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19950301962 Expired - Lifetime EP0675507B1 (fr) 1994-03-28 1995-03-23 Câble coaxial semi-rigide et méthode de fabrication

Country Status (3)

Country Link
EP (1) EP0675507B1 (fr)
JP (1) JP2929161B2 (fr)
DE (1) DE69517462T2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10109904B2 (en) 2015-08-11 2018-10-23 Keysight Technologies, Inc. Coaxial transmission line including electrically thin resistive layer and associated methods

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5574260B1 (en) * 1995-03-06 2000-01-18 Gore & Ass Composite conductor having improved high frequency signal transmission characteristics
KR100617289B1 (ko) * 2000-06-28 2006-08-30 엘지.필립스 엘시디 주식회사 백라이트 와이어의 단선방지 구조
DE10063542A1 (de) * 2000-12-20 2002-06-27 Alcatel Sa Elektrische Leitung und Verfahren zu ihrer Herstellung
JP4103360B2 (ja) * 2001-08-22 2008-06-18 日本電気株式会社 セミリジッドケーブル
JP3671919B2 (ja) 2002-03-05 2005-07-13 日立電線株式会社 同軸ケーブル及び同軸多心ケーブル
JP6699378B2 (ja) * 2016-06-14 2020-05-27 Tdk株式会社 コイル部品
WO2019074470A1 (fr) 2017-10-09 2019-04-18 Keysight Technologies, Inc. Fabrication de câble coaxial hybride
JP7243499B2 (ja) * 2019-07-11 2023-03-22 株式会社プロテリアル 高周波信号伝送用ケーブル及びその製造方法
JP7294011B2 (ja) * 2019-09-10 2023-06-20 株式会社プロテリアル 信号伝送用ケーブル

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4773976A (en) * 1986-04-14 1988-09-27 Northern Telecom Limited Method of making an insulated electrical conductor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10109904B2 (en) 2015-08-11 2018-10-23 Keysight Technologies, Inc. Coaxial transmission line including electrically thin resistive layer and associated methods

Also Published As

Publication number Publication date
EP0675507A3 (fr) 1996-09-18
DE69517462D1 (de) 2000-07-20
JPH07272553A (ja) 1995-10-20
DE69517462T2 (de) 2001-03-08
JP2929161B2 (ja) 1999-08-03
EP0675507A2 (fr) 1995-10-04

Similar Documents

Publication Publication Date Title
US4467002A (en) Dimensionally-recoverable article
US3639674A (en) Shielded cable
JP3671919B2 (ja) 同軸ケーブル及び同軸多心ケーブル
US6218624B1 (en) Coaxial cable
US4649228A (en) Transmission line
EP0675507B1 (fr) Câble coaxial semi-rigide et méthode de fabrication
CN104681907A (zh) 整体聚四氟乙烯绝缘表面镀银外导体射频电缆及加工方法
US20210399396A1 (en) Coaxial cable and cable assembly
JP2006294551A (ja) 同軸ケーブル
JP3010336B2 (ja) 同軸ケーブルおよびその製造方法
JP4942539B2 (ja) 同軸ケーブル
JP4137255B2 (ja) 同軸ケーブル
JP3443784B2 (ja) 高周波用同軸ケーブルの製造方法
JP2008004275A (ja) ２芯平行同軸ケーブル
JP2003187649A (ja) セミフレキシブル同軸線
JP2003051219A (ja) 超極細同軸ケーブル
JP3537288B2 (ja) セミリジッド同軸ケーブルおよびその製造方法
JP2003031046A (ja) 蒸着テープ縦添え２心平行極細同軸ケーブル
JP3625369B2 (ja) セミリジッド型同軸ケーブルおよびその製造方法
JP3346535B2 (ja) めっきアルミニウム電線、絶縁めっきアルミニウム電線およびこれらの製造方法
JP2006294552A (ja) 同軸ケーブル及びそれを用いたプローブケーブル
JP6746445B2 (ja) 同軸ケーブル
JP3639133B2 (ja) 高速細線同軸ケーブル及び高速細線フラット同軸ケーブル
JP2003031045A (ja) 蒸着テープ縦添え２心平行極細同軸ケーブル
JPH11213776A (ja) 細径同軸ケーブル

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): DE FR GB

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): DE FR GB

17P Request for examination filed

Effective date: 19970121

17Q First examination report despatched

Effective date: 19971203

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE FR GB

REF Corresponds to:

Ref document number: 69517462

Country of ref document: DE

Date of ref document: 20000720

ET Fr: translation filed
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
REG Reference to a national code

Ref country code: GB

Ref legal event code: IF02

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20070220

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20070226

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20070222

Year of fee payment: 13

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20080323

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20081125

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20081001

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20080331

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20080323