EP0368860A1 - Kontaktwerkstoff für vakuumschalter und verfahren zu dessen herstellung - Google Patents

Kontaktwerkstoff für vakuumschalter und verfahren zu dessen herstellung

Info

Publication number
EP0368860A1
EP0368860A1 EP88903830A EP88903830A EP0368860A1 EP 0368860 A1 EP0368860 A1 EP 0368860A1 EP 88903830 A EP88903830 A EP 88903830A EP 88903830 A EP88903830 A EP 88903830A EP 0368860 A1 EP0368860 A1 EP 0368860A1
Authority
EP
European Patent Office
Prior art keywords
copper
contact material
tellurium
chromium
selenium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP88903830A
Other languages
German (de)
English (en)
French (fr)
Inventor
Horst Kippenberg
Hannelore Schnödt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Siemens Corp
Original Assignee
Siemens AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG, Siemens Corp filed Critical Siemens AG
Publication of EP0368860A1 publication Critical patent/EP0368860A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00—Contacts
    • H01H1/02—Contacts characterised by the material thereof
    • H01H1/0203—Contacts characterised by the material thereof specially adapted for vacuum switches
    • H01H1/0206—Contacts characterised by the material thereof specially adapted for vacuum switches containing as major components Cu and Cr

Definitions

  • the invention relates to a contact material for vacuum switches, consisting of the basic components copper (Cu) and chrome and a tellurium (Te) - or selenium (Se) -containing additional component.
  • tellurium (Te) or selenium (Se) are preferred, which can favor the required so-called "soft" switching behavior due to their high vapor pressures.
  • Te tellurium
  • Se selenium
  • Examples from the patent literature are DE-PS 22 40 493, DE-AS 30 06 275, EP-B-0 083 200 and EP-A-0 172 912.
  • the additives tellurium or selenium form intermetallic phases with copper according to the state diagrams known from Hansen's "Constitution of Binary Alloys", Springer Verlag (1958). On the one hand, these have melting points above the melting point of copper and thus enable them to be brazed tendency contact materials, as is pointed out in DE-PS 22 54 623. Since such phases in the vapor pressure are significantly lower than the starting materials tellurium and selenium, the desired physical property of a high vapor pressure is noticeably weakened. However, this also limits the lowering of the tearing currents and voltage instabilities, since it is no longer the pure addition that is decisive, but the intermetallic phase that he forms.
  • the intermetallic phase is generally not completely present on the button of the contact piece made from the contact materials; rather, it is only found there together with the components chrome and copper in a predetermined proportion.
  • This structure must be chosen because, on the one hand, a minimum proportion of chromium is required for the erosion resistance of the contact material and for a sufficient greasing effect, and on the other hand, because of the requirements for current carrying capacity and switching capacity, a minimum proportion of copper is also required. This means that not as much copper can be replaced by the less conductive telluride or selenide.
  • the reduction in the concentration of the intermetallic phase in the button therefore usually has a weakening of the desired tear-off current reducing. Effect.
  • the object of the invention is therefore to specify a contact material and the associated manufacturing method, in which the latter conditions are met and which, in particular, enables switching behavior that is largely free of overvoltage.
  • the object is achieved by the entirety of the features of claim 1.
  • the characteristic of this claim includes in particular the new features compared to the older, not previously published European patent application 87100621.9 (VPA 86 P 3030).
  • Advantageous further developments are specified in subclaims 2 to 6, a method for producing the material according to the invention in method claim 7.
  • the copper telluride (Cu 2 Te) or copper selenide (Cu 2 Se) usually contained in CrCu materials is due to a ternary copper-chromium telluride or copper-chromium selenide with a specifically higher one Tellurium or selenium concentration replaced.
  • the binary telluride or selenide mentioned can be substituted by a ternary telluride or selenide which is similar in melting point and vapor pressure, but which has a significantly higher tellurium or Selenium concentration. This means that with a comparable volume fraction of telluride or selenide in the CrCu structure, the addition of a ternary CrCu telluride or selenide is more advantageous than that of the usual binary Cu telluride or selenide.
  • the ternary tellurides or selenides contained in the contact material according to the invention can be obtained by melting from the individual components chromium, copper and tellurium or selenium. They can then be added in powder form in the CrCu contact production in the desired amount and processed in a known manner.
  • the ternary intermetallic phase can be distributed homogeneously throughout the CrCu structure; however, it can also be limited to a surface zone of the contact and, in particular, starting from the button, can be limited to a predetermined depth of the material, as in the European one Patent application 87100621.9 is described in detail.
  • FIG. 1 shows a temperature-evaporation rate diagram for individual components in the chromium-copper-tellurium system
  • FIG. 2 shows a tear-off current distribution diagram for the intermetallic phases mentioned in the system according to FIG. 1.
  • the evaporation rate is chosen logarithmically as the abscissa and the temperature as the ordinate. From graphs 1 for copper and 2 for tellurium it can be seen that tellurium has a considerable evaporation rate even at low temperatures, whereas considerably higher temperatures have to be specified for copper.
  • the well-known intermetallic phase in the copper-tellurium system namely Cu 2 Te contains approx. 33 atomic% tellurium and 67 atomic% copper; the graph 3 for the relevant evaporation rate is relatively close below the copper graphene 2.
  • the tearing current is the abscissa and the Relative frequency of the stall current plotted so that the representation in this coordinate system provides a stall current distribution.
  • a mixture of chrome, copper and tellurium powder in a mass ratio of approx. 1: 2: 5.5 is heated, melted and homogenized under vacuum or under protective gas to approx. 1300oC.
  • a ternary copper-chromium telluride with a stoichiometry of approximately Cu 3 Cr 2 Te 4 is formed .
  • the ternary copper-chromium telluride produced in this way is ground, sieved to a powder size of ⁇ 100 ⁇ m and mixed with chromium and copper powder with a particle size distribution of likewise ⁇ 100 ⁇ m in a mass ratio of 1: 2: 2. This mixture is applied in an approximately 3 mm high layer to an approximately equally high layer made of a CrCu
  • contact pieces can be produced in which the additional components with the ternary tellurides or selenides are present in the entire contact material.

Landscapes

  • High-Tension Arc-Extinguishing Switches Without Spraying Means (AREA)
  • Powder Metallurgy (AREA)
EP88903830A 1987-07-28 1988-05-04 Kontaktwerkstoff für vakuumschalter und verfahren zu dessen herstellung Withdrawn EP0368860A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3724990 1987-07-28
DE3724990 1987-07-28

Publications (1)

Publication Number Publication Date
EP0368860A1 true EP0368860A1 (de) 1990-05-23

Family

ID=6332536

Family Applications (1)

Application Number Title Priority Date Filing Date
EP88903830A Withdrawn EP0368860A1 (de) 1987-07-28 1988-05-04 Kontaktwerkstoff für vakuumschalter und verfahren zu dessen herstellung

Country Status (5)

Country Link
US (1) US4997624A (enrdf_load_stackoverflow)
EP (1) EP0368860A1 (enrdf_load_stackoverflow)
JP (1) JPH02500554A (enrdf_load_stackoverflow)
IN (1) IN169611B (enrdf_load_stackoverflow)
WO (1) WO1989001231A1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109205576A (zh) * 2018-11-30 2019-01-15 武汉理工大学 一种铜基硫族化合物固溶体的室温超快速制备方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0538896A3 (en) * 1991-10-25 1993-11-18 Meidensha Electric Mfg Co Ltd Process for forming contact material
JP2011108380A (ja) * 2009-11-13 2011-06-02 Hitachi Ltd 真空バルブ用電気接点およびそれを用いた真空遮断器
CN103706783B (zh) * 2013-10-15 2017-02-15 陕西斯瑞新材料股份有限公司 一种高抗熔焊性CuCr40Te触头材料及其制备方法
CN106241752B (zh) * 2016-09-20 2018-07-06 广东先导稀材股份有限公司 一种碲化亚铜的制备方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4836071B1 (enrdf_load_stackoverflow) * 1968-07-30 1973-11-01
DE2240493C3 (de) * 1972-08-17 1978-04-27 Siemens Ag, 1000 Berlin Und 8000 Muenchen Durchdringungsverbundmetall als Kontaktwerkstoff für Vakuumschalter und Verfahren zu seiner Herstellung
DE2254623C3 (de) * 1972-11-08 1979-09-13 Siemens Ag, 1000 Berlin Und 8000 Muenchen Durchdringungsverbundmetall als Kontaktwerkstoff für Vakuumschalter mit hohen Schaltzahlen
JPS6059691B2 (ja) * 1979-02-23 1985-12-26 三菱電機株式会社 真空しや断器用接点及びその製造方法
JPS58108622A (ja) * 1981-12-21 1983-06-28 三菱電機株式会社 真空開閉器用電極材料
JPS58115728A (ja) * 1981-12-28 1983-07-09 三菱電機株式会社 真空しや断器用接点
DE3362624D1 (en) * 1982-11-16 1986-04-24 Mitsubishi Electric Corp Contact material for vacuum circuit breaker
JPS60172116A (ja) * 1984-02-16 1985-09-05 三菱電機株式会社 真空しや断器用接点
KR900001613B1 (ko) * 1986-01-10 1990-03-17 미쯔비시 덴끼 가부시기가이샤 진공차단기용 접점재료
EP0234246A1 (de) * 1986-01-30 1987-09-02 Siemens Aktiengesellschaft Schaltkontaktstücke für Vakuumschaltgeräte und Verfahren zu deren Herstellung
DE3864979D1 (de) * 1987-11-02 1991-10-24 Siemens Ag Verfahren zur herstellung von schmelzwerkstoffen aus kupfer, chrom und wenigstens einer leichtverdampflichen komponente sowie abschmelzelektrode zur verwendung bei einem derartigen verfahren.

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO8901231A1 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109205576A (zh) * 2018-11-30 2019-01-15 武汉理工大学 一种铜基硫族化合物固溶体的室温超快速制备方法
CN109205576B (zh) * 2018-11-30 2022-01-11 武汉理工大学 一种铜基硫族化合物固溶体的室温超快速制备方法

Also Published As

Publication number Publication date
WO1989001231A1 (en) 1989-02-09
US4997624A (en) 1991-03-05
IN169611B (enrdf_load_stackoverflow) 1991-11-23
JPH02500554A (ja) 1990-02-22

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