EP0397952B1 - Verfahren und Vorrichtung zum kontinuierlichen Ätzen und Beschichten von rostfreien Stahlbändern mit Aluminium - Google Patents

Verfahren und Vorrichtung zum kontinuierlichen Ätzen und Beschichten von rostfreien Stahlbändern mit Aluminium Download PDF

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Publication number
EP0397952B1
EP0397952B1 EP89810362A EP89810362A EP0397952B1 EP 0397952 B1 EP0397952 B1 EP 0397952B1 EP 89810362 A EP89810362 A EP 89810362A EP 89810362 A EP89810362 A EP 89810362A EP 0397952 B1 EP0397952 B1 EP 0397952B1
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EP
European Patent Office
Prior art keywords
strip
enclosure
bath
aluminum
argon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP89810362A
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English (en)
French (fr)
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EP0397952A1 (de
Inventor
Bogdan Zega
Peter Boswell
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Nippon Steel Nisshin Co Ltd
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Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nisshin Steel Co Ltd filed Critical Nisshin Steel Co Ltd
Priority to DE68917588T priority Critical patent/DE68917588T2/de
Priority to EP89810362A priority patent/EP0397952B1/de
Priority to CA002016893A priority patent/CA2016893C/en
Priority to JP2127039A priority patent/JP2825931B2/ja
Publication of EP0397952A1 publication Critical patent/EP0397952A1/de
Priority to US07/842,763 priority patent/US5262033A/en
Application granted granted Critical
Publication of EP0397952B1 publication Critical patent/EP0397952B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/003—Apparatus
    • C23C2/0038—Apparatus characterised by the pre-treatment chambers located immediately upstream of the bath or occurring locally before the dipping process
    • C23C2/004—Snouts
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/003—Apparatus
    • C23C2/0034—Details related to elements immersed in bath
    • C23C2/00342—Moving elements, e.g. pumps or mixers
    • C23C2/00344—Means for moving substrates, e.g. immersed rollers or immersed bearings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/003—Apparatus
    • C23C2/0035—Means for continuously moving substrate through, into or out of the bath
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/003—Apparatus
    • C23C2/0038—Apparatus characterised by the pre-treatment chambers located immediately upstream of the bath or occurring locally before the dipping process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C23C2/022—Pretreatment of the material to be coated, e.g. for coating on selected surface areas by heating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C23C2/024—Pretreatment of the material to be coated, e.g. for coating on selected surface areas by cleaning or etching

Definitions

  • the present invention relates to a method for continuously hot dip coating a stainless steel strip with aluminum, comprising the steps of alternatively submitting each side of said strip to an ion magnetically-enhanced sputtering process for cleaning said strip; dipping said cleaned strip into a molten aluminum bath to deposit a coating layer on each side of said strip; and cooling said coated strip.
  • It also relates to an apparatus for continuously dip coating both sides of a stainless steel strip with aluminum having a plurality of reciprocally acting magnetically-enhanced sputtering and heating devices alternatively placed on both sides of said strip, said devices comprising i) a magnet element on one side of the strip and, in registration therewith, ii) a counter-electrode on the other side of the strip, and iii) means to apply a positive voltage thereto relative to the strip to generate a low pressure argon plasma discharge which will be concentrated by the magnetic field of the magnet element to at least one confinement zone between the strip and said counter-electrode.
  • DDR-120.474 discloses an installation for the precleaning by sputtering before plating under vacuum of a stainless strip.
  • the precleaning unit can be integral with or separated from the plating unit itself.
  • the precleaning unit comprises a plurality of magnetron elements arranged consecutively along the defilading strip (see the drawing).
  • the strip is narrowly confined in the discharge region of the magnetrons by means of rolls (7) which prevent it from touching the pole-pieces of the magnet or the anode on the other side of the strip.
  • the strip is grounded as well as the remainder of the apparatus; only the anode is insulated and held at positive voltage relative to the strip. Seventy % of the energy fed to the magnetrons is used up to heat the strip.
  • the document does not specify how the sputter-cleaned strip is vacuum-plated afterwards.
  • GB-A-926.619 discloses a process consisting of pretreating the steel strip by passing it into a chamber having a hydrogen atmosphere in which the strip is heated to a temperature of 540° to 650°C at which the hydrogen is effective to reduce surface oxides. Afterwards the strip if heated further and then enters the bath of molten aluminum.
  • EP-A-134.143 relates to a continuous cleaning and hot dip coating process according to which a steel sheet is preheated and introduced into a reducing furnace in which a hydrogen atmosphere is maintained, so that the oxidation layer on the surface to be coated is reduced while the steel sheet is annealed. The annealed steel sheet is then fed to a cooling furnace in which the temperature of the steel is adjusted optionally for the hot dipping.
  • the steel sheets processed according to these two last documents are not stainless steel sheets so that no chromium oxides have to be reduced.
  • the chromium oxides are particularly difficult to reduce and request temperatures substantially higher than the melting point of the aluminum bath so that the reduced sheet has to be cooled before to be dipped into the molten bath of aluminum.
  • the cooling step there is a risk that the cleaned sheet be reoxidised.
  • these processes are costly since a lot of energy has to be spent to heat the sheet well over the desired pre-heating temperature for carrying out the hot dipping process.
  • the present invention proposes, as summarized in claim 1, to alternately submit each side of a strip to be hot dip coated to low argon pressure plasmatron discharges for cleaning said strip, and simultaneously heating it to the desired temperature for dip-coating.
  • Fig. 1 is a schematic view of an apparatus for carrying out the process according to the invention, but this apparatus as such does not illustrate the apparatus of the invention.
  • Fig. 2 is an enlarged schematic view of an etching magnetron device used in the apparatus of Fig. 1.
  • Fig. 3 is a schematic view of another embodiment of the apparatus for carrying out the process according to the invention and also illustrates the apparatus of the invention.
  • the apparatus represented on Fig. 1 comprises an enclosure consisting of four successive tubular compartments 1a - 1d connected to each other by reduced diameter apertures and terminated by a snout 2 which penetrates into a bath 3 of molten aluminum 4.
  • a continuous stainless strip 5 is circulated within the installation starting from a feed-spool 6 up to a take-up spool 7 at the end of the line.
  • the strip is guided by main rollers 8, 9, 10 and 11, and by seal-roll chambers 12a to 12e which also provide gas pressure isolation between compartments and from the outside. Seal-roll chambers are detailed in document EP-A-176 109 incorporated by reference.
  • the components 1a to 1d of the present installation are provided with input ducts 13a to 13d, respectively, and output ducts 14a to 14d, respectively.
  • the output ducts are used in connection with one or more suitable pumps to establish a reduced pressure within the enclosure.
  • the input ducts are used to introduce a gas at low pressure to sustain the plasmatron discharges in the compartments; this gas is usually argon.
  • the seal-roll chambers 12b, 12c and 12d can be omitted, whereby only one input duct, for instance 13d, and only one output duct, for instance 14a, are still necessary to maintain the full enclosure under the required low pressure of argon and all the other input and output ducts can be suppressed as well as the reduced diameter section between the compartments; in this case, the overall shape of the enclosure along its length remains approximately constant.
  • Each compartment of the present enclosure 1 contains a plasmatron device 24 (individual plasmatron are given the reference numbers 24a to 24d) which is represented on an enlarged scale in fig. 2.
  • a plasmatron device of the kind used in the present embodiment comprises a magnet frame 15 carrying three magnets, respectively 161, 162 and 163 arranged in order of alternating polarity, so that the magnetic field created by said magnets is closed in a confinement space between the magnets and an anode 18, as represented by reference 17 on the drawing.
  • the magnets are placed very close to the path of the circulating strip 5 so that the strip will circulate within the confinement space 17 while being prevented from rubbing against the magnets by means of rolls 19 made of a non-magnetic material, for instance bronze or austenitic steel.
  • the anode 18 is connected to a positive terminal of an electric generator (not shown) by a lead passing through an insulator 20 (for instance of steatite).
  • the strip When the strip is at ground potential (as is the enclosure as shown in the drawing) and the cathode 18 is at a positive voltage of a few hundred volts, for argon pressures of a few microbars, a luminescent discharge is generated in the confinement zone 17, as shown by the darkened area in fig. 2. Therefore the strip which passes through the luminescent discharge in zone 17 is etched by the impact of the gaseous ions formed in this region.
  • Reference 22 designates cooling passages through which coolant fluids can be passed in case refrigeration is needed.
  • the several successive magnetron devices housed within successive compartments 1a to 1d are identical with that represented in fig. 2, however they are arranged in successive alternate head-to-foot orientation, so that both sides of the strip can be etched as the strip 5 progresses along its path in the enclosure.
  • the strip 5 moves along its path in the enclosure 1 and each portion thereof passes successively in the discharge zones 17 of each successive plasmatron device 24a to 24d.
  • the number of compartments with respective plasmatron can be more than 4, for instance 6, 8 or more.
  • the etched strip is guided through seal-roll chamber 12e and snout 2 into the bath of molten aluminum 4, whereby it becomes coated with a film of aluminum.
  • the coating weight (thickness) is controlled by means of a conventional wiping apparatus W or an equivalent, after which the aluminium solidifies by cooling. Then the plated strip is stored over take-up spool 7.
  • the energy developped in the plasmatron discharge is sufficient to heat up the strip to the desired temperature before it enters the molten aluminum bath.
  • Fig. 3 represents schematically another apparatus for the continuous etching and subsequent immediate plating of a stainless strip.
  • This apparatus consists of a double-sided enclosure 31, made for instance of high grade steel, one side being for the entrance of unplated strip and the other side for the removal of the plated strip.
  • the entrance side comprises a succession of reduced size openings 32a to 32d of very narrow diameter to provide a pressure tight passage to a strip 33 supplied by a spool 34 which circulates vertically in the enclosure 31.
  • the clearance between the strip and the edges in the passages 32a to 32d should be in the order of a few tens of ⁇ m (e.g. 30-100 ⁇ m) to be sealingly effective.
  • the entrance side of the enclosure comprises a series of magnetron devices 34a to 34d each of which corresponds to that illustrated in fig. 2 and comprising a magnet unit 35a to 35d and an anode (38a to 38d).
  • the magnet units and the corresponding anodes are in registration with the moving strip 33 exactly as disclosed in the previous embodiment so that the strip becomes etched on both sides as it progressively passes through the discharge zones generated between the strip surface (at cathode potential) and the respective anodes.
  • the strip leaves the last magnetron element (35d, 38d) it passes over a turning roller 39 which is partly immersed in a molten aluminum bath 40, this bath being replenished as necessary with molten metal by syphoning means 41 represented schematically by a reservoir 42 of molten aluminum and a bent tube 43, the molten metal of reservoir 42 being raised to the level of the bath 40 by the atmospheric pressure working against the reduced pressure of argon within the enclosure 31; therefore the level of molten metal of bath 40 is maintained under control.
  • the strip 5 After being plated with Al by its passage in bath 40, the coating weight being conventionally controlled by wiping (see W in the drawing) the strip 5 leaves the enclosure through gas sealed passage means 44a to 44d which are of similar construction an the aforementioned passages 32a to 32d, and is stored over a take-up spool 45.
  • the enclosure 31 is provided with a series of opening ducts referenced P1, P2, P3, P4 and Ar.
  • the P labelled ducts are for build up of progressively reduced pressure within the enclosure, i.e. they are connected to respective vacuum pumps (not represented), while duct labelled Ar is for the arrival of a plasma sustaining gas, usually argon.
  • the operation of this apparatus practically duplicates that of the previous embodiment.
  • the strip supplied by the feed spool 34 penetrates into the enclosure through the successive gas tight openings 32a to 32d; it gets etched by passing through the discharge zones in the plasmatron devices 35a - 38a to 35d - 38d; then it is plated with aluminum by passing through bath 40 and, finally, it exits from the enclosure by passages 44a to 44d and is stored over take-up spool 45.
  • the strip was a 0.5 mm thick and 1 m wide stainless strip; therefore the width of each magnetron (10 units) was in correspondence.
  • the distance between the strip and the magnet elements was set to 8 mm (see rolls 19 in fig. 1) and the discharge confinement zone between the strip and the anodes 38 (made of tantalum) was 25 mm thick 20 x 30cm (surface about 600 cm2 for each magnetron).
  • the magnets were made of samarium-cobalt alloy giving a magnetic field in the working surface.
  • the pumps connected to outputs P1 to P4 gave, respectively, 103, 10, 10 ⁇ 1 and 10 ⁇ 3 Pa (10, 10 ⁇ 1, 10 ⁇ 3, and 10 ⁇ 5 mbar) and the Argon input was adjusted to give about 3'-5 x 10 ⁇ 1 Pa (3-5 x 10 ⁇ 3 mbar) argon pressure in the discharge areas.
  • the molten aluminum was maintained at 640-680°C.
  • the strip was grounded through the enclosure and under 500-600 V DC, the discharge current was about 20-40 mA/cm2 which means an energy consumption of 2-5 kW per magnetron.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating With Molten Metal (AREA)
  • ing And Chemical Polishing (AREA)

Claims (3)

  1. Verfahren zum kontinuierlichen heissen Tauchbeschichten von rostfreiem Bandstahl mit Aluminium, umfassend die Schritte:
    kontinuierliches Zirkulieren des Bandes in einem argongespühlten Gehäuse entlang eines Weges, der sehr nahe an einer Reihe von in einer bestimmten Weise angeordneten Magnetronvorrichtungen vorbeiführt,
    abwechselndes Behandeln jeder Seite des Bandes durch eine Argonplasmatronentladung bei niedrigem Druck zum Reinigen des Bandes und gleichzeitiges Erhitzen auf die für die Tauchbeschichtung gewünschte Temperatur,
    Eintauchen des gereinigten Bandes in ein geschmolzenes Aluminiumbad, um auf jeder Seite des Bandes eine Schicht abzuscheiden, und Abkühlen des Bandes.
  2. Verfahren gemäss Anspruch 1, bei dem sich das geschmolzene Aluminiumbad im gleichen Gehäuse befindet, in dem das Band dem magnetisch verstärkten Ionensputterprozess unterworfen wird, und bei dem das Band das Gehäuse nach der Plattierung mit Aluminium verlässt, um auf einer Aufwickelspule gelagert zu werden.
  3. Vorrichtung zur kontinuierlichen beidseitigen Tauchbeschichtung von rostfreien Stahlbändern mit Aluminium mit:
    einer Vielzahl von wechselseitig wirkenden magnetisch verstärkten Sputter- und Heizvorrichtungen, die abwechselnd auf beiden Seiten des Bandes angeordnet sind, wobei die Vorrichtungen umfassen:
    (i) ein Magnetelement auf einer Seite des Bandes und, in bestimmter Weise dazu angeordnet
    (ii) eine Gegenelektrode auf der anderen Seite des Bandes und
    (iii) Vorrichtungen, um auf diese gegenüber dem Band positive Spannung zu geben, um eine Argonplasmaentladung bei niedrigem Druck herbeizuführen, die durch das magnetische Feld des Magnetelements auf wenigstens eine beschränkte Zone zwischen dem Band und der Gegenelektrode konzentriert wird und dadurch gekennzeichnet ist,
    dass sie ein verlängertes, vertikal angeordnetes Vakuumgehäuse umfasst,
    das einerseits mit einer Vakuumvorrichtung und andererseits mit einer Argonquelle zur Beschickung dieses Gehäuses mit einem ein Plasma aufrechterhaltenden Gas unter einem Druck von etwa 10⁻² -1 Pa (10⁻⁴ bis 10⁻² mbar) verbunden ist und ein Bad aus geschmolzenem Aluminium am Boden des Gehäuses angeordnet ist, das mit einer Siphonvorrichtung für die Zuführung des unter normalem Druck stehenden geschmolzenen Metalls zur kontrollierten Aufrechterhaltung des Badspiegels
    Zuführen und Zirkulieren des Bandes abwärts von einem in dem Gehäuse höhergelegenen Einlass in das Bad, im Bad um eine Umlenkvorrichtung und aufwärts zu einem in dem Gehäuse höhergelegenen Auslass,
    gasdichte Vorrichtungen an dem Einlass und Auslass des Gehäuses, wobei die Sputter- und Heizvorrichtungen entlang des abwärtslaufenden Bandes angeordnet sind.
EP89810362A 1989-05-18 1989-05-18 Verfahren und Vorrichtung zum kontinuierlichen Ätzen und Beschichten von rostfreien Stahlbändern mit Aluminium Expired - Lifetime EP0397952B1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE68917588T DE68917588T2 (de) 1989-05-18 1989-05-18 Verfahren und Vorrichtung zum kontinuierlichen Ätzen und Beschichten von rostfreien Stahlbändern mit Aluminium.
EP89810362A EP0397952B1 (de) 1989-05-18 1989-05-18 Verfahren und Vorrichtung zum kontinuierlichen Ätzen und Beschichten von rostfreien Stahlbändern mit Aluminium
CA002016893A CA2016893C (en) 1989-05-18 1990-05-16 Apparatus for the continuous etching and aluminum plating of stainless steel strips
JP2127039A JP2825931B2 (ja) 1989-05-18 1990-05-18 ステンレススチールストリップの連続エッチングおよびアルミニウム鍍金法およびその装置
US07/842,763 US5262033A (en) 1989-05-18 1992-03-02 Apparatus for the continuous etchings and aluminum plating of stainless steel strips

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP89810362A EP0397952B1 (de) 1989-05-18 1989-05-18 Verfahren und Vorrichtung zum kontinuierlichen Ätzen und Beschichten von rostfreien Stahlbändern mit Aluminium

Publications (2)

Publication Number Publication Date
EP0397952A1 EP0397952A1 (de) 1990-11-22
EP0397952B1 true EP0397952B1 (de) 1994-08-17

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EP89810362A Expired - Lifetime EP0397952B1 (de) 1989-05-18 1989-05-18 Verfahren und Vorrichtung zum kontinuierlichen Ätzen und Beschichten von rostfreien Stahlbändern mit Aluminium

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EP (1) EP0397952B1 (de)
JP (1) JP2825931B2 (de)
CA (1) CA2016893C (de)
DE (1) DE68917588T2 (de)

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JPH0774424B2 (ja) * 1990-11-29 1995-08-09 日本鋼管株式会社 金属帯の連続前処理方法
JPH04297560A (ja) * 1991-03-26 1992-10-21 Nisshin Steel Co Ltd 鋼帯の連続溶融めっき方法及び装置
JPH0768620B2 (ja) * 1991-09-30 1995-07-26 中外炉工業株式会社 金属ストリップの表面清浄化装置
KR0166099B1 (ko) * 1992-02-12 1999-01-15 코가 노리수케 내식성이 우수한 알루미늄-규소-크롬계 도금강판 및 그 제조방법
BE1010913A3 (fr) † 1997-02-11 1999-03-02 Cockerill Rech & Dev Procede de recuit d'un substrat metallique au defile.
KR100489269B1 (ko) * 2002-11-18 2005-05-11 포항강판 주식회사 스테인레스강판의 알루미늄 도금장치 및 그 도금방법
DE102005012296A1 (de) † 2005-03-17 2006-09-21 Sms Demag Ag Verfahren und Vorrichtung zum Entzundern eines Metallbandes
KR101372624B1 (ko) * 2006-12-27 2014-03-10 주식회사 포스코 상압 플라즈마를 이용한 용융 알루미늄 도금 스테인레스강판 제조방법
NL2017925B1 (en) * 2016-12-05 2018-06-18 Onderzoekscentrum Voor Aanwending Van Staal N V Method and system for manufacturing a steel product having a coating with spangles, and a steel product having a coating with spangles
CN110519976B (zh) * 2019-08-08 2020-05-22 湖北久之洋红外系统股份有限公司 一种具有电磁屏蔽功能的蓝宝石光学窗口及制备方法

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CA2016893C (en) 2000-01-04
JPH0364442A (ja) 1991-03-19
DE68917588D1 (de) 1994-09-22
CA2016893A1 (en) 1990-11-18
JP2825931B2 (ja) 1998-11-18
DE68917588T2 (de) 1995-01-19
EP0397952A1 (de) 1990-11-22

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