EP0566323B1 - Developer for silver halide photographic light-sensitive material - Google Patents
Developer for silver halide photographic light-sensitive material Download PDFInfo
- Publication number
- EP0566323B1 EP0566323B1 EP19930302781 EP93302781A EP0566323B1 EP 0566323 B1 EP0566323 B1 EP 0566323B1 EP 19930302781 EP19930302781 EP 19930302781 EP 93302781 A EP93302781 A EP 93302781A EP 0566323 B1 EP0566323 B1 EP 0566323B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- developer
- compound
- mol
- silver
- per liter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052709 silver Inorganic materials 0.000 title claims description 53
- 239000004332 silver Substances 0.000 title claims description 53
- -1 silver halide Chemical class 0.000 title claims description 47
- 239000000463 material Substances 0.000 title claims description 21
- 150000001875 compounds Chemical class 0.000 claims description 30
- 125000004432 carbon atom Chemical group C* 0.000 claims description 17
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N 1,4-Benzenediol Natural products OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 11
- PLIKAWJENQZMHA-UHFFFAOYSA-N p-hydroxyphenylamine Natural products NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 claims description 10
- 150000001340 alkali metals Chemical group 0.000 claims description 5
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 125000002252 acyl group Chemical group 0.000 claims description 3
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 3
- 125000003277 amino group Chemical group 0.000 claims description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- 239000000243 solution Substances 0.000 description 37
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 29
- 239000000839 emulsion Substances 0.000 description 29
- 238000012545 processing Methods 0.000 description 22
- 239000007864 aqueous solution Substances 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 16
- 239000010802 sludge Substances 0.000 description 16
- 238000000034 method Methods 0.000 description 14
- 239000000203 mixture Substances 0.000 description 9
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 8
- 108010010803 Gelatin Proteins 0.000 description 8
- 229920000159 gelatin Polymers 0.000 description 8
- 239000008273 gelatin Substances 0.000 description 8
- 235000019322 gelatine Nutrition 0.000 description 8
- 235000011852 gelatine desserts Nutrition 0.000 description 8
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- ZNZYKNKBJPZETN-WELNAUFTSA-N Dialdehyde 11678 Chemical compound N1C2=CC=CC=C2C2=C1[C@H](C[C@H](/C(=C/O)C(=O)OC)[C@@H](C=C)C=O)NCC2 ZNZYKNKBJPZETN-WELNAUFTSA-N 0.000 description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000002738 chelating agent Substances 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 230000001235 sensitizing effect Effects 0.000 description 6
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 6
- 229910021612 Silver iodide Inorganic materials 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 4
- 230000003405 preventing effect Effects 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 229940045105 silver iodide Drugs 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- XUJNEKJLAYXESH-REOHCLBHSA-N L-Cysteine Chemical compound SC[C@H](N)C(O)=O XUJNEKJLAYXESH-REOHCLBHSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229960000583 acetic acid Drugs 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229940024606 amino acid Drugs 0.000 description 3
- 235000001014 amino acid Nutrition 0.000 description 3
- 150000001413 amino acids Chemical class 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 3
- 235000019341 magnesium sulphate Nutrition 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 159000000000 sodium salts Chemical class 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 3
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- LEVWYRKDKASIDU-IMJSIDKUSA-N L-cystine Chemical compound [O-]C(=O)[C@@H]([NH3+])CSSC[C@H]([NH3+])C([O-])=O LEVWYRKDKASIDU-IMJSIDKUSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 2
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 2
- 229960003067 cystine Drugs 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 229910001447 ferric ion Inorganic materials 0.000 description 2
- 238000010979 pH adjustment Methods 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- HAAYBYDROVFKPU-UHFFFAOYSA-N silver;azane;nitrate Chemical compound N.N.[Ag+].[O-][N+]([O-])=O HAAYBYDROVFKPU-UHFFFAOYSA-N 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 2
- 235000019345 sodium thiosulphate Nutrition 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- GHYOCDFICYLMRF-UTIIJYGPSA-N (2S,3R)-N-[(2S)-3-(cyclopenten-1-yl)-1-[(2R)-2-methyloxiran-2-yl]-1-oxopropan-2-yl]-3-hydroxy-3-(4-methoxyphenyl)-2-[[(2S)-2-[(2-morpholin-4-ylacetyl)amino]propanoyl]amino]propanamide Chemical compound C1(=CCCC1)C[C@@H](C(=O)[C@@]1(OC1)C)NC([C@H]([C@@H](C1=CC=C(C=C1)OC)O)NC([C@H](C)NC(CN1CCOCC1)=O)=O)=O GHYOCDFICYLMRF-UTIIJYGPSA-N 0.000 description 1
- LJRDOKAZOAKLDU-UDXJMMFXSA-N (2s,3s,4r,5r,6r)-5-amino-2-(aminomethyl)-6-[(2r,3s,4r,5s)-5-[(1r,2r,3s,5r,6s)-3,5-diamino-2-[(2s,3r,4r,5s,6r)-3-amino-4,5-dihydroxy-6-(hydroxymethyl)oxan-2-yl]oxy-6-hydroxycyclohexyl]oxy-4-hydroxy-2-(hydroxymethyl)oxolan-3-yl]oxyoxane-3,4-diol;sulfuric ac Chemical compound OS(O)(=O)=O.N[C@@H]1[C@@H](O)[C@H](O)[C@H](CN)O[C@@H]1O[C@H]1[C@@H](O)[C@H](O[C@H]2[C@@H]([C@@H](N)C[C@@H](N)[C@@H]2O)O[C@@H]2[C@@H]([C@@H](O)[C@H](O)[C@@H](CO)O2)N)O[C@@H]1CO LJRDOKAZOAKLDU-UDXJMMFXSA-N 0.000 description 1
- QFLWZFQWSBQYPS-AWRAUJHKSA-N (3S)-3-[[(2S)-2-[[(2S)-2-[5-[(3aS,6aR)-2-oxo-1,3,3a,4,6,6a-hexahydrothieno[3,4-d]imidazol-4-yl]pentanoylamino]-3-methylbutanoyl]amino]-3-(4-hydroxyphenyl)propanoyl]amino]-4-[1-bis(4-chlorophenoxy)phosphorylbutylamino]-4-oxobutanoic acid Chemical compound CCCC(NC(=O)[C@H](CC(O)=O)NC(=O)[C@H](Cc1ccc(O)cc1)NC(=O)[C@@H](NC(=O)CCCCC1SC[C@@H]2NC(=O)N[C@H]12)C(C)C)P(=O)(Oc1ccc(Cl)cc1)Oc1ccc(Cl)cc1 QFLWZFQWSBQYPS-AWRAUJHKSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- CBDMBBKKGFKNCA-UHFFFAOYSA-N 1,5-diphenylpyrazolidin-3-one Chemical compound N1C(=O)CC(C=2C=CC=CC=2)N1C1=CC=CC=C1 CBDMBBKKGFKNCA-UHFFFAOYSA-N 0.000 description 1
- HLESEOXHRZRIAG-UHFFFAOYSA-N 1-(1,3-benzothiazol-2-yl)pyrazolidin-3-one Chemical compound N1C(=O)CCN1C1=NC2=CC=CC=C2S1 HLESEOXHRZRIAG-UHFFFAOYSA-N 0.000 description 1
- JIPBZEFOQFUCIQ-UHFFFAOYSA-N 1-(4-hydroxyphenyl)-4,4-dimethylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=C(O)C=C1 JIPBZEFOQFUCIQ-UHFFFAOYSA-N 0.000 description 1
- SVJPLZNMCJQWPJ-UHFFFAOYSA-N 1-(4-methylphenyl)pyrazolidin-3-one Chemical compound C1=CC(C)=CC=C1N1NC(=O)CC1 SVJPLZNMCJQWPJ-UHFFFAOYSA-N 0.000 description 1
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 1
- BOXPXLFVWVZCIU-UHFFFAOYSA-N 1-hydroxy-1-phosphonopropane-1,2,3-tricarboxylic acid Chemical compound OC(=O)CC(C(O)=O)C(O)(C(O)=O)P(O)(O)=O BOXPXLFVWVZCIU-UHFFFAOYSA-N 0.000 description 1
- CARFETJZUQORNQ-UHFFFAOYSA-N 1h-pyrrole-2-thiol Chemical class SC1=CC=CN1 CARFETJZUQORNQ-UHFFFAOYSA-N 0.000 description 1
- XIWRQEFBSZWJTH-UHFFFAOYSA-N 2,3-dibromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1Br XIWRQEFBSZWJTH-UHFFFAOYSA-N 0.000 description 1
- DBCKMJVEAUXWJJ-UHFFFAOYSA-N 2,3-dichlorobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Cl)=C1Cl DBCKMJVEAUXWJJ-UHFFFAOYSA-N 0.000 description 1
- AYNPIRVEWMUJDE-UHFFFAOYSA-N 2,5-dichlorohydroquinone Chemical compound OC1=CC(Cl)=C(O)C=C1Cl AYNPIRVEWMUJDE-UHFFFAOYSA-N 0.000 description 1
- IKQCSJBQLWJEPU-UHFFFAOYSA-N 2,5-dihydroxybenzenesulfonic acid Chemical compound OC1=CC=C(O)C(S(O)(=O)=O)=C1 IKQCSJBQLWJEPU-UHFFFAOYSA-N 0.000 description 1
- GPASWZHHWPVSRG-UHFFFAOYSA-N 2,5-dimethylbenzene-1,4-diol Chemical compound CC1=CC(O)=C(C)C=C1O GPASWZHHWPVSRG-UHFFFAOYSA-N 0.000 description 1
- HIGSPBFIOSHWQG-UHFFFAOYSA-N 2-Isopropyl-1,4-benzenediol Chemical compound CC(C)C1=CC(O)=CC=C1O HIGSPBFIOSHWQG-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 description 1
- XWKAZXKJYHZGAI-UHFFFAOYSA-N 2-acetyl-4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound C1C(C)(C)C(=O)N(C(=O)C)N1C1=CC=CC=C1 XWKAZXKJYHZGAI-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- XXLXBIHEDAERSL-UHFFFAOYSA-N 2-butoxypentanedial Chemical compound CCCCOC(C=O)CCC=O XXLXBIHEDAERSL-UHFFFAOYSA-N 0.000 description 1
- JTMBCYAUSCBSEY-UHFFFAOYSA-N 2-methyl-2-sulfanylpropanoic acid Chemical compound CC(C)(S)C(O)=O JTMBCYAUSCBSEY-UHFFFAOYSA-N 0.000 description 1
- IQKPRZPVTQHVOY-UHFFFAOYSA-N 2-methylpentanedial Chemical compound O=CC(C)CCC=O IQKPRZPVTQHVOY-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- GODCLGCOHHTLHX-UHFFFAOYSA-N 3,3-diphosphonopropanoic acid Chemical compound OC(=O)CC(P(O)(O)=O)P(O)(O)=O GODCLGCOHHTLHX-UHFFFAOYSA-N 0.000 description 1
- YSMHGANYTYAANX-UHFFFAOYSA-N 3-ethoxy-2-methoxypentanedial Chemical compound CCOC(CC=O)C(OC)C=O YSMHGANYTYAANX-UHFFFAOYSA-N 0.000 description 1
- LUNMJPAJHJAGIS-UHFFFAOYSA-N 3-methylpentanedial Chemical compound O=CCC(C)CC=O LUNMJPAJHJAGIS-UHFFFAOYSA-N 0.000 description 1
- NAEHAPZYAHRUTE-UHFFFAOYSA-N 3-phenyl-2-sulfanylprop-2-enoic acid Chemical compound OC(=O)C(S)=CC1=CC=CC=C1 NAEHAPZYAHRUTE-UHFFFAOYSA-N 0.000 description 1
- AJKLCDRWGVLVSH-UHFFFAOYSA-N 4,4-bis(hydroxymethyl)-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(CO)(CO)CN1C1=CC=CC=C1 AJKLCDRWGVLVSH-UHFFFAOYSA-N 0.000 description 1
- SJSJAWHHGDPBOC-UHFFFAOYSA-N 4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=CC=C1 SJSJAWHHGDPBOC-UHFFFAOYSA-N 0.000 description 1
- SOVXTYUYJRFSOG-UHFFFAOYSA-N 4-(2-hydroxyethylamino)phenol Chemical compound OCCNC1=CC=C(O)C=C1 SOVXTYUYJRFSOG-UHFFFAOYSA-N 0.000 description 1
- SRYYOKKLTBRLHT-UHFFFAOYSA-N 4-(benzylamino)phenol Chemical compound C1=CC(O)=CC=C1NCC1=CC=CC=C1 SRYYOKKLTBRLHT-UHFFFAOYSA-N 0.000 description 1
- LWVBRIOOSVDZFO-UHFFFAOYSA-N 4-(carbamothioylamino)butanoic acid Chemical compound NC(=S)NCCCC(O)=O LWVBRIOOSVDZFO-UHFFFAOYSA-N 0.000 description 1
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 1
- HDGMAACKJSBLMW-UHFFFAOYSA-N 4-amino-2-methylphenol Chemical compound CC1=CC(N)=CC=C1O HDGMAACKJSBLMW-UHFFFAOYSA-N 0.000 description 1
- FQQGQVUWBXURTA-UHFFFAOYSA-N 4-ethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(CC)CN1C1=CC=CC=C1 FQQGQVUWBXURTA-UHFFFAOYSA-N 0.000 description 1
- ZZEYCGJAYIHIAZ-UHFFFAOYSA-N 4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)CN1C1=CC=CC=C1 ZZEYCGJAYIHIAZ-UHFFFAOYSA-N 0.000 description 1
- FIARATPVIIDWJT-UHFFFAOYSA-N 5-methyl-1-phenylpyrazolidin-3-one Chemical compound CC1CC(=O)NN1C1=CC=CC=C1 FIARATPVIIDWJT-UHFFFAOYSA-N 0.000 description 1
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- LVDKZNITIUWNER-UHFFFAOYSA-N Bronopol Chemical compound OCC(Br)(CO)[N+]([O-])=O LVDKZNITIUWNER-UHFFFAOYSA-N 0.000 description 1
- GQUZTSGWULGOLE-UHFFFAOYSA-N C(C)(=O)O[C-]1NN(CC1=O)C1=CC=CC=C1 Chemical compound C(C)(=O)O[C-]1NN(CC1=O)C1=CC=CC=C1 GQUZTSGWULGOLE-UHFFFAOYSA-N 0.000 description 1
- JGLMVXWAHNTPRF-CMDGGOBGSA-N CCN1N=C(C)C=C1C(=O)NC1=NC2=CC(=CC(OC)=C2N1C\C=C\CN1C(NC(=O)C2=CC(C)=NN2CC)=NC2=CC(=CC(OCCCN3CCOCC3)=C12)C(N)=O)C(N)=O Chemical compound CCN1N=C(C)C=C1C(=O)NC1=NC2=CC(=CC(OC)=C2N1C\C=C\CN1C(NC(=O)C2=CC(C)=NN2CC)=NC2=CC(=CC(OCCCN3CCOCC3)=C12)C(N)=O)C(N)=O JGLMVXWAHNTPRF-CMDGGOBGSA-N 0.000 description 1
- XXAXVMUWHZHZMJ-UHFFFAOYSA-N Chymopapain Chemical compound OC1=CC(S(O)(=O)=O)=CC(S(O)(=O)=O)=C1O XXAXVMUWHZHZMJ-UHFFFAOYSA-N 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 1
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 1
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 1
- FFEARJCKVFRZRR-UHFFFAOYSA-N L-Methionine Natural products CSCCC(N)C(O)=O FFEARJCKVFRZRR-UHFFFAOYSA-N 0.000 description 1
- PWKSKIMOESPYIA-BYPYZUCNSA-N L-N-acetyl-Cysteine Chemical compound CC(=O)N[C@@H](CS)C(O)=O PWKSKIMOESPYIA-BYPYZUCNSA-N 0.000 description 1
- 239000004201 L-cysteine Substances 0.000 description 1
- 235000013878 L-cysteine Nutrition 0.000 description 1
- 239000004158 L-cystine Substances 0.000 description 1
- 235000019393 L-cystine Nutrition 0.000 description 1
- FFFHZYDWPBMWHY-VKHMYHEASA-N L-homocysteine Chemical compound OC(=O)[C@@H](N)CCS FFFHZYDWPBMWHY-VKHMYHEASA-N 0.000 description 1
- AGPKZVBTJJNPAG-WHFBIAKZSA-N L-isoleucine Chemical compound CC[C@H](C)[C@H](N)C(O)=O AGPKZVBTJJNPAG-WHFBIAKZSA-N 0.000 description 1
- FFEARJCKVFRZRR-BYPYZUCNSA-N L-methionine Chemical compound CSCC[C@H](N)C(O)=O FFEARJCKVFRZRR-BYPYZUCNSA-N 0.000 description 1
- 229930195722 L-methionine Natural products 0.000 description 1
- FSVCELGFZIQNCK-UHFFFAOYSA-N N,N-bis(2-hydroxyethyl)glycine Chemical compound OCCN(CCO)CC(O)=O FSVCELGFZIQNCK-UHFFFAOYSA-N 0.000 description 1
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 1
- JYXGIOKAKDAARW-UHFFFAOYSA-N N-(2-hydroxyethyl)iminodiacetic acid Chemical compound OCCN(CC(O)=O)CC(O)=O JYXGIOKAKDAARW-UHFFFAOYSA-N 0.000 description 1
- WRUZLCLJULHLEY-UHFFFAOYSA-N N-(p-hydroxyphenyl)glycine Chemical compound OC(=O)CNC1=CC=C(O)C=C1 WRUZLCLJULHLEY-UHFFFAOYSA-N 0.000 description 1
- XUYPXLNMDZIRQH-LURJTMIESA-N N-acetyl-L-methionine Chemical compound CSCC[C@@H](C(O)=O)NC(C)=O XUYPXLNMDZIRQH-LURJTMIESA-N 0.000 description 1
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 1
- FYDGRHCYVIUOSL-UHFFFAOYSA-L S(=O)([O-])[O-].[Ag+2] Chemical compound S(=O)([O-])[O-].[Ag+2] FYDGRHCYVIUOSL-UHFFFAOYSA-L 0.000 description 1
- GGLZPLKKBSSKCX-UHFFFAOYSA-N S-ethylhomocysteine Chemical compound CCSCCC(N)C(O)=O GGLZPLKKBSSKCX-UHFFFAOYSA-N 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 1
- PCSMJKASWLYICJ-UHFFFAOYSA-N Succinic aldehyde Chemical compound O=CCCC=O PCSMJKASWLYICJ-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 241001061127 Thione Species 0.000 description 1
- HOLVRJRSWZOAJU-UHFFFAOYSA-N [Ag].ICl Chemical compound [Ag].ICl HOLVRJRSWZOAJU-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- MKBUQYWFFBCMFG-UHFFFAOYSA-N acetic acid propane-1,1-diamine Chemical compound CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.CCC(N)N MKBUQYWFFBCMFG-UHFFFAOYSA-N 0.000 description 1
- WTHXTWHYLIZJBH-UHFFFAOYSA-N acetic acid;azane Chemical compound N.CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O WTHXTWHYLIZJBH-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 230000021736 acetylation Effects 0.000 description 1
- 238000006640 acetylation reaction Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001370 alpha-amino acid derivatives Chemical class 0.000 description 1
- 235000008206 alpha-amino acids Nutrition 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000011126 aluminium potassium sulphate Nutrition 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- SOIFLUNRINLCBN-UHFFFAOYSA-N ammonium thiocyanate Chemical compound [NH4+].[S-]C#N SOIFLUNRINLCBN-UHFFFAOYSA-N 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HDFRDWFLWVCOGP-UHFFFAOYSA-N carbonothioic O,S-acid Chemical compound OC(S)=O HDFRDWFLWVCOGP-UHFFFAOYSA-N 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- ZUIVNYGZFPOXFW-UHFFFAOYSA-N chembl1717603 Chemical compound N1=C(C)C=C(O)N2N=CN=C21 ZUIVNYGZFPOXFW-UHFFFAOYSA-N 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- GTKRFUAGOKINCA-UHFFFAOYSA-M chlorosilver;silver Chemical class [Ag].[Ag]Cl GTKRFUAGOKINCA-UHFFFAOYSA-M 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 229940125773 compound 10 Drugs 0.000 description 1
- 229940125797 compound 12 Drugs 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 229940126214 compound 3 Drugs 0.000 description 1
- 229940125898 compound 5 Drugs 0.000 description 1
- 235000018417 cysteine Nutrition 0.000 description 1
- XUJNEKJLAYXESH-UHFFFAOYSA-N cysteine Natural products SCC(N)C(O)=O XUJNEKJLAYXESH-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- BBLSYMNDKUHQAG-UHFFFAOYSA-L dilithium;sulfite Chemical compound [Li+].[Li+].[O-]S([O-])=O BBLSYMNDKUHQAG-UHFFFAOYSA-L 0.000 description 1
- 238000001493 electron microscopy Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- ZZGUZQXLSHSYMH-UHFFFAOYSA-N ethane-1,2-diamine;propanoic acid Chemical compound NCCN.CCC(O)=O.CCC(O)=O ZZGUZQXLSHSYMH-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- IFQUWYZCAGRUJN-UHFFFAOYSA-N ethylenediaminediacetic acid Chemical compound OC(=O)CNCCNCC(O)=O IFQUWYZCAGRUJN-UHFFFAOYSA-N 0.000 description 1
- 239000012458 free base Substances 0.000 description 1
- JGEMYUOFGVHXKV-OWOJBTEDSA-N fumaraldehyde Chemical compound O=C\C=C\C=O JGEMYUOFGVHXKV-OWOJBTEDSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229940051250 hexylene glycol Drugs 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229960000310 isoleucine Drugs 0.000 description 1
- AGPKZVBTJJNPAG-UHFFFAOYSA-N isoleucine Natural products CCC(C)C(N)C(O)=O AGPKZVBTJJNPAG-UHFFFAOYSA-N 0.000 description 1
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 229960004452 methionine Drugs 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- VVNCNSJFMMFHPL-UHFFFAOYSA-N penicillamine Chemical compound CC(C)(S)C(N)C(O)=O VVNCNSJFMMFHPL-UHFFFAOYSA-N 0.000 description 1
- 229960001639 penicillamine Drugs 0.000 description 1
- 229960003330 pentetic acid Drugs 0.000 description 1
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229940050271 potassium alum Drugs 0.000 description 1
- GNHOJBNSNUXZQA-UHFFFAOYSA-J potassium aluminium sulfate dodecahydrate Chemical compound O.O.O.O.O.O.O.O.O.O.O.O.[Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GNHOJBNSNUXZQA-UHFFFAOYSA-J 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000012487 rinsing solution Substances 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 1
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 1
- 235000019982 sodium hexametaphosphate Nutrition 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 229940048086 sodium pyrophosphate Drugs 0.000 description 1
- 229910052979 sodium sulfide Inorganic materials 0.000 description 1
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 1
- AMZPPWFHMNMIEI-UHFFFAOYSA-M sodium;2-sulfanylidene-1,3-dihydrobenzimidazole-5-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C2NC(=S)NC2=C1 AMZPPWFHMNMIEI-UHFFFAOYSA-M 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 238000003419 tautomerization reaction Methods 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- ZEMGGZBWXRYJHK-UHFFFAOYSA-N thiouracil Chemical compound O=C1C=CNC(=S)N1 ZEMGGZBWXRYJHK-UHFFFAOYSA-N 0.000 description 1
- 229950000329 thiouracil Drugs 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
- G03C5/29—Development processes or agents therefor
- G03C5/305—Additives other than developers
Definitions
- the present invention relates to a photographic developer for a silver halide photographic light-sensitive material capable of forming an image of high sensitivity and high density without silver sludge formation even when processed at low replenishing rates.
- Sulfites such as sodium sulfite and potassium sulfite, used as antioxidants for photographic developers, have the ability to dissolve silver halide.
- this silver sludge in suspension in the developer, adheres to the film and the rollers and belts of the automatic processing machine.
- Japanese Patent Publication Open to Public Inspection (hereinafter referred to as Japanese Patent O.P.I. Publication) No. 114035/1983, using a thiouracil, Japanese Patent O.P.I. Publication No. 2043/1988, using a mercaptobenzoic acid, Japanese Patent Examined Publication No. 14953/1972, using an aliphatic mercaptocarboxylic acid, Japanese Patent O.P.I. Publication No. 178959/1987, Japanese Patent O.P.I. Publication No. 51844/1991, using a disulfide, Japanese Patent O.P.I. Publication No. 26136/1973, using a sulfur-containing ⁇ -amino acid, and various mercaptoazoles, all of which are compounds likely to form a water-soluble silver salt.
- US-A-4141734 discloses a process for developing exposed photographic silver halide materials.
- the aqueous developer preparation used contains a developer compound for the silver halide, a water-soluble solvent for the silver halide and an aliphatic, cycloaliphatic, aromatic or heterocyclic di-or trisulphide, such as L-cystine.
- US-A-4254215 discloses a process for the prevention of darkening and the formation of a sediment in photographic developer solutions which contain a silver halide developer, a water-soluble silver halide solvent and, as sulphur compounds, a combination of (a) an organic thiol compound or thione compound capable of tautomerism and (b) a Bunte salt which contains groups conferring solubility in water such as penicillamine or cysteine.
- An object of the present invention is to to provide a developer which allows an image of excellent finish quality to be easily obtained without silver sludge formation, photographic developer stain and roller/belt stain even when used at low replenishing rates in the continuous processing of a large amount of light-sensitive material using an automatic processing machine, and which has a sludge-preventing effect without affecting the photographic performance.
- a developer for developing a silver halide photographic light-sensitive material which contains a compound represented by the following formula 1 or 2: wherein R1 and R2 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms provided that R1 and R2 do not represent hydrogen atoms at the same time. R3 and R4 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; R5 represents a hydroxyl group, an amino group or an alkyl group having 1 to 3 carbon atoms.
- R6 and R7 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an acyl group having up to 18 carbon atoms or a -COOM2 group, provided that R6 and R7 do not represent hydrogen atoms at the same time.
- M1 represents a hydrogen atom, an alkali metal atom or an ammonium group, and m represents 0, 1 or 2.
- M2 is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkali metal atom, an aryl group or an aralkyl group having not more than 15 carbon atoms.
- Alkyl groups having 1 to 4 carbon atoms as described above include a methyl group, an ethyl group, a propyl group and a butyl group.
- acyl groups having up to 18 carbon atoms include an acetyl group and a benzoyl group.
- aralkyl groups having up to 15 carbon atoms include a benzyl group and a phenethyl group.
- Aryl groups include a phenyl group and a naphthyl group.
- alkali metal atoms for M1 examples include sodium ion and potassium ion.
- Strecker's method of amino acid synthesis known to be an amino acid synthesis method, wherein amino acid acetylation is achieved by alternate addition of alkali and acetic anhydride in an aqueous solution.
- the above compounds used in the present invention may be used singly or in combination. It is also acceptable to use in combination at least one compound of formula 1 and at least one compound of formula 2.
- the compounds of formulas 1 and 2 are used in amounts of preferably 1 ⁇ 10 ⁇ 5 to 3 ⁇ 10 ⁇ 2 mol, more preferably 1 ⁇ 10 ⁇ 4 to 1 ⁇ 10 ⁇ 2 mol per liter of developer.
- the replenishing rate for the developer of the present invention is normally 0.05 to 0.65 l, preferably 0.10 to 0.35 l per m2 of light-sensitive material, though it varies depending on the kinds of light-sensitive material, automatic processing machine, and other factors.
- the developing through drying processes are completed within 90 seconds when an automatic processing machine capable of developing, fixing and washing or stabilizing is used to process a silver halide light-sensitive material.
- the time from initiation of immersion of the tip of the light-sensitive material in the developer, via the various processes, to discharge of the same tip from the drying zone is preferably not longer than 90 seconds, more preferably not longer than 60 seconds.
- Fixing temperature and time are preferably about 20 to 50°C and 6 to 20 seconds, more preferably 30 to 40°C and 6 to 15 seconds.
- developing time is normally 5 to 45 seconds, preferably 8 to 30 seconds, and developing temperature is preferably 25 to 50°C, more preferably 30 to 40°C.
- Drying may be achieved by hot air blowing at normally 35 to 100°C, preferably 40 to 80°C.
- a drying zone equipped with a far infrared heating means may be arranged in the automatic processing machine.
- the automatic processing machine may be equipped with a mechanism for adding either water or an acidic rinsing solution having no fixing capability to the light-sensitive material, among the above developing, fixing and washing processes such as those described in Japanese Patent O.P.I. Publication No. 264953/199.
- the automatic processing machine may also have therein equipment for preparing developers and fixers.
- the developer of the present invention preferably contains as a developing agent a 1,4-dihydroxybenzene compound or, if necessary, a p-aminophenol compound and/or a pyrazolidone compound.
- 1,4-dihydroxybenzenes include hydroquinone, chlorohydroquinone, bromohydroquinone, isopropylhydroquinone, methylhydroquinone, 2,3-dichlorohydroquinone, 2,5-dichlorohydroquinone, 2,3-dibromohydroquinone, 2,5-dimethylhydroquinone and hydroquinone monosulfonate, with preference given to hydroquinone.
- p-aminophenol-based developing agents include N-methyl-p-aminophenol, p-aminophenol, N-( ⁇ -hydroxyethyl)-p-aminophenol, N-(4-hydroxyphenyl)glycine, 2-methyl-p-aminophenol and p-benzylaminophenol, with preference given to N-methyl-p-aminophenol.
- the amount of 1,4-dihydroxybenzene added is preferably 0.01 to 0.7 mol, more preferably 0.1 to 0.5 mol per liter of developer.
- the amounts of p-aminophenol compound and pyrazolidone compound added are preferably 0.0005 to 0.2 mol, more preferably 0.001 to 0.1 mol per liter of developer.
- sulfites optionally used in the developer of the present invention include sodium sulfite, potassium sulfite, lithium sulfite, ammonium sulfite, sodium bisulfite and potassium metasulfite.
- the amount of these sulfites used is preferably 0.1 to 2.0 mol, more preferably 0.1 to 1.0 mol per liter of developer.
- the upper limit is preferably 3.0 mol per liter of developer for a concentrated developer.
- the developer may optionally contain a chelating agent having an iron ion chelating stability constant of over 8.
- the preferred iron ion mentioned herein is ferric ion (Fe3+).
- Chelating agents having an iron ion chelating stability constant of over 8 include organic carboxylic acid chelating agents, organic phosphoric acid chelating agents, inorganic phosphoric acid chelating agents and polyhydroxyl compounds.
- such chelating agents include ethylenediamine-di-o-hydroxyphenylacetic acid, triethylenetetramineacetic acid, diaminopropanetetraacetic acid, nitrilotriacetic acid, hydroxyethylethylenediaminetriacetic acid, dihydroxyethylglycine, ethylenediaminediacetic acid, ethylenediaminedipropionic acid, iminodiacetic acid, diethylenetriaminepentaacetic acid, hydroxyethyliminodiacetic acid, 1,3-diamino-2-propanoltetraacetic acid, transcyclohexanediaminetetraacetic acid, ethylenediaminetetraacetic acid, glycol ether amine tetraacetic acid, ethylenediamine-N,N,N′,N′-tetrakismethylenephosphonic acid, nitrilo-N,N,N-trimethylenephosphonic acid, 1-hydroxyethyliden
- the developer of the present invention may optionally contain a hardener which enhances the film physical properties by reacting with the gelatin in the light-sensitive material during the developing process.
- hardeners include glutaraldehyde, ⁇ -methylglutaraldehyde, ⁇ -methylglutaraldehyde, maleic dialdehyde, succinic dialdehyde, methoxysuccinic dialdehyde, methylsuccinic dialdehyde, ⁇ -methoxy- ⁇ -ethoxyglutaraldehyde, ⁇ -n-butoxyglutaraldehyde, ⁇ , ⁇ -dimethoxysuccinic dialdehyde, ⁇ -isopropylsuccinic dialdehyde, ⁇ , ⁇ -diethylsuccinic dialdehyde, butylmaleic dialdehyde and bisulfite adducts thereof.
- the developer may further contain developing inhibitors such as sodium bromide and potassium iodide, organic solvents such as ethylene glycol, diethylene glycol, triethylene glycol, dimethylformamide, methyl cellosolve, hexylene glycol, ethanol and methanol, mercapto compounds such as 1-phenyl-5-mercaptotetrazole and sodium 2-mercaptobenzimidazole-5-sulfonate, and antifoggants such as 5-methylbenzotriazole and other benzotriazole compounds.
- organic solvents such as ethylene glycol, diethylene glycol, triethylene glycol, dimethylformamide, methyl cellosolve, hexylene glycol, ethanol and methanol
- mercapto compounds such as 1-phenyl-5-mercaptotetrazole and sodium 2-mercaptobenzimidazole-5-sulfonate
- antifoggants such as 5-methylbenzotriazole and other benzotriazole compounds.
- Other additives such as
- the pH of the developer is preferably 9.0 to 12, more preferably 9.0 to 11.5.
- Examples of the alkali or buffer used for pH adjustment include pH regulators such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, boric acid, sodium tertiary phosphate and potassium tertiary phosphate.
- a fixer used for fixing the light sensitive material developed by the developer of the invention may contain a fixing agent such as sodium thiosulfate or ammonium thiosulfate, with preference given to ammonium thiosulfate from the viewpoint of fixing speed.
- fixing agents are usually used in amounts of about 0.1 to 6 mol/liter.
- the fixer may also optionally contain a water-soluble aluminum salt as a hardener, such as aluminum chloride, aluminum sulfate or potassium alum.
- a water-soluble aluminum salt as a hardener, such as aluminum chloride, aluminum sulfate or potassium alum.
- the fixer may optionally incorporate malic acid, tartaric acid, citric acid, gluconic acid and derivatives thereof, singly or in combination. These compounds are effective when contained at not less than 0.001 mol per liter of fixer, with a greater effect obtained at 0.005 to 0.03 mol per liter of fixer.
- Fixer pH is normally not lower than 3.8, preferably 4.2 to 7.0. In view of hardening in the fixer and the emission of sulfurous acid gas odor the pH is more preferably 4.3 to 4.8.
- Silver halide photographic light-sensitive material emulsions to which the developer of the present invention is applicable include medical radiographic materials, photographic materials for printing plate making and direct positive photographic materials.
- the silver halide photographic light-sensitive material to which the developer of the present invention is applied may comprise a silver halide such as silver iodobromide, silver iodochloride or silver iodochlorobromide, with preference given to silver iodobromide from the viewpoint of high sensitivity.
- a silver halide such as silver iodobromide, silver iodochloride or silver iodochlorobromide, with preference given to silver iodobromide from the viewpoint of high sensitivity.
- Suitable emulsions for the silver halide photographic light-sensitive material include monodispersed grains of high inner iodine content such as those disclosed in Japanese Patent O.P.I. Publication Nos. 177535/1984, 802237/1986, 132943/1986 and 49751/1988. Crystalline form may be, for example, cubic, tetradecahedral or octahedral, and intermediate (111) and (100) planes may be present in any ratio.
- the emulsion may be of tabular grains having an aspect ratio of not less than 2. Such tabular grains have advantages such as improvements in spectral sensitizing efficiency, image granularity and sharpness, and are disclosed in British Patent No. 2,112,157, US Patent Nos. 4,439,520, 4,433,048, 4,414,310 and 4,434,226, and Japanese Patent O.P.I. Publication Nos. 113927/1983, 127921/1983, 138342/1988, 284272/1988 and 305343/1988.
- the emulsion can be prepared as described in these publications.
- Additives and other substances used in the silver halide photographic light-sensitive material include those described in Research Disclosure Nos. 17643 (December, 1978), 18716 (November, 1979) and 308119 (December, 1989) (hereinafter referred to as RD17643, RD18716 and RD308119, respectively). The following table shows where they are described.
- the resulting reaction mixture was desalinized at 40°C, using an aqueous solution of Demol-N (produced by Kao Atlas) and an aqueous solution of magnesium sulfate, after which it was re-dispersed in an aqueous gelatin solution, to yield a seed emulsion.
- grains were grown as follows: First, the seed emulsion was dispersed in an aqueous gelatin solution being kept at 40°C, and aqueous ammonia and acetic acid were added to obtain a pH of 9.7. An aqueous solution of ammoniacal silver nitrate and an aqueous solution of potassium bromide and potassium iodide were then added to the dispersion by the double jet method, while maintaining a pAg of 7.3 and a pH of 9.7, to yield a layer containing 35 mol% silver iodide. Next, another aqueous solution of ammoniacal silver nitrate and an aqueous solution of potassium bromide were added by the double jet method.
- the pAg was kept at 9.0, with the pH varied continuously over the range of 9.0 to 8.0. The pAg was then changed to 11.0, and while keeping the pH at 8.0, grains were grown up to the desired grain size. Subsequently, acetic acid was added to obtain a pH of 6.0, after which 400 mg of the anhydride of 5,5′-dichloro-9-ethyl-3,3′-di(3-sulfopropyl)oxacarbocyanine sodium salt was added per mol of silver halide. This mixture was then desalinized with the above aqueous solution of Demol-N and an aqueous solution of magnesium sulfate, and then re-dispersed in a gelatin solution.
- Monodispersed silver iodobromide emulsions A, B and C comprising tetradecahedral grains with round tips having an average silver iodide content of 2.0 mol%, were thus prepared, having average grain sizes of 0.40, 0.65 and 1.00 ⁇ m and variation coefficients of grain size distribution ( ⁇ / r ) of 0.17, 0.16 and 0.16, respectively, in which ⁇ is the standard deviation of grain size distribution and r is the average grain size.
- a hexagonal tabular seed emulsion was prepared as follows:
- solution A After stopping the addition of solutions B and C, the temperature of solution A was increased to 60°C over a period of 60 minutes, and solutions B and C were again added by the double jet method at a flow rate of 68.5 ml/min over a period of 50 minutes, while keeping the silver potential (determined using a silver ion selective electrode in combination with a saturated silver-silver chloride electrode as a reference electrode) at +6 mV using solution D.
- Grains were grown at 60°C by adding all of solutions B and C to solution A at a flow rate of 21.26 ml/min over a period of 111 minutes, using the mixer stirrer described in Japanese Patent Examined Publication Nos. 58288/1983 and 58289/1983 as above.
- the silver potential was kept at +25 mV using solution D.
- the following spectral sensitizing dyes A and B were added in amounts of 300 mg and 15 mg, respectively, per mol of silver halide.
- a 200:1 (w/w) mixture of the above sensitizing dyes A and B was added at 975 mg, 600 mg, 390 mg and 500 mg per mol of silver halide, respectively.
- emulsion II Of the four ripened emulsions, A, B and C were mixed in a weight ratio of 15:65:20, to yield emulsion I, while emulsion D, designated as emulsion II, was used by itself.
- aqueous solution a 9.3% aqueous solution of gelatin containing 1.35 kg of an anionic surfactant AS was prepared. This solution is called the aqueous solution.
- the oily solution and the aqueous solution were placed in a dispersing vessel and dispersed while keeping the liquid temperature at 40°C.
- To the resulting dispersion were added appropriate amounts of phenol and 1,1-dimethylol-bromo-1-nitromethane, and water was added to 240 kg.
- composition of the protective layer is as follows: The amounts of addition are shown per liter of coating solution.
- the resulting coating solution was coated and dried uniformly on a blue-colored subbed polyethylene terephthalate film base 180 ⁇ m thick.
- both the emulsion layer and the protective layer were coated simultaneously at a coating speed of 90 m per minute, to yield samples, wherein coating rates were 1.7 g/m2 as of silver for the emulsion layer and 0.99 g/m2 as of gelatin for the protective layer.
- developing sample 1 was obtained from emulsion I, and developing sample 2 obtained from emulsion II.
- compositions of the developer and fixer used in the present invention are as follows:
- fixer replenisher To prepare the fixer, parts A and B were added at the same time to about 5 liters of water, and while stirring and dissolving the mixture, water was added to 18 liters, and sulfuric acid or NaOH were added to obtain a pH of 4.4, to yield a fixer replenisher.
- Comparative Compounds 1 - 12 were used as comparative compounds.
- Processing temperatures were 35°C for developing, 33°C for fixation, 20°C for washing and 50°C for drying.
- the sample inserted between two sheets of fluorescent sensitizing paper KO-250, manufactured by Konica Corp., was subjected to exposure through an aluminum wedge of at a tube voltage of 80 kV, a tube amperage of 100 mA and an irradiation time of 50 msec, after which it was processed using the above automatic processing machines.
- the reciprocal of the exposure amount required to obtain a density of base density + fog density + 1.0 was calculated as a percent sensitivity relative to the sensitivity of sample No. 1 processed with the above developer and fixer of basic composition using automatic processing machine No. 2 (experiment No. 15).
- the density in the unexposed portion of the exposed sample was determined using Konica PDA-65 densitometer, and the base density was subtracted therefrom to obtain the fog density, and the maximum density was expressed as Dm. 2. Silver sludge evaluation
- the developing samples used were the above sample Nos. 1 and 2.
- silver sludge is substantially prevented without photographic performance deterioration even at reduced developer replenishing rates.
- Table 1 shows that the addition of the compound used in the present invention to the developer did not lower the sensitivity or Dm (maximum density), while the addition of a comparative compound significantly lowered the sensitivity, though it had a slight preventative effect on silver sludge at high replenishing rates.
- Results of experiment Nos. 1 through 10 demonstrate that developers containing a compound used in the present invention remain excellently effective without deterioration of the silver sludge preventing effect even when the replenishing rate is reduced to 200 ml/m2. Also, the results of experiment Nos. 12 and 14 demonstrate that there is no difference in silver sludge preventing effect among different automatic processing machines.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP92947/92 | 1992-04-13 | ||
JP4092947A JP2955906B2 (ja) | 1992-04-13 | 1992-04-13 | ハロゲン化銀写真感光材料用現像液 |
Publications (3)
Publication Number | Publication Date |
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EP0566323A2 EP0566323A2 (en) | 1993-10-20 |
EP0566323A3 EP0566323A3 (enrdf_load_stackoverflow) | 1994-03-23 |
EP0566323B1 true EP0566323B1 (en) | 1995-10-11 |
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ID=14068669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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EP19930302781 Expired - Lifetime EP0566323B1 (en) | 1992-04-13 | 1993-04-08 | Developer for silver halide photographic light-sensitive material |
Country Status (3)
Country | Link |
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EP (1) | EP0566323B1 (enrdf_load_stackoverflow) |
JP (1) | JP2955906B2 (enrdf_load_stackoverflow) |
DE (1) | DE69300613T2 (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5510231A (en) * | 1993-04-27 | 1996-04-23 | Konica Corporation | Solid developing composition for silver halide photographic light-sensitive material and processing method using the same |
US5506092A (en) * | 1993-12-06 | 1996-04-09 | Konica Corporation | Method of processing black and white silver halide photographic compositions with a developer containing an anti sludgant |
US5824458A (en) * | 1994-02-28 | 1998-10-20 | Fuji Photo Film Co., Ltd. | Developer and fixing solution for silver halide photographic material and processing method using the same |
DE69516054T2 (de) | 1994-07-18 | 2000-10-26 | Konica Corp., Tokio/Tokyo | Photographisches Silberhalogenidelement und sein Verarbeitungsverfahren |
GB0103527D0 (en) * | 2001-02-13 | 2001-03-28 | Eastman Kodak Co | Photographic developing composition and use thereof in the development of a photographic element |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US4141734A (en) * | 1975-09-11 | 1979-02-27 | Ciba-Geiby Ag | Photographic developing process |
US4254215A (en) * | 1978-03-31 | 1981-03-03 | Ciba-Geigy Ag | Process for the prevention of darkening and the formation of a sediment in photographic developer solutions |
-
1992
- 1992-04-13 JP JP4092947A patent/JP2955906B2/ja not_active Expired - Fee Related
-
1993
- 1993-04-08 EP EP19930302781 patent/EP0566323B1/en not_active Expired - Lifetime
- 1993-04-08 DE DE1993600613 patent/DE69300613T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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JPH05289255A (ja) | 1993-11-05 |
EP0566323A2 (en) | 1993-10-20 |
DE69300613T2 (de) | 1996-04-04 |
JP2955906B2 (ja) | 1999-10-04 |
EP0566323A3 (enrdf_load_stackoverflow) | 1994-03-23 |
DE69300613D1 (de) | 1995-11-16 |
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