EP0423370A1 - Procede de traitement au plasma et au plasmatron - Google Patents

Procede de traitement au plasma et au plasmatron Download PDF

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Publication number
EP0423370A1
EP0423370A1 EP90906434A EP90906434A EP0423370A1 EP 0423370 A1 EP0423370 A1 EP 0423370A1 EP 90906434 A EP90906434 A EP 90906434A EP 90906434 A EP90906434 A EP 90906434A EP 0423370 A1 EP0423370 A1 EP 0423370A1
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EP
European Patent Office
Prior art keywords
plasma jet
plasma
spray material
gas
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP90906434A
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German (de)
English (en)
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EP0423370A4 (en
Inventor
Sergei Alexandrovich Ermakov
Mikhail Valentinovich Karasev
Valery Stepanovich Klubnikin
Viktor Mikhailovich Maslennikov
Nikolai Alexeevich Sosnin
Pavel Abramovich Topolyansky
Sergei Jurievich Fedorov
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Leningradsky Politekhnichesky Institut
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Leningradsky Politekhnichesky Institut
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Publication date
Application filed by Leningradsky Politekhnichesky Institut filed Critical Leningradsky Politekhnichesky Institut
Publication of EP0423370A1 publication Critical patent/EP0423370A1/fr
Publication of EP0423370A4 publication Critical patent/EP0423370A4/de
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134—Plasma spraying

Definitions

  • the invention relates to plasma technology and relates in particular to methods for plasma processing and plasma patrons and can be used for spraying coatings, for spheridizing powder particles, for welding powders, preferably high-melting, and for plasma-chemical treatment of products.
  • a method for plasma spraying coatings (FR, B, 2026006) by forming a plasma jet and introducing the spray powder into the plasma jet using a transport gas via a cylindrical channel is known.
  • a plasmatron performing the said process is conventional, i.e. it contains a cathode and an anode in the form of a nozzle, the cylindrical channel being designed for the introduction of the wettable powder into the plasma jet in the anode (FR, B, 2026006).
  • a disadvantage of the method and of the plasma cartridge performing the method is that the cross section of the plasma jet is filled unevenly with the wettable powder. This leads to an undesirable phenomenon, such as uneven melting and acceleration of the powder in the plasma, which in turn results in low reproducibility of the properties of the sprayed coatings.
  • This disadvantage does not apply to a method for plasma processing (SU, A, 656669), in which a plasma jet is formed which is laminar or turbulent in accordance with the respective technological requirements, in which the spray material is co-injected via an annular gap which comprises the plasma jet introduces the transport gas and, after the union of the plasma flows and the spray material has taken place, introduces a focusing gas into the inhomogeneous plasma flow and focuses the plasma jet with the spray material.
  • the spray material with the transport gas and the focusing gas are fed vertically or at an angle to the direction of flow of the plasma jet.
  • a plasmatron for carrying out this method contains a cathode and a nozzle anode, behind which two or more nozzles are arranged coaxially with the anode in the direction of the flow of the plasma jet (SU, A, 656669).
  • the mutually facing surfaces of the adjacent nozzles run perpendicular to the plastmatron axis or at the same angles to this axis.
  • the annular gap between the anode and the first nozzle following it serves to introduce the spray material with the transport gas into the plasma jet, and the annular gap between the adjacent nozzles, which are arranged behind the anode, serve to introduce the focusing gas.
  • the annular gap for the supply of the spray material and the annular gap for the supply of the focusing gas are thus parallel to one another, more precisely, they form an equal angle with the plasmatron axis.
  • the spray material is focused at the moment when it has already been combined with the plasma jet, ie when the spray material has already been accelerated in the plasma jet and has reached a high speed.
  • a significant gas-dynamic influencing of the plasma jet on the part of the focusing gas is required.
  • the throughput of this gas must be large enough and corresponding to the plasma gas throughput.
  • the plasma beam power must be increased.
  • the increase in the plasma matron power results in an increase in the energy expenditure in the technological process (power consumption per machining unit, for example per unit area of the workpiece to be machined when applying a plasma or a plasma chemical coating).
  • the invention has for its object to develop a method for plasma processing and a plasmatron, which the introduction of the focusing gas for focusing the spray material practically without cooling the plasma jet, i.e. enable without affecting the thermogas dynamic parameters of the plasma jet, which gives the opportunity to achieve a high quality of plasma processing without increasing the Plasmatron performance.
  • This object is achieved according to the invention in a method for plasma processing by forming a plasma jet, introducing a spray material with a transport gas into this plasma jet via an annular gap which comprises the plasma jet, and focusing the spray material in the plasma jet using a focusing gas in that the focusing gas is in the area of the union of the plasma jet with the transport gas flow with the spray material is introduced.
  • the spray material flow has not yet reached a significant speed which it will achieve as a result of its interaction with the plasma jet. For this reason, a much less gas-dynamic influencing of the plasma jet on the part of the focusing gas is required for focusing the spray material, ie for changing its speed vector in this area. Accordingly, a lower throughput of this gas is required for this purpose than in the case of focusing the spray material further back in the flow direction of the plasma jet, as is provided in the Plasmatron according to SU, A, 656669.
  • the focusing gas supplied with a low throughput has no significant effect on the thermogas dynamic parameters of the plasma jet. The method according to the invention thus makes it possible to achieve a higher quality of the plasma processing at a given plasma beam power.
  • the average velocity V2 of the transport gas and the average velocity V3 of the focusing gas in the area of the introduction of the spray material into the plasma jet are determined by the following relationships:
  • the task is for a plasmatron with - coaxially arranged one behind the other - an exit ring electrode and two nozzles, with an annular gap between the exit electrode and the first of the two nozzles, which forms the feed channel for the spray material, and between the first and the second nozzle there is an annular gap, which represents the supply channel for the focusing gas, according to the invention in that the surface of the first nozzle which faces the outlet electrode and the surface of the first nozzle which faces the second nozzle are inclined relative to one another at an angle, the tip of which is cylindrical Region lies between the outlet opening of the outlet electrode and the inlet opening of the second nozzle, the diameter of this cylindrical region being equal to the diameter of the inlet opening of the second nozzle.
  • the facing surfaces of the exit electrode and the first nozzle form a cone angle of 40 ° to 80 ° and that the conical surface of the exit electrode is encompassed by the conical surface of the first nozzle. This ensures the best possible focus of the spray material.
  • 1a, 1b and 1c possible variants of the transport gas and the focusing gas supply according to the inventive method 2 shows the dependencies of the ratio of the dynamic pressures of the plasma jet and the transport gas in the area of the introduction of the spray material into the plasma jet on the introduction angle of the spray material
  • 3 shows the dependencies of the ratio of the dynamic pressures of the plasma jet and the focusing gas in the area of the introduction of the spray material into the plasma jet on the introduction angle of the spray material
  • 4 shows the plasmatron according to the invention, in which the jet forming nozzle is triangular in longitudinal section
  • 5 shows the outlet part of the plasma cartridge according to the invention, in which the jet formation nozzle is trapezoidal in longitudinal section.
  • the plasma processing method according to the invention is carried out as follows.
  • Plasma gas is introduced into the plasmatron and an electric arc is ignited.
  • an inhomogeneous plasma jet is formed at the plasmatron outlet.
  • a transport gas with a spray material for example spray powder, is supplied via the annular gap that surrounds the plasma jet.
  • the focusing gas is introduced in the area where the plasma jet with the transport gas flow that carries the wettable powder united.
  • the said area of the union represents an annular area which is located in the peripheral region of the plasma jet.
  • the focusing gas can be introduced into this area both via an annular gap which surrounds the plasma beam and also via individual channels, the outlet openings of which are arranged around the beam.
  • the focusing gas can be introduced both at an angle to the plasma beam and perpendicular to this beam.
  • the transport gas can also be introduced both at an angle and perpendicular to the beam in the case of the turbulent flow of the plasma jet, and in the case of laminar flow of the plasma jet, the introduction of the transport gas perpendicular to the plasma jet is inconvenient, as will be shown below. In all cases, however, the focusing gas must be introduced into the area where the plasma jet is combined with the gas carrying the spray powder.
  • Fig.1a, 1b and 1c The possible variants for the supply of the transport and the focusing gas are shown in Fig.1a, 1b and 1c, where the plasma jet with position 1, the transport gas flow with the wettable powder with position 2, the focusing gas flow with position 3 and the powder particles (Spray material particles) are designated with position 4.
  • the direction of flow of the plasma jet and the transport and focusing gas flows are indicated by corresponding arrows.
  • vapors consisting of a chemically active substance in a vapor-gas mixture represent the spray material. If a gas acts as an active substance, it fulfills both functions, i.e. it acts as a transport gas and as a spray material. In all cases of plasma processing except the last one, the transport gas and the focusing gas can have the same composition.
  • the focusing gas 3 forces the powder 4 out of the edge area of the plasma jet into the area of the jet near the axis and forms an inhomogeneous flow 5 in the direction of the plasma jet 1 that strikes the workpiece surface. Since the velocity of the particles of the powder 4, which is introduced by means of the transport gas, is still relatively low in the area of union of the plasma jet 1 with the transport gas flow 2, there is still no significant gas-dynamic influence on the part of the focusing gas to push the powder 4 towards the axis of the plasma jet 1 3 required and the throughput of this gas 3 can be selected to be small, so that the thermogas dynamic parameters of the plasma jet 1 change only insignificantly.
  • the non-cooling of the plasma jet 1, which is achieved in this case, requires a complete and uniform melting of the particles of the powder 4 and a uniform acceleration of these particles, thereby making it possible to achieve qualitative coatings and to increase the spraying efficiency with a relatively low plasma jet power.
  • the angle ⁇ of the divergence of the movement paths of the particles of the powder 4 during the further movement of the powder is relatively small.
  • the size of this angle ⁇ depends on the angle ⁇ at which the powder 4 is introduced into the plasma jet 1 and on the operating parameters of the process of plasma processing, namely on the dynamic pressures in the region of the introduction of the powder 4 of the plasma jet 1, the transport gas 2 and the focusing gas 3. It has been determined experimentally that for every angle ⁇ of the introduction of the powder, with optimally selected operating parameters, there is a certain minimum angle ⁇ of the divergence of the movement paths of the powder after focusing.
  • the characteristic curves 14 show the limit values of the ratios ⁇ 1V 2nd 1 / ⁇ 2V 2nd 2nd for the turbulent flow of the plasma jet, and the characteristic curves 15 the limit values of this ratio for the laminar flow of the plasma jet.
  • the limit values of the said parameter are understood to mean values of this ratio within which the minimum angle ⁇ of the divergence of the path of movement of the powder particles in the plasma jet is ensured after focusing.
  • the characteristic curves 14 and 15 represent parabolas.
  • the proportionality factors of the parabolas are 1.2x10 -2 (upper parabola) and 1.8x10 -2 (lower parabola).
  • the proportionality factor of the upper parabola is 15-55 and for the lower parabola 15-83.
  • the angle ⁇ cannot be equal to 90 ° in the case of laminar flow of the plasma jet, since in this case the dynamic pressure or the speed of the transport gas strive indefinitely.
  • the ratio is ⁇ 1V 2nd 1 / ⁇ 3V 2nd 3rd independent of the angle ⁇ and depends only on the flow of the plasma jet.
  • the characteristic curves 16 provide the limit values for the said ratio of the dynamic pressures of the plasma jet and the focusing gas in the region of the introduction of the powder into the plasma jet. These lines are determined by the proportionality factors 0.91 (top line 16) and 1.43 (bottom line 16).
  • the limit values of the ratios of the dynamic pressures of the plasma jet and the focusing gas in the region of the introduction of the powder in the case of laminar flow of the plasma jet are represented by characteristic curves 17 with a proportionality factor of 0.03 (upper characteristic curve 17) and 0.1 (lower characteristic curve 17).
  • the minimum angle ⁇ of the divergence of the path of movement of the powder particles after focusing is chosen when the speed V3 of the focusing gas is selected in the region of the powder introduction according to the relationship guaranteed.
  • the choice of the operating parameters ⁇ 1V 2nd 1 / ⁇ 2V 2nd 2nd and ⁇ 1V 2nd 1 / ⁇ 3V 2nd 3rd of the plasma processing process is determined by the angle ⁇ when introducing the powder into the plasma jet and the type of flow of this plasma jet.
  • the minimum angle ⁇ of the divergence of the movement paths of the powder in the plasma jet is achieved at an angle ⁇ for the introduction of the powder which is within the limits of 20 ° to 40 °.
  • the angle ⁇ is 2 ° to 3 °. If the angle ⁇ is outside the specified limits, the angle ⁇ increases and reaches values from 12 ° to 13 °.
  • the degree of focus of the powder can thus be changed by changing the angle at which the powder is introduced into the plasma jet. This is very important in the practical implementation of plasma processing due to the diversity of the shape and the dimensions of the surfaces of the workpieces to be processed.
  • the plasmatron according to the invention contains - arranged coaxially - a cathode 18 (FIG. 4), an inlet nozzle 19, electrode spacers 20, a nozzle anode 21, which functions as an outlet electrode, a jet formation nozzle 22 and an outlet nozzle 23.
  • the facing surfaces of the anode 21 and the Beam formation nozzle 22 represent cones with a cone angle ⁇ in the limits of 40 ° to 80 °.
  • the cone surface of the beam formation nozzle 22 comprises the cone surface of the anode 21, ie the conical surface of the anode 21 is convex and the conical surface of the nozzle 22 is concave.
  • An annular gap 24 is formed between the conical surfaces of the anode 21 and the jet formation nozzle 22 which face one another and which represents the channel for the introduction of the spray material into the plasma jet.
  • the surfaces of the jet forming nozzle 22 and the outlet nozzle 23, which face each other, are flat and there is an annular gap 25 between them, which represents the channel for the focusing gas supply.
  • the annular gap 24 is connected, for example, to the powder metering device (not shown) and the annular gap 25 to the focusing gas source (not shown).
  • the surface 26 of the jet formation nozzle 22 facing the anode 21 is inclined by the angle ⁇ against the surface 27 of the jet formation nozzle 22 facing the exit nozzle 23.
  • the tip 28 of the angle ⁇ lies in a cylindrical region which is located between the outlet opening of the anode 21 and the inlet opening of the outlet nozzle 23. This is necessary so that the focusing gas in the area of the union of the plasma jet with the transport gas flow that carries the spray material is introduced.
  • the anode 21 and the outlet nozzle 23 have the same inside diameter, which is preferable when applying coatings made of high-melting powder materials (aluminum oxide, zirconium oxide and the like) and when processing surfaces with plasma chemistry is.
  • the diameter of said cylindrical region where the tip 28 of the angle ⁇ is equal to the inside diameter of the anode 21 and the outlet nozzle 23.
  • the inside diameter of the outlet nozzle 23 is larger than the inside diameter of the anode 21, the The diameter of this cylindrical region must be the same as the inside diameter of the outlet nozzle 23, ie the diameter of its inlet bore. This is due to the fact that the inside diameter of the outlet nozzle 23 determines the transverse dimension of the plasma jet in the region of the introduction of the spray material into the plasma jet.
  • the variant of the design with different inner diameters of the anode and the outlet nozzle can be advantageous when applying coatings made of low-melting powder materials (tin, zinc and the like).
  • FIG. 5 shows the outlet part of a plasma cartridge according to the invention, where the jet formation nozzle 22 has a different shape. If the surfaces 26 and 27 of the nozzle 22 intersect in the plasmatron shown in FIG. 4 in such a way that the apex of the angle ⁇ is at the boundary of said cylindrical region, the nozzle 22 in the plasmatron according to FIG. 5 has a cylindrical inner surface 29 on and their surfaces 26 and 27 do not intersect. Only the continuations of these areas intersect. In this case, the tip 28 of the angle ⁇ is within a cylindrical region which is delimited by the outlet opening of the anode 21 and the inlet opening of the nozzle. In other words, in the construction according to FIG. 4, the jet formation nozzle 22 has a triangular longitudinal section and in the construction according to FIG. 5 it has a trapezoidal longitudinal section.
  • the height of the cylindrical inner surface 29 of the jet formation nozzle 22 is determined by the plasmatron operating condition.
  • the diameter of the outlet opening of the anode 21 is dimensioned small (4 to 8 mm), and in order to ensure that the tip 28 of the angle ⁇ is in the cylindrical region determined above, the height of the surface 29 the nozzle 22 should also be very small or zero, which corresponds to FIG.
  • an increase in the inner diameter of the anode 21 (7 to 20 mm) is advantageous. In this case, the height of the cylindrical inner surface 29 of the nozzle 22 can be increased.
  • annular gap 25 for the focusing gas supply can lie at an angle to the plasmatron axis; the mutual position of columns 24 and 25 is analogous to the representation in FIG. 1c.
  • the plasmatron works as follows. After the ignition of the electric arc between cathode 18 (FIG. 4) and anode 21 and the formation of an inhomogeneous plasma jet at the anode outlet, the focusing gas is supplied via the annular gap 25 and the transport gas via the annular gap 24 with the spray material, for example with a spray powder.
  • the direction of the introduction of the plasma gas, the transport gas and the focusing gas is indicated in FIG. 4 by corresponding arrows.
  • the powder is introduced and the powder is focused in the region of the plasma jet near the axis at the same time.
  • the powder is focused at the moment of its union with the plasma jet, i.e. if the powder from
  • Plasma jet has not yet been accelerated. This is to change the direction of movement of the powder, ie to focus this powder in the region of the plasma jet near the axis no significant interference from the focusing gas required. For this reason, the throughput of this gas is small, which prevents the plasma jet from cooling.
  • the powder is focused in the plasma beam with minimal influence on this beam. This makes it possible to achieve high-quality coatings and a high spraying efficiency with a relatively low plasmatron output, which in turn ensures an increase in the number of operating hours of the plasmatron and prevents the workpieces from overheating.
  • a coating was sprayed with titanium oxide powder (Metco 102) using a plasma cartridge with the following design and operational parameters:
  • a corundum powder was injected with the aid of a plasmatron with the design parameters listed in Example 1 and with the following operational parameters:
  • the spraying efficiency was 82%, the spraying rate 3 kg / h.
  • the specific energy consumption of the spraying process was 5 kW.h / kg
  • the power required to achieve the specified values is 70 kW to 100 kW at Spraying corundum in air-natural gas plasma, 32 kW to 35 kW in argon-hydrogen plasma and 50 kW in nitrogen plasma using the spraying system from METCO.
  • the sprayed coatings have the following characteristic values: adhesive strength 10 MPa to 30 MPa, porosity 2% to 5%.
  • the invention can be used for spraying coatings, for spheridizing particles, for surfacing powders, preferably high-melting, and for plasma-chemical processing of products.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Coating By Spraying Or Casting (AREA)

Abstract

Un procédé de traitement au plasma prévoit la focalisation d'un agent de traitement, alimentée par une ouverture annulaire, afin de former un jet de plasma, les gaz de focalisation étant dirigés vers le point de confluence du jet avec le gaz de transport de l'élément à traiter. Deux buses (22, 23) sont montées dans un plasmatron en aval de l'électrode de sortie (21). On prévoit entre l'électrode de sortie (21) et la première buse (22) une ouverture annulaire (24) pour l'alimentation d'un élément de traitement; entre les buses (22, 23) on prévoit une ouverture annulaire (25) pour l'alimentation d'un gaz de focalisation. Les surfaces (26, 27) de la première buse (22) qui sont tournées, respectivement, vers l'électrode (21) et la deuxième buse (23) sont orientées sous un angle delta, dont le sommet (28) est situé entre l'ouverture de sortie de l'électrode (21) et l'ouverture d'entrée de la deuxième buse (23).
EP19900906434 1989-03-31 1990-01-15 Method of treatment with plasma and plasmatron Withdrawn EP0423370A4 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
SU4680291 1989-03-31
SU4680291 1989-03-31
SU4698232 1989-04-18
SU4698232 1989-04-18

Publications (2)

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EP0423370A1 true EP0423370A1 (fr) 1991-04-24
EP0423370A4 EP0423370A4 (en) 1991-11-21

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EP19900906434 Withdrawn EP0423370A4 (en) 1989-03-31 1990-01-15 Method of treatment with plasma and plasmatron

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EP (1) EP0423370A4 (fr)
JP (1) JPH03505104A (fr)
AU (1) AU5449190A (fr)
BR (1) BR9006280A (fr)
FI (1) FI905886A0 (fr)
WO (1) WO1990012123A1 (fr)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996029443A1 (fr) * 1995-03-17 1996-09-26 Hoechst Aktiengesellschaft Procede d'application thermique de fines couches de ceramique et dispositif associe
EP1096176A1 (fr) * 1999-10-29 2001-05-02 Inventio Ag Système d'entraínement de câble pour entraíner des câbles en fibres synthétiques
WO2001032949A1 (fr) * 1999-10-30 2001-05-10 Agrodyn Hochspannungstechnik Gmbh Procede et dispositif servant au revetement par plasma de surfaces
WO2003102397A1 (fr) * 2002-05-30 2003-12-11 Massachusetts Institute Of Technology Convertisseur a combustible plasmatron a faible consommation presentant des decharges volumiques accrues
US7381382B2 (en) 2004-03-29 2008-06-03 Massachusetts Institute Of Technology Wide dynamic range multistage plasmatron reformer system
US7407634B2 (en) 2003-04-11 2008-08-05 Massachusetts Institute Of Technology Plasmatron fuel converter having decoupled air flow control
EP2465965B1 (fr) * 2010-12-15 2014-06-04 LEONI Bordnetz-Systeme GmbH Dispositif et procédé de vaporisation d'une structure en matériau conducteur sur un substrat
CN110997968A (zh) * 2017-09-28 2020-04-10 三菱重工业株式会社 喷镀喷嘴以及等离子体喷镀装置

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US5043548A (en) * 1989-02-08 1991-08-27 General Electric Company Axial flow laser plasma spraying
US5518178A (en) * 1994-03-02 1996-05-21 Sermatech International Inc. Thermal spray nozzle method for producing rough thermal spray coatings and coatings produced
US5858469A (en) * 1995-11-30 1999-01-12 Sermatech International, Inc. Method and apparatus for applying coatings using a nozzle assembly having passageways of differing diameter
SE523135C2 (sv) * 2002-09-17 2004-03-30 Smatri Ab Plasmasprutningsanordning
RU2474983C1 (ru) * 2011-07-07 2013-02-10 Федеральное государственное бюджетное учреждение науки Институт теоретической и прикладной механики им. С.А. Христиановича Сибирского отделения Российской академии наук (ИТПМ СО РАН) Узел кольцевого ввода порошкового материала электродугового плазмотрона
CN115505864B (zh) * 2022-08-08 2023-12-29 中国人民解放军陆军装甲兵学院 一种小尺寸轴向送粉内孔等离子喷涂枪

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JPS5638799A (en) * 1979-09-04 1981-04-14 Daido Steel Co Ltd Plasma torch
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EP0202077A1 (fr) * 1985-05-13 1986-11-20 Onoda Cement Company, Ltd. Procédé pour le dépôt de plasma à l'aide d'un dispositif du type pistolet pulvérisateur simple et appareil à cet effet
EP0250308A1 (fr) * 1986-06-17 1987-12-23 Societe Nouvelle De Metallisation Industries Snmi Torche de rechargement à plasma

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Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996029443A1 (fr) * 1995-03-17 1996-09-26 Hoechst Aktiengesellschaft Procede d'application thermique de fines couches de ceramique et dispositif associe
EP1096176A1 (fr) * 1999-10-29 2001-05-02 Inventio Ag Système d'entraínement de câble pour entraíner des câbles en fibres synthétiques
US6371448B1 (en) 1999-10-29 2002-04-16 Inventio Ag Rope drive element for driving synthetic fiber ropes
WO2001032949A1 (fr) * 1999-10-30 2001-05-10 Agrodyn Hochspannungstechnik Gmbh Procede et dispositif servant au revetement par plasma de surfaces
US6800336B1 (en) 1999-10-30 2004-10-05 Foernsel Peter Method and device for plasma coating surfaces
WO2003102397A1 (fr) * 2002-05-30 2003-12-11 Massachusetts Institute Of Technology Convertisseur a combustible plasmatron a faible consommation presentant des decharges volumiques accrues
US6881386B2 (en) 2002-05-30 2005-04-19 Massachusetts Institute Of Technology Low current plasmatron fuel converter having enlarged volume discharges
US7597860B2 (en) 2002-05-30 2009-10-06 Massachusetts Institute Of Technology Low current plasmatron fuel converter having enlarged volume discharges
US7407634B2 (en) 2003-04-11 2008-08-05 Massachusetts Institute Of Technology Plasmatron fuel converter having decoupled air flow control
US7381382B2 (en) 2004-03-29 2008-06-03 Massachusetts Institute Of Technology Wide dynamic range multistage plasmatron reformer system
EP2465965B1 (fr) * 2010-12-15 2014-06-04 LEONI Bordnetz-Systeme GmbH Dispositif et procédé de vaporisation d'une structure en matériau conducteur sur un substrat
CN110997968A (zh) * 2017-09-28 2020-04-10 三菱重工业株式会社 喷镀喷嘴以及等离子体喷镀装置

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JPH03505104A (ja) 1991-11-07
FI905886A0 (fi) 1990-11-29
BR9006280A (pt) 1991-08-06
WO1990012123A1 (fr) 1990-10-18
EP0423370A4 (en) 1991-11-21
AU5449190A (en) 1990-11-05

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