EP0468990A1 - Procede et dispositif pour la production d'un champ electrique a haute frequence dans un espace utile - Google Patents

Procede et dispositif pour la production d'un champ electrique a haute frequence dans un espace utile

Info

Publication number
EP0468990A1
EP0468990A1 EP19900905516 EP90905516A EP0468990A1 EP 0468990 A1 EP0468990 A1 EP 0468990A1 EP 19900905516 EP19900905516 EP 19900905516 EP 90905516 A EP90905516 A EP 90905516A EP 0468990 A1 EP0468990 A1 EP 0468990A1
Authority
EP
European Patent Office
Prior art keywords
space
coupling
power
useful
wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP19900905516
Other languages
German (de)
English (en)
Inventor
Wolfgang Krüger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of EP0468990A1 publication Critical patent/EP0468990A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/80—Apparatus for specific applications
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P5/00—Coupling devices of the waveguide type
    • H01P5/02—Coupling devices of the waveguide type with invariable factor of coupling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/6402—Aspects relating to the microwave cavity
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/70—Feed lines
    • H05B6/707—Feed lines using waveguides
    • H05B6/708—Feed lines using waveguides in particular slotted waveguides

Definitions

  • the invention relates to a method and a device for generating an electrical high-frequency field according to claim 1 and claim 14, respectively.
  • a desired field strength profile within a usable space that has dimensions that are significantly larger in one direction than in the other two directions, be generated.
  • a desired distribution of HF power to a lossy medium that is introduced into the usable space is also to be achieved.
  • a usable space can be achieved in a rectangular waveguide with a suitable width, which has a largely uniform local distribution of the electric field strength, but can be considerably longer than it corresponds to a multiple of the free space wavelength at the frequency used .
  • the waveguide is chosen so that at the frequency determined by the HF generator, the wave type of the lowest frequency ("basic type") with a high phase wavelength propagates in the waveguide or forms a standing wave. Part of this standing wave can then be used to generate a uniform field configuration. In this way, however, it is not possible to achieve a uniform power density distribution in a strongly absorbing medium, since the damping in the direction of propagation of the wave causes a sharp drop in the field strength and the power density.
  • the plasma is produced between two elongated plates made of metal or a dielectric, which are a few millimeters apart and oppose each other. These plates also serve as electrodes for excitation of the plasma and as waveguides for guiding the laser beam in the resonator.
  • the RF power can be guided via guide segments segmented along the plasma zone. Vouchers are supplied in several places, which however results in discrepancies in the suggestion.
  • Embodiments of such stripline lasers are described in detail, for example, in DE-OS 37 29 053 and EP-A-0 275 023.
  • the object of the invention is to specify a method and the associated device, by means of which, for example, a high-frequency field with a desired local field profile, preferably a uniform field, can be generated in a spatially stretched useful space.
  • a method and the associated device should also allow RF power with a desired, in particular uniform, local course to be distributed to a lossy medium introduced into the usable space.
  • Such a method should be suitable for a wide variety of applications, for example also for CO 2 lasers.
  • the vector of the electric field strength for the HF power coupled into the useful space is largely perpendicular to the surfaces of the useful space determined by the two larger dimensions.
  • the length dimensions that characterize the usable space at least one is larger than the other two or exactly as large as one of the other.
  • At least one of the two major lengths is in this case greater than 1/10 of the macrurt wavelength, which corresponds to the frequency of the coupled power, the direction of the power flow into the useful space largely forming a right angle with the directions of the longitudinal dimensions.
  • the usable space in a structure in the manner of a waveguide. It is dimensioned such that at a specific excitation frequency f the phase wavelength becomes so large at least in one direction, in particular the longitudinal direction, that it comes close to the greatest length dimension of the usable space or that it exceeds this dimension.
  • the structure can be dimensioned such that the phase wavelength becomes computationally imaginary at the excitation frequency. In this case there is an aperiodically damped waveguide.
  • the dimensioning of the coupling space surrounding the usable space is defined in the manner of a waveguide by theoretically specifying the phase wavelength in the direction of at least one of the two larger length extinctions.
  • the HF power is supplied to the useful space not from the ends or from a single point, but essentially from 1 or more of the long sides and distributed over them.
  • these sides are provided with so-called "coupling walls" with coupling openings.
  • the coupled-in power can be taken in a simple manner from a correspondingly designed waveguide structure which, as a divider space, has similar limit dimensions with respect to the phase wavelength over at least part of its length as the coupling space.
  • the power can be applied in a known manner by means of a waveguide, by means of a coupling pin or coupling loop of a coaxial line transition or directly with the coupling pin of a magnetron. be fed.
  • the method according to the invention is suitable for a wide variety of technical applications. These include, for example, spectroscopic observation and the generation or decomposition of gases, vapors or liquids of a certain composition, as well as the treatment of surfaces of solid substances or the deposition of layers on substrates or on the surfaces serving as electrodes themselves the invention advantageously suitable for generating electromagnetic radiation by excitation of a gas plasma, in particular in gas lasers and preferably in stripline lasers.
  • FIG. 1 shows the principle of the invention with the field strength profile in both directions
  • FIGS. 2 to 4 different cross-sections of the coupling space according to FIG. 1 with a tube therein, the interior of which serves as a useful space
  • FIG. 5 shows the design of the coupling space according to Art a ridge waveguide with the inner volume of an inserted tube as usable space
  • FIG. 6 shows the arrangement of two tubes pushed into one another, the space between them forming a cooling channel
  • FIG. 6 shows another embodiment of the cooling channel
  • FIG. 8 shows an embodiment example suitable for a laser application with one-sided coupling of the RF power into the coupling space
  • FIG. 9 shows another embodiment a double-sided coupling of the RF power
  • FIG. 10 the assignment of the field strength profile in the transverse direction of the useful space with the associated structure of the coupling space.
  • a useful space 1 in which the desired field distribution is to be generated or in which the RF power with a certain field distribution is to be supplied to a medium, is electrically connected to a coupling space 2.
  • the coupling space is delimited along the sides by a boundary 15.
  • the purpose of the distribution space 40 is to supply the signals from a generator 46, for example a magnetron, with the frequency f and the associated free space wavelength ⁇ and, for example, via a waveguide or a cable 44 and a transmission cable.
  • a generator 46 for example a magnetron
  • Suitable cross-sectional dimensions of the coupling space 2 can be calculated by an approximation sufficient for many purposes if there are media in the useful space, their relative dielectric constant - has a real part f ', between 0.7 and 3 and - an imaginary part £ "-_ between 0.05 and 0.2.
  • a real part l e * ⁇ ⁇ 1 occurs, for example, in the case of piezoelectric materials in the vicinity of mechanical ones Resonances as well as with plasmas.
  • the coupling wall 30 is replaced by a continuously conductive wall, which, however, has moved outwards by 5% of the wavelength 3, and that the usable space 1 is free of the medium to which the HF power is supplied shall be.
  • the cross-sectional dimensions of the coupling space 2 are then to be selected such that only a weakly aperiodically damped wave can propagate in the longitudinal direction in the z direction at a certain frequency f ß or a wave whose phase wavelength p is at least 1.5 times the free space wavelength 0 the generator frequency is f.
  • the distribution space can be dimensioned according to the same principle, the disturbance caused by the coupling point for the HF power not having any significant effect.
  • special measures are expedient in the vicinity of the point or the points at which the ⁇ F power is supplied by the generator 46, on the one hand to improve the adaptation, and on the other hand the effect of the field disturbance at the supply point on the closest areas of the To prevent coupling wall 30.
  • Such a measure can, for example, in the reduction of coupling openings in this area or in the interposition of another distribution room with coupling wall.
  • f B (0, 6 ... 0.9).
  • f Q the smaller factor being assigned to a larger width of the usable space 2.
  • a particular advantage of the method according to the application is that with a suitable dimensioning of distribution space 40, coupling wall 30 and coupling space 2, the risk of instabilities in the power distribution in the medium can be reduced. If, for example, the conductivity of the medium rises rapidly at a point when a critical temperature, field strength or power density is exceeded, in many arrangements used to date a considerable part of the total power is concentrated on this point and increases the instability.
  • the power is transported in the longitudinal direction of the usable space, i.e. the z-direction according to FIG. 1.
  • the increased power consumption compared to the neighboring areas due to the properties of the coupling space in the transverse direction can lead to a mismatch in the area of the nearest coupling openings and also reduce the power supply in this direction .
  • FIG. 1 also shows the course of the field strength E with a desired largely uniform power density distribution over the width (x direction) and the length (z direction) of the useful space 1 with the length L is shown as a solid line.
  • the field course outside the useful space 1 is indicated by broken lines, taking into account the effect of parts made of dielectric material at the ends of the useful space 1 in the z direction, which leads to a rapid drop in the electric field strength E.
  • the HF power fed in by the generator 46 in the middle of one narrow side of the distributor space 40 leads to the sketched field profile. It enters the coupling space 2 largely uniformly through the openings 31 of the coupling wall 30.
  • the useful space 1 is expediently arranged in the area of the maximum of the field strength E in the coupling space 2, so that the unevenness of the field strength E remains low in the transverse direction.
  • FIG. 1 shows the course of the field strength E in the entire coupling space 2, corresponding to a disturbed sinus distribution.
  • the useful space can be determined so that the non-uniformity of the field strength distribution or the power distribution in the medium becomes a minimum.
  • the longitudinal direction in the useful space 1 the steep drop at the ends of the curve is carried out in the same way as in the distributor space 40 by special measures in the end regions.
  • Such measures are, for example, the introduction of parts made of dielectrics or conductive substances, cross-sectional widenings or the insertion or addition of waveguide pieces which act as a resonator.
  • the coupling space 2 each contains a tube 50, for example made of ceramic, the inner volume of which can be used as a useful space 1 for a wide variety of applications.
  • a tube 50 for example made of ceramic, the inner volume of which can be used as a useful space 1 for a wide variety of applications.
  • only one of the two side walls of the coupling space 2 is designed as a coupling wall 30, through whose openings 31 and 32 the HF power is supplied.
  • the other side wall 15 is closed, but can also be provided with small openings which are suitable for optical observation, for irradiation of UV light as an ignition aid or for similar purposes, the through the opposite coupling wall fed RF power can only pass through to an insignificant extent.
  • both side walls are designed as coupling walls 30 and 30 ', so that RF power can be fed in from both sides.
  • the special possibility here is discussed further below for specific application purposes.
  • the coupling space forms a T-structure, in the center of which there is the tube 50 with the useful space 1.
  • the web at the base of the T forms the coupling wall 30 with coupling openings 33, while the webs on the T-beam form the associated short-circuit walls 15.
  • the short-circuit walls 15 and 15 'and the coupling wall 30 may also be advantageous here to arrange the short-circuit walls 15 and 15 'and the coupling wall 30 at different distances from the tube 50.
  • the coupling spaces 2 in FIGS. 2 to 4 are designed in the manner of rectangular waveguides; there are also possible designs in the form of ridge waveguides, as will be shown below.
  • the webs 22 and 23 on the wide walls 10 and 20 can be flat and with their opposite surfaces 11 and 21 are parallel to each other.
  • the useful space 1 may be advantageous not to arrange the useful space 1 centrally between the coupling wall 30 and the short-circuit wall 15, in order in this way to achieve a uniform field profile in the transverse direction of the useful space 1 or one to obtain favorable performance adaptation of a medium in the tube 50 to the field conditions in the coupling space 2.
  • 12 of the desired specific field distributions of the coupling space 2 can be formed in a star shape in cross section with the same or different lengths of the individual radiation-like parts.
  • the distance of the short-circuit walls 15 or one or more coupling walls 30 from the longitudinal axis of the useful space 1 can thus be varied.
  • a waveguide structure 20 is shown as a coupling space, in which webs 12 and 22 are provided for adapting to the cross-section of a tubular container 50 with its inner volume as a useful space 1, which have a curved, for example, on the tube 50 matched area.
  • the webs 12 and 22 advantageously contain cooling channels 54 and 55 through which a cooling liquid or a cooling gas flows.
  • the coupling space 20 can form a uniform structure with the coupling wall 30 and the distributor space 40.
  • a further tube 51 made of electrically active material can be arranged in the tube 50 according to FIG. 5, as is indicated in FIG. 6. With suitable dimensioning, this can bring about an additional homogenization of the field in usable space 1.
  • the space between the tubes 50 and 51 can be flowed through with a low-loss coolant for cooling purposes.
  • FIG. 7 it is further shown that by dividing the intermediate space between the two tubes, separate cooling lines are formed. As a result, water can also be used as the cooling liquid under certain conditions, without a significant absorption of the HF power taking place therein.
  • the coupling walls 30 can have the following different structures with their coupling openings 31.
  • slots, round or rectangular holes or a combination thereof are possible.
  • slots can also be arranged in a row in a row against one another, or else the slots run zigzag.
  • Combinations of slots with holes are also possible, for example in the form of dumbbell structures.
  • Webs can also be used as coupling means, which are alternately pressed out of the plane of the coupling wall 30 in the direction of the coupling space 2 or the distribution space 40, or, if appropriate, also so-called coupling loops.
  • a metal wall with a long, continuous longitudinal slot can also serve as the coupling wall 30.
  • Coupling wall in the aforementioned sense is also to be understood as other devices which have the function of an electromagnetic coupling between the distribution space and the coupling space, such as e.g. Pieces of low rectangular waveguides that can be filled with a dielectric.
  • the tube 50 with its internal volume as the useful space 1 according to FIGS. 2 to 5 can have sealable accesses at both ends, via which a medium can be inserted or removed.
  • a medium can be, for example, a gas or gas mixture which is to be excited for the analysis or emission of laser radiation or in which certain decomposition or connection processes are to take place.
  • catalytically active substances can be present in the usable space, for example in the form of layers on the walls.
  • the tube 50 it is possible to introduce substrates into the tube 50, the surfaces of which are to be influenced, for example, by plasma etching, or on which layers are to be deposited.
  • a substrate can advantageously continuously run through the useful space 1.
  • Such layers can also be deposited uniformly on the boundary walls of the useful space 1 itself, that is to say, for example, on the inner tube wall or the opposing inner surfaces 11, 21 of webs 12, 22.
  • the groove is' 1 zraum directly formed by the space between opposing surfaces 11 and 21 of two webs 12 and 22 of wall parts 10 and 20th
  • This design in the manner of a ridge waveguide can be used in particular for a ribbon conductor gas laser.
  • the width of the useful space 1 is limited by the requirement for uniformity of the electric field in the transverse direction. Certain widths cannot be exceeded with this arrangement unless a higher unevenness in the field course in the transverse direction can be accepted. If a uniform field profile over a larger width is required, then as already shown in principle in FIG. 3, there is the advantageous possibility of feeding the RF power from two sides into the coupling space 2, which corresponds to FIG. 8 for the laser application in FIG. 9 is also formed by the space between the band electrodes 10 and 20.
  • FIG. 10 shows the course of the field strength E y for the embodiment according to FIG. 9. Such a course occurs when a lossy medium is brought into the useful space and the RF power enters the coupling space 2 in phase from the distribution spaces 40 or 40 'through the openings of the coupling walls 30 or 30'.
  • the wall parts 10 and 20 shown in FIGS. 8, 9 and 10 with the webs 12 and 22 need not be made of a uniform material.
  • the surfaces 11 and 21 of the webs 10 and 20 can be provided with optically, chemically, physically or mechanically effective coatings as required.
  • the abrasion and sputter resistance can preferably be improved by an aluminum oxide or boron nitride coating;
  • the optical properties of layers made of germanium and silicon and their oxides, made of aluminum oxides and gold, are particularly advantageous in the case of CO 2 -band conductor and waveguide lasers, the latter two materials also counteracting the disruptive CO 2 decomposition.
  • the regions of a web or both webs 12 and 22 facing the usable space are advantageously produced at a height of up to a few millimeters from dielectric material, preferably a ceramic material with good thermal conductivity and a low relative dielectric constant, which is good is heat-conducting and bubble-free connected to the metallic part of the walls 10, 20 or the webs 12, 22.
  • the desired stabilizing effect which suppresses an arc discharge, essentially arises from the fact that, with a suitable choice of the dielectric constant and the thickness of such plate supports, this counteracts a local current increase, as occurs, for example, during arcing, as a capacitive series resistor, in that the electric field strength decreases at this point.
  • the feed can be phase-locked in amplitude and phase. This can be done, for example, by dividing the power of a single generator into one 3 dB branching or by using two phase-locked coupled generators.
  • two generators can be used that are not coupled and do not synchronize with each other. In this case, an RF field strength that fluctuates over time with the difference frequency of the generators results in the useful space. This can be permitted for various applications if the difference frequency is high enough.
  • two generators can be alternately keyed so that one generator emits a power pulse while the other is blocked. Such a mode of operation is also permissible or even desirable for many applications, for example the excitation of a laser plasma.

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Constitution Of High-Frequency Heating (AREA)

Abstract

Il s'agit de coupler dans des espaces utiles, de préférence de forme allongée dans un seul sens, des champs à haute fréquence dont résulte, le cas échéant, une distribution voulue de la puissance HF dans un milieu absorbant introduit dans ledit espace utile. On y parvient soit en en provoquant dans le plus grand allongement de l'espace utile une longueur d'onde de De Broglie qui atteint approximativement ou dépasse l'allongement de l'espace utile (1), soit en provoquant dans cette direction une onde amortie apériodique, la puissance HF étant couplée dans l'espace utile, suivant l'allure de champ désirée, aussi perpendiculairement que nécessaire à la direction de l'allongement. Dans le dispositif y afférent comportant un espace utile de forme linéaire, l'espace utile (1) se trouve à l'intérieur d'un espace d'accouplement (2) qui présente sur toute sa longueur au moins une paroi de couplage (30, 30') avec des ouvertures de couplage (31 à 34) pour la distribution de la puissance HF et qui est alimenté depuis un espace de distribution (40, 40').
EP19900905516 1989-04-17 1990-04-10 Procede et dispositif pour la production d'un champ electrique a haute frequence dans un espace utile Withdrawn EP0468990A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3912569 1989-04-17
DE19893912569 DE3912569A1 (de) 1989-04-17 1989-04-17 Verfahren und vorrichtung zur erzeugung eines elektrischen hochfrequenzfeldes in einem nutzraum

Publications (1)

Publication Number Publication Date
EP0468990A1 true EP0468990A1 (fr) 1992-02-05

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
EP19900905516 Withdrawn EP0468990A1 (fr) 1989-04-17 1990-04-10 Procede et dispositif pour la production d'un champ electrique a haute frequence dans un espace utile

Country Status (4)

Country Link
EP (1) EP0468990A1 (fr)
JP (1) JPH04504640A (fr)
DE (1) DE3912569A1 (fr)
WO (1) WO1990013151A1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE68921050T2 (de) * 1988-12-14 1995-09-21 Mitsubishi Electric Corp Mikrowellenheizgerät.
DE60023964T2 (de) * 1999-02-01 2006-06-22 Ohmi, Tadahiro, Sendai Laservorrichtung, Belichtungsapparat unter Verwendung derselben und Herstellungsverfahren
JP5199962B2 (ja) * 2009-08-05 2013-05-15 三菱重工業株式会社 真空処理装置
JP5622477B2 (ja) * 2010-08-06 2014-11-12 三菱重工業株式会社 真空処理装置
JP5523977B2 (ja) * 2010-08-06 2014-06-18 三菱重工業株式会社 真空処理装置およびプラズマ処理方法
US20130084408A1 (en) * 2010-08-06 2013-04-04 Mitsubishi Heavy Industries, Ltd. Vacuum processing apparatus and plasma processing method
JP5721362B2 (ja) * 2010-08-06 2015-05-20 三菱重工業株式会社 真空処理装置およびプラズマ処理方法
JP5517826B2 (ja) * 2010-08-17 2014-06-11 三菱重工業株式会社 真空処理装置およびプラズマ処理方法
JP5517827B2 (ja) * 2010-08-17 2014-06-11 三菱重工業株式会社 真空処理装置およびプラズマ処理方法
JP5822658B2 (ja) * 2011-10-31 2015-11-24 三菱重工業株式会社 真空処理装置
JP6391560B2 (ja) * 2015-12-24 2018-09-19 三菱電機株式会社 導波管変換回路及びアンテナ装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1263990A (fr) * 1959-05-07 1961-06-19 Unilever Nv Perfectionnements à des dispositifs de guide d'ondes et à leur utilisation
US4513424A (en) * 1982-09-21 1985-04-23 Waynant Ronald W Laser pumped by X-band microwaves
JPS61220486A (ja) * 1985-03-27 1986-09-30 Mitsubishi Electric Corp レ−ザ発振装置
DE3708314A1 (de) * 1987-03-14 1988-09-22 Deutsche Forsch Luft Raumfahrt Mikrowellengepumpter hochdruckgasentladungslaser
DD263648B5 (de) * 1987-08-31 1996-01-25 Buck Werke Gmbh Einrichtung zur erzeugungs eines Mikrowellenplasmas mit grosser Ausdehnung und Homogenitaet

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO9013151A1 *

Also Published As

Publication number Publication date
JPH04504640A (ja) 1992-08-13
DE3912569A1 (de) 1990-10-18
WO1990013151A1 (fr) 1990-11-01

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