DE3856348T2 - Laser Plasmavorrichtung - Google Patents

Laser Plasmavorrichtung

Info

Publication number
DE3856348T2
DE3856348T2 DE3856348T DE3856348T DE3856348T2 DE 3856348 T2 DE3856348 T2 DE 3856348T2 DE 3856348 T DE3856348 T DE 3856348T DE 3856348 T DE3856348 T DE 3856348T DE 3856348 T2 DE3856348 T2 DE 3856348T2
Authority
DE
Germany
Prior art keywords
plasma device
laser plasma
laser
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3856348T
Other languages
English (en)
Other versions
DE3856348D1 (de
Inventor
Junichi Nishimae
Kenji Yoshizawa
Masakazu Taki
Yoshihioro Ueda
Tadashi Yanagi
Akihiko Iwata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP62015690A external-priority patent/JPH0673319B2/ja
Priority claimed from JP1807187A external-priority patent/JPH084165B2/ja
Priority claimed from JP62195185A external-priority patent/JP2583518B2/ja
Priority claimed from JP22522087A external-priority patent/JPS6469079A/ja
Priority claimed from JP22521987A external-priority patent/JP2566586B2/ja
Priority claimed from JP62225211A external-priority patent/JP2566585B2/ja
Priority claimed from JP62225208A external-priority patent/JPS6471096A/ja
Priority claimed from JP22522187A external-priority patent/JPS6469080A/ja
Priority claimed from JP62225206A external-priority patent/JPS6469066A/ja
Priority claimed from JP22522487A external-priority patent/JPH07105536B2/ja
Priority claimed from JP62225209A external-priority patent/JP2531526B2/ja
Priority claimed from JP22521587A external-priority patent/JPS6469074A/ja
Priority claimed from JP22520587A external-priority patent/JP2566583B2/ja
Priority claimed from JP22522287A external-priority patent/JPH07105535B2/ja
Priority claimed from JP62225214A external-priority patent/JPS6469073A/ja
Priority claimed from JP22520287A external-priority patent/JPH0682876B2/ja
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of DE3856348D1 publication Critical patent/DE3856348D1/de
Publication of DE3856348T2 publication Critical patent/DE3856348T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321—Discharge generated by other radiation
    • H01J37/32339—Discharge generated by other radiation using electromagnetic radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/0315—Waveguide lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Lasers (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Plasma Technology (AREA)
DE3856348T 1987-01-26 1988-01-23 Laser Plasmavorrichtung Expired - Fee Related DE3856348T2 (de)

Applications Claiming Priority (16)

Application Number Priority Date Filing Date Title
JP62015690A JPH0673319B2 (ja) 1987-01-26 1987-01-26 プラズマ装置
JP1807187A JPH084165B2 (ja) 1987-01-28 1987-01-28 気体レ−ザ装置
JP62195185A JP2583518B2 (ja) 1987-08-06 1987-08-06 電源装置
JP22522187A JPS6469080A (en) 1987-09-10 1987-09-10 Gas laser equipment
JP62225206A JPS6469066A (en) 1987-09-10 1987-09-10 Gas laser equipment
JP22522487A JPH07105536B2 (ja) 1987-09-10 1987-09-10 気体レーザ装置
JP22522087A JPS6469079A (en) 1987-09-10 1987-09-10 Gas laser equipment
JP22521587A JPS6469074A (en) 1987-09-10 1987-09-10 Gas laser equipment
JP22521987A JP2566586B2 (ja) 1987-09-10 1987-09-10 気体レーザ装置
JP22522287A JPH07105535B2 (ja) 1987-09-10 1987-09-10 気体レーザ装置
JP62225214A JPS6469073A (en) 1987-09-10 1987-09-10 Gas laser equipment
JP22520287A JPH0682876B2 (ja) 1987-09-10 1987-09-10 気体レーザ装置
JP22520587A JP2566583B2 (ja) 1987-09-10 1987-09-10 炭酸ガスレーザ装置
JP62225209A JP2531526B2 (ja) 1987-09-10 1987-09-10 気体レ―ザ装置
JP62225208A JPS6471096A (en) 1987-09-10 1987-09-10 Plasma device
JP62225211A JP2566585B2 (ja) 1987-09-10 1987-09-10 光導波路型気体レーザ装置

Publications (2)

Publication Number Publication Date
DE3856348D1 DE3856348D1 (de) 1999-08-12
DE3856348T2 true DE3856348T2 (de) 1999-11-25

Family

ID=27585655

Family Applications (2)

Application Number Title Priority Date Filing Date
DE3855896T Expired - Fee Related DE3855896T2 (de) 1987-01-26 1988-01-23 Plasmavorrichtung
DE3856348T Expired - Fee Related DE3856348T2 (de) 1987-01-26 1988-01-23 Laser Plasmavorrichtung

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE3855896T Expired - Fee Related DE3855896T2 (de) 1987-01-26 1988-01-23 Plasmavorrichtung

Country Status (3)

Country Link
EP (2) EP0674471B1 (de)
KR (1) KR910002239B1 (de)
DE (2) DE3855896T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8817308D0 (en) * 1988-07-20 1988-08-24 British Aerospace Gas laser
DE3912568A1 (de) * 1989-04-17 1990-10-18 Siemens Ag Gas-laser, insbesondere co(pfeil abwaerts)2(pfeil abwaerts)-laser
GB2234655A (en) * 1989-07-07 1991-02-06 Charles * Carter Arthur Heating by gas ionization
US5048048A (en) * 1989-08-11 1991-09-10 Mitsubishi Denki K.K. Gas laser device
DE3933619C2 (de) * 1989-10-07 1993-12-23 Fraunhofer Ges Forschung Vorrichtungen zur elektrischen Anregung eines Gases mit Mikrowellenenergie
DE4008195A1 (de) * 1990-03-15 1991-09-26 Fraunhofer Ges Forschung Vorrichtung zur anregung des gases einer gasentladungsstrecke mit mikrowellenenergie
US5280252A (en) * 1991-05-21 1994-01-18 Kabushiki Kaisha Kobe Seiko Sho Charged particle accelerator
DE4123470A1 (de) * 1991-07-16 1993-01-21 Suessmuth Norbert Kompakter gas-laser mit mikrowellen-anregung
US5606571A (en) * 1994-03-23 1997-02-25 Matsushita Electric Industrial Co., Ltd. Microwave powered gas laser apparatus
EP1026796B1 (de) * 1999-02-01 2005-11-16 Tadahiro Ohmi Laservorrichtung, Belichtungsapparat unter Verwendung derselben und Herstellungsverfahren
JP4303350B2 (ja) 1999-03-26 2009-07-29 忠弘 大見 レーザ発振装置、露光装置及びデバイスの製造方法
KR20110088658A (ko) * 2010-01-29 2011-08-04 (주)에스피에스 전자파를 이용한 플라즈마 발생장치 및 이를 위한 도파관
CN112996209B (zh) * 2021-05-07 2021-08-10 四川大学 一种微波激发常压等离子体射流的结构和阵列结构

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169251A (en) 1978-01-16 1979-09-25 Hughes Aircraft Company Waveguide gas laser with high frequency transverse discharge excitation
US4263534A (en) * 1980-01-08 1981-04-21 International Business Machines Corporation Single sided sustain voltage generator
JPH06105597B2 (ja) * 1982-08-30 1994-12-21 株式会社日立製作所 マイクロ波プラズマ源
ZA841218B (en) * 1983-03-08 1984-09-26 Allied Corp Plasma excitation system

Also Published As

Publication number Publication date
DE3855896T2 (de) 1998-01-02
EP0674471B1 (de) 1999-07-07
KR910002239B1 (ko) 1991-04-08
DE3855896D1 (de) 1997-06-12
EP0280044B1 (de) 1997-05-07
EP0280044A3 (de) 1991-10-23
EP0674471A1 (de) 1995-09-27
KR880009461A (ko) 1988-09-15
EP0280044A2 (de) 1988-08-31
DE3856348D1 (de) 1999-08-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee