EP0565070A1 - Procédé d'électrodéposition - Google Patents
Procédé d'électrodéposition Download PDFInfo
- Publication number
- EP0565070A1 EP0565070A1 EP93105726A EP93105726A EP0565070A1 EP 0565070 A1 EP0565070 A1 EP 0565070A1 EP 93105726 A EP93105726 A EP 93105726A EP 93105726 A EP93105726 A EP 93105726A EP 0565070 A1 EP0565070 A1 EP 0565070A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- pulse
- layer
- surface coating
- structured surface
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 68
- 238000009713 electroplating Methods 0.000 title abstract 2
- 238000000576 coating method Methods 0.000 claims abstract description 51
- 239000011248 coating agent Substances 0.000 claims abstract description 47
- 239000000463 material Substances 0.000 claims abstract description 18
- 238000012876 topography Methods 0.000 claims abstract description 7
- 230000012010 growth Effects 0.000 claims abstract description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 38
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 27
- 239000003792 electrolyte Substances 0.000 claims description 18
- 229910052804 chromium Inorganic materials 0.000 claims description 15
- 239000011651 chromium Substances 0.000 claims description 15
- 229910052759 nickel Inorganic materials 0.000 claims description 14
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 claims description 10
- 230000006911 nucleation Effects 0.000 claims description 6
- 238000010899 nucleation Methods 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 230000008021 deposition Effects 0.000 abstract description 9
- 239000010410 layer Substances 0.000 description 55
- 238000007639 printing Methods 0.000 description 9
- 229910000599 Cr alloy Inorganic materials 0.000 description 3
- 244000052616 bacterial pathogen Species 0.000 description 3
- 239000000788 chromium alloy Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000003698 anagen phase Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000016507 interphase Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000010327 methods by industry Methods 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
Definitions
- the invention relates to a method for the electrochemical (galvanic) application of a surface coating to an object, preferably a machine component, in particular a machine roller, using an electrical variable of the galvanic process which causes the layer application.
- a hard chrome layer is then applied to the surface structure created in this way.
- These various work steps required for the creation are quite complex and require complicated process engineering. The costs are essentially determined by the complex processing steps such as mechanical grinding to size and chemical structure etching; these machining processes are relatively expensive.
- the invention is therefore based on the object of specifying a method for the electrochemical application of a surface coating to an object, which enables the desired, structured surface topographies to be created in a simple and inexpensive manner.
- nucleation of the deposition material takes place on the surface to be coated by means of at least one initial impulse of the electrical quantity and that the deposition material nuclei are subsequently grown by the addition of further deposition material by means of at least one subsequent impulse.
- This procedure according to the invention leads to a uniform, optimal structuring of the surface without the need for complex intermediate grinding as well as chemical etching processes. Rather, the desired surface structure is set during the galvanic coating process. It is essential here that the nucleation with separating material is first carried out by means of the initial impulse of the electrical quantity and that the germs formed are subsequently grown by the subsequent impulse.
- an electrical voltage and / or an electrical current is used as the electrical variable such that the initial pulse and / or the subsequent pulse have a defined shape by means of a corresponding voltage and / or current function as a function of time Has.
- the structured surface coatings preferably by means of galvanic chrome or chromium alloy electrolytes, by means of galvanic nickel or nickel alloy electrolytes, by means of galvanic cobalt or cobalt alloy electrolytes, by means of galvanic copper or copper alloy electrolytes or by means of galvanic noble metal or noble metal alloy electrolytes.
- the structure of the surface created according to the invention the requirements of the most varied fields of application can be met.
- the structure forms defined lubricant deposits or has a storage capacity for substances that come into contact with the surface.
- the structuring leads to low-glare devices, for example in medical or optical technology.
- a multilayer structure is provided, at least one of the layers being provided with the structured surface topography.
- a nickel strike layer is preferably first applied to the object.
- This nickel strike layer is applied with a thickness of 0.2 to 2 ⁇ m, preferably ⁇ 1 ⁇ m.
- the application is preferably carried out by means of a galvanic process.
- the object is, for example, a roller or a cylinder of a printing press.
- the cylinder is preferably made of steel (St.52 / Nirosta).
- a sulfamate-nickel layer is applied to the nickel strike layer.
- This layer is preferably produced with a thickness of 25 to 40 ⁇ m, in particular 30 ⁇ m.
- a chromium layer in particular a low-crack chromium layer, is applied to the sulfamate-nickel layer.
- This chrome layer preferably has a thickness of 5 up to 15 ⁇ m, in particular from 10 ⁇ m.
- the structured surface coating generated by means of the initial and subsequent pulse is now applied to the chrome layer.
- This surface coating is preferably designed as a structured chromium layer, a chromium or a chromium alloy electrolyte being used in the galvanic process.
- the application is carried out by first applying germs of the deposition material to the surface to be coated (for example the mentioned chrome layer) by means of at least one initial pulse of the electrical quantity of the galvanic process.
- the structured surface coating is preferably produced with a maximum thickness of 5 to 20 ⁇ m, preferably 7 to 10 ⁇ m.
- the "maximum thickness” is understood to mean the measure up to the highest elevations, because due to the structuring, that is to say higher and lower lying areas, a thickness measure specification is not otherwise clearly defined.
- the so-called “load share”, which is also defined as the “material share” according to DIN 4762, can also be used as the design. This load share is the percentage ratio of the length of the profile cut in a certain cutting line to a reference distance.
- the profile results from the surface structure, the cutting line being below the highest elevations of the structure, so that it cuts the corresponding elevations leads in some areas between the surveys.
- the method according to the invention preferably achieves a load share of 25%, the cutting line being 2 ⁇ m below the highest point of the structure.
- a finishing layer of micro-cracked chromium is applied to the structured surface coating.
- This final layer is preferably produced with a thickness of 5 to 20 ⁇ m, in particular 8 to 10 ⁇ m.
- the structured surface coating produced by the method according to the invention has the correspondingly desired roughness or the correspondingly desired load-bearing component
- the other layers mentioned here nickel strike layer, sulfamate-nickel layer, low-crack chrome layer (base layer) and finishing layer made of micro-cracked chromium ) on the other hand, to be regarded as having the same thickness and unstructured.
- a chromium electrolyte is used for the electrochemical process for applying the structured surface coating.
- This chrome electrolyte preferably has a temperature of about 45 ° C.
- the object is set in rotation while the structured surface coating is being applied.
- this takes place in the cylinders of the printing presses mentioned in that they are rotated about their longitudinal central axis.
- Anodes made of PbSn7 or platinized titanium are particularly preferably used when applying the structured surface coating.
- the object to be coated forms the cathode when the structured surface coating is applied.
- a trapezoidal initial voltage pulse and also an approximately trapezoidal subsequent voltage pulse are preferably used to generate the structure of the surface coating.
- the machine component is immersed in the electrolytes, in particular chrome electrolytes, and the initial impulse is only started after a voltage-free or current-free waiting time.
- This waiting time serves, among other things, to adjust the temperature, i.e. the base material (machine component) assumes approximately the temperature of the electrolyte.
- This waiting time is preferably 60 s.
- This intermediate period is thus between the period of the nucleation mentioned above and the growth phase of the deposition process.
- a basic pulse (voltage or current pulse) is connected upstream of the initial pulse.
- This starting edge increases the current in the galvanic process up to a maximum current of approx. 950 A based on a standard area. This maximum current is now maintained over a period of approximately 60s.
- FIG. 1 shows a longitudinal section through a dampening cylinder 1 of a printing press.
- the dampening cylinder 1 has a cylindrical base body 2, the outer surface 3 of which is provided with a layer structure 4.
- the layer structure 4 is identified by the dash-dot line in FIG. 1. It is guided around the edge regions 5 of the dampening cylinder 1 with the length of a portion of the radius.
- the layer structure 4 is composed of individual layers, each of which is applied electrochemically, that is to say by means of galvanic processes.
- FIG. 2 shows a section through the layer structure 4.
- a nickel strike layer 6 is electrodeposited on the base body 2 of the dampening cylinder 1.
- the basic body is made of steel St.52 / Nirosta.
- the nickel strike layer 6 is a pre-nickel plating.
- the electrolyte used for this is very acidic with a high chloride concentration.
- the nickel strike layer 6 has a uniform thickness of preferably 1 to 2 ⁇ m.
- a sulfamate-nickel layer 7 is applied electrolytically to the nickel strike layer 6.
- This sulfamate-nickel layer 7 is sulfur-free; it has a thickness of 30 to 40 ⁇ m and a Vickers hardness of 200 to 250 HV.
- a low-crack chrome layer 8 is electroplated onto the sulfamate-nickel layer 7; it has a uniform thickness of 10 to 15 ⁇ m and forms a so-called base layer.
- a structured surface coating 9 is applied to the chrome layer 8 by means of a galvanic process.
- This surface coating 9 represents a structured chrome layer 10. Due to the structuring, there are corresponding elevations and depressions, the maximum thickness, measured from the sole to the apex of the maximum elevation, of this structured chrome layer 10 being 7 to 10 ⁇ m.
- FIG. 3 shows a voltage-time diagram which illustrates the control of an electrical variable (voltage U) of the galvanic process for applying the base layer and for subsequently applying the structured surface coating 9.
- the dampening cylinder 1 is switched as a cathode and anodes made of PbSn7 or platinized titanium are used.
- the electrode distance between the anode and cathode is set to approx. 25 cm.
- the dampening cylinder 1 is continuously rotated about its longitudinal axis 12 (FIG. 1) while the structured surface coating 9 is being applied.
- the electrochemical process for applying the base layer (chrome layer 8) and the structured surface coating 9 is carried out as follows:
- the base body 2 of the dampening cylinder 1 is introduced into a chrome electrolyte with a temperature of approx. 45 ° C., after which Initially, a waiting time t w passes, which is approximately 60 s long. During this time (without applying current or voltage), the temperature of the base material (base body 2) is adjusted to the electrolyte temperature.
- an electrical base pulse 13 is first applied between the anode and cathode after the waiting time t w . Then, by means of an initial and a subsequent pulse 14, nucleation of the separating material (initial pulse 14 ') and then growth of the separating material nuclei by addition with further separating material is then brought about (subsequent pulse 14''), as a result of which the structured surface coating 9 is formed.
- the basic pulse 13 and the initial and subsequent pulse 14 are designed as follows:
- the basic pulse 13 is a voltage pulse with a trapezoidal shape.
- the start and follow pulse 14 is also a voltage pulse, which is composed of the start pulse 14 'and the directly following pulse 14''and also has a trapezoidal shape; the pure trapezoidal shape is disturbed insofar as the starting edge (leading edge) of the initial pulse 14 'has a different slope than the starting edge of the subsequent pulse 14''. This will be discussed in more detail below.
- a constant amplitude 16 with 4 V over a period of 600 s connects to the starting edge 15.
- This is followed by an end flank 17, which has a drop of ⁇ U / ⁇ t 0.4 V / 5 s having.
- An intermediate time period t z then follows, which is current-free or voltage-free and has a length of 60 s.
- the current on which the galvanic process is based is increased to a maximum current I max of 950 A. This maximum current I max is maintained over a period of 60 s.
- the total flank formed by the initial pulse 14 'and the subsequent pulse 14'' is designated by 19. It is composed of the two starting edges 18 and 20.
- finishing layer 11 is applied to the structured surface coating 9 produced according to the invention using a conventional electrochemical process.
- FIG. 4 shows the structure chrome of the structured surface coating 9 in a 200-fold magnification.
- FIG. 5 shows a 500-fold magnification. It can be clearly seen that there is a very uniform structured distribution.
- FIGS. 6 and 7 show a comparison of a known surface coating with the surface coating according to the invention: namely, FIG. 6 shows a conventional surface coating subjected to a grinding and etching process in 200 times magnification and FIG. 7 shows the structured surface coating 9 according to the invention, also in FIG 200x magnification. It can be clearly seen that the structure according to the invention is constructed in a substantially more uniform and orderly manner than in the case of the prior art.
- a degreasing process and a de-papering are of course carried out first, as is customary, before the layer structure 4 is applied. These processes may also be repeated several times.
- the nickel strike layer 6 Only then is the nickel strike layer 6, then the sulfamate nickel layer 7 and then the chrome layer 8 applied.
- the structured surface coating 9 is then deposited and then the final layer 10 is applied, which consists of micro-cracked chromium and with which the dimensional accuracy can be controlled.
- the invention is not limited to chromium or chromium alloy layers, but can also be carried out with other deposition materials.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4211881 | 1992-04-09 | ||
DE4211881A DE4211881C2 (de) | 1992-04-09 | 1992-04-09 | Verfahren zum elektrochemischen Aufbringen einer strukturierten Oberflächenbeschichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0565070A1 true EP0565070A1 (fr) | 1993-10-13 |
EP0565070B1 EP0565070B1 (fr) | 1997-07-30 |
Family
ID=6456427
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP93105726A Expired - Lifetime EP0565070B1 (fr) | 1992-04-09 | 1993-04-07 | Procédé d'électrodéposition |
Country Status (4)
Country | Link |
---|---|
US (1) | US5415761A (fr) |
EP (1) | EP0565070B1 (fr) |
AT (1) | ATE156201T1 (fr) |
DE (1) | DE4211881C2 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3438330A1 (fr) | 2017-08-03 | 2019-02-06 | Groz-Beckert KG | Partie d'outil de machine textile et procédé de fabrication d'un outil textile |
US11136685B2 (en) | 2015-11-05 | 2021-10-05 | Topocrom Systems Ag | Method and device for the galvanic application of a surface coating |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5958207A (en) | 1994-10-01 | 1999-09-28 | Heidelberger Druckmaschinen Ag | Process for applying a surface coating |
JP3293828B2 (ja) * | 1993-10-07 | 2002-06-17 | ハイデルベルガー ドルツクマシーネン アクチエンゲゼルシヤフト | 表面被覆のための電気的適用方法 |
DE4432512C2 (de) * | 1994-09-13 | 1998-12-17 | Lpw Chemie Gmbh | Verwendung eines Verfahrens zur elektrolytischen Abscheidung von Chromschichten |
US5958604A (en) * | 1996-03-20 | 1999-09-28 | Metal Technology, Inc. | Electrolytic process for cleaning and coating electrically conducting surfaces and product thereof |
US7556722B2 (en) | 1996-11-22 | 2009-07-07 | Metzger Hubert F | Electroplating apparatus |
DE19828545C1 (de) * | 1998-06-26 | 1999-08-12 | Cromotec Oberflaechentechnik G | Galvanisches Bad, Verfahren zur Erzeugung strukturierter Hartchromschichten und Verwendung |
WO2000026444A1 (fr) * | 1998-11-03 | 2000-05-11 | The John Hopkins University | Structure de metallisation en cuivre et procede de production correspondant |
US6309969B1 (en) | 1998-11-03 | 2001-10-30 | The John Hopkins University | Copper metallization structure and method of construction |
DE19902527B4 (de) | 1999-01-22 | 2009-06-04 | Hydro Aluminium Deutschland Gmbh | Druckplattenträger und Verfahren zur Herstellung eines Druckplattenträgers oder einer Offsetdruckplatte |
DE19914136B4 (de) * | 1999-03-27 | 2009-02-26 | Koenig & Bauer Aktiengesellschaft | Oberfläche für Maschinenteile in Druckmaschinen |
US8298395B2 (en) | 1999-06-30 | 2012-10-30 | Chema Technology, Inc. | Electroplating apparatus |
US6478943B1 (en) | 2000-06-01 | 2002-11-12 | Roll Surface Technologies, Inc. | Method of manufacture of electrochemically textured surface having controlled peak characteristics |
US6670308B2 (en) * | 2002-03-19 | 2003-12-30 | Ut-Battelle, Llc | Method of depositing epitaxial layers on a substrate |
DE10214618B4 (de) * | 2002-04-03 | 2007-07-12 | Robert Bosch Gmbh | Verfahren zum Bearbeiten von Werkstücken mittels eines Bearbeitungsverfahrens, insbesondere des elektrochemischen Bearbeitungsverfahrens |
DE10214989A1 (de) * | 2002-04-04 | 2003-10-30 | Georg Frommeyer | Druckzylinder zur Verwendung in einer Tiefdruckmaschine, sowie Verfahren zur Herstellung einer Oberflächenbeschichtung eines Druckzylinders |
AT412556B (de) * | 2002-10-04 | 2005-04-25 | Miba Gleitlager Gmbh | Verfahren zum herstellen eines wenigstens ein lagerauge aufweisenden werkstückes |
DE10344722B4 (de) * | 2002-10-04 | 2007-11-29 | Miba Gleitlager Gmbh | Verfahren zum Herstellen eines wenigstens ein Lagerauge aufweisenden Werkstückes |
DE10251614A1 (de) * | 2002-11-06 | 2004-05-19 | Thomas Kronenberger | Verfahren zur Erzeugung einer definiert eingestellten gleichmäßigen Oberflächenstruktur mit vorgegebener Rauhtiefe auf Bauteilen oder Werkstücken |
DE10255853A1 (de) | 2002-11-29 | 2004-06-17 | Federal-Mogul Burscheid Gmbh | Herstellung strukturierter Hartchromschichten |
DE10302107A1 (de) * | 2003-01-21 | 2004-07-29 | Fuchs Technology Ag | Zylinderoberfläche |
DE10361888B3 (de) * | 2003-12-23 | 2005-09-22 | Airbus Deutschland Gmbh | Anodisierverfahren für Aluminiumwerkstoffe |
DE102004019370B3 (de) | 2004-04-21 | 2005-09-01 | Federal-Mogul Burscheid Gmbh | Herstellung einer strukturierten Hartchromschicht und Herstellung einer Beschichtung |
DE102004021926A1 (de) * | 2004-05-04 | 2005-12-01 | Mtu Aero Engines Gmbh | Verfahren zur Herstellung einer Beschichtung sowie Anode zur Verwendung in einem solchen Verfahren |
US20050284766A1 (en) * | 2004-06-25 | 2005-12-29 | Herdman Roderick D | Pulse reverse electrolysis of acidic copper electroplating solutions |
WO2006082218A1 (fr) * | 2005-02-04 | 2006-08-10 | Siemens Aktiengesellschaft | Surface a microstructure reduisant la mouillabilite et procede de realisation associe |
DE102005022692A1 (de) * | 2005-05-18 | 2006-11-23 | Robert Bosch Gmbh | Verfahren zur Herstellung beschichteter Oberflächen und Verwendung derselben |
DE102008017270B3 (de) | 2008-04-04 | 2009-06-04 | Federal-Mogul Burscheid Gmbh | Strukturierte Chrom-Feststoffpartikel-Schicht und Verfahren zu deren Herstellung sowie beschichtetes Maschinenelement |
AT506076B1 (de) * | 2008-06-03 | 2009-06-15 | Vassilios Dipl Ing Polydoros | Verfahren zur herstellung von nanostrukturierten chromschichten auf einem substrat |
DE102008040354A1 (de) | 2008-07-11 | 2010-01-14 | Robert Bosch Gmbh | Hochdruckpumpe für ein Einspritzsystem zum Einspritzen von Kraftstoff in eine Brennkraftmaschine |
EP2149447A1 (fr) | 2008-07-29 | 2010-02-03 | Alcan Technology & Management Ltd. | Procédé de fabrication d'une bande de matériau ayant une structure de surface |
DE102014005941A1 (de) * | 2014-04-24 | 2015-11-12 | Te Connectivity Germany Gmbh | Verfahren zum Herstellen eines elektrischen Kontaktelements zur Vermeidung von Zinnwhiskerbildung, und Kontaktelement |
EP3000918B1 (fr) | 2014-09-24 | 2018-10-24 | topocrom systems AG | Procédé et dispositif d'application galvanique d'un revêtement de surface |
EP4012074A1 (fr) | 2020-12-14 | 2022-06-15 | topocrom systems AG | Revêtement de surface et son procédé de fabrication |
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US3318786A (en) * | 1964-10-16 | 1967-05-09 | Diamond Alkali Co | Chromium plating |
DE1421984A1 (de) * | 1962-10-01 | 1968-11-07 | Forsch Edelmetalle Und Metallc | Verfahren zur Herstellung von rissfreien Chromueberzuegen |
US4869971A (en) * | 1986-05-22 | 1989-09-26 | Nee Chin Cheng | Multilayer pulsed-current electrodeposition process |
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---|---|---|---|---|
DE2030295A1 (en) * | 1970-06-19 | 1972-01-27 | Bosch Gmbh Robert | Decorative micropore chromium coating - electroplated on bright and |
US4468293A (en) * | 1982-03-05 | 1984-08-28 | Olin Corporation | Electrochemical treatment of copper for improving its bond strength |
US5185073A (en) * | 1988-06-21 | 1993-02-09 | International Business Machines Corporation | Method of fabricating nendritic materials |
-
1992
- 1992-04-09 DE DE4211881A patent/DE4211881C2/de not_active Expired - Fee Related
-
1993
- 1993-04-07 US US08/045,042 patent/US5415761A/en not_active Expired - Lifetime
- 1993-04-07 EP EP93105726A patent/EP0565070B1/fr not_active Expired - Lifetime
- 1993-04-07 AT AT93105726T patent/ATE156201T1/de active
Patent Citations (3)
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DE1421984A1 (de) * | 1962-10-01 | 1968-11-07 | Forsch Edelmetalle Und Metallc | Verfahren zur Herstellung von rissfreien Chromueberzuegen |
US3318786A (en) * | 1964-10-16 | 1967-05-09 | Diamond Alkali Co | Chromium plating |
US4869971A (en) * | 1986-05-22 | 1989-09-26 | Nee Chin Cheng | Multilayer pulsed-current electrodeposition process |
Non-Patent Citations (1)
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US11136685B2 (en) | 2015-11-05 | 2021-10-05 | Topocrom Systems Ag | Method and device for the galvanic application of a surface coating |
US11732373B2 (en) | 2015-11-05 | 2023-08-22 | Topocrom Systems Ag | Method and device for the galvanic application of a surface coating |
EP3438330A1 (fr) | 2017-08-03 | 2019-02-06 | Groz-Beckert KG | Partie d'outil de machine textile et procédé de fabrication d'un outil textile |
WO2019025203A1 (fr) | 2017-08-03 | 2019-02-07 | Groz-Beckert Kommanditgesellschaft | Pièce d'outil de machine textile et procédé pour fabriquer un outil textile |
CN111201340A (zh) * | 2017-08-03 | 2020-05-26 | 格罗兹-贝克特公司 | 纺织机械工具部件和用于制造纺织工具的方法 |
CN111201340B (zh) * | 2017-08-03 | 2024-03-01 | 格罗兹-贝克特公司 | 纺织机械工具部件和用于制造纺织工具的方法 |
Also Published As
Publication number | Publication date |
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US5415761A (en) | 1995-05-16 |
EP0565070B1 (fr) | 1997-07-30 |
DE4211881A1 (de) | 1993-10-14 |
DE4211881C2 (de) | 1994-07-28 |
ATE156201T1 (de) | 1997-08-15 |
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