EP0644216B1 - Naphthalene-ring resin, resin composition, and cured product thereof - Google Patents
Naphthalene-ring resin, resin composition, and cured product thereof Download PDFInfo
- Publication number
- EP0644216B1 EP0644216B1 EP94910046A EP94910046A EP0644216B1 EP 0644216 B1 EP0644216 B1 EP 0644216B1 EP 94910046 A EP94910046 A EP 94910046A EP 94910046 A EP94910046 A EP 94910046A EP 0644216 B1 EP0644216 B1 EP 0644216B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- resin
- epoxy resin
- formula
- resin composition
- represented
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920005989 resin Polymers 0.000 title claims abstract description 65
- 239000011347 resin Substances 0.000 title claims abstract description 65
- 239000011342 resin composition Substances 0.000 title abstract description 8
- 239000003822 epoxy resin Substances 0.000 claims abstract description 80
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 80
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims abstract description 3
- 239000000203 mixture Substances 0.000 claims description 39
- 239000004848 polyfunctional curative Substances 0.000 claims description 25
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 18
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 15
- 125000003545 alkoxy group Chemical group 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- -1 glycidyloxy group Chemical group 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 32
- 238000010521 absorption reaction Methods 0.000 abstract description 18
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 abstract description 13
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 abstract description 8
- 239000004305 biphenyl Substances 0.000 abstract description 3
- 235000010290 biphenyl Nutrition 0.000 abstract description 3
- 238000006482 condensation reaction Methods 0.000 abstract description 2
- 239000002305 electric material Substances 0.000 abstract description 2
- 239000012776 electronic material Substances 0.000 abstract description 2
- 125000002496 methyl group Chemical class [H]C([H])([H])* 0.000 abstract description 2
- 238000006266 etherification reaction Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 22
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 21
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 18
- 150000001875 compounds Chemical class 0.000 description 13
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 11
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 11
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 10
- 239000004593 Epoxy Substances 0.000 description 9
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 8
- 229920003986 novolac Polymers 0.000 description 8
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 7
- 229930003836 cresol Natural products 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 5
- 235000013824 polyphenols Nutrition 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229920000768 polyamine Polymers 0.000 description 4
- 239000003566 sealing material Substances 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003377 acid catalyst Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 3
- INZDTEICWPZYJM-UHFFFAOYSA-N 1-(chloromethyl)-4-[4-(chloromethyl)phenyl]benzene Chemical group C1=CC(CCl)=CC=C1C1=CC=C(CCl)C=C1 INZDTEICWPZYJM-UHFFFAOYSA-N 0.000 description 2
- 229910015900 BF3 Inorganic materials 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 150000003934 aromatic aldehydes Chemical class 0.000 description 2
- 150000007514 bases Chemical class 0.000 description 2
- 229950011260 betanaphthol Drugs 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000001819 mass spectrum Methods 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 150000008442 polyphenolic compounds Chemical class 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- 238000007142 ring opening reaction Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-dioxonaphthalene Natural products C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 1
- BOKGTLAJQHTOKE-UHFFFAOYSA-N 1,5-dihydroxynaphthalene Chemical compound C1=CC=C2C(O)=CC=CC2=C1O BOKGTLAJQHTOKE-UHFFFAOYSA-N 0.000 description 1
- HMUGRILXVBKBID-UHFFFAOYSA-N 1-(bromomethyl)-4-[4-(bromomethyl)phenyl]benzene Chemical group C1=CC(CBr)=CC=C1C1=CC=C(CBr)C=C1 HMUGRILXVBKBID-UHFFFAOYSA-N 0.000 description 1
- YHKXFIHFUOMWFG-UHFFFAOYSA-N 1-(chloromethyl)-3-[3-(chloromethyl)phenyl]benzene Chemical group ClCC1=CC=CC(C=2C=C(CCl)C=CC=2)=C1 YHKXFIHFUOMWFG-UHFFFAOYSA-N 0.000 description 1
- DURKIAQJGSFQIL-UHFFFAOYSA-N 1-(chloromethyl)-3-[4-(chloromethyl)phenyl]benzene Chemical group C1=CC(CCl)=CC=C1C1=CC=CC(CCl)=C1 DURKIAQJGSFQIL-UHFFFAOYSA-N 0.000 description 1
- UQWJRHXJJRTQCX-UHFFFAOYSA-N 1-(ethoxymethyl)-4-[4-(ethoxymethyl)phenyl]benzene Chemical group C1=CC(COCC)=CC=C1C1=CC=C(COCC)C=C1 UQWJRHXJJRTQCX-UHFFFAOYSA-N 0.000 description 1
- NRQUWBYCZOWOAU-UHFFFAOYSA-N 1-(methoxymethyl)-3-[3-(methoxymethyl)phenyl]benzene Chemical group COCC1=CC=CC(C=2C=C(COC)C=CC=2)=C1 NRQUWBYCZOWOAU-UHFFFAOYSA-N 0.000 description 1
- MODAACUAXYPNJH-UHFFFAOYSA-N 1-(methoxymethyl)-4-[4-(methoxymethyl)phenyl]benzene Chemical group C1=CC(COC)=CC=C1C1=CC=C(COC)C=C1 MODAACUAXYPNJH-UHFFFAOYSA-N 0.000 description 1
- AGIBHMPYXXPGAX-UHFFFAOYSA-N 2-(iodomethyl)oxirane Chemical compound ICC1CO1 AGIBHMPYXXPGAX-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- SRJCJJKWVSSELL-UHFFFAOYSA-N 2-methylnaphthalen-1-ol Chemical compound C1=CC=CC2=C(O)C(C)=CC=C21 SRJCJJKWVSSELL-UHFFFAOYSA-N 0.000 description 1
- 150000004786 2-naphthols Chemical class 0.000 description 1
- OUNQUWORSXHSJN-UHFFFAOYSA-N 4-bromonaphthalen-1-ol Chemical compound C1=CC=C2C(O)=CC=C(Br)C2=C1 OUNQUWORSXHSJN-UHFFFAOYSA-N 0.000 description 1
- LVSPDZAGCBEQAV-UHFFFAOYSA-N 4-chloronaphthalen-1-ol Chemical compound C1=CC=C2C(O)=CC=C(Cl)C2=C1 LVSPDZAGCBEQAV-UHFFFAOYSA-N 0.000 description 1
- FPBMWSBRLLFCEG-UHFFFAOYSA-N 4-chloronaphthalen-2-ol Chemical compound C1=CC=CC2=CC(O)=CC(Cl)=C21 FPBMWSBRLLFCEG-UHFFFAOYSA-N 0.000 description 1
- GBVHCGKQBBXKQZ-UHFFFAOYSA-N 4-ethylnaphthalen-1-ol Chemical compound C1=CC=C2C(CC)=CC=C(O)C2=C1 GBVHCGKQBBXKQZ-UHFFFAOYSA-N 0.000 description 1
- ZSUDUDXOEGHEJR-UHFFFAOYSA-N 4-methylnaphthalen-1-ol Chemical compound C1=CC=C2C(C)=CC=C(O)C2=C1 ZSUDUDXOEGHEJR-UHFFFAOYSA-N 0.000 description 1
- BZCYULYTYLSGBX-UHFFFAOYSA-N 5-bromonaphthalen-2-ol Chemical compound BrC1=CC=CC2=CC(O)=CC=C21 BZCYULYTYLSGBX-UHFFFAOYSA-N 0.000 description 1
- XURLSQIGYIACRH-UHFFFAOYSA-N 5-butylnaphthalen-1-ol Chemical compound C1=CC=C2C(CCCC)=CC=CC2=C1O XURLSQIGYIACRH-UHFFFAOYSA-N 0.000 description 1
- IPZJPYHEVWLBNH-UHFFFAOYSA-N 5-chloronaphthalen-1-ol Chemical compound C1=CC=C2C(O)=CC=CC2=C1Cl IPZJPYHEVWLBNH-UHFFFAOYSA-N 0.000 description 1
- GFXOVMFSDVWIOO-UHFFFAOYSA-N 5-ethoxynaphthalen-1-ol Chemical compound C1=CC=C2C(OCC)=CC=CC2=C1O GFXOVMFSDVWIOO-UHFFFAOYSA-N 0.000 description 1
- BNCWWEADOZHLFE-UHFFFAOYSA-N 5-ethoxynaphthalen-2-ol Chemical compound OC1=CC=C2C(OCC)=CC=CC2=C1 BNCWWEADOZHLFE-UHFFFAOYSA-N 0.000 description 1
- QWAWNXODWGJFPU-UHFFFAOYSA-N 5-ethylnaphthalen-1-ol Chemical compound C1=CC=C2C(CC)=CC=CC2=C1O QWAWNXODWGJFPU-UHFFFAOYSA-N 0.000 description 1
- JMPGZDAPXHPJEA-UHFFFAOYSA-N 5-ethylnaphthalen-2-ol Chemical compound OC1=CC=C2C(CC)=CC=CC2=C1 JMPGZDAPXHPJEA-UHFFFAOYSA-N 0.000 description 1
- WLZPYTDCBHITRF-UHFFFAOYSA-N 5-methoxynaphthalen-1-ol Chemical compound C1=CC=C2C(OC)=CC=CC2=C1O WLZPYTDCBHITRF-UHFFFAOYSA-N 0.000 description 1
- HKLUQGYAKFXFEO-UHFFFAOYSA-N 5-methoxynaphthalen-2-ol Chemical compound OC1=CC=C2C(OC)=CC=CC2=C1 HKLUQGYAKFXFEO-UHFFFAOYSA-N 0.000 description 1
- VVTMLJYBQHRIPC-UHFFFAOYSA-N 5-methylnaphthalen-2-ol Chemical compound OC1=CC=C2C(C)=CC=CC2=C1 VVTMLJYBQHRIPC-UHFFFAOYSA-N 0.000 description 1
- YLDFTMJPQJXGSS-UHFFFAOYSA-N 6-bromo-2-naphthol Chemical compound C1=C(Br)C=CC2=CC(O)=CC=C21 YLDFTMJPQJXGSS-UHFFFAOYSA-N 0.000 description 1
- FSUYQOYAPVYVHS-UHFFFAOYSA-N 6-bromonaphthalen-1-ol Chemical compound BrC1=CC=C2C(O)=CC=CC2=C1 FSUYQOYAPVYVHS-UHFFFAOYSA-N 0.000 description 1
- NRLZGPVINJTXJL-UHFFFAOYSA-N 6-chloronaphthalen-1-ol Chemical compound ClC1=CC=C2C(O)=CC=CC2=C1 NRLZGPVINJTXJL-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- QSDSWPOSISCSSI-UHFFFAOYSA-N 7-chloronaphthalen-2-ol Chemical compound C1=CC(Cl)=CC2=CC(O)=CC=C21 QSDSWPOSISCSSI-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- HMOJHNGIVUHXGS-UHFFFAOYSA-N 8-ethylnaphthalen-2-ol Chemical compound C1=C(O)C=C2C(CC)=CC=CC2=C1 HMOJHNGIVUHXGS-UHFFFAOYSA-N 0.000 description 1
- IIMWYPQPDPTIIA-UHFFFAOYSA-N 8-methylnaphthalen-2-ol Chemical compound C1=C(O)C=C2C(C)=CC=CC2=C1 IIMWYPQPDPTIIA-UHFFFAOYSA-N 0.000 description 1
- 238000005727 Friedel-Crafts reaction Methods 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- VEOUUDAQOPKAEX-UHFFFAOYSA-N [3-[3-(hydroxymethyl)phenyl]phenyl]methanol Chemical group OCC1=CC=CC(C=2C=C(CO)C=CC=2)=C1 VEOUUDAQOPKAEX-UHFFFAOYSA-N 0.000 description 1
- SFHGONLFTNHXDX-UHFFFAOYSA-N [4-[4-(hydroxymethyl)phenyl]phenyl]methanol Chemical group C1=CC(CO)=CC=C1C1=CC=C(CO)C=C1 SFHGONLFTNHXDX-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 1
- 229940008406 diethyl sulfate Drugs 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- GKIPXFAANLTWBM-UHFFFAOYSA-N epibromohydrin Chemical compound BrCC1CO1 GKIPXFAANLTWBM-UHFFFAOYSA-N 0.000 description 1
- 238000006735 epoxidation reaction Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- ZUVBIBLYOCVYJU-UHFFFAOYSA-N naphthalene-1,7-diol Chemical compound C1=CC=C(O)C2=CC(O)=CC=C21 ZUVBIBLYOCVYJU-UHFFFAOYSA-N 0.000 description 1
- MNZMMCVIXORAQL-UHFFFAOYSA-N naphthalene-2,6-diol Chemical compound C1=C(O)C=CC2=CC(O)=CC=C21 MNZMMCVIXORAQL-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical class C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
- C08G59/063—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols with epihalohydrins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/3218—Carbocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
Definitions
- This invention relates to resins with high refractive indices which are useful as sealing and laminating materials for electronic components; resin compositions containing said resins to afford cured products with high heat resistance, low water absorption and good adhesion; as well as the cured products of said resin compositions.
- This invention provides resins which afford cured products with high heat resistance, low water absorption and good adhesion enough to endure such rigorous working conditions; resin compositions containing said resins; and the cured products thereof.
- this invention relates to:
- n is 0 to 10, preferably 0 to 8, more preferably 0 to 4. If n (mean value) exceeds 10, the viscosity increases to deteriorate the workability.
- the halogen atom includes a chlorine atom, bromine atom, etc.
- the lower alkyl group includes methyl, ethyl, t-butyl, etc.
- the lower alkoxy group includes methoxy, ethoxy, etc.
- the resin of formula (II) according to this invention is obtained by condensing a naphthol with a biphenyl derivative represented by formula (IV): wherein R represents a halogen atom, hydroxyl group or lower alkoxy group, if necessary, in the presence of an acid catalyst.
- R represents a halogen atom, hydroxyl group or lower alkoxy group, if necessary, in the presence of an acid catalyst.
- the naphthol includes 1-naphthol, 2-naphthol, 1,7-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, 1,5-dihydroxynaphthalene, 4-methyl-1-naphthol, 2-methyl-1-naphthol, 8-methyl-2-naphthol, 5-methyl-2-naphthol, 4-ethyl-1-naphthol, 5-ethyl-1-naphthol, 8-ethyl-2-naphthol, 5-ethyl-2-naphthol, 5-butyl-1-naphthol, 4-chloro-1-naphthol, 5-chloro-1-naphthol, 6-chloro-1-naphthol, 4-bromo-1-naphthol, 6-bromo-1-naphthol, 4-chloro-2-naphthol, 5-bromo
- R preferably represents a chlorine atom, bromine atom, iodine atom, hydroxyl group or a lower alkoxy group containing 4 or less carbon atoms. With alkoxy groups containing 5 or more carbon atoms, the reaction is slow.
- Preferred examples of the biphenyl derivative of formula (IV) include 4,4'-bis(chloromethyl)biphenyl, 4,4'-bis(bromomethyl)biphenyl, 4,3'-bis(chloromethyl)biphenyl, 3,3'-bis(chloromethyl)biphenyl, 4,4'-bis(hydroxymethyl) biphenyl, 4,4'-bis(methoxymethyl)biphenyl, 3,3'-bis(hydroxymethyl)biphenyl, 3,3'-bis(methoxymethyl)biphenyl, 4,4'-bis(ethoxymethyl)biphenyl, etc.
- the acid catalyst which can be used in the above condensation reaction includes inorganic or organic acids, for example, mineral acids such as hydrochloric acid, sulfuric acid, phosphoric acid; organic sulfonic acids such as methanesulfonic acid, p-toluenesulfonic acid; as well as Friedel-Crafts catalysts such as zinc chloride, aluminium chloride, cupric chloride, ferric chloride; sulfuric acid esters such as dimethyl sulfate, diethyl sulfate; trifluoromethanesulfonic acid; boron trifluoride; oxalic acid; and they may be used alone or in combination.
- the acid catalyst is preferably used in an amount of 0.1 to 30% by weight of the compound of formula (IV).
- the naphthol is usually used 0.5 to 20.0 times, preferably 2 to 10 times in molar excess of the compound of formula (IV).
- the reaction may be carried out in the absence or presence of a solvent such as benzene, toluene, methyl isobutyl ketone, etc.
- the reaction temperature is preferably 40 to 180°C, and the reaction time is preferably 1 to 8 hours.
- the catalyst used and/or acid produced are washed with water or otherwise removed, and the solvent and excessive naphthol are removed under reduced pressure to give the intended resin of formula (II).
- resin represented by formula (II) includes the resins represented by formulae (V) and (VI): wherein n represents a mean value and ranges from 0 to 10.
- resin of formula (II) can be reacted with an epihalohydrin compound in the presence of a basic compound to readily give the epoxy resin represented by formula (III).
- the epihalohydrin compound include epichlorohydrin, epibromohydrin, epiiodohydrin or mixtures thereof, among which epichlorohydrin is industrially preferable.
- the resin of formula (II) is reacted with an epihalohydrin compound in molar excess of the hydroxyl equivalent of the resin in the presence of a quaternary ammonium salt such as tetramethylammonium chloride, tetramethylammonium bromide, triethylammonium chloride; or an alkali metal hydroxide such as sodium hydroxide, potassium hydroxide, etc.
- a quaternary ammonium salt such as tetramethylammonium chloride, tetramethylammonium bromide, triethylammonium chloride
- an alkali metal hydroxide such as sodium hydroxide, potassium hydroxide, etc.
- reaction When a quaternary ammonium salt is used, the reaction often stops at the stage of ring-opening addition reaction. Then, one of the above alkali metal hydroxides is added to cause a ring-closing reaction.
- the ring-opening addition reaction and ring-closing reaction may occur at the same time.
- the proportion of the epihalohydrin compound used is usually 1 to 50 moles, preferably 3 to 15 moles per 1 hydroxyl equivalent of the compound represented by formula (II).
- the reaction may be promoted by alcohols such as methanol; acetone; or aprotic polar solvents such as dimethyl sulfoxide, dimethyl sulfon, dimethylformaldehyde, preferably dimethyl sulfoxide.
- the amount of the alkali metal hydroxide used is usually 0.8 to 1.5 moles, preferably 0.9 to 1.3 moles per 1 hydroxyl equivalent of the resin of formula (II).
- the amount thereof is usually 0.001 to 1.0 moles, preferably 0.005 to 0.5 moles per 1 hydroxyl equivalent of the resin represented by formula (II).
- the reaction temperature is usually 30 to 130°C, preferably 40 to 120°C.
- the reaction time is usually 1 to 10 hours, preferably 2 to 8 hours.
- the reaction may be proceeded while removing the water produced by the reaction from the reaction system. After completion of the reaction, by-produced salt is washed with water, filtered or otherwise removed, to give the epoxy resin represented by formula (III).
- the epoxy resin represented by formula (III) according to this invention may be used as component (A) alone or in combination with other epoxy resins.
- the proportion of the epoxy resin represented by formula (III) according to this invention in the total amount of epoxy resins is preferably 30% by weight or more, especially 50% by weight or more.
- Epoxy resins which can be used in combination with the epoxy resin represented by formula (III) according to this invention include bisphenol A-type epoxy resins, bisphenol F-type epoxy resins, bisphenol S-type epoxy resins, alicyclic epoxy resins, biphenyl epoxy resins, novolak-type epoxy resins, among which novolak-type epoxy resins are especially advantageous in respect of heat resistance.
- the novolak-type epoxy resins include, for example, cresol novolak-type epoxy resins, phenol novolak-type epoxy resins, brominated phenol novolak-type epoxy resins.
- Epoxy resins which can be used in combination are not limited to those listed above, and only one or more than one of them may be chosen.
- the resin represented by formula (II) according to this invention serves as a hardener, and may be used as component (B) alone or in combination with other hardeners.
- the proportion of the resin represented by formula (II) according to this invention in the total amount of hardeners is preferably 30% by weight or more, especially 50% by weight or more.
- Hardeners which can be used in combination with the resin represented by formula (II) according to this invention include polyamine-based hardeners such as aliphatic polyamines, aromatic polyamines, polyamide polyamines; acid anhydride-based hardeners such as hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride; phenol-based hardeners such as phenol novolak, cresol novolak; Lewis acids such as boron trifluoride, or their salts; dicyandiamides, etc., but are not limited to these examples. And only one or more than one of them may be chosen.
- polyamine-based hardeners such as aliphatic polyamines, aromatic polyamines, polyamide polyamines
- acid anhydride-based hardeners such as hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride
- phenol-based hardeners such as phenol novolak, cresol novolak
- Lewis acids such as boro
- the epoxy resin as component (A) includes those listed above, in addition to the epoxy resin represented by formula (III) according to this invention.
- the hardener as component (B) includes those listed above, in addition to the resin of formula (II) according to this invention.
- the amount of the hardener as component (B) used is preferably 0.5 to 1.5 equivalents, especially 0.6 to 1.2 equivalents per 1 epoxy equivalent of the epoxy resin of component (A).
- cure accelerators may be used, including as non-limitative examples, imidazole compounds such as 2-methylimidazole, 2-ethylimidazole; tertiary amine compounds such as 2-(dimethylaminomethyl)phenol; triphenylphosphine compounds, etc.
- the amount of the cure accelerator used is preferably 0.01 to 15 parts by weight, especially 0.1 to 10 parts by weight based on 100 parts by weight of the epoxy resin of component (A).
- the epoxy resin compositions according to this invention further contain known additives including inorganic fillers such as silica, alumina, talc, glass fibers; surface-treating agents for fillers such as silane coupling agent; release agents; pigments; etc.
- inorganic fillers such as silica, alumina, talc, glass fibers
- surface-treating agents for fillers such as silane coupling agent
- release agents such as pigments; etc.
- the epoxy resin compositions according to this invention are obtained by homogeneously mixing individual components.
- the epoxy resin compositions according to this invention are usually precured at temperatures between 130 and 170°C for 30 to 300 seconds and then postcured at temperatures between 150 and 200°C for 2 to 10 hours, to proceed a curing reaction enough to afford the cured products according to this invention.
- the resins according to this invention can be used as epoxy resins or hardeners in a wide field requiring heat resistance, low water absorption and high adhesion. Specifically, they are useful as constituents in any kind of electric and electronic materials such as insulating materials, laminated sheets, sealing materials, etc. They can also be used in the field of molding materials, composite materials, etc.
- Example 2 The same procedure as described in Example 1 was conducted except that the amount of 1-naphthol was changed to 432g (3.0mol), to give 450g of a product (A-2) of formula (II) according to this invention wherein all of X represent a hydrogen atom.
- the softening point of the product (A-2) was 113°C and the hydroxyl equivalent (g/eq) was 255.
- the value of n in formula (II) was 0.8 by GPC analysis.
- the softening point of the product (B-2) which was an epoxy resin of formula (III) according to this invention wherein all of Y represent a hydrogen atom and n 0.8 was 91.2°C, and the epoxy equivalent (g/eq) was 336.
- Example 5 The same procedure as described in Example 5 was conducted except that the product (A-1) was replaced by 235g of the product (A-2) obtained by Example 2 to give 277g of a product (B-4).
- the softening point of the product (B-4) which was an epoxy resin represented by formula (III) according to this invention wherein all of Y represent a hydrogen atom and n 0.8 was 88°C, and the epoxy equivalent (g/eq) was 325.
- the product (A-1) or (A-2) obtained by Example 1 or 2 as a hardener; cresol novolak-type epoxy resin EOCN-1020 as an epoxy resin; and 2-methylimidazole as a cure accelerator were mixed in the proportions shown as parts by weight in Table 1 and roll-milled at 70 to 80°C for 15 minutes. After cooled, the mixture was ground, tabletted, molded by a transfer molding machine, then precured at 160°C for 2 hours and postcured at 180°C for 8 hours to give a cured product (test piece) according to this invention. The water absorption and adhesion of this cured product were determined. The results are shown in Table 1.
- the bond strength was estimated by tensile shear according to ASTM D1002.
- the adhesion was evaluated as follows: Measured value (kg/cm 2 ) Evaluation ⁇ 40 ⁇ 40 to 80 ⁇ 80 ⁇ O.
- Phenol novolak resin (PN(H-1)) as a hardener; the product (B-1) or (B-2) obtained by Example 3 or 4 as an epoxy resin; and 2-methylimidazole as a cure accelerator were mixed in the proportions shown as parts by weight in Table 2 and tested for the properties of the cured product according to this invention in the same way as in Examples 7 and 8. The results are shown in Table 2.
- PN(H-1) Phenol novolac resin (manufactured by Nippon Kayaku); Hydroxyl group equivalent (g/eq) 106; Softening point 85°C.
- EOCN1020 Cresol novolak-type epoxy resin (manufactured by Nippon Kayaku); Epoxy equivalent (g/eq) 200; Softening point 65°C.
- EPOMIC R-301 Bisphenol A-type epoxy resin (manufactured by Mitsui Petrochemical Epoxy, Co. Ltd.); Epoxy equivalent (g/eq) 470; Softening point 68°C.
- EPPN502 Polyepoxy compound (manufactured by Nippon Kayaku); Epoxy equivalent (g/eq) 168; Softening point 70°C. Table 1
- the resins of formulae (II) and (III) according to this invention have high refractive indices, and the cured products thereof show a water absorption remarkably lower than conventional resins and better adhesion without deteriorating glass transition temperture and heat deformation temperature which are indicative of heat resistance.
- the resins of this invention satisfactorily meet the recent requirements for high heat resistance, low water absorption and high adhesion, and thanks to these performances, they are very useful in a wide field, particularly as sealing materials for electric and electronic components, molding materials, optical materials or laminating materials.
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP90955/93 | 1993-03-22 | ||
JP05090955A JP3132610B2 (ja) | 1993-03-22 | 1993-03-22 | ナフタレン環含有樹脂、樹脂組成物及びその硬化物 |
PCT/JP1994/000445 WO1994021707A1 (en) | 1993-03-22 | 1994-03-18 | Naphthalene-ring resin, resin composition, and cured product thereof |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0644216A1 EP0644216A1 (en) | 1995-03-22 |
EP0644216A4 EP0644216A4 (enrdf_load_stackoverflow) | 1995-04-26 |
EP0644216B1 true EP0644216B1 (en) | 1996-07-17 |
Family
ID=14012917
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP94910046A Expired - Lifetime EP0644216B1 (en) | 1993-03-22 | 1994-03-18 | Naphthalene-ring resin, resin composition, and cured product thereof |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0644216B1 (enrdf_load_stackoverflow) |
JP (1) | JP3132610B2 (enrdf_load_stackoverflow) |
KR (1) | KR100271774B1 (enrdf_load_stackoverflow) |
CN (1) | CN1041526C (enrdf_load_stackoverflow) |
DE (1) | DE69400309T2 (enrdf_load_stackoverflow) |
TW (1) | TW295592B (enrdf_load_stackoverflow) |
WO (1) | WO1994021707A1 (enrdf_load_stackoverflow) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3476584B2 (ja) * | 1995-03-03 | 2003-12-10 | 日本化薬株式会社 | エポキシ樹脂、エポキシ樹脂組成物およびその硬化物 |
JP3575776B2 (ja) * | 1995-12-28 | 2004-10-13 | 日本化薬株式会社 | エポキシ樹脂、エポキシ樹脂組成物及びその硬化物 |
KR100975846B1 (ko) * | 2006-02-28 | 2010-08-16 | 디아이씨 가부시끼가이샤 | 페놀 수지의 제조 방법, 및 에폭시 수지의 제조 방법 |
TW200842135A (en) * | 2007-04-23 | 2008-11-01 | Chang Chun Plastics Co Ltd | Flame retardant resin composition |
JP5433294B2 (ja) * | 2009-04-30 | 2014-03-05 | エア・ウォーター株式会社 | ジヒドロキシナフタレン系重合体、その製造方法およびその用途 |
CN101824136B (zh) * | 2010-04-02 | 2011-12-07 | 南京航空航天大学 | 含萘环和联苯结构环氧树脂及其合成方法 |
JP6403554B2 (ja) * | 2013-12-04 | 2018-10-10 | 日本化薬株式会社 | フェノール樹脂、エポキシ樹脂、エポキシ樹脂組成物、およびその硬化物 |
TWI728084B (zh) * | 2016-03-30 | 2021-05-21 | 日商日鐵化學材料股份有限公司 | 多價羥基樹脂、其之製造方法、環氧樹脂、環氧樹脂組成物及其之硬化物 |
WO2020003824A1 (ja) * | 2018-06-27 | 2020-01-02 | Dic株式会社 | エポキシ樹脂組成物及びその硬化物 |
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US3437695A (en) * | 1964-10-05 | 1969-04-08 | Phillips Petroleum Co | Polymerization |
JPS61138622A (ja) * | 1984-12-12 | 1986-06-26 | Agency Of Ind Science & Technol | 繊維強化複合材料及びそれから得られる硬化成形物 |
JPS62521A (ja) * | 1985-02-18 | 1987-01-06 | Sugiro Otani | 縮合多環多核芳香族樹脂の製造方法及びその製造に用いる熱硬化性組成物 |
-
1993
- 1993-03-22 JP JP05090955A patent/JP3132610B2/ja not_active Expired - Fee Related
-
1994
- 1994-03-15 TW TW083102216A patent/TW295592B/zh not_active IP Right Cessation
- 1994-03-18 WO PCT/JP1994/000445 patent/WO1994021707A1/ja active IP Right Grant
- 1994-03-18 KR KR1019940704176A patent/KR100271774B1/ko not_active Expired - Fee Related
- 1994-03-18 DE DE69400309T patent/DE69400309T2/de not_active Expired - Fee Related
- 1994-03-18 EP EP94910046A patent/EP0644216B1/en not_active Expired - Lifetime
- 1994-03-18 CN CN94190143A patent/CN1041526C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69400309T2 (de) | 1996-11-21 |
CN1106194A (zh) | 1995-08-02 |
WO1994021707A1 (en) | 1994-09-29 |
CN1041526C (zh) | 1999-01-06 |
EP0644216A1 (en) | 1995-03-22 |
JP3132610B2 (ja) | 2001-02-05 |
TW295592B (enrdf_load_stackoverflow) | 1997-01-11 |
JPH06271654A (ja) | 1994-09-27 |
KR100271774B1 (ko) | 2000-11-15 |
EP0644216A4 (enrdf_load_stackoverflow) | 1995-04-26 |
KR950701656A (ko) | 1995-04-28 |
DE69400309D1 (de) | 1996-08-22 |
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