EP0545230B2 - Process for preparing modified oxide ceramic coatings on barrier-layer metals. - Google Patents

Process for preparing modified oxide ceramic coatings on barrier-layer metals. Download PDF

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Publication number
EP0545230B2
EP0545230B2 EP92120006A EP92120006A EP0545230B2 EP 0545230 B2 EP0545230 B2 EP 0545230B2 EP 92120006 A EP92120006 A EP 92120006A EP 92120006 A EP92120006 A EP 92120006A EP 0545230 B2 EP0545230 B2 EP 0545230B2
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bath
electrolyte
moles
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oxide ceramic
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EP0545230B1 (en
EP0545230A1 (en
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Peter Prof. Dr. Kurze
Hans-Jürgen Kletke
Dora Banerjee
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Electro Chemical Engineering GmbH
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/026—Anodisation with spark discharge
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/26—Anodisation of refractory metals or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/30—Anodisation of magnesium or alloys based thereon

Definitions

  • the invention relates to a method for producing oxide ceramic layers on barrier layer-forming Metals or their alloys by plasma chemical anodic oxidation in aqueous organic Electrolytes, whereby the oxide ceramic layer can also be modified for special applications.
  • This anodic oxidation in aqueous electrolytes is a gas-solid reaction under plasma conditions, where the high energy input at the base of the discharge column is liquid on the anode Metal that creates a briefly melted oxide with the activated oxygen.
  • the stratification takes place via partial anodes.
  • the spark discharge is preceded by a formation area (P. Kurz; Dechema-Monographien Volume 121 - VCH Verlagsgesellschaft 1990, page 167-180 with further references).
  • the electrolytes were combined so that their positive properties are combined and high-quality anodically produced oxide ceramic layers on aluminum.
  • Different salts can have higher salt concentrations in the electrolyte bath and thus higher viscosities can be achieved.
  • Such highly viscous electrolytes have a high heat capacity, stabilize the trained oxygen film on the anode and thus guarantee a uniform oxide layer formation (DD-WP 142 360).
  • the barrier layer grows as the voltage of the anodically polarized metal increases. Then arises at the Phase boundary metal / gas / electrolyte partially an oxygen plasma, through which the oxide ceramic layer forms.
  • the metal ion in the oxide ceramic layer comes from the metal, the oxygen from the anodic Reaction in the aqueous electrolyte used.
  • the oxide ceramic is at the determined plasma temperatures of around 7,000 Kelvin liquid. To the side of the metal there is enough time for the The oxide ceramic melt can contract well and thus a sintered, low-pore oxide ceramic layer forms.
  • the melt of the oxide ceramic is quickly removed by the Electrolytes cooled down and the still migrating gases, especially oxygen and water vapor leave an oxide ceramic layer with a wide-meshed capillary system. From scanning electron microscopic Pore diameters from 0.1 ⁇ m to 30 ⁇ m were determined (CERA-MIC COATINGS BY ANODIC SPARK DEPOSITION G.P. Wirtz et al, MATERIALS & MANUFACTURING PROCESSES 6 (1), 87-115 (1991), especially Figure 12).
  • DE-A-2 203 445 describes a method in which by using spark discharges During the anodization porous layers are made on aluminum, which are suitable for use in the Chromatography are determined.
  • EP-A-280 886 describes the use of anodic oxidation under spark discharges on Al, Ti, Ta, Nb, Zr and their alloys for the production of decorative layers on these metals.
  • aluminum and its alloys are pure aluminum and others the alloys AlMn; AlMnCu; AlMgl; AlMgl, 5; E-AlMgSi; AlMgSi0,5; AlZnMgCu0.5; AlZnMgCu1,5; G-AlSi-12; G-AlSi5Mg; G-AlSi8Cu3; G-AlCu4Ti; G-AlCu4TiMg understood.
  • magnesium cast alloys are also particularly suitable for the purposes of the invention the ASTM designations AS41, AM60, AZ61, AZ63, AZ81, AZ91, AZ92, HK31, QE22, ZE41, ZH62, ZK51, ZK61, EZ33, HZ32 and wrought alloys AZ31, AZ61, AZ 80, M1, ZK60, ZK40.
  • TiAl6V4 Pure titanium or titanium alloys such as TiAl6V4; TiAl5Fe2.5 and others deploy.
  • the chloride-free electrolytic bath can be used in processes for plasma chemical anodization usual inorganic anions, namely phosphate, borate, silicate, aluminate, fluoride or anions of inorganic Contain acids such as citrate, oxalate and acetate.
  • inorganic anions namely phosphate, borate, silicate, aluminate, fluoride or anions of inorganic Contain acids such as citrate, oxalate and acetate.
  • the electrolyte bath preferably contains phosphate, borate and fluoride ions in combination and in one Amount of at least 0.1 mol / l of each of these anions up to a total of 2 mol / l.
  • the cations of the electrolyte bath are chosen so that they are as good as possible with the respective anions Form soluble salts to enable high salt concentrations and viscosities. It is usually the case with alkali, ammonium, alkaline earth and aluminum ions up to 1 mol / l.
  • the electrolyte bath contains urea, hexamethylenediamine, hexamethylenetetramine, glycol or glycerin in an amount up to a total of 1.5 mol / l as a stabilizer.
  • very dilute electrolyte baths can also be used use in which the concentration of the anions is only 0.01 to 0.1 mol / l.
  • the pH value is between 10 and 12, preferably 11. Due to the low conductivity of this electrolyte bath, the final voltage value can reach up to 2,000 V. The energy input caused by the plasma chemical reaction is accordingly very high.
  • the oxide ceramic layer that forms on the aluminum materials consists of corundum, as X-ray diffraction studies show. The oxide ceramic layer can be hardened up to 2,000 HV. These oxide ceramic layers can be used in particular where extremely high abrasive wear protection is required.
  • the power supply for plasma chemical anodizing to form the ceramic layer takes place in such a way that the required current density of at least 1.A / dm 2 is kept constant and that the voltage is brought to a final value which is set.
  • the final voltage value is between 50 and 400 volts and is determined by the metal used or by its alloy components, by the composition of the electrolyte bath and by its bath management.
  • a sample plate made of AlMgSi1 with a surface area of 2 dm 2 is degreased and then rinsed with distilled water.
  • the sample thus treated is in an aqueous / organic chloride-free electrolyte bath of the composition a) cations 0.13 mol / l sodium ions 0.28 mol / l ammonium ions b) anions 0.214 mol / l phosphate 0.238 mol / l borate 0.314 mol / l fluoride c) stabilizer and complexing agent 0.6 mol / l hexamethylenetetramine at a current density of 4 A / dm 2 and an electrolyte temperature of 12 ° C ⁇ 2 ° C plasma-anodized. After a coating time of 60 minutes, the final voltage value of 250 V is reached.
  • the ceramicized sample plate is rinsed and dried.
  • the layer thickness of the ceramic layer is 100 ⁇ m.
  • the hardness of the ceramic layer was determined to be 750 (HV 0.015).
  • a die-cast housing made of GD-AlSi12 with a surface area of 1 dm 2 is treated in a stain, which consists half of 40% HF and 65% HNO 3 , for 1 minute at room temperature and then rinsed with distilled water.
  • the die-cast housing thus pickled is oxidized plasma-chemically-anodically in the aqueous / organic chloride-free electrolyte bath from Example 1 at a current density of 8 A / dm 2 and an electrolyte temperature of 10 ° C ⁇ 2 ° C. After a coating time of 30 minutes, a final voltage value of 216 volts is registered.
  • the ceramic die-cast housing is rinsed and dried.
  • the layer thickness of the ceramic layer is 40 ⁇ m.
  • a sample plate made of an AZ 91 magnesium alloy with a surface area of 1 dm 2 is pickled in 40% hydrofluoric acid at room temperature for 1 minute.
  • the sample treated in this way is oxidically plasma-anodically oxidized in an aqueous / organic chloride-free electrolyte bath according to Example 1 at a current density of 4 A / dm 2 and an electrolyte temperature of 12 ° C. ⁇ 2 ° C.
  • the ceramic layer has a layer thickness of 50 ⁇ m.
  • a rod made of pure titanium (length: 30 mm, diameter: 5 mm) is stained as in Example 2 pickled and then rinsed with distilled water.
  • the sample treated in this way is placed in an aqueous, chloride-free electrolyte bath of the composition: a) cations 0.2 mol / l calcium ions b) anions 0.4 mol / l phosphate at a current density of 18 A / dm 2 and an electrolyte temperature of 10 ° C ⁇ 2 ° C oxidized by chemical anodizing.
  • the ceramized rod is rinsed with distilled water and dried.
  • the layer thickness is 40 ⁇ m.
  • a gear wheel made of AlMgSi1 with a surface area of 6 dm 2 is degreased and rinsed with distilled water.
  • An aqueous / organic chloride-free electrolyte bath is an electrolyte bath from Example 1 diluted 100 times with water, which additionally contains 0.1 mol / l sodium aluminate and sodium silicate.
  • the gearwheel is oxidized at a current density of 10 A / dm 2 by plasma chemical anodizing. After a coating time of 120 minutes, a final voltage value of 800 volts is reached.
  • the ceramized gear is rinsed and dried.
  • the layer thickness of the oxide ceramic layer is 130 ⁇ m.
  • the hardness of the ceramic layer was determined to be 1900 HV (0.1).
  • the service life of the gear coated in this way increases fourfold compared to the conventional anodized gear of the same size.
  • An ultrasonic sonotrode made of AlZnMgCu1.5 with a surface area of 6.4 dm 2 is degreased and then rinsed with distilled water.
  • the ultrasound sonotrode treated in this way is oxidized in an aqueous-organic, chloride-free electrolyte bath, as described in Example 1, at a current density of 3.5 A / dm 2 and an electrolyte temperature of 15 ° C. in a plasma-chemical-anodic manner. After a coating time of 25 minutes, the voltage value of 250 V is reached.

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  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
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Abstract

In order to enhance the thickness and wear resistance of oxide-ceramic coatings on barrier-layer metals, a plasmachemical anodic oxidation in a chloride-free electrolyte bath is carried out at a pH from 2 to 8 and constant bath temperature, using a constant current density of at least 1 A/dm<2>, until the voltage settles at a final value. Thus it is possible to generate, on objects made of aluminium or aluminium alloys, an oxide-ceramic coating which consists of corundum, and even on magnesium or titanium, coating thicknesses of up to 150 mu m are achieved.

Description

Die Erfindung betrifft ein Verfahren zur Erzeugung von Oxidkeramikschichten auf sperrschichtbildenden Metallen oder deren Legierungen durch plasmachemische anodische Oxidation in wäßrig organischen Elektrolyten, wobei die Oxidkeramikschicht für spezielle Anwendungen auch noch modifiziert werden kann.The invention relates to a method for producing oxide ceramic layers on barrier layer-forming Metals or their alloys by plasma chemical anodic oxidation in aqueous organic Electrolytes, whereby the oxide ceramic layer can also be modified for special applications.

Diese anodische Oxidation ist in wäßrigen Elektrolyten eine Gas-Festkörper-Reaktion unter Plasmabedingungen, bei der der hohe Energieeintrag am Fußpunkt der Entladungssäule auf der Anode flüssiges Metall erzeugt, das mit dem aktivierten Sauerstoff ein kurzzeiterschmolzenes Oxid bildet. Die Schichtbildung erfolgt über Partialanoden. Der Funkenentladung ist ein Formierbereich vorgelagert (P. Kurze; Dechema-Monographien Band 121 - VCH Verlagsgesellschaft 1990, Seite 167-180 mit weiteren Literaturhinweisen). Die Elektrolyte wurden so kombiniert, daß ihre positiven Eigenschaften vereint werden und qualitativ hochwertige anodisch erzeugte Oxidkeramikschichten auf Aluminium entstehen. Durch. Kombination verschiedener Salze können höhere Salzkonzentrationen im Elektrolytbad und damit höhere Viskositäten erreicht werden. Solche hochviskosen Elektrolyte haben eine hohe Wärmekapazität, stabilisieren den ausgebildeten Sauerstoffilm auf der Anode und garantieren damit eine gleichmäßige Oxidschichtausbildung (DD-WP 142 360).This anodic oxidation in aqueous electrolytes is a gas-solid reaction under plasma conditions, where the high energy input at the base of the discharge column is liquid on the anode Metal that creates a briefly melted oxide with the activated oxygen. The stratification takes place via partial anodes. The spark discharge is preceded by a formation area (P. Kurz; Dechema-Monographien Volume 121 - VCH Verlagsgesellschaft 1990, page 167-180 with further references). The electrolytes were combined so that their positive properties are combined and high-quality anodically produced oxide ceramic layers on aluminum. By. combination Different salts can have higher salt concentrations in the electrolyte bath and thus higher viscosities can be achieved. Such highly viscous electrolytes have a high heat capacity, stabilize the trained oxygen film on the anode and thus guarantee a uniform oxide layer formation (DD-WP 142 360).

Aufgrund des Verlaufs der Stromdichte-Potential-Kurven (SPK) für die anodische Funkenentladung lassen sich drei markante Bereiche unterscheiden, der Faraday-, Funkenentladungs-, und Bogenentladungsbereich (s.P. Kurze loc.cit).Due to the course of the current density-potential curves (SPK) for the anodic spark discharge three distinctive areas can be distinguished, the Faraday, spark discharge and arc discharge area (see brief short loc.cit).

Auf dem Metall oder der Metallegierung befindet sich natürlicherweise eine Sperrschicht. Durch Erhöhung der Spannung des anodisch gepolten Metalls wächst die Sperrschicht. Dann entsteht an der Phasengrenze Metall/Gas/Elektrolyt partiell ein Sauerstoffplasma, durch das sich die Oxidkeramikschicht bildet. Das Metallion in der Oxidkeramikschicht stammt aus dem Metall, der Sauerstoff aus der anodischen Reaktion in dem verwendeten wäßrigen Elektrolyten. Die Oxidkeramik ist bei den ermittelten Plasmatemperaturen von etwa 7.000 Kelvin flüssig. Zur Seite des Metalls hin ist die Zeit ausreichend, damit sich die Schmelze der Oxidkeramik gut zusammenziehen kann und so eine aufgesinterte porenarme Oxidkeramikschicht bildet. Zur Seite des Elektrolyten hin wird die Schmelze der Oxidkeramik schnell durch den Elektrolyten abgekühlt und die noch abwandernden Gase, insbesondere Sauerstoff und Wasserdampf hinterlassen eine Oxidkeramikschicht mit einem weitmaschig verknüpften Kapillarsystem. Aus rasterelektronenmikroskopischen Untersuchungen wurden Porendurchmesser von 0,1 µm bis 30 µm bestimmt (CERA-MIC COATINGS BY ANODIC SPARK DEPOSITION G.P. Wirtz et al, MATERIALS & MANUFACTURING PROCESSES 6 (1), 87-115 (1991), insbesondere Figur 12).There is naturally a barrier layer on the metal or metal alloy. By The barrier layer grows as the voltage of the anodically polarized metal increases. Then arises at the Phase boundary metal / gas / electrolyte partially an oxygen plasma, through which the oxide ceramic layer forms. The metal ion in the oxide ceramic layer comes from the metal, the oxygen from the anodic Reaction in the aqueous electrolyte used. The oxide ceramic is at the determined plasma temperatures of around 7,000 Kelvin liquid. To the side of the metal there is enough time for the The oxide ceramic melt can contract well and thus a sintered, low-pore oxide ceramic layer forms. To the side of the electrolyte, the melt of the oxide ceramic is quickly removed by the Electrolytes cooled down and the still migrating gases, especially oxygen and water vapor leave an oxide ceramic layer with a wide-meshed capillary system. From scanning electron microscopic Pore diameters from 0.1 µm to 30 µm were determined (CERA-MIC COATINGS BY ANODIC SPARK DEPOSITION G.P. Wirtz et al, MATERIALS & MANUFACTURING PROCESSES 6 (1), 87-115 (1991), especially Figure 12).

In der DE-A-2 203 445 wird ein Verfahren beschrieben, in dem durch Nutzung von Funkenentladungen während der Anodisation poröse Schichten auf Aluminium hergestellt werden, die für den Einsatz in der Chromatographie bestimmt sind.DE-A-2 203 445 describes a method in which by using spark discharges During the anodization porous layers are made on aluminum, which are suitable for use in the Chromatography are determined.

Die EP-A-280 886 beschreibt die Nutzung der anodischen Oxidation unter Funkenentladungen auf Al, Ti, Ta, Nb, Zr und deren Legierungen zur Herstellung dekorativer Schichten auf diesen Metallen.EP-A-280 886 describes the use of anodic oxidation under spark discharges on Al, Ti, Ta, Nb, Zr and their alloys for the production of decorative layers on these metals.

Mit den vorbekannten Verfahren lassen sich nur Keramikschichten mit verhältnismäßig geringen Stärken bis maximal 30 µm herstellen, die für den Einsatz als Verschleiß- und Korrosionsschutzschichten unzureichend sind.With the previously known methods, only ceramic layers with a relatively small amount can be produced Manufacture thicknesses up to a maximum of 30 µm for use as wear and corrosion protection layers are inadequate.

Es ist deshalb Aufgabe der Erfindung, auf den zuvor genannten Metallen Oxidkeramikschichten zu erzeugen, die eine wesentlich höhere Schichtdicke bis zu 150 µm haben, abriebfest und korrosionsbeständig sind und eine hohe Biegewechselfestigkeit aufweisen.It is therefore an object of the invention to apply oxide ceramic layers to the aforementioned metals produce that have a much higher layer thickness up to 150 microns, abrasion-resistant and corrosion-resistant are and have high flexural fatigue strength.

Erfindungsgemäß werden Oxidkeramikschichten auf Aluminium, Magnesium, Titan, Tantal, Zirkon, Niob, Hafnium, Antimon, Wolfram, Molybdän, Vanadium, Wismut oder deren Legierungen durch plasmachemische anodische Oxidation bei Einhaltung der folgenden Parameter erzeugt:

  • 1. Das Elektrolytbad soll chloridfrei sein, was bedeutet, daß es weniger als 5 x 10-3 mol/l Chloridionen enthält.
  • 2. Das Elektrolytbad wird auf einen pH-Wert von 2 bis 8 eingestellt.
  • 3. Die Badtemperatur liegt im Bereich von -30 bis + 15°C und vorzugsweise zwischen -10 und + 15°C.
  • 4. Die Badtemperatur wird in den Grenzen von ± 2° C konstant gehalten.
  • 5. Die Stromdichte von mindestens 1 A/dm2 wird konstant gehalten bis sich die Spannung auf einen Endwert einstellt.
    • According to the invention, oxide ceramic layers on aluminum, magnesium, titanium, tantalum, zircon, niobium, hafnium, antimony, tungsten, molybdenum, vanadium, bismuth or their alloys are produced by plasma-chemical anodic oxidation while observing the following parameters:
  • 1. The electrolyte bath should be chloride-free, which means that it contains less than 5 x 10 -3 mol / l chloride ions.
  • 2. The electrolyte bath is adjusted to a pH of 2 to 8.
  • 3. The bath temperature is in the range of -30 to + 15 ° C and preferably between -10 and + 15 ° C.
  • 4. The bath temperature is kept constant within the limits of ± 2 ° C.
  • 5. The current density of at least 1 A / dm 2 is kept constant until the voltage reaches an end value.

    • Unter Aluminium und dessen Legierungen werden im Rahmen der vorliegenden Erfindung Reinstaluminium und u.a. die Legierungen AlMn; AlMnCu; AlMgl; AlMgl,5; E-AlMgSi; AlMgSi0,5; AlZnMgCu0,5; AlZnMgCu1,5; G-AlSi-12; G-AlSi5Mg; G-AlSi8Cu3; G-AlCu4Ti; G-AlCu4TiMg verstanden.Within the scope of the present invention, aluminum and its alloys are pure aluminum and others the alloys AlMn; AlMnCu; AlMgl; AlMgl, 5; E-AlMgSi; AlMgSi0,5; AlZnMgCu0.5; AlZnMgCu1,5; G-AlSi-12; G-AlSi5Mg; G-AlSi8Cu3; G-AlCu4Ti; G-AlCu4TiMg understood.

    Für die Zwecke der Erfindung eignen sich ferner außer Reinmagnesium insbesondere die Magnesiumgußlegierungen der ASTM-Bezeichnungen AS41, AM60, AZ61, AZ63, AZ81, AZ91, AZ92, HK31, QE22, ZE41, ZH62, ZK51, ZK61, EZ33, HZ32 sowie die Knetlegierungen AZ31, AZ61, AZ 80, M1, ZK60, ZK40.In addition to pure magnesium, magnesium cast alloys are also particularly suitable for the purposes of the invention the ASTM designations AS41, AM60, AZ61, AZ63, AZ81, AZ91, AZ92, HK31, QE22, ZE41, ZH62, ZK51, ZK61, EZ33, HZ32 and wrought alloys AZ31, AZ61, AZ 80, M1, ZK60, ZK40.

    Des weiteren lassen sich Reintitan oder auch Titanlegierungen wie TiAl6V4; TiAl5Fe2,5 u.a. einsetzen.Pure titanium or titanium alloys such as TiAl6V4; TiAl5Fe2.5 and others deploy.

    Das chloridfreie Elektrolytbad kann die in Verfahren für die plasmachemische anodische Oxidation üblichen anorganischen Anionen, nämlich Phosphat, Borat, Silicat, Aluminat, Fluorid oder Anionen anorganischer Säuren wie Citrat, Oxalat und Acetat enthalten.The chloride-free electrolytic bath can be used in processes for plasma chemical anodization usual inorganic anions, namely phosphate, borate, silicate, aluminate, fluoride or anions of inorganic Contain acids such as citrate, oxalate and acetate.

    Vorzugsweise enthält das Elektrolytbad Phosphat-, Borat- und Fluoridionen in Kombination und in einer Menge von wenigstens 0,1 mol/l von jedem einzelnen dieser Anionen bis insgesamt 2 mol/l.The electrolyte bath preferably contains phosphate, borate and fluoride ions in combination and in one Amount of at least 0.1 mol / l of each of these anions up to a total of 2 mol / l.

    Die Kationen des Elektrolytbads werden so gewählt, daß sie mit den jeweiligen Anionen möglichst gut lösliche Salze bilden, um hohe Salzkonzentrationen und Viskositäten zu ermöglichen. Das ist in der Regel bei Alkali-, Ammonium-, Erdalkali und Aluminiumionen bis 1 mol/l der Fall.The cations of the electrolyte bath are chosen so that they are as good as possible with the respective anions Form soluble salts to enable high salt concentrations and viscosities. It is usually the case with alkali, ammonium, alkaline earth and aluminum ions up to 1 mol / l.

    Darüber hinaus enthält das Elektrolytbad Harnstoff, Hexamethylendiamin, Hexamethylentetramin, Glykol oder Glycerin in einer Menge bis insgesamt 1,5 mol/l als Stabilisator.In addition, the electrolyte bath contains urea, hexamethylenediamine, hexamethylenetetramine, glycol or glycerin in an amount up to a total of 1.5 mol / l as a stabilizer.

    Zur Erzeugung von besonders verschleißfesten Oxidkeramikschichten auf Aluminium oder deren Legierungen durch plasmachemische anodische Oxidation bei einer Stromdichte von mindestens 5 A/dm2, die konstant gehalten wird, bis sich die Spannung auf einen Endwert einstellt, lassen sich auch sehr stark verdünnte Elektrolytbäder gemäß Anspruch 7 einsetzen, in denen die Konzentration der Anionen nur 0,01 bis 0,1 mol/l beträgt. In diesen stark verdünnten Bädern liegt der PH-Wert zwischen 10 und 12, vorzugsweise bei 11. Aufgrund der geringen Leitfähigkeit dieses Elektrolytbades kann sich der Spannungsendwert bis auf 2.000 V einstellen. Der durch die plasmachemische Reaktion verursachte Energieeintrag ist dementsprechend sehr hoch. Die sich bildende Oxidkeramikschicht auf den Aluminiumwerkstoffen besteht aus Korund, wie Röntgenbeugungsuntersuchungen zeigen. Es werden Härten der Oxidkeramikschicht bis 2.000 HV erreicht. Diese Oxidkeramikschichten sind insbesondere dort einsetzbar, wo ein extrem hoher abrasiver Verschleißschutz gefordert ist.In order to produce particularly wear-resistant oxide ceramic layers on aluminum or their alloys by plasma-chemical anodic oxidation at a current density of at least 5 A / dm 2 , which is kept constant until the voltage reaches an end value, very dilute electrolyte baths can also be used use in which the concentration of the anions is only 0.01 to 0.1 mol / l. In these highly diluted baths, the pH value is between 10 and 12, preferably 11. Due to the low conductivity of this electrolyte bath, the final voltage value can reach up to 2,000 V. The energy input caused by the plasma chemical reaction is accordingly very high. The oxide ceramic layer that forms on the aluminum materials consists of corundum, as X-ray diffraction studies show. The oxide ceramic layer can be hardened up to 2,000 HV. These oxide ceramic layers can be used in particular where extremely high abrasive wear protection is required.

    Die Wahl der Spannungs- und Stromform, wie Gleich-, Wechsel-, Dreh-, Impuls- und/oder mehrphasig verketteter Wechselstrom in den Frequenzen bis 500 Hz hat überraschenderweise auf den Schichtbildungsprozeß zur Erzeugung der Keramikschicht auf den Metallen keinen Einfluß.The choice of voltage and current form, such as single, alternating, rotating, pulse and / or multi-phase chained alternating current in the frequencies up to 500 Hz surprisingly affects the layer formation process no influence on the production of the ceramic layer on the metals.

    Die Stromversorgung zum plasmachemischen Anodisieren zur Bildung der Keramikschicht erfolgt in der Weise, daß die erforderliche Stromdichte von mindestens 1.A/dm2 konstant gehalten und daß die Spannung auf einen sich einstellenden Endwert gefahren wird. Der Spannungsendwert liegt zwischen 50 und 400 Volt und wird durch das verwendete Metall, bzw. durch dessen Legierungsbestandteile, durch die Zusammensetzung des Elektrolytbades und durch seine Badführung bestimmt.The power supply for plasma chemical anodizing to form the ceramic layer takes place in such a way that the required current density of at least 1.A / dm 2 is kept constant and that the voltage is brought to a final value which is set. The final voltage value is between 50 and 400 volts and is determined by the metal used or by its alloy components, by the composition of the electrolyte bath and by its bath management.

    Die folgenden Beispiele erläutern die Erfindung, ohne sie zu beschränken.The following examples illustrate the invention without restricting it.

    Beispiel 1example 1

    Eine Probeplatte aus AlMgSi1 mit einer Oberfläche von 2 dm2 wird entfettet und anschließend mit destilliertem Wasser gespült.A sample plate made of AlMgSi1 with a surface area of 2 dm 2 is degreased and then rinsed with distilled water.

    Die so behandelte Probe wird in einem wäßrig/organischen chloridfreien Elektrolytbad der Zusammensetzung a) Kationen 0,13 mol/l Natriumionen 0,28 mol/l Ammoniumionen b) Anionen 0,214 mol/l Phosphat 0,238 mol/l Borat 0,314 mol/l Fluorid c) Stabilisator und Komplexbildner 0,6 mol/l Hexamethylentetramin bei einer Stromdichte von 4 A/dm2 und einer Elektrolyttemperatur von 12°C ± 2°C plasmachemisch anodisch oxidiert. Nach einer Beschichtungszeit von 60 Minuten wird der Spannungsendwert von 250 V erreicht.The sample thus treated is in an aqueous / organic chloride-free electrolyte bath of the composition a) cations 0.13 mol / l sodium ions 0.28 mol / l ammonium ions b) anions 0.214 mol / l phosphate 0.238 mol / l borate 0.314 mol / l fluoride c) stabilizer and complexing agent 0.6 mol / l hexamethylenetetramine at a current density of 4 A / dm 2 and an electrolyte temperature of 12 ° C ± 2 ° C plasma-anodized. After a coating time of 60 minutes, the final voltage value of 250 V is reached.

    Die keramisierte Probeplatte wird gespült und getrocknet. Die Schichtdicke der Keramikschicht beträgt 100 µm. Die Härte der Keramikschicht wurde mit 750 (HV 0.015) bestimmt. The ceramicized sample plate is rinsed and dried. The layer thickness of the ceramic layer is 100 µm. The hardness of the ceramic layer was determined to be 750 (HV 0.015).

    Beispiel 2Example 2

    Ein Druckgußgehäuse aus GD-AlSi12 mit einer Oberfläche von 1 dm2 wird in einer Beize, die jeweils zur Hälfte aus 40%iger HF und 65%iger HNO3 besteht, 1 Minute bei Raumtemperatur behandelt und anschließend mit destilliertem Wasser gespült.A die-cast housing made of GD-AlSi12 with a surface area of 1 dm 2 is treated in a stain, which consists half of 40% HF and 65% HNO 3 , for 1 minute at room temperature and then rinsed with distilled water.

    Das so gebeizte Druckgußgehäuse wird in dem wäßrig/organischen chloridfreien Elektrolytbad aus Beispiel 1 bei einer Stromdichte von 8 A/dm2 und einer Elektrolyttemperatur von 10°C ± 2°C plasmachemisch-anodisch oxidiert. Nach einer Beschichtungszeit von 30 Minuten wird ein Spannungsendwert von 216 Volt registriert.The die-cast housing thus pickled is oxidized plasma-chemically-anodically in the aqueous / organic chloride-free electrolyte bath from Example 1 at a current density of 8 A / dm 2 and an electrolyte temperature of 10 ° C ± 2 ° C. After a coating time of 30 minutes, a final voltage value of 216 volts is registered.

    Das keramisierte Druckgußgehäuse wird gespült und getrocknet.The ceramic die-cast housing is rinsed and dried.

    Die Schichtdicke der Keramikschicht beträgt 40 µm.The layer thickness of the ceramic layer is 40 µm.

    Beispiel 3Example 3

    Eine Probeplatte aus einer Magnesiumlegierung des Typs AZ 91 mit einer Oberfläche von 1 dm2 wird 1 Minute in einer 40%igen Flußsäure bei Raumtemperatur gebeizt.A sample plate made of an AZ 91 magnesium alloy with a surface area of 1 dm 2 is pickled in 40% hydrofluoric acid at room temperature for 1 minute.

    Die so behandelte Probe wird in einem wäßrig/organischen chloridfreien Elektrolytbad nach Beispiel 1 bei einer Stromdichte von 4 A/dm2 und einer Elektrolyttemperatur von 12°C ± 2°C plasmachemisch-anodisch oxidiert.The sample treated in this way is oxidically plasma-anodically oxidized in an aqueous / organic chloride-free electrolyte bath according to Example 1 at a current density of 4 A / dm 2 and an electrolyte temperature of 12 ° C. ± 2 ° C.

    Nach 17 Minuten wird der Spannungswert von 252 Volt erreicht.After 17 minutes the voltage value of 252 volts is reached.

    Die Keramikschicht hat eine Schichtdicke von 50 µm.The ceramic layer has a layer thickness of 50 µm.

    Beispiel 4Example 4

    Ein Stab aus Reintitan (Länge: 30 mm, Durchmesser: 5 mm) wird in einer Beize wie in Beispiel 2 gebeizt und anschließend mit destilliertem Wasser gespült.A rod made of pure titanium (length: 30 mm, diameter: 5 mm) is stained as in Example 2 pickled and then rinsed with distilled water.

    Die so behandelte Probe wird in einem wäßrigen chloridfreien Elektrolytbad der Zusammensetzung: a) Kationen 0,2 mol/l Calciumionen b) Anionen 0,4 mol/l Phosphat bei einer Stromdichte von 18 A/dm2 und einer Elektrolyttemperatur von 10°C ± 2°C plasmachemisch-anodisch oxidiert.The sample treated in this way is placed in an aqueous, chloride-free electrolyte bath of the composition: a) cations 0.2 mol / l calcium ions b) anions 0.4 mol / l phosphate at a current density of 18 A / dm 2 and an electrolyte temperature of 10 ° C ± 2 ° C oxidized by chemical anodizing.

    Nach einer Beschichtungszeit von 10 Minuten wird der Spannungsendwert von 210 Volt erreicht. Der keramisierte Stab wird mit destilliertem Wasser gespült und getrocknet. Die Schichtdicke beträgt 40 µm.After a coating time of 10 minutes, the final voltage value of 210 volts is reached. The ceramized rod is rinsed with distilled water and dried. The layer thickness is 40 µm.

    Beispiel 5Example 5

    Ein Zahnrad aus AlMgSi1 mit einer Oberfläche von 6 dm2 wird entfettet und mit destilliertem Wasser gespült. Als wäßrig/organisches chloridfreies Elektrolytbad wird ein in 100-facher mit Wasser verdünntes Elektrolytbad aus Beispiel 1 eingesetzt, daß zusätzlich je 0,1 mol/l Natriumaluminat und Natriumsilikat enthält.
    Das Zahnrad wird bei einer Stromdichte von 10 A/dm2 plasmachemisch-anodisch oxidiert. Nach einer Beschichtungszeit von 120 Minuten wird ein Spannungsendwert von 800 Volt erreicht.
    Das keramisierte Zahnrad wird gespült und getrocknet. Die Schichtdicke der Oxidkeramikschicht beträgt 130 um. Die Härte der Keramikschicht wurde mit 1900 HV (0,1) bestimmt. Die Standzeit des so beschichteten Zahnrades erhöht sich auf das Vierfache im Vergleich mit dem konventionell eloxierten Zahnrad gleicher Abmessung.    A gear wheel made of AlMgSi1 with a surface area of 6 dm 2 is degreased and rinsed with distilled water. An aqueous / organic chloride-free electrolyte bath is an electrolyte bath from Example 1 diluted 100 times with water, which additionally contains 0.1 mol / l sodium aluminate and sodium silicate.
    The gearwheel is oxidized at a current density of 10 A / dm 2 by plasma chemical anodizing. After a coating time of 120 minutes, a final voltage value of 800 volts is reached.
    The ceramized gear is rinsed and dried. The layer thickness of the oxide ceramic layer is 130 μm. The hardness of the ceramic layer was determined to be 1900 HV (0.1). The service life of the gear coated in this way increases fourfold compared to the conventional anodized gear of the same size.

    Beispiel 6Example 6

    Eine Ultraschallsonotrode aus AlZnMgCu1,5 mit einer Oberfläche von 6,4 dm2 wird entfettet und anschließend mit destilliertem Wasser gespült.An ultrasonic sonotrode made of AlZnMgCu1.5 with a surface area of 6.4 dm 2 is degreased and then rinsed with distilled water.

    Die so behandelte Ultraschallsonotrode wird in einem wäßriglorganischen chloridfreien Elektrolytbad, wie im Beispiel 1 beschrieben, bei einer Stromdichte von 3,5 A/dm2 und einer Elektrolyttemperatur von 15°C plasmachemisch-anodisch oxidiert. Nach einer Beschichtungszeit von 25 Minuten wird der Spannungs wert von 250 V erreicht.The ultrasound sonotrode treated in this way is oxidized in an aqueous-organic, chloride-free electrolyte bath, as described in Example 1, at a current density of 3.5 A / dm 2 and an electrolyte temperature of 15 ° C. in a plasma-chemical-anodic manner. After a coating time of 25 minutes, the voltage value of 250 V is reached.

    Claims (9)

    1. Process for producing oxide ceramic layers on Al, Mg, Ti, Ta, Zr, Hf, Sb, W, Mo, V, Bi or other alloys by plasmachemical anodic oxidation, characterized in that a current density of at least 1 A/dm2 is kept constant, at a constant bath temperature of from -30 to +15 °C, in a chloride-free electrolyte-bath having a pH-value of 2 to 8, until a voltage has been set to a final value.
    2. Process in accordance with claim 1, characterized in that said bath-temperature is from -10 to +15 °C.
    3. Process in accordance with claim 1 or 2, characterized in that said bath-temperature is kept constant within limits of± 2 °C.
    4. Process in accordance with any one of claims 1 to 3, characterized in that said electrolyte-bath contains less than 5 x 10-3 moles/l chloride ions.
    5. Process in accordance with any one of claims 1 to 4, characterized in that said electrolyte-bath contains phosphate, borate and fluoride ions up to a total concentration of 2 moles/l.
    6. Process in accordance with any one of claims 1 to 5, characterized in that said electrolyte-bath contains a stabilizer selected from the group consisting of urea, hexamethylene-diamine and hexamethylene-tetramine, glycol and glycerin at a concentration of up to 1.5 moles/l.
    7. Process for producing particularly wear-resistant oxide-ceramic layers on aluminum or its alloys by plasmachemical anodic oxidation at a current density of at least 5 A/dm2, which is kept constant until a voltage has been set to a final value, with the use of an electrolyte-bath containing less than 5 x 10-3 moles/l of chloride ions and phosphate, borate and fluoride ions up to a total concentration of 2 moles/l after thinning said electrolyte-bath to a concentration of 0.01 to 0.1 moles/l and raising the pH-value to 10 to 12, preferably 11.
    8. Process in accordance with any one of claims 1 to 7, characterized in that said voltage has frequencies of up to 500 Hz.
    9. Process in accordance with claim 7, characterized in that said electrolyte-bath contains a stabilizer selected from the group consisting of urea, hexamethylene-diamine and hexamethylene-tetramine, glycol and glycerin at a concentration of up to 1.5 moles/l.
    EP92120006A 1991-11-27 1992-11-25 Process for preparing modified oxide ceramic coatings on barrier-layer metals. Expired - Lifetime EP0545230B2 (en)

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    DE4139006 1991-11-27

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    ATE124472T1 (en) 1995-07-15
    EP0545230B1 (en) 1995-06-28
    DE4139006C2 (en) 1996-10-24
    DE4139006C3 (en) 2003-07-10
    JPH05239692A (en) 1993-09-17
    US5811194A (en) 1998-09-22
    DE4139006A1 (en) 1993-06-03
    JP2912101B2 (en) 1999-06-28
    EP0545230A1 (en) 1993-06-09
    DE59202722D1 (en) 1995-08-03
    US5385662A (en) 1995-01-31

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