EA201692408A1 - Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала - Google Patents

Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала

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Publication number
EA201692408A1
EA201692408A1 EA201692408A EA201692408A EA201692408A1 EA 201692408 A1 EA201692408 A1 EA 201692408A1 EA 201692408 A EA201692408 A EA 201692408A EA 201692408 A EA201692408 A EA 201692408A EA 201692408 A1 EA201692408 A1 EA 201692408A1
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EA
Eurasian Patent Office
Prior art keywords
sapphire material
gas ions
sappire
multiplay
treating
Prior art date
Application number
EA201692408A
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English (en)
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EA035316B1 (ru
EA035316B9 (ru
Inventor
Фредерик Герналек
Дени Бусардо
Original Assignee
Кертек
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Publication date
Priority claimed from FR1401172A external-priority patent/FR3021332B1/fr
Priority claimed from FR1402293A external-priority patent/FR3027120B1/fr
Application filed by Кертек filed Critical Кертек
Publication of EA201692408A1 publication Critical patent/EA201692408A1/ru
Publication of EA035316B1 publication Critical patent/EA035316B1/ru
Publication of EA035316B9 publication Critical patent/EA035316B9/ru

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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00Compounds of aluminium
    • C01F7/02Aluminium oxide; Aluminium hydroxide; Aluminates
    • C01F7/021After-treatment of oxides or hydroxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48Ion implantation
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/16Oxides
    • C30B29/20Aluminium oxides
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/04After-treatment of single crystals or homogeneous polycrystalline material with defined structure using electric or magnetic fields or particle radiation
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
    • C23C14/5826Treatment with charged particles
    • C23C14/5833Ion beam bombardment
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Human Computer Interaction (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

Способ обработки сапфирового материала включает облучение поверхности сапфирового материала, причём поверхность прилегает к среде, отличной от сапфирового материала, пучком одно- и/или многозарядных ионов газа так, чтобы получить ионно-имплантированный слой в сапфировом материале, причём ионы выбраны из ионов элементов из списка, состоящего из гелия (Не), неона (Ne), аргона (Ar), криптона (Kr), ксенона (Хе), бора (В), углерода (С), азота (N), кислорода (О), фтора (F), кремния (Si), фосфора (Р) и серы (S). Обработка даёт антибликовый эффект на обработанных материалах (61, 62, 63) по сравнению с необработанными подложками (60). Указанный способ может быть использован для получения ёмкостной сенсорной панели с высоким пропусканием в видимом диапазоне.
EA201692408A 2014-05-23 2015-03-23 Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала EA035316B9 (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1401172A FR3021332B1 (fr) 2014-05-23 2014-05-23 Procede de traitement par un faisceau d'ions d'un gaz mono et multicharges pour produire des materiaux en saphir synthetique antireflet
FR1402293A FR3027120B1 (fr) 2014-10-09 2014-10-09 Dalle tactile capacitive a haute transmission dans le domaine visible et inrayable
PCT/EP2015/056116 WO2015176850A1 (en) 2014-05-23 2015-03-23 Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material

Publications (3)

Publication Number Publication Date
EA201692408A1 true EA201692408A1 (ru) 2017-04-28
EA035316B1 EA035316B1 (ru) 2020-05-27
EA035316B9 EA035316B9 (ru) 2020-07-27

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Family Applications (2)

Application Number Title Priority Date Filing Date
EA201692408A EA035316B9 (ru) 2014-05-23 2015-03-23 Способ обработки сапфирового материала пучком одно- и/или многозарядных ионов газа для получения антибликового материала
EA201692406A EA034019B1 (ru) 2014-05-23 2015-05-22 СПОСОБ ОБРАБОТКИ ПОВЕРХНОСТИ ДЕТАЛИ ИЗ СИНТЕТИЧЕСКОГО САПФИРОВОГО МАТЕРИАЛА ДЛЯ МОДИФИКАЦИИ ОТРАЖАЮЩИХ СВОЙСТВ УКАЗАННОЙ ПОВЕРХНОСТИ В ИНТЕРВАЛЕ ДЛИН ВОЛН 400-800 нм

Family Applications After (1)

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EA201692406A EA034019B1 (ru) 2014-05-23 2015-05-22 СПОСОБ ОБРАБОТКИ ПОВЕРХНОСТИ ДЕТАЛИ ИЗ СИНТЕТИЧЕСКОГО САПФИРОВОГО МАТЕРИАЛА ДЛЯ МОДИФИКАЦИИ ОТРАЖАЮЩИХ СВОЙСТВ УКАЗАННОЙ ПОВЕРХНОСТИ В ИНТЕРВАЛЕ ДЛИН ВОЛН 400-800 нм

Country Status (10)

Country Link
US (2) US10982312B2 (ru)
EP (2) EP3146086B1 (ru)
JP (2) JP6878009B2 (ru)
KR (2) KR102320294B1 (ru)
CN (2) CN106662958B (ru)
AU (2) AU2015263472B2 (ru)
CA (2) CA2949923A1 (ru)
EA (2) EA035316B9 (ru)
SG (2) SG11201609845VA (ru)
WO (2) WO2015176850A1 (ru)

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EP3389078A1 (fr) * 2017-04-13 2018-10-17 The Swatch Group Research and Development Ltd Procédé d'implantation d'ions multichargés sur une surface d'un objet à traiter et installation pour la mise en oeuvre de ce procédé

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JP2017516737A (ja) 2017-06-22
US20170107641A1 (en) 2017-04-20
AU2015261820A1 (en) 2016-12-08
AU2015263472B2 (en) 2019-06-27
EA034019B1 (ru) 2019-12-19
EP3146086A1 (en) 2017-03-29
KR102363999B1 (ko) 2022-02-16
JP2017518440A (ja) 2017-07-06
WO2015176850A1 (en) 2015-11-26
WO2015177334A1 (en) 2015-11-26
CN106661724B (zh) 2020-06-30
KR20170008302A (ko) 2017-01-23
KR102320294B1 (ko) 2021-11-01
CN106661724A (zh) 2017-05-10
US10982312B2 (en) 2021-04-20
US10196731B2 (en) 2019-02-05
CA2949878A1 (en) 2015-11-26
EP3146416A1 (en) 2017-03-29
US20170114442A1 (en) 2017-04-27
AU2015261820B2 (en) 2020-09-10
SG11201609845VA (en) 2016-12-29
CN106662958A (zh) 2017-05-10
SG11201609846RA (en) 2016-12-29
JP6878009B2 (ja) 2021-05-26
CA2949923A1 (en) 2015-11-26
EP3146086B1 (en) 2019-10-02
EA201692406A1 (ru) 2017-04-28
AU2015263472A1 (en) 2016-12-08
EA035316B1 (ru) 2020-05-27
KR20170008851A (ko) 2017-01-24
EA035316B9 (ru) 2020-07-27
JP6626008B2 (ja) 2019-12-25
CN106662958B (zh) 2020-03-06

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