EP0631712A1 - Procede d'acceleration de particules chargees electriquement - Google Patents

Procede d'acceleration de particules chargees electriquement

Info

Publication number
EP0631712A1
EP0631712A1 EP93906431A EP93906431A EP0631712A1 EP 0631712 A1 EP0631712 A1 EP 0631712A1 EP 93906431 A EP93906431 A EP 93906431A EP 93906431 A EP93906431 A EP 93906431A EP 0631712 A1 EP0631712 A1 EP 0631712A1
Authority
EP
European Patent Office
Prior art keywords
tube
particle
space
reservoir
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP93906431A
Other languages
German (de)
English (en)
Other versions
EP0631712B1 (fr
Inventor
Christoph Schultheiss
Martin Konijnenberg
Markus Schwall
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Karlsruhe GmbH
Original Assignee
Kernforschungszentrum Karlsruhe GmbH
Forschungszentrum Karlsruhe GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kernforschungszentrum Karlsruhe GmbH, Forschungszentrum Karlsruhe GmbH filed Critical Kernforschungszentrum Karlsruhe GmbH
Publication of EP0631712A1 publication Critical patent/EP0631712A1/fr
Application granted granted Critical
Publication of EP0631712B1 publication Critical patent/EP0631712B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
    • H05H1/06—Longitudinal pinch devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H5/00—Direct voltage accelerators; Accelerators using single pulses

Definitions

  • the invention relates to a method for generating an electrically charged particle beam and to a particle accelerator for carrying out the method and for using the same.
  • particles of predetermined charge and mass are extracted from a reservoir and fed to an acceleration space between two different electrical potentials, in order to ultimately be available as a beam for further machining processes.
  • the object of the invention is to achieve high particle beam intensities or equivalent to a high current or a high current density and a sharp bundling of the particle beam with economically acceptable means and expenditures.
  • the charged particles are sucked in the reservoir with a high current intensity and current density in a dielectric tube space beginning in the electrode, which partly forms the reservoir wall, and are accelerated there via the potential difference between the two electrodes.
  • the particles arrive in a target space, they have reached their process energy.
  • a residual gas filling with the residual pressure p in the dielectric tube space is ionized and electrically polarized by the particle stream.
  • a charge cloud on and along the inner tube wall has a repulsive effect on the particle stream.
  • Space charge compensation and electrostatic focusing of the particle beam take place. This process proceeds well if the product of the residual gas pressure p and the inner diameter d of the tube is applied so low that the acceleration voltage applied from the outside between the electrodes is essentially retained for the particle beam acceleration in spite of parasitic discharge in the residual gas filling .
  • a localized magnetic field in the area of Tube space causes a beam deflection.
  • the cross section of the particle beam is influenced by cross-sectional changes in the dielectric tube space.
  • the acceleration path for the particle beam is divided in a defined manner via a potential control by means of resistively coupled auxiliary electrodes between the two main electrodes.
  • the particle accelerator characterized in claim 6 is suitable for carrying out the method.
  • one electrode partially forms the reservoir wall.
  • the counter electrode is outside the reservoir.
  • the dielectric tube space is directed towards them in its further course.
  • the tube space is expediently partially or completely formed by a system of dielectric tube segments arranged in alignment.
  • the segments form radially shaped slots with one another. This prevents surface currents.
  • the slitting is such that radiation or particles emanating radially from the tube axis do not reach the radial slit end, or if at all only via a long detour.
  • an adequately electrically insulated gas supply is provided in the end area to the counterelectrode, via which gas can flow into the tube space in both directions.
  • the noticeable improvement in the quality of the particle beam is on the one hand largely attributable to the structural measure, the stack of electrodes and insulators of the pseudo-spark gap through a tube space limited by dielectric material, in the exemplary embodiment which is described below, a quartz tube or an aligned sequence of several shorter quartz tubes , to replace.
  • the high beam quality is again largely due to the independent formation of a charged particle stream in the quartz tube arrangement.
  • Figure 1 schematic representation of the acceleration and transport path for the particle beam
  • Figure la cross section through the dielectric tube with positive space charge in the axis and negative space charge accumulation on the tube wall when electrons form the particle beam;
  • Figure 2 curved acceleration and transport path in the recipient with additional magnetic beam focusing
  • FIG. 3a division of the dielectric tube into the acceleration and transport section by means of an auxiliary electrode
  • Figure 3b Potential control by auxiliary electrodes between the end electrodes
  • Figure 4a basic radial expansion of the tube space between the tube segments:
  • Figure 4b structurally simple expansion of the tube space
  • Figure 4c constructionally complex tube space expansion
  • FIG. 5 tube space with an electrically decoupled pump device
  • Figure 6 electrically high-lying particle reservoir, simple schematic example of the particle generation and suction in the tube space;
  • Figure 7 pulsed light source.
  • the electron beam leaving the quartz tube consists of two parts, namely a part from the gas discharge in the pseudo-spark chamber and a part that results from an independent beam formation in the quartz tube.
  • the electron beam from the pseudo-spark chamber only reliably couples into the dielectric tube if the end of the dielectric tube lies on an intermediate electrode, and the better, the more cathodically charged it is, i.e. the deeper it is pushed into the pseudo-spark chamber.
  • FIG. 1 a device (FIG. 1), which e.g. consists of the plasma 1 of a rapidly changing hollow cathode and a dielectric tube 5 protruding therein.
  • the other end of the dielectric tube 5, insulated from the cathode electrode 2 projects freely into a recipient 8 (see FIG. 2).
  • the anode 3 plays a subordinate role.
  • An anode 3 can also be dispensed with; the function of the anode 3 is then taken over by the metallic recipient 8. Both collect the negative excess charge and use it to form the return current to the capacitors.
  • the dielectric tube space 5 must contain a residual gas filling with the pressure p.
  • the particle stream 7 ionizes and polarizes the residual gas, so that the wall of the tube space 5 is repelled for the particle beam 7 and the axis is attracted (see schematic illustration in FIG. 1a for this).
  • the space charge repulsion in the axis 12 is reduced in the case of the electron beam 7 (FIG. 1 a).
  • the negative charge clouds 38 on the wall are removed from the tube 5 by the external electric field sucked, whereby the charge carriers formed from the gas form a positive excess charge 39. This positive excess charge 39 reduces the negative space charge carried by the beam 7.
  • the profile of the electron beam 7 resembles a hollow cylinder. This indicates a remaining space charge rejection during the acceleration process.
  • the jet 7 remains stable and widens only slightly over a distance of 15 cm; however, the residual pressure in the recipient 8 must be greater than 0.2 Pa (oxygen).
  • the profile of the beam 7 indicates the ability of the tube space 5 to also hold and accelerate those electrons that would leave the beam 7 in an open acceleration structure. This explains the good efficiency of the acceleration of particles in the tube space 5.
  • the dielectric tube 5 or the first section thereof must be at least three times as long as its inside diameter.
  • the voltage breakdown at the tube 5 is approximately 4 Pa with an applied voltage of 20 kV and a diameter d of the dielectric tube of 3 mm.
  • the preferred working pressure range in the implementation example is approximately between 0.1 Pa and 1.5 Pa.
  • Oxygen was used as the gas filling. However, each gas can be taken as a residual gas filling.
  • the diagnosis of the energy distribution of the electrons with the aid of the X-ray brake radiation and magnetic field spectroscopy shows that the energy distribution of the electrons remains constant in the above preferred pressure range due to collective effects in the dielectric tube 5.
  • an externally applied voltage of 20 kV a mean electron energy between 11 and 12 keV is measured over a period of 70 nsec, regardless of vibrations of the total current in the tube, which is up to 6 kA. It can be seen that the extracted electron current increases when an auxiliary anode 9 is integrated into the dielectric tube 5 and is connected to the anode 3 via an ohmic or inductive resistor 10 (FIG. 3a).
  • the resistor 10 is dimensioned so that the anode potential drifts away from the auxiliary anode 9 and the potential is applied to the entire dielectric tube 5 from a low current (10 mA-10 A). This measure is generally recommended, in particular if the dielectric tube 5 is very long (for example 100 cm) and / or is curved, and / or if the cross-section along the dielectric tube 5 is to reduce or increase the current density changes.
  • the distance from the reservoir 1 to the auxiliary electrode 9 in FIG. 3a is called the channel accelerator 11 and the formation of the particle beam 7 is called a channel spark.
  • the section from the auxiliary electrode 9 to the anodic end of the dielectric tube 5 is referred to as the beam guide 12.
  • the electrical insulation capacity of the inner wall 23 of the accelerator tube 5 is impaired by contamination; this results in a malfunction of the mode of operation of the channel spark.
  • the occurrence of a secondary discharge in the adsorbates of the inner wall 23 of the dielectric tube 5 is also unavoidable when the particle stream from the reservoir 1 increases.
  • the discharge on the inner wall of the dielectric tube 5 shields the outer field, as a result of which the focusing of the particle stream 7 from the reservoir 1 onto the axis 12 is hindered.
  • FIG. 4 shows three solution examples a), b), c) for a segmented arrangement 16 of the tube 5, each in connection with a dielectric body 18, 19, 20, which has an inner radial 18 or topologically has any slit 19, 20 which is intended to interrupt any harmful inner surface currents 23 from one dielectric tube segment to the other.
  • This slit can also include at least one depression 22 or the like, which prevents the further penetration of vapors into the rear space of the slit. This ensures that the segments are insulated from one another, which means safe operation of the channel spark.
  • a pulsed surface discharge or laser plasma can also be used as the reservoir 1 for electrons in FIG. 1.
  • a minimum pressure of the order of 0.2 Pa must be set for the transport of the high-current beam in the anode compartment.
  • a trigger plasma 29 can be passed through a dielectric tube 30 with approximately the same inner diameter and the same length as the accelerator tube 11 into the reservoir space 1 and thus the operation can be initiated.
  • the other end of the dielectric tube is grounded to the trigger source 31 via a resistor 32 dimensioned in such a way that any secondary discharge to the trigger source 31 does not cause any destruction (see FIG. 6).
  • a gas supply 24 is attached to the tube 5 at the end of the dielectric tube 5 to the counterelectrode 3, 8, so that the gas both in the direction of reservoir 1 and in the recipient 8 can flow in, in which the counter electrode 3 is located (FIG. 5).
  • a further dielectric tube 27 can be introduced, which has an inner diameter of at most 1/2 d and which is metallized on both sides on the end faces or provided with electrodes 28, the to the gas source 26 pointing electrode 28 is grounded and the other floats freely.
  • the potential of the reservoir 1 is at anode potential. Because of the shielding effect of the electrons and the low mobility of the ions, the density of the plasma in the reservoir 1 at the entrance of the dielectric tube 5 must be high. To effectively extract the ions from the plasma into the dielectric tube 5, the acceleration section (up to the first auxiliary electrode 13, see FIG. 3b) must be selected briefly and the voltage high due to the Child-Langmuir law.
  • the auxiliary electrode begins to carry current.
  • the ohmic or inductive resistor 11 which connects the auxiliary electrode 13 to the cathode, causes the first auxiliary electrode 13 to drift to anode potential.
  • a subsequent second auxiliary electrode 13 takes over the task of building up the electrical field and if this is deactivated by current load, it is a subsequent one, etc. (see FIG. 3b).
  • the residual pressure In order to keep the cross sections for the charge reversal of the ions low, the residual pressure must be as low as possible. In the implementation example it was around 0.1 Pa.
  • This type of ion acceleration has two advantages: firstly, the auxiliary electrodes 13 act like a linear accelerator; secondly, the ion beam leaves the dielectric tube 5 with good parallelism.
  • the channel spark is initially a simple and inexpensive source for high-current directional electron and ion beams, with the aid of which process energy can be deposited in still or differentially pumped gases, gas mixtures and mixtures of gas and aerosols.
  • process energy can be deposited in still or differentially pumped gases, gas mixtures and mixtures of gas and aerosols.
  • Gas target can be created in which the electron beam is braked to produce braking and characteristic radiation in the gas.
  • Aerosols of unknown composition can be continuously passed through the dielectric tube, completely ionized by the electron beam and determined on the basis of the characteristic radiation.
  • Material can be irradiated, removed and processed with the aid of the particle beams (see FIG. 2).
  • the process of ablation in the case of electrons is ablation, in the case of ions it is atomization, including hot processes.
  • the sputtered, ablated and evaporated materials 33 predominantly move away from the target 14 in the target normal and consist, roughly in order of the power density of the particle beam, of ions, atoms, molecules, clusters and aerosols of any size, some of which are still excited and Carry excess loads.
  • the target material sputtered, ablated and vaporized by the particle beam can be used to produce layers on substrates using the Tayloring process (each atomic layer is different), as an atomic mixture (between otherwise incompatible materials) and as a compound substance on high-strength fibers or the like. be used.
  • Layers on substrates can also be produced with atomic material, which can be produced with the aid of the particle and / or electrical tromagnetic radiation is released from its gaseous chemical compound.
  • the high-current electron / ion beams from the channel spark form a particle source with high brilliance and current strength and can be introduced into the medium and high-energy accelerator after a differentially pumped path.
  • the plasma which is formed when the particle beams strike a target is a productive pulsed source for electromagnetic radiation (light, UV, VUV, soft X-ray radiation).
  • a very intense pulsed light source 37 is obtained by bombarding the end face of a light guide 35 by means of the particle beam (see FIG. 7).
  • a very hot plasma 36 is generated from the light guide material, the emitted light of which, due to its spectral composition and the power density at the point of origin, is coupled into the light guide with a high yield.
  • a plasma is formed in the dielectric tube and microwaves are generated from the interaction of the electron beam with the plasma, which penetrate the dielectric tube undamped and undisturbed and reach the outside.
  • the electron beam of the channel discharge is characterized by a high current in the lower kA range at a comparatively low acceleration voltage (5-10 kV) and is suitable for producing pulsed soft braking radiation after the well-focused electron beam strikes a target biological structures in the micrometer range can be imaged by casting shadows.
  • the channel discharge is suitable as a free-running and triggerable switch for high voltages.
  • the channel discharge can also be used as a pulse generator with repetition frequencies up to 10 kHz.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Particle Accelerators (AREA)

Abstract

Procédé d'accélération de particules chargées électriquement et accélérateur de particules permettant de mettre en ÷uvre et d'appliquer le procédé. Le rayonnement ainsi produit présente une haute intensité et une forte concentration. Il est bien adapté au dépôt uniforme de matériaux sur un substrat. Il est également bien adapté à la production de lumière de différents domaines spectraux.
EP93906431A 1992-03-19 1993-03-18 Procede d'acceleration de particules chargees electriquement Expired - Lifetime EP0631712B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE4208764 1992-03-19
DE4208764A DE4208764C2 (de) 1992-03-19 1992-03-19 Gasgefüllter Teilchenbeschleuniger
PCT/DE1993/000253 WO1993019572A1 (fr) 1992-03-19 1993-03-18 Procede d'acceleration de particules chargees electriquement

Publications (2)

Publication Number Publication Date
EP0631712A1 true EP0631712A1 (fr) 1995-01-04
EP0631712B1 EP0631712B1 (fr) 1998-05-20

Family

ID=6454418

Family Applications (1)

Application Number Title Priority Date Filing Date
EP93906431A Expired - Lifetime EP0631712B1 (fr) 1992-03-19 1993-03-18 Procede d'acceleration de particules chargees electriquement

Country Status (5)

Country Link
US (1) US5576593A (fr)
EP (1) EP0631712B1 (fr)
JP (1) JP2831468B2 (fr)
DE (2) DE4208764C2 (fr)
WO (1) WO1993019572A1 (fr)

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DE19813589C2 (de) * 1998-03-27 2002-06-20 Karlsruhe Forschzent Verfahren zum Erzeugen eines gepulsten Elektronenstrahls und Elektronenstrahlquelle zur Durchführung des Verfahrens
DE19902146C2 (de) * 1999-01-20 2003-07-31 Fraunhofer Ges Forschung Verfahren und Einrichtung zur gepulsten Plasmaaktivierung
JP3482949B2 (ja) * 2000-08-04 2004-01-06 松下電器産業株式会社 プラズマ処理方法及び装置
US6906338B2 (en) * 2000-08-09 2005-06-14 The Regents Of The University Of California Laser driven ion accelerator
DE10207835C1 (de) * 2002-02-25 2003-06-12 Karlsruhe Forschzent Kanalfunkenquelle zur Erzeugung eines stabil gebündelten Elektronenstrahls
DE10310623B8 (de) * 2003-03-10 2005-12-01 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen eines Plasmas durch elektrische Entladung in einem Entladungsraum
WO2005027913A1 (fr) * 2003-09-19 2005-03-31 Pfizer Products Inc. Compositions pharmaceutiques et methodes de traitement consistant en des associations d'un derive de la 2-alkylidene-19-nor-vitamine d et d'un secretagogue de l'hormone de croissance
ITMI20040008A1 (it) * 2004-01-08 2004-04-08 Valentin Dediu Processo per la produzione di nanotubi di carbonio a singola parete
ITMI20050585A1 (it) * 2005-04-07 2006-10-08 Francesco Cino Matacotta Apparato e processo per la generazione accelerazione e propagazione di fasci di elettroni e plasma
US7557511B2 (en) * 2005-08-01 2009-07-07 Neocera, Llc Apparatus and method utilizing high power density electron beam for generating pulsed stream of ablation plasma
JP2009507344A (ja) * 2005-08-30 2009-02-19 アドバンスト テクノロジー マテリアルズ，インコーポレイテッド 低圧ドーパントガスの高電圧イオン源への配送
DE102006028856B4 (de) * 2006-06-23 2008-05-29 Forschungszentrum Karlsruhe Gmbh Verfahren zum Aufbringen einer bioaktiven, gewebeverträglichen Schicht auf einen Formkörper, solche Formkörper sowie Verwendung solchermaßen beschichteter Formkörper
IT1395701B1 (it) 2009-03-23 2012-10-19 Organic Spintronics S R L Dispositivo per la generazione di plasma e per dirigere un flusso di elettroni verso un bersaglio
JP5681030B2 (ja) * 2011-04-15 2015-03-04 清水電設工業株式会社 プラズマ・電子ビーム発生装置、薄膜製造装置及び薄膜の製造方法
RU2462009C1 (ru) * 2011-06-08 2012-09-20 Мурадин Абубекирович Кумахов Способ изменения направления движения пучка ускоренных заряженных частиц, устройство для осуществления этого способа, источник электромагнитного излучения, линейный и циклический ускорители заряженных частиц, коллайдер и средство для получения магнитного поля, создаваемого током ускоренных заряженных частиц
ITBO20120695A1 (it) * 2012-12-20 2014-06-21 Organic Spintronics S R L Dispositivo di deposizione a plasma impulsato

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Also Published As

Publication number Publication date
EP0631712B1 (fr) 1998-05-20
WO1993019572A1 (fr) 1993-09-30
JPH07501654A (ja) 1995-02-16
US5576593A (en) 1996-11-19
JP2831468B2 (ja) 1998-12-02
DE4208764A1 (de) 1993-09-30
DE59308583D1 (de) 1998-06-25
DE4208764C2 (de) 1994-02-24

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