EA035316B9 - Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала - Google Patents

Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала

Info

Publication number
EA035316B9
EA035316B9 EA201692408A EA201692408A EA035316B9 EA 035316 B9 EA035316 B9 EA 035316B9 EA 201692408 A EA201692408 A EA 201692408A EA 201692408 A EA201692408 A EA 201692408A EA 035316 B9 EA035316 B9 EA 035316B9
Authority
EA
Eurasian Patent Office
Prior art keywords
sapphire material
ion beam
charged gas
gas ion
treating
Prior art date
Application number
EA201692408A
Other languages
English (en)
Other versions
EA035316B1 (ru
EA201692408A1 (ru
Inventor
Фредерик Герналек
Дени Бусардо
Original Assignee
Кертек
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR1401172A external-priority patent/FR3021332B1/fr
Priority claimed from FR1402293A external-priority patent/FR3027120B1/fr
Application filed by Кертек filed Critical Кертек
Publication of EA201692408A1 publication Critical patent/EA201692408A1/ru
Publication of EA035316B1 publication Critical patent/EA035316B1/ru
Publication of EA035316B9 publication Critical patent/EA035316B9/ru

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00—Compounds of aluminium
    • C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
    • C01F7/021—After-treatment of oxides or hydroxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/16—Oxides
    • C30B29/20—Aluminium oxides
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/04—After-treatment of single crystals or homogeneous polycrystalline material with defined structure using electric or magnetic fields or particle radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5826—Treatment with charged particles
    • C23C14/5833—Ion beam bombardment
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Human Computer Interaction (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

В изобретении способ обработки сапфирового материала включает облучение поверхности сапфирового материала, причем поверхность прилегает к среде, отличной от сапфирового материала, пучком одно- и/или многозарядных ионов газа так, чтобы получить ионно-имплантированный слой в сапфировом материале, причем ионы выбраны из ионов элементов из списка, состоящего из гелия (He), неона (Ne), аргона (Ar), криптона (Kr), ксенона (Xe), бора (B), углерода (C), азота (N), кислорода (O), фтора (F), кремния (Si), фосфора (P) и серы (S). Обработка дает антибликовый эффект на обработанных материалах (61, 62, 63) по сравнению с необработанными подложками (60). Указанный способ может быть использован для получения емкостной сенсорной панели с высоким пропусканием в видимом диапазоне.
EA201692408A 2014-05-23 2015-03-23 Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала EA035316B9 (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1401172A FR3021332B1 (fr) 2014-05-23 2014-05-23 Procede de traitement par un faisceau d'ions d'un gaz mono et multicharges pour produire des materiaux en saphir synthetique antireflet
FR1402293A FR3027120B1 (fr) 2014-10-09 2014-10-09 Dalle tactile capacitive a haute transmission dans le domaine visible et inrayable
PCT/EP2015/056116 WO2015176850A1 (en) 2014-05-23 2015-03-23 Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material

Publications (3)

Publication Number Publication Date
EA201692408A1 EA201692408A1 (ru) 2017-04-28
EA035316B1 EA035316B1 (ru) 2020-05-27
EA035316B9 true EA035316B9 (ru) 2020-07-27

Family

ID=52727135

Family Applications (2)

Application Number Title Priority Date Filing Date
EA201692408A EA035316B9 (ru) 2014-05-23 2015-03-23 Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала
EA201692406A EA034019B1 (ru) 2014-05-23 2015-05-22 СПОСОБ ОБРАБОТКИ ПОВЕРХНОСТИ ДЕТАЛИ ИЗ СИНТЕТИЧЕСКОГО САПФИРОВОГО МАТЕРИАЛА ДЛЯ МОДИФИКАЦИИ ОТРАЖАЮЩИХ СВОЙСТВ УКАЗАННОЙ ПОВЕРХНОСТИ В ИНТЕРВАЛЕ ДЛИН ВОЛН 400-800 нм

Family Applications After (1)

Application Number Title Priority Date Filing Date
EA201692406A EA034019B1 (ru) 2014-05-23 2015-05-22 СПОСОБ ОБРАБОТКИ ПОВЕРХНОСТИ ДЕТАЛИ ИЗ СИНТЕТИЧЕСКОГО САПФИРОВОГО МАТЕРИАЛА ДЛЯ МОДИФИКАЦИИ ОТРАЖАЮЩИХ СВОЙСТВ УКАЗАННОЙ ПОВЕРХНОСТИ В ИНТЕРВАЛЕ ДЛИН ВОЛН 400-800 нм

Country Status (10)

Country Link
US (2) US10982312B2 (ru)
EP (2) EP3146086B1 (ru)
JP (2) JP6878009B2 (ru)
KR (2) KR102320294B1 (ru)
CN (2) CN106662958B (ru)
AU (2) AU2015263472B2 (ru)
CA (2) CA2949923A1 (ru)
EA (2) EA035316B9 (ru)
SG (2) SG11201609845VA (ru)
WO (2) WO2015176850A1 (ru)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11535926B2 (en) 2011-12-23 2022-12-27 Hkbu R&D Licensing Limited Sapphire thin film coated substrate
EA035316B9 (ru) * 2014-05-23 2020-07-27 Кертек Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала
JPWO2017104443A1 (ja) * 2015-12-16 2018-08-30 株式会社アルバック サファイア基板の製造方法及びサファイア基板
EA201892252A1 (ru) * 2016-04-12 2019-03-29 Агк Гласс Юроп Противоотражающая устойчивая к царапанию стеклянная подложка и способ ее изготовления
EP3458625A4 (en) * 2016-05-19 2020-07-29 Hong Kong Baptist University SUBSTRATE COATED WITH SAPPHIRE THIN LAYER
FR3062855B1 (fr) * 2017-02-14 2019-04-19 Sa Quertech Procede de traitement par un faisceau d ions pour produire un saphir antifreflet a haute transmittance resistant a la rayure.
EP3389078A1 (fr) * 2017-04-13 2018-10-17 The Swatch Group Research and Development Ltd Procédé d'implantation d'ions multichargés sur une surface d'un objet à traiter et installation pour la mise en oeuvre de ce procédé
FR3067275B1 (fr) 2017-06-07 2022-08-12 Timothee Boitouzet Procede de delignification partielle par voie supercritique ou subcritique et de remplissage d'un materiau ligno-cellulosique
EP3632876A1 (fr) * 2017-10-12 2020-04-08 The Swatch Group Research and Development Ltd Particules de poudre céramique revetue
EP3503159B1 (fr) * 2017-12-20 2021-05-05 The Swatch Group Research and Development Ltd Procédé d'implantation d'ions sur une surface d'un objet à traiter
FR3077895B1 (fr) * 2018-02-09 2020-02-28 Sas Woodoo Dispositif de detection tactile avec interface tactile en materiau composite
US10488560B2 (en) * 2018-02-13 2019-11-26 Visera Technologies Company Limited Optical elements
EP3556911A1 (fr) * 2018-04-19 2019-10-23 Comadur S.A. Procédé de structuration d'un motif décoratif ou technique dans un objet réalisé en un matériau amorphe, semi-cristallin ou cristallin au moins partiellement transparent
WO2019238868A1 (en) * 2018-06-14 2019-12-19 Agc Glass Europe Reflectance reduction of substrate for transmitting infrared light
EP3636796A1 (fr) * 2018-10-10 2020-04-15 Comadur S.A. Procede de durcissement d'un traitement antireflet depose sur un substrat transparent et substrat transparent comprenant un traitement antireflet durci
TW202038326A (zh) * 2019-01-11 2020-10-16 日商索尼半導體解決方案公司 氧化物半導體膜之蝕刻方法
EP3696151A1 (fr) * 2019-02-18 2020-08-19 Rolex Sa Glace de montre colorée
EP4113220B1 (fr) * 2021-07-02 2024-08-28 Comadur SA Procédé de traitement de surface d'une pierre, notamment pour l'horlogerie

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060210783A1 (en) * 2005-03-18 2006-09-21 Seder Thomas A Coated article with anti-reflective coating and method of making same
FR2899242A1 (fr) * 2007-04-05 2007-10-05 Quertech Ingenierie Sarl Procede de durcissement par implantation d'ions d'helium dans une piece metallique
US20130328798A1 (en) * 2012-06-06 2013-12-12 Ga-Lane Chen Touch panel with sapphire substrate and display device
EP2752507A1 (en) * 2013-01-08 2014-07-09 Apple Inc. Ion implant indicia for cover glass or display component

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06330314A (ja) * 1993-05-17 1994-11-29 Japan Steel Works Ltd:The イオン注入法による傾斜機能材料の製造方法および製造装置
US6979630B2 (en) * 2002-08-08 2005-12-27 Isonics Corporation Method and apparatus for transferring a thin layer of semiconductor material
FR2879625B1 (fr) * 2004-02-04 2007-04-27 Guernalec Frederic Dispositif de nitruration par implantation ionique d'une piece en alliage d'aluminium et procede mettant en oeuvre un tel dispositif
JP2007109474A (ja) * 2005-10-12 2007-04-26 Fujifilm Corp イオン注入装置
JP2009216452A (ja) * 2008-03-07 2009-09-24 Seiko Epson Corp 透光性部材、時計、および透光性部材の製造方法
JP5463352B2 (ja) * 2008-06-12 2014-04-09 コリア アトミック エナジー リサーチ インスティチュート 発色調節されたサファイアの製造方法
TWI453949B (zh) * 2009-12-30 2014-09-21 Hon Hai Prec Ind Co Ltd 發光二極體製作方法
TWM443936U (en) * 2011-11-17 2012-12-21 Tera Xtal Technology Corp Touch panel structure
KR20130065097A (ko) * 2011-12-09 2013-06-19 엘지이노텍 주식회사 발광 소자의 제조 방법
US8852695B2 (en) * 2012-09-10 2014-10-07 The Research Foundation For The State University Of New York Optical barriers, waveguides, and methods for fabricating barriers and waveguides for use in harsh environments
US9623628B2 (en) * 2013-01-10 2017-04-18 Apple Inc. Sapphire component with residual compressive stress
CN104145320B (zh) * 2013-02-12 2018-02-02 苹果公司 多步骤离子注入
US9416442B2 (en) * 2013-03-02 2016-08-16 Apple Inc. Sapphire property modification through ion implantation
EP2778252A3 (en) * 2013-03-15 2014-12-10 Apple Inc. Layered Coatings For Sapphire Structure
FR3009217B1 (fr) * 2013-08-01 2016-10-28 Quertech Procede de traitement de poudre a base d'oxyde de cerium
EA035316B9 (ru) * 2014-05-23 2020-07-27 Кертек Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала
JP2017531609A (ja) * 2014-10-24 2017-10-26 エージーシー グラス ユーロップＡｇｃ Ｇｌａｓｓ Ｅｕｒｏｐｅ イオン注入方法およびイオン注入されたガラス基材
US10280504B2 (en) * 2015-09-25 2019-05-07 Apple Inc. Ion-implanted, anti-reflective layer formed within sapphire material
ES2883165T3 (es) * 2016-04-12 2021-12-07 Agc Inc Uso de implantación de iones para reducir la reflectancia y mantener la neutralidad del color en la reflectancia de un sustrato de vidrio
US20190119154A1 (en) * 2016-04-12 2019-04-25 Agc Glass Europe Glass substrate with reduced internal reflectance and method for manufacturing the same
BR112018070866A2 (pt) * 2016-04-12 2019-02-05 Agc Glass Company North America substrato de vidro refletivo azul e método de fabricação do mesmo
EA201892252A1 (ru) * 2016-04-12 2019-03-29 Агк Гласс Юроп Противоотражающая устойчивая к царапанию стеклянная подложка и способ ее изготовления
CA3019255A1 (en) * 2016-04-12 2017-10-19 Agc Glass Europe Heat treatable antireflective glass substrate and method for manufacturing the same
US11066329B2 (en) * 2016-04-12 2021-07-20 Agc Glass Europe Antireflective glass substrate and method for manufacturing the same
FR3062658B1 (fr) * 2017-02-03 2022-06-24 Sa Quertech Procede de traitement antireflectif et resistant a la rayure dans un saphir synthetique
FR3062855B1 (fr) * 2017-02-14 2019-04-19 Sa Quertech Procede de traitement par un faisceau d ions pour produire un saphir antifreflet a haute transmittance resistant a la rayure.
EP3389078A1 (fr) * 2017-04-13 2018-10-17 The Swatch Group Research and Development Ltd Procédé d'implantation d'ions multichargés sur une surface d'un objet à traiter et installation pour la mise en oeuvre de ce procédé

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060210783A1 (en) * 2005-03-18 2006-09-21 Seder Thomas A Coated article with anti-reflective coating and method of making same
FR2899242A1 (fr) * 2007-04-05 2007-10-05 Quertech Ingenierie Sarl Procede de durcissement par implantation d'ions d'helium dans une piece metallique
US20130328798A1 (en) * 2012-06-06 2013-12-12 Ga-Lane Chen Touch panel with sapphire substrate and display device
EP2752507A1 (en) * 2013-01-08 2014-07-09 Apple Inc. Ion implant indicia for cover glass or display component

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
CHAIWONG, C. ; YU, L.D. ; SCHINARAKIS, K. ; VILAITHONG, T.: "Optical property modification of ruby and sapphire by N-ion implantation", SURFACE AND COATINGS TECHNOLOGY, ELSEVIER BV, AMSTERDAM, NL, vol. 196, no. 1-3, 22 June 2005 (2005-06-22), AMSTERDAM, NL, pages 108 - 112, XP027609147, ISSN: 0257-8972 *
KIRKPATRICK A, HARRIS D C, JOHNSON L F: "EFFECT OF ION IMPLANTATION ON THE STRENGTH OF SAPPHIRE AT 300-600�C", JOURNAL OF MATERIALS SCIENCE, KLUWER ACADEMIC PUBLISHERS, DORDRECHT, vol. 36, no. 09, 1 May 2001 (2001-05-01), Dordrecht, pages 2195 - 2201, XP001048280, ISSN: 0022-2461, DOI: 10.1023/A:1017596001471 *
WILLIAM T. SPRATT, MENGBING HUANG, CHUANLEI JIA, LEI WANG, VIMAL K. KAMINENI, ALAIN C. DIEBOLD, RICHARD MATYI AND HUA XIA: "Effects of hydrogen ion implantation and thermal annealing on structural and optical properties of single-crystal sapphire", ION BEAMS - NEW APPICATIONS FROM MESOSCALE TO NANOSCALE : SYMPOSIUM HELD APRIL 25 - 29, 2011, SAN FRANCISCO, CALIFORNIA, U.S.A., CAMBRIDGE UNIV. PRESS, NEW YORK, NY, vol. 1354, 25 April 2011 (2011-04-25) - 29 April 2011 (2011-04-29), New York, NY, pages 97 - 102, XP002729037, ISBN: 978-1-60511-331-9, DOI: 10.1557/OPL.2011.1279 *

Also Published As

Publication number Publication date
EP3146416B1 (en) 2024-09-18
WO2015177334A1 (en) 2015-11-26
AU2015261820A1 (en) 2016-12-08
CA2949923A1 (en) 2015-11-26
JP2017518440A (ja) 2017-07-06
CN106661724A (zh) 2017-05-10
JP6878009B2 (ja) 2021-05-26
CN106662958B (zh) 2020-03-06
CA2949878A1 (en) 2015-11-26
KR20170008302A (ko) 2017-01-23
AU2015261820B2 (en) 2020-09-10
EP3146086A1 (en) 2017-03-29
JP2017516737A (ja) 2017-06-22
WO2015176850A1 (en) 2015-11-26
SG11201609846RA (en) 2016-12-29
KR102320294B1 (ko) 2021-11-01
EA035316B1 (ru) 2020-05-27
CN106662958A (zh) 2017-05-10
AU2015263472B2 (en) 2019-06-27
JP6626008B2 (ja) 2019-12-25
EA201692406A1 (ru) 2017-04-28
US20170114442A1 (en) 2017-04-27
AU2015263472A1 (en) 2016-12-08
EA034019B1 (ru) 2019-12-19
CN106661724B (zh) 2020-06-30
EP3146416A1 (en) 2017-03-29
US20170107641A1 (en) 2017-04-20
KR102363999B1 (ko) 2022-02-16
EP3146086B1 (en) 2019-10-02
US10196731B2 (en) 2019-02-05
US10982312B2 (en) 2021-04-20
KR20170008851A (ko) 2017-01-24
EA201692408A1 (ru) 2017-04-28
SG11201609845VA (en) 2016-12-29

Similar Documents

Publication Publication Date Title
EA035316B9 (ru) Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала
PH12015501772A1 (en) Ion beam treatment method for producing superhydrophilic glass materials
EP3581209A3 (en) Reactive gas generation system and method of treatment using reactive gas
TW200608489A (en) Plasma treatment method and plasma etching method
PH12020551923A1 (en) Methods and compositions for treating cancer
WO2014110446A3 (en) Method and system for graphene formation
SG10201900327YA (en) A method of cvd plasma processing with a toroidal plasma processing apparatus
TW201614725A (en) Methods for high precision plasma etching of substrates
WO2012001325A3 (fr) Procede de traitement de surface d'un dispositif de distribution de produit fluide.
EP3492428A3 (en) Nanocrystalline graphene and method of forming nanocrystalline graphene
EA029422B9 (ru) Способ обработки стеклянного материала пучком однозарядных и многозарядных ионов газа для получения антиотражающего стеклянного материала
WO2005093777A3 (en) Ion sources
WO2009111535A3 (en) Method to improve uniformity of chemical mechanical polishing planarization
WO2008118738A3 (en) Apparatus and methods of forming a gas cluster ion beam using a low-pressure source
TW200715412A (en) Method and apparatus for forming metal film
WO2012073142A3 (de) Verfahren und vorrichtung zur ionenimplantation
WO2012001330A3 (fr) Procede de traitement de surface d'un dispositif de distribution de produit fluide.
EP4292651A3 (en) Liponucleotide-based therapy for ards
WO2012001326A3 (fr) Procede de traitement de surface d'un dispositif de distribution de produit fluide
WO2015187639A3 (en) Method of improving ion beam quality in a non-mass-analyzed ion implantation system
MX2021001517A (es) Terapia basada en microarn dirigida contra canceres positivos para proteina citosolica de linfocito 1 (lcp-1).
WO2014160886A3 (en) Systems and methods for treating material surfaces
MX2018007275A (es) Proceso para tratamiento de superficie con fase gaseosa.
GB201303809D0 (en) Method and apparatus
WO2012001321A3 (fr) Procede de traitement de surface elastomere d'un dispositif de distribution de produit fluide.

Legal Events

Date Code Title Description
TH4A Publication of the corrected specification to eurasian patent
MM4A Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s)

Designated state(s): AM AZ BY KZ KG TJ TM