EP0338354B1 - Nassbehandlungsvorrichtung mit Deckel für fotografische Schichtträger - Google Patents

Nassbehandlungsvorrichtung mit Deckel für fotografische Schichtträger Download PDF

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Publication number
EP0338354B1
EP0338354B1 EP19890106238 EP89106238A EP0338354B1 EP 0338354 B1 EP0338354 B1 EP 0338354B1 EP 19890106238 EP19890106238 EP 19890106238 EP 89106238 A EP89106238 A EP 89106238A EP 0338354 B1 EP0338354 B1 EP 0338354B1
Authority
EP
European Patent Office
Prior art keywords
liquid
treatment apparatus
lid
filter
vapour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP19890106238
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0338354A2 (de
EP0338354A3 (en
Inventor
Franz Heckl
Alfons Dipl.-Ing. Kastl
Hans Dipl.- Ing. Ketterer
Horst Köninger
Rudolf Dipl.-Ing. Loistl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert AG
Original Assignee
Agfa Gevaert AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert AG filed Critical Agfa Gevaert AG
Publication of EP0338354A2 publication Critical patent/EP0338354A2/de
Publication of EP0338354A3 publication Critical patent/EP0338354A3/de
Application granted granted Critical
Publication of EP0338354B1 publication Critical patent/EP0338354B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D13/00—Processing apparatus or accessories therefor, not covered by groups G11B3/00 - G11B11/00
    • G03D13/02—Containers; Holding-devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D3/00—Liquid processing apparatus involving immersion; Washing apparatus involving immersion
    • G03D3/08—Liquid processing apparatus involving immersion; Washing apparatus involving immersion having progressive mechanical movement of exposed material
    • G03D3/13—Liquid processing apparatus involving immersion; Washing apparatus involving immersion having progressive mechanical movement of exposed material for long films or prints in the shape of strips, e.g. fed by roller assembly
    • G03D3/132—Liquid processing apparatus involving immersion; Washing apparatus involving immersion having progressive mechanical movement of exposed material for long films or prints in the shape of strips, e.g. fed by roller assembly fed by roller assembly

Definitions

  • the invention relates to a wet treatment device for photographic substrates which has at least one liquid tank and which can be moved by the wet treatment device by means of a transport device, a free surface of the wet treatment device being coverable by a cover against an installation space for the wet treatment device.
  • Housing parts which are essentially located above treatment tanks and which are designed as removable covers for filling, emptying or cleaning the tanks have the disadvantages that chemical vapors form above the tanks and under the cover or covers and condensation water forms on the inside of the cover. This will, on the one hand the oxidation of the treatment liquid is accelerated in an undesirable manner, on the other hand the vapors also escape into the installation space of the device and lead to an unpleasant smell. The formation of condensation can lead to the condensation in the installation room dripping off and the operator's clothing dripping when the lid is removed.
  • Pressure chambers known as wet treatment devices, for example by DE-PS 35 35 980 or DE-OS 32 30 175, through which the layer supports are transported on a predominantly horizontal path and into which the treatment liquid is under pressure, mostly from above and below , is pumped in.
  • the upper chamber part which is designed as a removable cover, in such a way that it partially surrounds transport rollers and dips between them into the treatment liquid, so that oxidation of the treatment liquid and formation of condensation on the cover in this area is avoided.
  • this is generally not possible in the insertion and exit area of the layer support, which must lie above the treatment liquid.
  • this embodiment is not applicable to treatment tanks, through which layer supports are in any case also transported to a considerable extent vertically, for example on a U-shaped or a U-wave-shaped path. There must always be sufficient space between the cover and the surface of the liquid for the introduction, execution and redirection of the substrates to be treated, which is then more rapid Oxidation, the formation of condensate and also the escape of chemical odors into the exterior are the result.
  • it is already known, for example from DE-OS 34 28 361 to provide wipers, sealing flaps, suction devices or similar locks for liquids and vapors before or after wet treatment devices on the lead-through slots for the layer supports. However, these only prevent the escape of moisture and odors directly at the feed-through slots and not above the tanks and cannot prevent the liquids from being oxidized and condensed.
  • the invention is therefore based on the object of avoiding condensate formation and avoidable oxidation of the treatment liquid and the escape of chemical odors into the exterior in a wet treatment device of the type mentioned above the treatment tanks despite a distance between the liquid surface.
  • the invention achieves that chemical vapors arising above the tanks are drawn off upwards and therefore condensate formation on the inside of the lid is prevented and secondly by the filter material arranged in the lid these chemical vapors are freed from the chemicals and therefore also from their odors in such a way that after outside through the Cover only odor-free, cleaned vapors that do not pollute the environment.
  • This makes it possible to connect the wet treatment devices according to the invention directly to cassette unloaders and loaders or to medical devices or the like that process X-ray film and to set them up directly in daylight treatment rooms for medical or other examinations (for example for material testing) without operators or patients having to deal with odor or harmful chemical influences be subjected.
  • 1 and 2 show the housing of a film processor with dryer at 1, the tanks for developer, fixing solution and washing bath as well as a chamber between developer and fixing bath for intermediate washing with 2 to 5 and two dryer units or their blasters and blowers with 6 and 7 designated.
  • Tanks 2, 4 and 5 are racks with pairs of transport rollers, which are only shown schematically and are not numbered.
  • Device walls are provided in front of the first tank 2 and after the last tank 5, in which through-slots 8 are provided for inserting and carrying out the substrates to be treated. Partition walls with passage slots can also be provided at the transition points from one tank to the next.
  • sealing tabs can be provided which fold up in the transport direction when a layer support is being carried through, but which bear against it.
  • known suction fans for the vapors generated above the tanks or known squeeze rollers in the case of passage slots provided at a tank outlet can also be provided in a known manner on the passage slots.
  • the chemical vapors would be covered with slots, gaps, etc. in the case of an ordinary device cover. escape in any way from the device cladding and enter the room air unfiltered and pollute the environment (smell and pollutants).
  • the damp, warm interior air would condense on the cooler lid.
  • the condensed water can run over the clothing of the machine's operating personnel or, if the lid is closed, possibly on the inside of the processor processed films drip and thus produce errors on the film.
  • the moist air may be deposited on the machine's feed plate and damage the film surface when the film is being fed.
  • a basic arrangement for avoiding these problems consists in a filter unit 9, an exemplary embodiment of which is shown in FIG.
  • the filter unit 9 has a porous carrier material 11, preferably in bulk form, which is treated with an adsorber reagent for the chemical components of the chemical vapors rising above the tanks 2 to 5.
  • carrier material 11 in bulk form, it must be held against falling out.
  • air-permeable filter mats 12 are provided above and below the carrier material layer 11. Only as an example when applied to customary wet treatment chemicals for films containing silver salt, KMnO4 as adsorbent reagent, 11 AL2O3 as support material and as filter mats non-absorbent plastic nonwovens can be used.
  • bottom surface 10a and cover surface 10b are designed, for example, as dimensionally stable, chemical-resistant grids.
  • Grids 10a, 10b and narrow sides of the filter unit 9 can be made, for example, of dimensionally stable plastic or metal, narrow sides and bottom surface being able to be produced in one piece and the cover surface being able to be placed on the narrow sides, for example so that after filling with the filter materials 11, 12 they can be glued or welded.
  • the lid surface 10b can have a handle 10c so that the filter unit 9 can be replaced easily and cleanly when it is used up.
  • a filter unit 9 could now be placed directly as a lid on the open top of the wet treatment device 1 or over the tanks 2 to 5 and replaced when the absorber material is used up.
  • a device cover designed as a hollow body 13 is inserted into the grooves or depressions 1 a of the device 1 with the interposition of a sealing strip 14, preferably screwed to the device 1.
  • This hollow body has a base plate 13a designed as a grid or grate, and associated air-impermeable side walls 13b and a cover plate that can be connected to it, again designed as a grid or grate 13c.
  • the cover plate 13c can be inserted in the grooves of the upper edges of the side walls 13b and is therefore easily removable. After removing its cover plate 13c, the filter unit 9 is then inserted into the cover 13 in such a way that its grid 10a fully covers the grid of the base plate 13a. With the help of the handle 10c, a used filter unit 9 can easily be exchanged for a new one. So that no chemical vapors can escape between the base plate 13a and base surface 10a, a sealing strip 15 is also provided along the edges of the two.
  • FIG. 1 differs from that according to FIG. 2 in that a device hood 16, which is impermeable to air, can also be slipped over the cover 13.
  • the space between the top of the hood 16 and the cover plate 13c forms a channel for extracting the cleaned vapors emerging from the filter unit 9, a cage 17 being provided laterally next to or behind the cover 13.
  • a blower 18 is arranged in the cage 17, the suction opening of which is directed towards the channel and the blowing opening 18a of which extends through an opening in the hood 16.
  • the steam which has been freed of chemicals, is sucked off by the blower 18 and directed to the outside.
  • the mode of operation of a device cover 13 according to the invention, equipped with a chemical filter 9, is thus that the vapors rising above the tanks 2 to 5 pass through the grids 13a and / or 10a occur and are cleaned by the filter material of chemicals and then exit as vaporous, odorless air through the upper grilles 10b and / or 13c into the space surrounding the device 1, without thereby affecting the ambient air.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Developing Apparatuses (AREA)
  • Closures For Containers (AREA)
EP19890106238 1988-04-21 1989-04-08 Nassbehandlungsvorrichtung mit Deckel für fotografische Schichtträger Expired - Lifetime EP0338354B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19883813360 DE3813360C1 (enrdf_load_stackoverflow) 1988-04-21 1988-04-21
DE3813360 1988-04-21

Publications (3)

Publication Number Publication Date
EP0338354A2 EP0338354A2 (de) 1989-10-25
EP0338354A3 EP0338354A3 (en) 1990-10-31
EP0338354B1 true EP0338354B1 (de) 1993-09-29

Family

ID=6352515

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19890106238 Expired - Lifetime EP0338354B1 (de) 1988-04-21 1989-04-08 Nassbehandlungsvorrichtung mit Deckel für fotografische Schichtträger

Country Status (2)

Country Link
EP (1) EP0338354B1 (enrdf_load_stackoverflow)
DE (1) DE3813360C1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6273938B1 (en) 1999-08-13 2001-08-14 3M Innovative Properties Company Channel flow filter

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1529802A (fr) * 1967-05-09 1968-06-21 Kodak Pathe Nouveau récipient pour des produits à constituant volatil et couvercle approprié à un tel récipient
DD207131A3 (de) * 1981-10-28 1984-02-15 Pentacon Dresden Veb Vorrichtung zum nassbehandeln fotografischer schichttraeger
DE3226658A1 (de) * 1982-07-16 1984-01-19 Meteor-Siegen Apparatebau Paul Schmeck Gmbh, 5900 Siegen Lichtpausgeraet mit einer filteranordnung
DE3428361A1 (de) * 1984-08-01 1986-02-06 Vereinigte CeWe-Colorbetriebe GmbH & Co KG, 2900 Oldenburg Verfahren und vorrichtung zur entfeuchtung von eine entwicklungsmaschine durchlaufenden fotografischen papierabzuegen
JPS6142542U (ja) * 1984-08-21 1986-03-19 大日本スクリ−ン製造株式会社 感光材料処理装置
DE3502971A1 (de) * 1985-01-30 1986-05-07 Johann Baptist Rombach Gmbh & Co Kg, 7500 Karlsruhe Filter zur reinigung stroemender gase
DE3535980C1 (de) * 1985-10-09 1986-11-20 Agfa-Gevaert Ag, 5090 Leverkusen Vorrichtung zur Nassbehandlung fotografischer Schichttraeger

Also Published As

Publication number Publication date
DE3813360C1 (enrdf_load_stackoverflow) 1989-10-26
EP0338354A2 (de) 1989-10-25
EP0338354A3 (en) 1990-10-31

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