EP0554814B1 - Elektrostatischer Deflektor mit allgemein zylindrischer Grundform - Google Patents

Elektrostatischer Deflektor mit allgemein zylindrischer Grundform Download PDF

Info

Publication number
EP0554814B1
EP0554814B1 EP93101475A EP93101475A EP0554814B1 EP 0554814 B1 EP0554814 B1 EP 0554814B1 EP 93101475 A EP93101475 A EP 93101475A EP 93101475 A EP93101475 A EP 93101475A EP 0554814 B1 EP0554814 B1 EP 0554814B1
Authority
EP
European Patent Office
Prior art keywords
principal
plates
deflecting
electrostatic deflector
deflector according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP93101475A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0554814A1 (de
Inventor
Harald Prof. Ibach
Dieter Bruchmann
Sieghart Dr. Lehwald
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Juelich GmbH
Original Assignee
Forschungszentrum Juelich GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Forschungszentrum Juelich GmbH filed Critical Forschungszentrum Juelich GmbH
Publication of EP0554814A1 publication Critical patent/EP0554814A1/de
Application granted granted Critical
Publication of EP0554814B1 publication Critical patent/EP0554814B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/44—Energy spectrometers, e.g. alpha-, beta-spectrometers
    • H01J49/46—Static spectrometers
    • H01J49/48—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter
    • H01J49/482—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter with cylindrical mirrors

Definitions

  • the invention relates to an electrostatic deflector according to the preamble of claim 1.
  • electrostatic deflection systems For energy selection of charged particles, e.g. of electrons, electrostatic deflection systems are preferably used. Their mode of action is based on the different distractions of particles of different energy and the one made possible by it Suppression of particles of unwanted energy.
  • electrostatic energy filters have above all the Cylinder mirror, the spherical deflector and the cylindrical one Deflector found widespread in technology, though in principle, flat baffles can also be provided. In theory, the toroidal deflector was also examined (Hermann Wollnik, Optics of Charged Particles, pp. 119ff, Academic Press, Orlando, 1987).
  • All of the above energy filters are suitable Dimensioning by angular focusing at least first order in the energy dispersion levels.
  • the geometry of the filter forms these dispersion levels a bevy of planes that are parallel to each other, like the cylindrical one Deflector, or inclined to each other, as in the toroidal and spherical deflector or in the cylinder mirror.
  • the spherical deflector and the cylinder mirror show this particularly advantageous stigmatic focus on.
  • the angular focusing allows the focusing transport of charged particles from a non-zero solid angle through the energy filter.
  • the size of the processable solid angle is limited by image errors, especially angular errors. These cause the energy filter effect when exposed to particles from a larger solid angle range worsened. As a rule, therefore, the recorded Solid angles can be limited by apertures. In analogy to Light optics can also be achieved by limiting the light intensity talk through the artifacts.
  • the main baffles are corresponding to two parallel cylinder surface sectors constant radius, which is a particle path laterally limit. The one due to the design of the main baffle plates Angular error is unsatisfactory.
  • From US-A-3 710 103 is an electron spectrometer with a Delay grid known.
  • the aim of the invention is an electrostatic deflector to create its energy filtering effect under stigmatic Focusing and at least second order vanishing angular error in at least one dispersion level in simpler Be adapted to the nature of a particle beam can.
  • the deflection field can be on either side of the dispersion plane Center beam through a subdivision of the main baffle plates increasing perpendicular to the cylinder axis in at least three sections be weakened, the different Potentially brought sections for a corresponding course of the deflection field.
  • a biconvex curvature can be cumulative for the attenuation or "bulge” of the generally cylindrical main baffles (hereinafter referred to as “main baffles”) be provided in the rz direction.
  • the front cover plates should preferably be one a stigmatic focus of the charged particles Allow passage of the field to the center beam.
  • an average radial distance between the main baffle plates which is at least half the distance between the front cover plates and is dimensioned that when the front cover plates are loaded with a Potential of suitable strength is approximately spherical Curvature of the equipotential surfaces around the central beam results.
  • the curvature of the equipotential surfaces is inside of the deflector essentially using the four baffles through an at least partial space closure with sufficient field penetration to the area of Middle jet reached.
  • the shape of the front cover plates is the function can be selected accordingly; one is particularly clear flat and parallel execution of the same.
  • the resulting deflector is used to facilitate understanding as defined by a generally cylindrical basic shape is therefore a type of deflector working with four plates, which is not actually one of the spherical assign cylindrical or toroidal deflector shapes is.
  • Such optimization can be done by calculating the Field course with variation and adaptation of the influencing variables with a computer program can be achieved that also as the variable generally in the range of 100 ° to 150 ° deflection angle of the deflector. This angle is used in the optimization varies so that the desired focus in the radial plane is reached at the exit of the deflector.
  • K. Ost J. Phys. E: Schi. Instr. 12 (1979) p. 1006 ff.
  • a stigmatic focus also using non-spherical baffles can be achieved if this by a pair of front Cover plates parallel to the dispersion plane of the central jet be supplemented.
  • Eo or positive
  • this additional pair of plates can focus perpendicular to the dispersion plane of the center beam while weakening (reinforcing) the Focusing in the dispersion plane intensified (weakened) be so that at a certain deflection angle stigmatic Focus is achieved.
  • the shape of the bulges of the "inner” and the “" outer " The main baffle is basically independent of each other as well like their course towards the front. Particularly easy However, an implementation that is symmetrical on all sides is feasible of these plates.
  • ⁇ V is the voltage between the cylinders
  • R2 and R1 are the radii of the "outer and inner cylinder.
  • the entrance and exit slit of the cylindrical deflector will expediently realized by metallic materials that necessarily represent equipotential surfaces. This will the deflection angle at which first-order angle focusing occurs, diminishes.
  • the main baffles can also be shaped with cylindrical ones Main baffles are approximated perpendicular to the z-axis each have at least three sections with different Have radii of curvature.
  • the inner cylindrical Deflection plate in the direction of the cylinder axis to the cylinder faces each have increasing radii of curvature and decreasing radii of curvature of the main outer baffle exhibit.
  • a version is particularly simple in which the individual sections each have constant radii.
  • the one described Curvature of the equipotential surfaces in the rz plane can also be achieved by using cylindrical main baffles the known type used, but along the z-axis divided into at least three sections and the different sections are subjected to different voltages.
  • a general design is also a free design of the Main baffles possible, the optimal shape starting from a simple geometric basic form by numerical Calculation of particle trajectories using known methods results.
  • One way to find such an optimal shape e.g. in that the main baffles of the chosen Basic form in numerical calculations in numerous sections divided and then in the calculation of the particle trajectories these are subjected to different voltages.
  • the one corrected focusing calculated potential distribution on the Plate sections provide a family of equipotential surfaces with increasing weakening of the deflection field to the main deflection plates there.
  • the aforementioned weakening of the edge of the deflection field in the dispersion plane can also by bulging the cylinder surfaces in the dispersion levels are reinforced.
  • the cylinder surfaces have sections parallel to the cylinder axis, the Radii of curvature differ from one another.
  • one is preferably the middle dispersion level Mirror-symmetrical contour of the main baffle plates provided.
  • a curved one Input and / or output aperture may be useful as well if necessary, curved entry and / or exit column.
  • the front ends Cover plates 1 and 2 by creating a suitable one Tension in cooperation with the other main baffles 3 and 4 or 5 to 10 the stigmatic focusing of the gap of the panels on the gap of the panels 12.
  • Distance between the main baffles 3 and 4 or 5 to 7 and 8 to 10 preferably not less than half the distance between lids 1 and 2 chosen to be a stigmatic To achieve focus.
  • the deflection angle in the dispersion plane in the example according to FIG. 1 and the embodiment according to FIG. 4 145 °.
  • the optimal value for the deflection angle depends on the ratio of the radii of the main baffles 3 and 4 and 5, respectively to 7 and 8 to 10, as well as the distance between the cover plates 1 and 2 and must by numerical simulation be determined.
  • the one to eliminate the angular error at least second order necessary weakening of the deflection field on both sides of the center beam is in the embodiment due to the opposite curvature of the main deflection plates 3 and 4 reached perpendicular to the dispersion plane.
  • the radii of this Curvatures must also be calculated using numerical simulation become.
  • a comparable effect can also be achieved through a Segmentation of the main baffles 3 and 4 into three parts each 5-7 and 8-10 can be achieved.
  • the segments must then be different Voltages are applied in such a way that the potential distribution is similar to the example in Fig. 1. You can see the voltage at 8 and 10 more negative than the voltage on 9 and the voltage on 5 and 7 should be chosen more positive than the voltage at 6.
  • the segmentation the main baffle has the advantage of a larger one Flexibility in setting optimal focusing conditions and the elimination of the angular error. That stands as Disadvantage compared to a greater complexity of the voltage supply.
  • Fig. 5c is the exit position as a function of the entry angle in the dispersion level.
  • the picture demonstrates the almost angular error-free illustration.
  • the shape of the equipotential surfaces which lead to the result described in FIG. 5, is in a cross section perpendicular to the dispersion plane in Fig. 6 shown. It is obvious that the same imaging properties can also be achieved with an arrangement of only two main baffles, which shape the shown equipotential surfaces correspond.
  • FIG. 7 finally shows the results of a numerical simulation a deflector according to DE-PS 26 20 877, i.e. without additional front cover plates.
  • 7c is the exit position again as a function of the entry angle in the dispersion plane shown. Obviously, the angular error elimination succeeds not quite as good as with the invention Execution according to Fig. 1.
  • FIG. 8 The arrangements shown in FIG. 8 are designed symmetrically, and the radii of the individual sections are section by section constant.
  • the cross marks the center of the Particle orbits.
  • the cover plates 1 and 2 are at potentials brought to the arithmetic mean of those on the main baffles 3 and 4 correspond to the potentials provided (FIG. 8a) or deviating therefrom to a more negative potential (Fig. 8b).
  • the dotted lines mark the equipotential surfaces.
  • Fig. 3 shows an example in which the inner Main baffle 3 and outer main baffle 4 in their Form two correspond to equipotential surfaces shown in FIG. 8b.
  • the main baffles have a constant in planes perpendicular to the plane of the drawing Curvature.
  • the cross in Fig. 8b marks the center of the particle trajectories.
  • the equipotential surfaces are by dotted lines marked.
  • Fig. 9 shows a deflector variant with bulge in the Dispersion level.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Tubes For Measurement (AREA)
  • Particle Accelerators (AREA)
  • Measurement Of Radiation (AREA)
EP93101475A 1992-02-03 1993-01-30 Elektrostatischer Deflektor mit allgemein zylindrischer Grundform Expired - Lifetime EP0554814B1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE4202985 1992-02-03
DE4202985 1992-02-03
DE4239866 1992-11-27
DE4239866A DE4239866A1 (enrdf_load_stackoverflow) 1992-02-03 1992-11-27

Publications (2)

Publication Number Publication Date
EP0554814A1 EP0554814A1 (de) 1993-08-11
EP0554814B1 true EP0554814B1 (de) 2001-06-20

Family

ID=25911471

Family Applications (1)

Application Number Title Priority Date Filing Date
EP93101475A Expired - Lifetime EP0554814B1 (de) 1992-02-03 1993-01-30 Elektrostatischer Deflektor mit allgemein zylindrischer Grundform

Country Status (3)

Country Link
US (1) US5357107A (enrdf_load_stackoverflow)
EP (1) EP0554814B1 (enrdf_load_stackoverflow)
DE (2) DE4239866A1 (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5773823A (en) * 1993-09-10 1998-06-30 Seiko Instruments Inc. Plasma ion source mass spectrometer
JP3188794B2 (ja) * 1993-09-10 2001-07-16 セイコーインスツルメンツ株式会社 プラズマイオン源質量分析装置
US5506413A (en) * 1994-07-08 1996-04-09 The United States Of America As Represented By The Secretary Of The Air Force Spatial-focus energy analyzer
US6867414B2 (en) * 2002-09-24 2005-03-15 Ciphergen Biosystems, Inc. Electric sector time-of-flight mass spectrometer with adjustable ion optical elements
US6797951B1 (en) 2002-11-12 2004-09-28 The United States Of America As Represented By The Secretary Of The Air Force Laminated electrostatic analyzer
EP1946352A4 (en) * 2005-11-01 2010-10-13 Univ Colorado MULTICHANNEL CURRENT ANALYZER FOR LOADED PARTICLES
JP2008089542A (ja) * 2006-10-05 2008-04-17 Hitachi Kenki Fine Tech Co Ltd 走査型プローブ顕微鏡の探針制御方法
US8309936B2 (en) * 2009-02-27 2012-11-13 Trustees Of Columbia University In The City Of New York Ion deflector for two-dimensional control of ion beam cross sectional spread
US10361064B1 (en) 2018-02-28 2019-07-23 National Electrostatics Corp. Beam combiner

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710103A (en) * 1971-12-03 1973-01-09 Varian Associates Planar retarding grid electron spectrometer
DE2848538A1 (de) * 1978-11-09 1980-05-22 Leybold Heraeus Gmbh & Co Kg Elektronen- oder ionenoptische einrichtung
JPS57194446A (en) * 1981-05-22 1982-11-30 Shimadzu Corp Charged particle energy analyzer
US4959544A (en) * 1988-10-07 1990-09-25 Kabushiki Kaisha Toshiba Energy analyzer

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2620877C2 (de) * 1976-05-11 1982-07-22 Finnigan MAT GmbH, 2800 Bremen Elektrostatisches Toroidkondensatorprisma
JPS61161645A (ja) 1985-01-09 1986-07-22 Natl Inst For Res In Inorg Mater 円筒静電型粒子エネルギ−分析器

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710103A (en) * 1971-12-03 1973-01-09 Varian Associates Planar retarding grid electron spectrometer
DE2848538A1 (de) * 1978-11-09 1980-05-22 Leybold Heraeus Gmbh & Co Kg Elektronen- oder ionenoptische einrichtung
JPS57194446A (en) * 1981-05-22 1982-11-30 Shimadzu Corp Charged particle energy analyzer
US4959544A (en) * 1988-10-07 1990-09-25 Kabushiki Kaisha Toshiba Energy analyzer

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
J. PHYS. E: SCI. INSTRUM., Band 14, 1981, 325-329 *

Also Published As

Publication number Publication date
DE59310175D1 (de) 2001-07-26
EP0554814A1 (de) 1993-08-11
US5357107A (en) 1994-10-18
DE4239866A1 (enrdf_load_stackoverflow) 1993-08-05

Similar Documents

Publication Publication Date Title
EP0218920B1 (de) Elektronenenergiefilter vom Omega-Typ
EP0530640B1 (de) Abbildungssystem für Strahlung geladener Teilchen mit Spiegelkorrektor
EP0617451B1 (de) Abbildendes Elektronenenergiefilter
DE2850411C2 (de) Elektronenstrahlerzeugungssystem in einer Kathodenstrahlröhre
DE19633496B4 (de) Monchromator für die Elektronenoptik, insbesondere Elketronenmikroskopie
EP1995758B1 (de) Monochromator und Teilchenstrahlquelle mit Monochromator
EP0175933A1 (de) Rasterlinsen-System ohne Ablenkfarbfehler zur Materialbearbeitung mit Korpuskularstrahlen
DE1798021A1 (de) Mikroanalysenvorrichtung
EP0218921B1 (de) Elektronenenergiefilter vom Alpha-Typ
DE3522340C2 (enrdf_load_stackoverflow)
EP0373550A2 (de) Flugzeit(massen)spektrometer mit hoher Auflösung und Transmission
DE3107634A1 (de) Farbbildroehre mit aberrationsarmer strahlfokussierungslinse
EP0554814B1 (de) Elektrostatischer Deflektor mit allgemein zylindrischer Grundform
DE1498646B2 (de) Ionen mikroanalysevorrichtung
EP1559126B9 (de) BILDGEBENDER ENERGIEFILTER FüR ELEKTRISCH GELADENE TEILCHEN UND VERWENDUNG DES BILDGEBENDEN ENERGIEFILTERS
DE3120301C2 (enrdf_load_stackoverflow)
DE19734059A1 (de) Anordnung für Schattenwurflithographie
EP1352410B1 (de) Elektrostatischer korrektor
DE2834391A1 (de) Einrichtung zur erzeugung von zeichenmustern auf einer objektflaeche mittels elektronenstrahlen
DE895200C (de) Kathodenstrahlroehre
DE4107888C2 (de) Elektronenkanone
EP0185789B1 (de) Analysator für geladene Teilchen
EP0090989A2 (de) Elektronenoptik des Elektronenstrahlerzeugersystems einer Farbbildröhre
DE1907093C3 (de) Ionenmikroanalysator
DE1498646C (de) Ionen-Mikroanalysevorrichtung

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): CH DE FR GB IT LI

17P Request for examination filed

Effective date: 19940121

17Q First examination report despatched

Effective date: 19951212

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): CH DE FR GB IT LI

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

ITF It: translation for a ep patent filed
REF Corresponds to:

Ref document number: 59310175

Country of ref document: DE

Date of ref document: 20010726

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)

Effective date: 20010822

ET Fr: translation filed
REG Reference to a national code

Ref country code: GB

Ref legal event code: IF02

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CH

Payment date: 20120124

Year of fee payment: 20

Ref country code: FR

Payment date: 20120201

Year of fee payment: 20

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20111209

Year of fee payment: 20

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20120126

Year of fee payment: 20

Ref country code: GB

Payment date: 20120124

Year of fee payment: 20

REG Reference to a national code

Ref country code: DE

Ref legal event code: R071

Ref document number: 59310175

Country of ref document: DE

REG Reference to a national code

Ref country code: GB

Ref legal event code: PE20

Expiry date: 20130129

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION

Effective date: 20130129

Ref country code: DE

Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION

Effective date: 20130131