SG11201609845VA - Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material - Google Patents
Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire materialInfo
- Publication number
- SG11201609845VA SG11201609845VA SG11201609845VA SG11201609845VA SG11201609845VA SG 11201609845V A SG11201609845V A SG 11201609845VA SG 11201609845V A SG11201609845V A SG 11201609845VA SG 11201609845V A SG11201609845V A SG 11201609845VA SG 11201609845V A SG11201609845V A SG 11201609845VA
- Authority
- SG
- Singapore
- Prior art keywords
- producing
- ion beam
- treatment method
- beam treatment
- gas ion
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
- C01F7/00—Compounds of aluminium
- C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
- C01F7/021—After-treatment of oxides or hydroxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/48—Ion implantation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/20—Aluminium oxides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/04—After-treatment of single crystals or homogeneous polycrystalline material with defined structure using electric or magnetic fields or particle radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
- G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Treatment with charged particles
- C23C14/5833—Ion beam bombardment
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Human Computer Interaction (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1401172A FR3021332B1 (fr) | 2014-05-23 | 2014-05-23 | Procede de traitement par un faisceau d'ions d'un gaz mono et multicharges pour produire des materiaux en saphir synthetique antireflet |
| FR1402293A FR3027120B1 (fr) | 2014-10-09 | 2014-10-09 | Dalle tactile capacitive a haute transmission dans le domaine visible et inrayable |
| PCT/EP2015/056116 WO2015176850A1 (en) | 2014-05-23 | 2015-03-23 | Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201609845VA true SG11201609845VA (en) | 2016-12-29 |
Family
ID=52727135
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201609845VA SG11201609845VA (en) | 2014-05-23 | 2015-03-23 | Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material |
| SG11201609846RA SG11201609846RA (en) | 2014-05-23 | 2015-05-22 | Treatment method for modifying the reflected colour of a sapphire material surface |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201609846RA SG11201609846RA (en) | 2014-05-23 | 2015-05-22 | Treatment method for modifying the reflected colour of a sapphire material surface |
Country Status (10)
| Country | Link |
|---|---|
| US (2) | US10982312B2 (ru) |
| EP (2) | EP3146086B1 (ru) |
| JP (2) | JP6878009B2 (ru) |
| KR (2) | KR102320294B1 (ru) |
| CN (2) | CN106662958B (ru) |
| AU (2) | AU2015263472B2 (ru) |
| CA (2) | CA2949923A1 (ru) |
| EA (2) | EA035316B9 (ru) |
| SG (2) | SG11201609845VA (ru) |
| WO (2) | WO2015176850A1 (ru) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11535926B2 (en) | 2011-12-23 | 2022-12-27 | Hkbu R&D Licensing Limited | Sapphire thin film coated substrate |
| WO2015176850A1 (en) * | 2014-05-23 | 2015-11-26 | Quertech | Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material |
| WO2017104443A1 (ja) * | 2015-12-16 | 2017-06-22 | 株式会社アルバック | サファイア基板の製造方法及びサファイア基板 |
| TWI653266B (zh) * | 2016-05-19 | 2019-03-11 | 香港浸會大學 | 藍寶石薄膜塗布基材 |
| FR3062855B1 (fr) * | 2017-02-14 | 2019-04-19 | Sa Quertech | Procede de traitement par un faisceau d ions pour produire un saphir antifreflet a haute transmittance resistant a la rayure. |
| EP3389078A1 (fr) * | 2017-04-13 | 2018-10-17 | The Swatch Group Research and Development Ltd | Procédé d'implantation d'ions multichargés sur une surface d'un objet à traiter et installation pour la mise en oeuvre de ce procédé |
| FR3067275B1 (fr) | 2017-06-07 | 2022-08-12 | Timothee Boitouzet | Procede de delignification partielle par voie supercritique ou subcritique et de remplissage d'un materiau ligno-cellulosique |
| EP3632876A1 (fr) * | 2017-10-12 | 2020-04-08 | The Swatch Group Research and Development Ltd | Particules de poudre céramique revetue |
| EP3843123A1 (fr) * | 2017-12-20 | 2021-06-30 | The Swatch Group Research and Development Ltd | Installation pour la mise en oeuvre d'un procédé d'implantation d'ions sur une surface d'un objet à traiter |
| FR3077895B1 (fr) * | 2018-02-09 | 2020-02-28 | Sas Woodoo | Dispositif de detection tactile avec interface tactile en materiau composite |
| US10488560B2 (en) * | 2018-02-13 | 2019-11-26 | Visera Technologies Company Limited | Optical elements |
| EP3556911A1 (fr) * | 2018-04-19 | 2019-10-23 | Comadur S.A. | Procédé de structuration d'un motif décoratif ou technique dans un objet réalisé en un matériau amorphe, semi-cristallin ou cristallin au moins partiellement transparent |
| WO2019238868A1 (en) * | 2018-06-14 | 2019-12-19 | Agc Glass Europe | Reflectance reduction of substrate for transmitting infrared light |
| EP3636796A1 (fr) * | 2018-10-10 | 2020-04-15 | Comadur S.A. | Procede de durcissement d'un traitement antireflet depose sur un substrat transparent et substrat transparent comprenant un traitement antireflet durci |
| TW202038326A (zh) * | 2019-01-11 | 2020-10-16 | 日商索尼半導體解決方案公司 | 氧化物半導體膜之蝕刻方法 |
| EP3696151A1 (fr) * | 2019-02-18 | 2020-08-19 | Rolex Sa | Glace de montre colorée |
| EP4113220A1 (fr) * | 2021-07-02 | 2023-01-04 | Comadur SA | Procédé de traitement de surface d'une pierre, notamment pour l'horlogerie |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06330314A (ja) * | 1993-05-17 | 1994-11-29 | Japan Steel Works Ltd:The | イオン注入法による傾斜機能材料の製造方法および製造装置 |
| US6979630B2 (en) * | 2002-08-08 | 2005-12-27 | Isonics Corporation | Method and apparatus for transferring a thin layer of semiconductor material |
| FR2879625B1 (fr) * | 2004-02-04 | 2007-04-27 | Guernalec Frederic | Dispositif de nitruration par implantation ionique d'une piece en alliage d'aluminium et procede mettant en oeuvre un tel dispositif |
| US20060210783A1 (en) * | 2005-03-18 | 2006-09-21 | Seder Thomas A | Coated article with anti-reflective coating and method of making same |
| JP2007109474A (ja) * | 2005-10-12 | 2007-04-26 | Fujifilm Corp | イオン注入装置 |
| FR2899242B1 (fr) | 2007-04-05 | 2010-10-22 | Quertech Ingenierie | Procede de durcissement par implantation d'ions d'helium dans une piece metallique |
| JP2009216452A (ja) * | 2008-03-07 | 2009-09-24 | Seiko Epson Corp | 透光性部材、時計、および透光性部材の製造方法 |
| JP5463352B2 (ja) * | 2008-06-12 | 2014-04-09 | コリア アトミック エナジー リサーチ インスティチュート | 発色調節されたサファイアの製造方法 |
| TWI453949B (zh) * | 2009-12-30 | 2014-09-21 | Hon Hai Prec Ind Co Ltd | 發光二極體製作方法 |
| TWM443936U (en) * | 2011-11-17 | 2012-12-21 | Tera Xtal Technology Corp | Touch panel structure |
| KR20130065097A (ko) * | 2011-12-09 | 2013-06-19 | 엘지이노텍 주식회사 | 발광 소자의 제조 방법 |
| TWI573049B (zh) * | 2012-06-06 | 2017-03-01 | 鴻海精密工業股份有限公司 | 觸控螢幕及顯示裝置 |
| US8852695B2 (en) * | 2012-09-10 | 2014-10-07 | The Research Foundation For The State University Of New York | Optical barriers, waveguides, and methods for fabricating barriers and waveguides for use in harsh environments |
| US9092187B2 (en) * | 2013-01-08 | 2015-07-28 | Apple Inc. | Ion implant indicia for cover glass or display component |
| US9623628B2 (en) * | 2013-01-10 | 2017-04-18 | Apple Inc. | Sapphire component with residual compressive stress |
| EP2789004A1 (en) * | 2013-02-12 | 2014-10-15 | Apple Inc. | Multi-step ion implantation |
| US9416442B2 (en) * | 2013-03-02 | 2016-08-16 | Apple Inc. | Sapphire property modification through ion implantation |
| EP2778252A3 (en) * | 2013-03-15 | 2014-12-10 | Apple Inc. | Layered Coatings For Sapphire Structure |
| FR3009217B1 (fr) * | 2013-08-01 | 2016-10-28 | Quertech | Procede de traitement de poudre a base d'oxyde de cerium |
| WO2015176850A1 (en) * | 2014-05-23 | 2015-11-26 | Quertech | Single- and/or multi-charged gas ion beam treatment method for producing an anti-glare sapphire material |
| EP3209623A1 (en) * | 2014-10-24 | 2017-08-30 | AGC Glass Europe | Ion implantation process and ion implanted glass substrates |
| US10280504B2 (en) * | 2015-09-25 | 2019-05-07 | Apple Inc. | Ion-implanted, anti-reflective layer formed within sapphire material |
| BR112018070870A2 (pt) * | 2016-04-12 | 2019-02-05 | Agc Glass Company North America | substrato de vidro antirrefletivo termicamente tratável e método de fabricação do mesmo |
| US20190092683A1 (en) * | 2016-04-12 | 2019-03-28 | Agc Glass Europe | Antireflective, scratch-resistant glass substrate and method for manufacturing the same |
| CN109963821A (zh) * | 2016-04-12 | 2019-07-02 | 旭硝子欧洲玻璃公司 | 蓝色反射玻璃基板及其制造方法 |
| EA201892197A1 (ru) * | 2016-04-12 | 2019-04-30 | Агк Гласс Юроп | Стеклянная подложка со сниженным внутренним отражением и способ ее изготовления |
| EA201892161A1 (ru) * | 2016-04-12 | 2019-04-30 | Агк Гласс Юроп Са | Противоотражающая стеклянная подложка нейтрального цвета и способ ее изготовления |
| EA201892122A1 (ru) * | 2016-04-12 | 2019-06-28 | Агк Гласс Юроп | Противоотражающая стеклянная подложка и способ ее изготовления |
| FR3062658B1 (fr) * | 2017-02-03 | 2022-06-24 | Sa Quertech | Procede de traitement antireflectif et resistant a la rayure dans un saphir synthetique |
| FR3062855B1 (fr) * | 2017-02-14 | 2019-04-19 | Sa Quertech | Procede de traitement par un faisceau d ions pour produire un saphir antifreflet a haute transmittance resistant a la rayure. |
| EP3389078A1 (fr) * | 2017-04-13 | 2018-10-17 | The Swatch Group Research and Development Ltd | Procédé d'implantation d'ions multichargés sur une surface d'un objet à traiter et installation pour la mise en oeuvre de ce procédé |
-
2015
- 2015-03-23 WO PCT/EP2015/056116 patent/WO2015176850A1/en active Application Filing
- 2015-03-23 CN CN201580036710.2A patent/CN106662958B/zh active Active
- 2015-03-23 AU AU2015263472A patent/AU2015263472B2/en active Active
- 2015-03-23 JP JP2016568901A patent/JP6878009B2/ja active Active
- 2015-03-23 EP EP15711748.2A patent/EP3146086B1/en active Active
- 2015-03-23 CA CA2949923A patent/CA2949923A1/en not_active Abandoned
- 2015-03-23 KR KR1020167035994A patent/KR102320294B1/ko active IP Right Grant
- 2015-03-23 US US15/312,572 patent/US10982312B2/en active Active
- 2015-03-23 SG SG11201609845VA patent/SG11201609845VA/en unknown
- 2015-03-23 EA EA201692408A patent/EA035316B9/ru not_active IP Right Cessation
- 2015-05-22 KR KR1020167036057A patent/KR102363999B1/ko active IP Right Grant
- 2015-05-22 SG SG11201609846RA patent/SG11201609846RA/en unknown
- 2015-05-22 AU AU2015261820A patent/AU2015261820B2/en not_active Ceased
- 2015-05-22 US US15/312,583 patent/US10196731B2/en active Active
- 2015-05-22 EA EA201692406A patent/EA034019B1/ru not_active IP Right Cessation
- 2015-05-22 JP JP2016568619A patent/JP6626008B2/ja active Active
- 2015-05-22 WO PCT/EP2015/061363 patent/WO2015177334A1/en active Application Filing
- 2015-05-22 CA CA2949878A patent/CA2949878A1/en not_active Abandoned
- 2015-05-22 CN CN201580035555.2A patent/CN106661724B/zh active Active
- 2015-05-22 EP EP15726066.2A patent/EP3146416A1/en active Pending
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