EA201692408A1 - Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала - Google Patents
Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материалаInfo
- Publication number
- EA201692408A1 EA201692408A1 EA201692408A EA201692408A EA201692408A1 EA 201692408 A1 EA201692408 A1 EA 201692408A1 EA 201692408 A EA201692408 A EA 201692408A EA 201692408 A EA201692408 A EA 201692408A EA 201692408 A1 EA201692408 A1 EA 201692408A1
- Authority
- EA
- Eurasian Patent Office
- Prior art keywords
- sapphire material
- gas ions
- sappire
- multiplay
- treating
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F7/00—Compounds of aluminium
- C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
- C01F7/021—After-treatment of oxides or hydroxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/48—Ion implantation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/20—Aluminium oxides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/04—After-treatment of single crystals or homogeneous polycrystalline material with defined structure using electric or magnetic fields or particle radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Treatment with charged particles
- C23C14/5833—Ion beam bombardment
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Human Computer Interaction (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Способ обработки сапфирового материала включает облучение поверхности сапфирового материала, причём поверхность прилегает к среде, отличной от сапфирового материала, пучком одно- и/или многозарядных ионов газа так, чтобы получить ионно-имплантированный слой в сапфировом материале, причём ионы выбраны из ионов элементов из списка, состоящего из гелия (Не), неона (Ne), аргона (Ar), криптона (Kr), ксенона (Хе), бора (В), углерода (С), азота (N), кислорода (О), фтора (F), кремния (Si), фосфора (Р) и серы (S). Обработка даёт антибликовый эффект на обработанных материалах (61, 62, 63) по сравнению с необработанными подложками (60). Указанный способ может быть использован для получения ёмкостной сенсорной панели с высоким пропусканием в видимом диапазоне.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1401172A FR3021332B1 (fr) | 2014-05-23 | 2014-05-23 | Procede de traitement par un faisceau d'ions d'un gaz mono et multicharges pour produire des materiaux en saphir synthetique antireflet |
FR1402293A FR3027120B1 (fr) | 2014-10-09 | 2014-10-09 | Dalle tactile capacitive a haute transmission dans le domaine visible et inrayable |
PCT/EP2015/056116 WO2015176850A1 (en) | 2014-05-23 | 2015-03-23 | Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material |
Publications (3)
Publication Number | Publication Date |
---|---|
EA201692408A1 true EA201692408A1 (ru) | 2017-04-28 |
EA035316B1 EA035316B1 (ru) | 2020-05-27 |
EA035316B9 EA035316B9 (ru) | 2020-07-27 |
Family
ID=52727135
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EA201692408A EA035316B9 (ru) | 2014-05-23 | 2015-03-23 | Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала |
EA201692406A EA034019B1 (ru) | 2014-05-23 | 2015-05-22 | СПОСОБ ОБРАБОТКИ ПОВЕРХНОСТИ ДЕТАЛИ ИЗ СИНТЕТИЧЕСКОГО САПФИРОВОГО МАТЕРИАЛА ДЛЯ МОДИФИКАЦИИ ОТРАЖАЮЩИХ СВОЙСТВ УКАЗАННОЙ ПОВЕРХНОСТИ В ИНТЕРВАЛЕ ДЛИН ВОЛН 400-800 нм |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EA201692406A EA034019B1 (ru) | 2014-05-23 | 2015-05-22 | СПОСОБ ОБРАБОТКИ ПОВЕРХНОСТИ ДЕТАЛИ ИЗ СИНТЕТИЧЕСКОГО САПФИРОВОГО МАТЕРИАЛА ДЛЯ МОДИФИКАЦИИ ОТРАЖАЮЩИХ СВОЙСТВ УКАЗАННОЙ ПОВЕРХНОСТИ В ИНТЕРВАЛЕ ДЛИН ВОЛН 400-800 нм |
Country Status (10)
Country | Link |
---|---|
US (2) | US10982312B2 (ru) |
EP (2) | EP3146086B1 (ru) |
JP (2) | JP6878009B2 (ru) |
KR (2) | KR102320294B1 (ru) |
CN (2) | CN106662958B (ru) |
AU (2) | AU2015263472B2 (ru) |
CA (2) | CA2949923A1 (ru) |
EA (2) | EA035316B9 (ru) |
SG (2) | SG11201609845VA (ru) |
WO (2) | WO2015176850A1 (ru) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11535926B2 (en) | 2011-12-23 | 2022-12-27 | Hkbu R&D Licensing Limited | Sapphire thin film coated substrate |
JP6878009B2 (ja) * | 2014-05-23 | 2021-05-26 | ケルテック | 防眩サファイア材料を製造するための一価及び/又は多価ガスイオンビーム処理方法 |
WO2017104443A1 (ja) * | 2015-12-16 | 2017-06-22 | 株式会社アルバック | サファイア基板の製造方法及びサファイア基板 |
TWI653266B (zh) * | 2016-05-19 | 2019-03-11 | 香港浸會大學 | 藍寶石薄膜塗布基材 |
FR3062855B1 (fr) | 2017-02-14 | 2019-04-19 | Sa Quertech | Procede de traitement par un faisceau d ions pour produire un saphir antifreflet a haute transmittance resistant a la rayure. |
EP3389078A1 (fr) * | 2017-04-13 | 2018-10-17 | The Swatch Group Research and Development Ltd | Procédé d'implantation d'ions multichargés sur une surface d'un objet à traiter et installation pour la mise en oeuvre de ce procédé |
FR3067275B1 (fr) | 2017-06-07 | 2022-08-12 | Timothee Boitouzet | Procede de delignification partielle par voie supercritique ou subcritique et de remplissage d'un materiau ligno-cellulosique |
EP3632876A1 (fr) * | 2017-10-12 | 2020-04-08 | The Swatch Group Research and Development Ltd | Particules de poudre céramique revetue |
EP3843123A1 (fr) * | 2017-12-20 | 2021-06-30 | The Swatch Group Research and Development Ltd | Installation pour la mise en oeuvre d'un procédé d'implantation d'ions sur une surface d'un objet à traiter |
FR3077895B1 (fr) * | 2018-02-09 | 2020-02-28 | Sas Woodoo | Dispositif de detection tactile avec interface tactile en materiau composite |
US10488560B2 (en) * | 2018-02-13 | 2019-11-26 | Visera Technologies Company Limited | Optical elements |
EP3556911A1 (fr) * | 2018-04-19 | 2019-10-23 | Comadur S.A. | Procédé de structuration d'un motif décoratif ou technique dans un objet réalisé en un matériau amorphe, semi-cristallin ou cristallin au moins partiellement transparent |
EP3807227A1 (en) * | 2018-06-14 | 2021-04-21 | AGC Glass Europe | Reflectance reduction of substrate for transmitting infrared light |
EP3636796A1 (fr) * | 2018-10-10 | 2020-04-15 | Comadur S.A. | Procede de durcissement d'un traitement antireflet depose sur un substrat transparent et substrat transparent comprenant un traitement antireflet durci |
TW202038326A (zh) * | 2019-01-11 | 2020-10-16 | 日商索尼半導體解決方案公司 | 氧化物半導體膜之蝕刻方法 |
EP3696151A1 (fr) * | 2019-02-18 | 2020-08-19 | Rolex Sa | Glace de montre colorée |
EP4113220A1 (fr) * | 2021-07-02 | 2023-01-04 | Comadur SA | Procédé de traitement de surface d'une pierre, notamment pour l'horlogerie |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06330314A (ja) * | 1993-05-17 | 1994-11-29 | Japan Steel Works Ltd:The | イオン注入法による傾斜機能材料の製造方法および製造装置 |
US6979630B2 (en) * | 2002-08-08 | 2005-12-27 | Isonics Corporation | Method and apparatus for transferring a thin layer of semiconductor material |
FR2879625B1 (fr) * | 2004-02-04 | 2007-04-27 | Guernalec Frederic | Dispositif de nitruration par implantation ionique d'une piece en alliage d'aluminium et procede mettant en oeuvre un tel dispositif |
US20060210783A1 (en) * | 2005-03-18 | 2006-09-21 | Seder Thomas A | Coated article with anti-reflective coating and method of making same |
JP2007109474A (ja) * | 2005-10-12 | 2007-04-26 | Fujifilm Corp | イオン注入装置 |
FR2899242B1 (fr) * | 2007-04-05 | 2010-10-22 | Quertech Ingenierie | Procede de durcissement par implantation d'ions d'helium dans une piece metallique |
JP2009216452A (ja) * | 2008-03-07 | 2009-09-24 | Seiko Epson Corp | 透光性部材、時計、および透光性部材の製造方法 |
CN102066624B (zh) * | 2008-06-12 | 2013-03-13 | 韩国原子力研究院 | 制造颜色受控的蓝宝石的方法 |
TWI453949B (zh) * | 2009-12-30 | 2014-09-21 | Hon Hai Prec Ind Co Ltd | 發光二極體製作方法 |
TWM443936U (en) * | 2011-11-17 | 2012-12-21 | Tera Xtal Technology Corp | Touch panel structure |
KR20130065097A (ko) * | 2011-12-09 | 2013-06-19 | 엘지이노텍 주식회사 | 발광 소자의 제조 방법 |
TWI573049B (zh) * | 2012-06-06 | 2017-03-01 | 鴻海精密工業股份有限公司 | 觸控螢幕及顯示裝置 |
US8852695B2 (en) * | 2012-09-10 | 2014-10-07 | The Research Foundation For The State University Of New York | Optical barriers, waveguides, and methods for fabricating barriers and waveguides for use in harsh environments |
US9092187B2 (en) * | 2013-01-08 | 2015-07-28 | Apple Inc. | Ion implant indicia for cover glass or display component |
US9623628B2 (en) * | 2013-01-10 | 2017-04-18 | Apple Inc. | Sapphire component with residual compressive stress |
EP2789004A1 (en) * | 2013-02-12 | 2014-10-15 | Apple Inc. | Multi-step ion implantation |
US9416442B2 (en) * | 2013-03-02 | 2016-08-16 | Apple Inc. | Sapphire property modification through ion implantation |
EP2778252A3 (en) * | 2013-03-15 | 2014-12-10 | Apple Inc. | Layered Coatings For Sapphire Structure |
FR3009217B1 (fr) * | 2013-08-01 | 2016-10-28 | Quertech | Procede de traitement de poudre a base d'oxyde de cerium |
JP6878009B2 (ja) * | 2014-05-23 | 2021-05-26 | ケルテック | 防眩サファイア材料を製造するための一価及び/又は多価ガスイオンビーム処理方法 |
CA2961865A1 (en) * | 2014-10-24 | 2016-04-28 | Agc Glass Europe | Ion implantation process and ion implanted glass substrates |
US10280504B2 (en) * | 2015-09-25 | 2019-05-07 | Apple Inc. | Ion-implanted, anti-reflective layer formed within sapphire material |
JP7015788B2 (ja) * | 2016-04-12 | 2022-02-15 | エージーシー グラス ユーロップ | 反射防止、耐引掻性ガラス基板およびその製造方法 |
US20190119154A1 (en) * | 2016-04-12 | 2019-04-25 | Agc Glass Europe | Glass substrate with reduced internal reflectance and method for manufacturing the same |
KR20190116050A (ko) * | 2016-04-12 | 2019-10-14 | 에이쥐씨 글래스 유럽 | 청색 반사 유리 기판 및 이의 제조 방법 |
KR102325576B1 (ko) * | 2016-04-12 | 2021-11-15 | 에이쥐씨 글래스 유럽 | 반사 방지 유리 기판 및 그의 제조 방법 |
SG11201808096PA (en) * | 2016-04-12 | 2018-10-30 | Agc Glass Europe | Neutral color antireflective glass substrate and method for manufacturing the same |
US20190119155A1 (en) * | 2016-04-12 | 2019-04-25 | Agc Glass Europe | Heat treatable antireflective glass substrate and method for manufacturing the same |
FR3062658B1 (fr) * | 2017-02-03 | 2022-06-24 | Sa Quertech | Procede de traitement antireflectif et resistant a la rayure dans un saphir synthetique |
FR3062855B1 (fr) * | 2017-02-14 | 2019-04-19 | Sa Quertech | Procede de traitement par un faisceau d ions pour produire un saphir antifreflet a haute transmittance resistant a la rayure. |
EP3389078A1 (fr) * | 2017-04-13 | 2018-10-17 | The Swatch Group Research and Development Ltd | Procédé d'implantation d'ions multichargés sur une surface d'un objet à traiter et installation pour la mise en oeuvre de ce procédé |
-
2015
- 2015-03-23 JP JP2016568901A patent/JP6878009B2/ja active Active
- 2015-03-23 CN CN201580036710.2A patent/CN106662958B/zh active Active
- 2015-03-23 EA EA201692408A patent/EA035316B9/ru not_active IP Right Cessation
- 2015-03-23 KR KR1020167035994A patent/KR102320294B1/ko active IP Right Grant
- 2015-03-23 US US15/312,572 patent/US10982312B2/en active Active
- 2015-03-23 EP EP15711748.2A patent/EP3146086B1/en active Active
- 2015-03-23 AU AU2015263472A patent/AU2015263472B2/en active Active
- 2015-03-23 CA CA2949923A patent/CA2949923A1/en not_active Abandoned
- 2015-03-23 SG SG11201609845VA patent/SG11201609845VA/en unknown
- 2015-03-23 WO PCT/EP2015/056116 patent/WO2015176850A1/en active Application Filing
- 2015-05-22 SG SG11201609846RA patent/SG11201609846RA/en unknown
- 2015-05-22 KR KR1020167036057A patent/KR102363999B1/ko active IP Right Grant
- 2015-05-22 WO PCT/EP2015/061363 patent/WO2015177334A1/en active Application Filing
- 2015-05-22 AU AU2015261820A patent/AU2015261820B2/en not_active Ceased
- 2015-05-22 JP JP2016568619A patent/JP6626008B2/ja active Active
- 2015-05-22 EP EP15726066.2A patent/EP3146416A1/en active Pending
- 2015-05-22 CA CA2949878A patent/CA2949878A1/en not_active Abandoned
- 2015-05-22 EA EA201692406A patent/EA034019B1/ru not_active IP Right Cessation
- 2015-05-22 CN CN201580035555.2A patent/CN106661724B/zh active Active
- 2015-05-22 US US15/312,583 patent/US10196731B2/en active Active
Also Published As
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EA201692408A1 (ru) | Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала | |
PH12015501772A1 (en) | Ion beam treatment method for producing superhydrophilic glass materials | |
PL3711080T3 (pl) | Zsynchronizowane pulsowanie źródła przetwarzania plazmy oraz polaryzacji podłoża | |
EP3581209A3 (en) | Reactive gas generation system and method of treatment using reactive gas | |
GB2530926A (en) | Poly(alkyenylamide)-polysaccharide hydrogels for treatment of subterranean formations | |
PH12017500559A1 (en) | Ion implantation process and ion implanted glass substrates | |
SG10201900327YA (en) | A method of cvd plasma processing with a toroidal plasma processing apparatus | |
MY183097A (en) | Implant masking and alignment system with rollers | |
WO2015123720A8 (en) | Plasma hydrogel therapy | |
SG10201806260UA (en) | Device and method for electro-fenton process using a carbon electrode and its application for removal of organic pollutants | |
EP3571899A4 (en) | PLASMA GENERATION AND GAS TREATMENT APPARATUS | |
WO2012001325A3 (fr) | Procede de traitement de surface d'un dispositif de distribution de produit fluide. | |
EA201791560A1 (ru) | Порошковый состав для интраназального введения для лечения гипогликемии | |
MY173489A (en) | Process for dehumidifying moist gas mixtures | |
EP4353320A3 (en) | Blood plasma and plasma fractions as therapy for tumor growth and progression | |
BR112019005040A2 (pt) | aplicação de pridopidina para tratamento de síndrome de rett | |
MX2021001517A (es) | Terapia basada en microarn dirigida contra canceres positivos para proteina citosolica de linfocito 1 (lcp-1). | |
WO2014160886A3 (en) | Systems and methods for treating material surfaces | |
EP3268505A4 (en) | Method for neutral beam processing based on gas cluster ion beam technology and articles produced thereby | |
EP3807402A4 (en) | METHOD FOR GENERATE INDUCED OLIGODENDROCYTE LINEAGE CELLS AND TREATMENT USING SUCH CELLS | |
MX2021013461A (es) | Metodo para tratar cancer urotelial del tracto inferior. | |
NZ744845A (en) | Cancer treatment | |
MX2018007275A (es) | Proceso para tratamiento de superficie con fase gaseosa. | |
SG11202007515XA (en) | Pancreatic cells for treating diabetes and methods of generating the same | |
SG11201907014WA (en) | Method for anti-reflective and scratch-resistant treatment of synthetic sapphire |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TH4A | Publication of the corrected specification to eurasian patent | ||
MM4A | Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s) |
Designated state(s): AM AZ BY KZ KG TJ TM |