DK3481976T3 - Fremgangsmåde til galvanisk pådampning af zink og zinklegeringslag fra et alkalisk coatingbad med reduceret neddbrydning af organiske badtilsætningsstoffer - Google Patents

Fremgangsmåde til galvanisk pådampning af zink og zinklegeringslag fra et alkalisk coatingbad med reduceret neddbrydning af organiske badtilsætningsstoffer Download PDF

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Publication number
DK3481976T3
DK3481976T3 DK18702306.4T DK18702306T DK3481976T3 DK 3481976 T3 DK3481976 T3 DK 3481976T3 DK 18702306 T DK18702306 T DK 18702306T DK 3481976 T3 DK3481976 T3 DK 3481976T3
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DK
Denmark
Prior art keywords
zinc
alkalic
galvanic
evaporation
procedure
Prior art date
Application number
DK18702306.4T
Other languages
English (en)
Inventor
Volker Wohlfarth
Ralph Krauss
Michael Zöllinger
Original Assignee
Dr Ing Max Schloetter Gmbh & Co Kg
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Application filed by Dr Ing Max Schloetter Gmbh & Co Kg filed Critical Dr Ing Max Schloetter Gmbh & Co Kg
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Publication of DK3481976T3 publication Critical patent/DK3481976T3/da

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • C23C28/3225—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only with at least one zinc-based layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C23C4/08—Metallic material containing only metal elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/18—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C25D21/14—Controlled addition of electrolyte components
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/22—Electroplating: Baths therefor from solutions of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
DK18702306.4T 2017-02-07 2018-02-05 Fremgangsmåde til galvanisk pådampning af zink og zinklegeringslag fra et alkalisk coatingbad med reduceret neddbrydning af organiske badtilsætningsstoffer DK3481976T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP17155082.5A EP3358045A1 (de) 2017-02-07 2017-02-07 Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen
PCT/EP2018/052779 WO2018146041A1 (de) 2017-02-07 2018-02-05 Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen

Publications (1)

Publication Number Publication Date
DK3481976T3 true DK3481976T3 (da) 2020-05-18

Family

ID=57995081

Family Applications (1)

Application Number Title Priority Date Filing Date
DK18702306.4T DK3481976T3 (da) 2017-02-07 2018-02-05 Fremgangsmåde til galvanisk pådampning af zink og zinklegeringslag fra et alkalisk coatingbad med reduceret neddbrydning af organiske badtilsætningsstoffer

Country Status (18)

Country Link
US (1) US11339492B2 (da)
EP (2) EP3358045A1 (da)
JP (1) JP6644952B2 (da)
KR (1) KR102086616B1 (da)
CN (1) CN110325669B (da)
BR (1) BR112019004029B1 (da)
DK (1) DK3481976T3 (da)
ES (1) ES2790584T3 (da)
HR (1) HRP20200760T1 (da)
HU (1) HUE049752T2 (da)
MX (1) MX2019002586A (da)
PH (1) PH12019500424A1 (da)
PL (1) PL3481976T3 (da)
PT (1) PT3481976T (da)
RU (1) RU2724765C1 (da)
SI (1) SI3481976T1 (da)
TW (1) TWI763777B (da)
WO (1) WO2018146041A1 (da)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110462107A (zh) * 2019-02-15 2019-11-15 迪普索股份公司 锌或锌合金电镀方法和系统
JPWO2021131340A1 (da) * 2019-12-23 2021-07-01
CN116670334A (zh) 2020-12-28 2023-08-29 迪普索股份公司 用金属对物品进行电镀的方法和系统
JP7233793B1 (ja) * 2021-12-02 2023-03-07 ディップソール株式会社 金属で物品を電気めっきする方法及びシステム
JP7442866B1 (ja) 2022-11-25 2024-03-05 ディップソール株式会社 電気めっき用陽極並びに金属で物品を電気めっきする方法及びシステム

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US2243696A (en) * 1937-02-01 1941-05-27 Du Pont Process for electrodeposition of zinc and anode therefor
JPS5135190B2 (da) * 1972-04-29 1976-09-30
JPS534931B2 (da) 1973-12-20 1978-02-22
CA1232227A (en) * 1982-02-18 1988-02-02 Christopher Vance Manufacturing electrode by immersing substrate in aluminium halide and other metal solution and electroplating
US4814048A (en) 1987-06-24 1989-03-21 Sumitomo Metal Industries, Ltd. Pb alloy insoluble anode and continuous electroplating of zinc using it
DE19834353C2 (de) 1998-07-30 2000-08-17 Hillebrand Walter Gmbh & Co Kg Alkalisches Zink-Nickelbad
US7247229B2 (en) * 1999-06-28 2007-07-24 Eltech Systems Corporation Coatings for the inhibition of undesirable oxidation in an electrochemical cell
DE60023190T3 (de) 2000-06-15 2016-03-10 Coventya, Inc. Zink-nickel-elektroplattierung
US20020009638A1 (en) * 2000-06-23 2002-01-24 Marion Dattilo Composite coated electrode and method of fabricating the same
US8377283B2 (en) 2002-11-25 2013-02-19 Coventya, Inc. Zinc and zinc-alloy electroplating
DE10306823B4 (de) * 2003-02-19 2010-07-08 Enthone Inc., West Haven Verfahren und Elektrolyt zur Hochgeschwindigkeitsabscheidung von Zink-Mangan-Legierungen
AU2003239929A1 (en) * 2003-06-03 2005-01-04 Coventya Sas Zinc and zinc-alloy electroplating
DE10345594A1 (de) 2003-09-29 2005-05-04 Niederrhein Hochschule Verfahren und Zelle zur elektrochemischen Oxidation von Cyaniden
US20050133376A1 (en) * 2003-12-19 2005-06-23 Opaskar Vincent C. Alkaline zinc-nickel alloy plating compositions, processes and articles therefrom
FR2864553B1 (fr) 2003-12-31 2006-09-01 Coventya Installation de depot de zinc ou d'alliages de zinc
ES2324169T3 (es) 2005-04-26 2009-07-31 Atotech Deutschland Gmbh Baño galvanico alcalino con una membrana de filtracion.
DE102008056776A1 (de) * 2008-11-11 2010-05-12 Enthone Inc., West Haven Galvanisches Bad und Verfahren zur Abscheidung von zinkhaltigen Schichten
DE102008058086B4 (de) 2008-11-18 2013-05-23 Atotech Deutschland Gmbh Verfahren und Vorrichtung zur Reinigung von galvanischen Bädern zur Abscheidung von Metallen
ES2384135T3 (es) 2009-08-25 2012-06-29 Thyssenkrupp Steel Europe Ag Procedimiento para fabricar un componente de acero provisto de un recubrimiento metálico de protección contra la corrosión y componente de acero
ES2788080T3 (es) 2009-09-08 2020-10-20 Atotech Deutschland Gmbh Polímeros con grupos terminales amino y su uso como aditivos para baños galvanoplásticos de zinc y de aleaciones de zinc
PL2384800T3 (pl) * 2010-05-07 2013-07-31 Dr Ing Max Schloetter Gmbh & Co Kg Regeneracja alkalicznych elektrolitów cynkowo-niklowych drogą usuwania jonów cynkowych
US20160024683A1 (en) 2013-03-21 2016-01-28 Atotech Deutschland Gmbh Apparatus and method for electrolytic deposition of metal layers on workpieces
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CN103911650B (zh) * 2014-04-02 2016-07-06 广东达志环保科技股份有限公司 一种应用于碱性锌镍合金电镀的阳极

Also Published As

Publication number Publication date
PH12019500424B1 (en) 2019-05-27
JP6644952B2 (ja) 2020-02-12
PT3481976T (pt) 2020-05-18
MX2019002586A (es) 2019-09-18
EP3481976A1 (de) 2019-05-15
ES2790584T3 (es) 2020-10-28
KR102086616B1 (ko) 2020-03-09
RU2724765C1 (ru) 2020-06-25
HRP20200760T1 (hr) 2020-10-16
WO2018146041A1 (de) 2018-08-16
KR20190099388A (ko) 2019-08-27
EP3358045A1 (de) 2018-08-08
CN110325669B (zh) 2020-11-03
TWI763777B (zh) 2022-05-11
BR112019004029A2 (pt) 2019-08-20
SI3481976T1 (sl) 2020-08-31
PL3481976T3 (pl) 2020-11-02
CN110325669A (zh) 2019-10-11
PH12019500424A1 (en) 2019-05-27
TW201842211A (zh) 2018-12-01
US20190376200A1 (en) 2019-12-12
HUE049752T2 (hu) 2020-10-28
EP3481976B1 (de) 2020-04-15
US11339492B2 (en) 2022-05-24
BR112019004029B1 (pt) 2020-10-27
JP2019530800A (ja) 2019-10-24

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