DK304386A - Fremgangsmaade og apparat til udfaeldning - Google Patents

Fremgangsmaade og apparat til udfaeldning Download PDF

Info

Publication number
DK304386A
DK304386A DK304386A DK304386A DK304386A DK 304386 A DK304386 A DK 304386A DK 304386 A DK304386 A DK 304386A DK 304386 A DK304386 A DK 304386A DK 304386 A DK304386 A DK 304386A
Authority
DK
Denmark
Prior art keywords
cathode
chamber
anode
primary anode
maintain
Prior art date
Application number
DK304386A
Other languages
Danish (da)
English (en)
Other versions
DK304386D0 (da
Inventor
Clark Bergman
Original Assignee
Andal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25173525&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DK304386(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Andal Corp filed Critical Andal Corp
Publication of DK304386D0 publication Critical patent/DK304386D0/da
Publication of DK304386A publication Critical patent/DK304386A/da

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Resonance Imaging Apparatus (AREA)
  • Branch Pipes, Bends, And The Like (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Discharge Heating (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Arc-Extinguishing Devices That Are Switches (AREA)
DK304386A 1985-11-15 1986-06-26 Fremgangsmaade og apparat til udfaeldning DK304386A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/798,484 US4620913A (en) 1985-11-15 1985-11-15 Electric arc vapor deposition method and apparatus

Publications (2)

Publication Number Publication Date
DK304386D0 DK304386D0 (da) 1986-06-26
DK304386A true DK304386A (da) 1987-05-16

Family

ID=25173525

Family Applications (1)

Application Number Title Priority Date Filing Date
DK304386A DK304386A (da) 1985-11-15 1986-06-26 Fremgangsmaade og apparat til udfaeldning

Country Status (12)

Country Link
US (1) US4620913A (fr)
EP (1) EP0225680B1 (fr)
JP (1) JPS62120472A (fr)
CN (1) CN86104365A (fr)
AT (1) ATE43648T1 (fr)
BR (1) BR8602994A (fr)
CA (1) CA1306972C (fr)
DE (1) DE3663689D1 (fr)
DK (1) DK304386A (fr)
ES (1) ES8801950A1 (fr)
FI (1) FI862732A (fr)
IN (1) IN169091B (fr)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4731539A (en) * 1983-05-26 1988-03-15 Plaur Corporation Method and apparatus for introducing normally solid material into substrate surfaces
US4782267A (en) * 1986-02-07 1988-11-01 Applied Electron Corporation In-situ wide area vacuum ultraviolet lamp
FR2595572B1 (fr) * 1986-03-12 1989-06-16 France Implant Procede de fabrication d'implants chirurgicaux au moins partiellement revetus d'une couche en un compose metallique, et implants realises conformement audit procede
US4728406A (en) * 1986-08-18 1988-03-01 Energy Conversion Devices, Inc. Method for plasma - coating a semiconductor body
US5215640A (en) * 1987-02-03 1993-06-01 Balzers Ag Method and arrangement for stabilizing an arc between an anode and a cathode particularly for vacuum coating devices
US4842710A (en) * 1987-03-23 1989-06-27 Siemens Aktiengesellschaft Method of making mixed nitride films with at least two metals
DE3712205A1 (de) * 1987-04-10 1988-10-20 Detlev Dipl Chem Dr Repenning Verfahren zur herstellung von schichten mit hochharten diamantaehnlichen und/oder reibungsarmen eigenschaften
US4753598A (en) * 1987-07-06 1988-06-28 Asm America, Inc. Pivoting electrical contact
FR2619247A1 (fr) * 1987-08-05 1989-02-10 Realisations Nucleaires Et Implanteur d'ions metalliques
FI79351C (fi) * 1988-01-18 1989-12-11 Asko Anttila Foerfarande och anordning foer ytbelaeggning av material.
US4975230A (en) * 1988-06-17 1990-12-04 Vapor Technologies Inc. Method of making an open pore structure
US4943325A (en) * 1988-10-19 1990-07-24 Black & Veatch, Engineers-Architects Reflector assembly
EP0402441B1 (fr) * 1988-12-20 1998-10-07 Sparkler Filters, Inc. Unite d'entrainement pour filtre de suction
US4936960A (en) * 1989-01-03 1990-06-26 Advanced Energy Industries, Inc. Method and apparatus for recovery from low impedance condition during cathodic arc processes
AU6716390A (en) * 1989-10-02 1991-04-28 Regents Of The University Of California, The Thin film fabrication method and device
US5841236A (en) * 1989-10-02 1998-11-24 The Regents Of The University Of California Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication
US5238546A (en) * 1990-03-01 1993-08-24 Balzers Aktiengesellschaft Method and apparatus for vaporizing materials by plasma arc discharge
DE4006456C1 (en) * 1990-03-01 1991-05-29 Balzers Ag, Balzers, Li Appts. for vaporising material in vacuum - has electron beam gun or laser guided by electromagnet to form cloud or pre-melted spot on the target surface
CA2065581C (fr) 1991-04-22 2002-03-12 Andal Corp. Methode de deposition physique en phase vapeur activee par plasma, et appareil connexe
JPH06506986A (ja) * 1991-04-29 1994-08-04 ナウチノ−プロイズボドストヴェノーエ・プレドプリェティエ・“ノヴァテク” ガス放電プラズマ中での製品の処理方法と装置
DE4125365C1 (fr) * 1991-07-31 1992-05-21 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De
CH683776A5 (de) * 1991-12-05 1994-05-13 Alusuisse Lonza Services Ag Beschichten einer Substratfläche mit einer Permeationssperre.
US5254173A (en) * 1992-01-31 1993-10-19 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Turntable mechanism
DE4203371C1 (fr) * 1992-02-06 1993-02-25 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De
US5393575A (en) * 1992-03-03 1995-02-28 Esterlis; Moisei Method for carrying out surface processes
US5306408A (en) * 1992-06-29 1994-04-26 Ism Technologies, Inc. Method and apparatus for direct ARC plasma deposition of ceramic coatings
US5534314A (en) * 1994-08-31 1996-07-09 University Of Virginia Patent Foundation Directed vapor deposition of electron beam evaporant
WO1996031899A1 (fr) 1995-04-07 1996-10-10 Advanced Energy Industries, Inc. Systeme de traitement par plasma en film mince a quantum d'energie ajustable
EP0784102B1 (fr) * 1996-01-10 2001-12-12 Alcan Technology & Management AG Procédé et dispositif pour revêtir la surface d'un substrat
US5941647A (en) * 1996-08-19 1999-08-24 Citizen Watch Co., Ltd. Guide bush and method of forming hard carbon film over the inner surface of the guide bush
US6077572A (en) * 1997-06-18 2000-06-20 Northeastern University Method of coating edges with diamond-like carbon
US6302136B1 (en) 1997-06-27 2001-10-16 3M Innovative Properties Company Steam valve
GB9722648D0 (en) * 1997-10-24 1997-12-24 Univ Nanyang ARC monitoring
US6103074A (en) * 1998-02-14 2000-08-15 Phygen, Inc. Cathode arc vapor deposition method and apparatus
US6245435B1 (en) 1999-03-01 2001-06-12 Moen Incorporated Decorative corrosion and abrasion resistant coating
US6245280B1 (en) * 1999-06-21 2001-06-12 Energy Conversion Devices, Inc. Method and apparatus for forming polycrystalline particles
DE10010126C2 (de) * 2000-03-03 2002-10-10 Cobes Gmbh Nachrichten Und Dat Verfahren und Vorrichtung zum Plasmabehandeln der Oberfläche von Substraten durch Ionenbeschuß
US7030335B2 (en) * 2000-03-17 2006-04-18 Applied Materials, Inc. Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
GB0108782D0 (en) * 2001-04-07 2001-05-30 Trikon Holdings Ltd Methods and apparatus for forming precursors
US7026057B2 (en) 2002-01-23 2006-04-11 Moen Incorporated Corrosion and abrasion resistant decorative coating
US20070126312A1 (en) * 2002-03-08 2007-06-07 Chien-Min Sung DLC field emission with nano-diamond impregnated metals
US6806629B2 (en) 2002-03-08 2004-10-19 Chien-Min Sung Amorphous diamond materials and associated methods for the use and manufacture thereof
US6949873B2 (en) * 2002-03-08 2005-09-27 Chien-Min Sung Amorphous diamond materials and associated methods for the use and manufacture thereof
US7235912B2 (en) * 2002-03-08 2007-06-26 Chien-Min Sung Diamond-like carbon thermoelectric conversion devices and methods for the use and manufacture thereof
US7358658B2 (en) * 2002-03-08 2008-04-15 Chien-Min Sung Amorphous diamond materials and associated methods for the use and manufacture thereof
WO2008049463A1 (fr) * 2006-10-27 2008-05-02 Oerlikon Trading Ag, Trübbach Procédé et appareil pour fabriquer des substrats nettoyés ou des substrats propres qui sont en outre traités
PL2140476T3 (pl) * 2007-04-17 2016-11-30 Źródło do próżniowo-łukowego osadzania z fazy gazowej oraz komora do łukowego osadzania z fazy gazowej ze źródłem do próżniowo-łukowego osadzania z fazy gazowej
CA2686445C (fr) * 2007-05-25 2015-01-27 Oerlikon Trading Ag, Truebbach Installation et procede de traitement sous vide
KR101854936B1 (ko) * 2010-06-22 2018-06-14 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 지정된 전기장을 갖는 아크 증착 소스
US9893223B2 (en) 2010-11-16 2018-02-13 Suncore Photovoltaics, Inc. Solar electricity generation system
CN103320752B (zh) * 2013-06-19 2016-02-03 储琦 蒸发镀膜设备及其抽气工艺
EP3556901B1 (fr) * 2018-04-20 2021-03-31 Plansee Composite Materials Gmbh Source d'arc sous vide
CN111634892B (zh) * 2020-03-30 2022-11-11 渤海大学 一种氮化铝纳米片自组装微米结构及其制备装置、方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3573098A (en) * 1968-05-09 1971-03-30 Boeing Co Ion beam deposition unit
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
SU1040631A1 (ru) * 1980-06-25 1983-09-07 Предприятие П/Я В-8851 Вакуумно-дуговое устройство
CH650028A5 (de) * 1980-09-26 1985-06-28 Balzers Hochvakuum Anordnung zum gleichfoermigen beschichten von rotationsflaechen durch bedampfen im hochvakuum.
JPS6011103B2 (ja) * 1981-02-23 1985-03-23 レオニド パフロヴイツチ サブレフ 電弧金属蒸発装置用の消耗性陰極
US4351855A (en) * 1981-02-24 1982-09-28 Eduard Pinkhasov Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum
JPS583033A (ja) * 1981-06-30 1983-01-08 Fujitsu Ltd 木構造検索処理装置
US4512867A (en) * 1981-11-24 1985-04-23 Andreev Anatoly A Method and apparatus for controlling plasma generation in vapor deposition
US4505947A (en) * 1982-07-14 1985-03-19 The Standard Oil Company (Ohio) Method for the deposition of coatings upon substrates utilizing a high pressure, non-local thermal equilibrium arc plasma
US4485759A (en) * 1983-01-19 1984-12-04 Multi-Arc Vacuum Systems Inc. Planetary substrate support apparatus for vapor vacuum deposition coating
US4448799A (en) * 1983-04-21 1984-05-15 Multi-Arc Vacuum Systems Inc. Arc-initiating trigger apparatus and method for electric arc vapor deposition coating systems
US4559121A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization for permeable targets
US4430184A (en) * 1983-05-09 1984-02-07 Vac-Tec Systems, Inc. Evaporation arc stabilization
US4559125A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Apparatus for evaporation arc stabilization during the initial clean-up of an arc target
US4556471A (en) * 1983-10-14 1985-12-03 Multi-Arc Vacuum Systems Inc. Physical vapor deposition apparatus
FR2556373B1 (fr) * 1983-12-07 1989-09-08 Vac Tec Syst Procede ameliore et appareil pour la stabilisation d'un arc de pulverisation de cibles non permeables a l'aide d'un anneau d'arret permeable

Also Published As

Publication number Publication date
IN169091B (fr) 1991-09-07
US4620913A (en) 1986-11-04
JPH0510422B2 (fr) 1993-02-09
JPS62120472A (ja) 1987-06-01
CN86104365A (zh) 1987-05-20
ES556678A0 (es) 1988-03-01
EP0225680B1 (fr) 1989-05-31
FI862732A0 (fi) 1986-06-26
DK304386D0 (da) 1986-06-26
ES8801950A1 (es) 1988-03-01
CA1306972C (fr) 1992-09-01
FI862732A (fi) 1987-05-16
DE3663689D1 (en) 1989-07-06
BR8602994A (pt) 1987-11-17
ATE43648T1 (de) 1989-06-15
EP0225680A1 (fr) 1987-06-16

Similar Documents

Publication Publication Date Title
DK304386A (da) Fremgangsmaade og apparat til udfaeldning
SE8205250L (sv) Plasmabagapparat for paleggning av overdrag
DE59203453D1 (de) Lichtbogen-Beschichtungsanlage mit zusätzlicher Ionisationsanode.
ATE406467T1 (de) Plasmabehandlungsvorrichtung mit kombinierter anoden/ionen quelle
ES8303542A1 (es) Un procedimiento y su aparato correspondiente para la metalizacion ionica de un sustrato.
ES467062A1 (es) Electrodo bipolar.
ATE29623T1 (de) Magnetron kathodenzerstauebungssystem.
DK0975818T3 (da) Fremgangsmåde og anordning til PVD belægning
US7241360B2 (en) Method and apparatus for neutralization of ion beam using AC ion source
EP0741404B1 (fr) Procédé d'excitation d'un plasma et système d'électrode pour sa mise en oeuvre
GB1257015A (fr)
US4731540A (en) Ion beam materials processing system with neutralization means and method
Emeléus et al. II. On groups of electrons in the Geissler discharge
KR890003728B1 (ko) 칼라 수상관용 전자총의 내부방전 억제장치
UA16738A1 (uk) Пристрій для обробки підложек іоhами вуглецю
GB1507087A (en) Extractor ion source
JPS55110774A (en) High vacuum ion plating apparatus
SU1750270A1 (ru) Способ получения пленок и устройство для его осуществления
Ikegami et al. A metal ion source for the cyclotron has been developed to accelerate metal ions in the cyclotron. The structure and function of this source were already described before. I) In this report we describe production and acceleration of several metal ions (Li2+, Be 3+, and B3+) in the cyclotron. As the materials to charge, single crystal of LiF, single crystal of B2 3, boron nitride and
JPS5538946A (en) Sputtering apparatus
JPS56102036A (en) Manufacture of thermionic emission type cathode
JPS5513817A (en) Ionization chamber type x-ray detector
JPS642244A (en) Electron shower device for ion implanter
JPS61227839A (ja) イオンシヤワ−装置に非対称交流電圧を印加してイオンエツチングを施こす微細加工法
JPS5658965A (en) Coating formation method by ion plating

Legal Events

Date Code Title Description
AHB Application shelved due to non-payment