DK3033303T3 - Transmissionselektronmikroskopibærer med delvist hydrogeneret grafen - Google Patents
Transmissionselektronmikroskopibærer med delvist hydrogeneret grafen Download PDFInfo
- Publication number
- DK3033303T3 DK3033303T3 DK14750617.4T DK14750617T DK3033303T3 DK 3033303 T3 DK3033303 T3 DK 3033303T3 DK 14750617 T DK14750617 T DK 14750617T DK 3033303 T3 DK3033303 T3 DK 3033303T3
- Authority
- DK
- Denmark
- Prior art keywords
- carriers
- transmission electron
- electron microscopy
- partially hydrogenated
- hydrogenated graphene
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/194—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/194—After-treatment
- C01B32/196—Purification
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
- G01N23/20025—Sample holders or supports therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/48—Biological material, e.g. blood, urine; Haemocytometers
- G01N33/50—Chemical analysis of biological material, e.g. blood, urine; Testing involving biospecific ligand binding methods; Immunological testing
- G01N33/53—Immunoassay; Biospecific binding assay; Materials therefor
- G01N33/543—Immunoassay; Biospecific binding assay; Materials therefor with an insoluble carrier for immobilising immunochemicals
- G01N33/54393—Improving reaction conditions or stability, e.g. by coating or irradiation of surface, by reduction of non-specific binding, by promotion of specific binding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/2007—Holding mechanisms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/2602—Details
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Immunology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- General Physics & Mathematics (AREA)
- Pathology (AREA)
- Inorganic Chemistry (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Molecular Biology (AREA)
- Hematology (AREA)
- Biomedical Technology (AREA)
- Urology & Nephrology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Biotechnology (AREA)
- Microbiology (AREA)
- Cell Biology (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Optics & Photonics (AREA)
- Toxicology (AREA)
- Carbon And Carbon Compounds (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Sampling And Sample Adjustment (AREA)
- Plasma Technology (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Measuring Or Testing Involving Enzymes Or Micro-Organisms (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361865359P | 2013-08-13 | 2013-08-13 | |
| GBGB1318463.5A GB201318463D0 (en) | 2013-08-13 | 2013-10-18 | Graphene Modification |
| PCT/GB2014/052423 WO2015022500A1 (en) | 2013-08-13 | 2014-08-07 | Graphene modification |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DK3033303T3 true DK3033303T3 (da) | 2022-11-28 |
Family
ID=49727003
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK14750617.4T DK3033303T3 (da) | 2013-08-13 | 2014-08-07 | Transmissionselektronmikroskopibærer med delvist hydrogeneret grafen |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US9947505B2 (da) |
| EP (2) | EP4144691A3 (da) |
| JP (2) | JP6434978B2 (da) |
| KR (2) | KR102372067B1 (da) |
| CN (2) | CN109437171B (da) |
| AU (2) | AU2014307798B2 (da) |
| CA (1) | CA2919271C (da) |
| DK (1) | DK3033303T3 (da) |
| ES (1) | ES2930656T3 (da) |
| FI (1) | FI3033303T3 (da) |
| GB (1) | GB201318463D0 (da) |
| IL (2) | IL243747B (da) |
| SG (3) | SG10201807763TA (da) |
| WO (1) | WO2015022500A1 (da) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109994353B (zh) * | 2013-08-13 | 2021-07-20 | 英国研究与创新署 | 包括多孔金属箔的电子显微镜样品支架 |
| ITUB20152559A1 (it) * | 2015-07-28 | 2017-01-28 | Univ Degli Studi Dellaquila | Materiali tridimensionali a base di ossido di grafene (go) |
| GB201613173D0 (en) * | 2016-07-29 | 2016-09-14 | Medical Res Council | Electron microscopy |
| CA3040745A1 (en) * | 2016-11-04 | 2018-05-11 | Ppc Insulators Austria Gmbh | Glaze for a ceramic article |
| CN107093543A (zh) * | 2017-04-02 | 2017-08-25 | 浙江大学 | 一种氧化石墨烯碳支持膜透射电镜载网及其制备方法 |
| US11680914B2 (en) | 2017-10-06 | 2023-06-20 | The Governing Council Of The University Of Toronto | Methods and systems for 3D structure estimation using non-uniform refinement |
| US10752986B2 (en) * | 2017-10-30 | 2020-08-25 | Savannah River Nuclear Solutions, Llc | Method of manufacturing a three-dimensional carbon structure |
| KR102592698B1 (ko) * | 2017-11-29 | 2023-10-24 | 삼성전자주식회사 | 나노결정질 그래핀 및 나노결정질 그래핀의 형성방법 |
| US11180373B2 (en) * | 2017-11-29 | 2021-11-23 | Samsung Electronics Co., Ltd. | Nanocrystalline graphene and method of forming nanocrystalline graphene |
| US11217531B2 (en) | 2018-07-24 | 2022-01-04 | Samsung Electronics Co., Ltd. | Interconnect structure having nanocrystalline graphene cap layer and electronic device including the interconnect structure |
| KR102532605B1 (ko) | 2018-07-24 | 2023-05-15 | 삼성전자주식회사 | 나노결정질 그래핀 캡층을 포함하는 인터커넥트 구조체 및 이 인터커넥트 구조체를 포함하는 전자 소자 |
| KR20200011821A (ko) | 2018-07-25 | 2020-02-04 | 삼성전자주식회사 | 탄소물 직접 성장방법 |
| KR102601607B1 (ko) | 2018-10-01 | 2023-11-13 | 삼성전자주식회사 | 그래핀의 형성방법 |
| JP7189529B2 (ja) * | 2018-10-15 | 2022-12-14 | 国立大学法人 筑波大学 | 環境セルとその製造方法 |
| CN109589996B (zh) * | 2018-11-30 | 2023-04-07 | 清华大学 | 一种TiO2基/二维材料纳米复合光催化纤维膜及其制备方法 |
| CN111470500B (zh) * | 2019-01-23 | 2021-10-08 | 清华大学 | 一种生物活性配体功能化石墨烯薄膜及其制备方法 |
| CN111477265B (zh) * | 2019-01-23 | 2022-12-06 | 清华大学 | 一种功能化石墨烯薄膜在冷冻电镜三维重构中的应用 |
| GB201904187D0 (en) * | 2019-03-26 | 2019-05-08 | Res & Innovation Uk | Graphene functionalization method, apparatus, and functionalized graphene product |
| KR20200126721A (ko) | 2019-04-30 | 2020-11-09 | 삼성전자주식회사 | 그래핀 구조체 및 그래핀 구조체의 형성방법 |
| JP7307464B2 (ja) * | 2019-05-24 | 2023-07-12 | 株式会社大一商会 | 遊技機 |
| JP7307463B2 (ja) * | 2019-05-24 | 2023-07-12 | 株式会社大一商会 | 遊技機 |
| JP7307461B2 (ja) * | 2019-05-24 | 2023-07-12 | 株式会社大一商会 | 遊技機 |
| JP7307462B2 (ja) * | 2019-05-24 | 2023-07-12 | 株式会社大一商会 | 遊技機 |
| JP7307466B2 (ja) * | 2019-05-24 | 2023-07-12 | 株式会社大一商会 | 遊技機 |
| JP7307465B2 (ja) * | 2019-05-24 | 2023-07-12 | 株式会社大一商会 | 遊技機 |
| CN112146967A (zh) * | 2019-06-28 | 2020-12-29 | Fei 公司 | 用于制备和递送用于带电粒子分析的生物样品的系统和方法 |
| JP7370042B2 (ja) * | 2019-08-19 | 2023-10-27 | 国立研究開発法人産業技術総合研究所 | 透過電子顕微鏡試料支持体、その製造方法及びそれを用いたサンプル調整方法 |
| CN111912869A (zh) * | 2019-10-30 | 2020-11-10 | 清华大学 | 一种还原氧化石墨烯膜在冷冻电镜中的应用 |
| US11304304B2 (en) | 2019-11-11 | 2022-04-12 | International Business Machines Corporation | Ionic contaminant cleaning |
| KR102364619B1 (ko) * | 2020-02-17 | 2022-02-17 | 엘지전자 주식회사 | 세포 배양 용기 및 이의 제조 방법 |
| CN111547713A (zh) * | 2020-06-16 | 2020-08-18 | 柯良节 | 一种高纯石墨烯膜的生产设备及其制备方法 |
| KR102373061B1 (ko) * | 2020-06-18 | 2022-03-14 | 한국화학연구원 | 전도성 기재 및 이를 이용한 분석대상물의 분석방법 |
| JPWO2022039251A1 (da) * | 2020-08-20 | 2022-02-24 | ||
| WO2023058676A1 (ja) * | 2021-10-07 | 2023-04-13 | 国立大学法人大阪大学 | グラフェングリッド、グラフェングリッドの製造方法、構造解析対象物質の構造解析方法 |
| KR102558793B1 (ko) * | 2021-11-26 | 2023-07-25 | (주)엠씨케이테크 | 그래핀 복합 구조체 제조방법 및 이로부터 제조되는 그래핀 복합 구조체 |
| CN114348998A (zh) * | 2021-12-15 | 2022-04-15 | 无锡漆好环保新材料研究有限公司 | 一种氧化石墨烯的制备方法 |
| CN116281981B (zh) * | 2023-04-04 | 2024-05-24 | 东华工程科技股份有限公司 | 一种石墨烯制备装置及方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8409450B2 (en) * | 2008-03-24 | 2013-04-02 | The Regents Of The University Of California | Graphene-based structure, method of suspending graphene membrane, and method of depositing material onto graphene membrane |
| CN101694474B (zh) | 2009-10-22 | 2012-10-10 | 浙江大学 | 一种纳米孔电学传感器 |
| FR2952471A1 (fr) * | 2009-11-09 | 2011-05-13 | Commissariat Energie Atomique | Graphene epitaxie sur sic, ayant un gap ouvert et une mobilite comparable a celle du graphene standard a gap nul |
| JP5492574B2 (ja) * | 2010-01-08 | 2014-05-14 | 東京エレクトロン株式会社 | 基板のクリーニング方法及び基板のクリーニング装置 |
| JP2012004272A (ja) * | 2010-06-16 | 2012-01-05 | Sumitomo Electric Ind Ltd | 炭化珪素半導体の洗浄方法および炭化珪素半導体の洗浄装置 |
| US20130277573A1 (en) | 2011-01-07 | 2013-10-24 | Dune Sciences, Inc. | Functionalized carbon membranes |
| TWI456195B (zh) | 2011-01-27 | 2014-10-11 | Univ Nat Cheng Kung | 生醫及微奈米結構物質感測晶片及其製備方法 |
| KR101886871B1 (ko) * | 2011-08-25 | 2018-08-10 | 한국과학기술원 | 질소 도핑된 그라핀, 이를 포함하는 울트라캐패시터 및 이의 제조방법 |
| CN102358614A (zh) * | 2011-10-20 | 2012-02-22 | 中国科学院物理研究所 | 一种石墨烯纳米图案的加工方法 |
| CN104136368B (zh) * | 2012-02-24 | 2017-02-22 | 加州理工学院 | 用于石墨烯形成的方法和系统 |
| WO2014066574A1 (en) * | 2012-10-25 | 2014-05-01 | Applied Materials, Inc. | Growing graphene on substrates |
| US10287677B2 (en) * | 2012-11-19 | 2019-05-14 | The Regents Of The University Of California | Methods of fabricating pillared graphene nanostructures |
-
2013
- 2013-10-18 GB GBGB1318463.5A patent/GB201318463D0/en not_active Ceased
-
2014
- 2014-08-07 CN CN201811078552.9A patent/CN109437171B/zh active Active
- 2014-08-07 US US14/911,718 patent/US9947505B2/en active Active
- 2014-08-07 DK DK14750617.4T patent/DK3033303T3/da active
- 2014-08-07 AU AU2014307798A patent/AU2014307798B2/en active Active
- 2014-08-07 SG SG10201807763TA patent/SG10201807763TA/en unknown
- 2014-08-07 EP EP22201031.6A patent/EP4144691A3/en active Pending
- 2014-08-07 FI FIEP14750617.4T patent/FI3033303T3/fi active
- 2014-08-07 KR KR1020217011409A patent/KR102372067B1/ko active IP Right Grant
- 2014-08-07 ES ES14750617T patent/ES2930656T3/es active Active
- 2014-08-07 KR KR1020167003594A patent/KR102290843B1/ko active IP Right Grant
- 2014-08-07 EP EP14750617.4A patent/EP3033303B1/en active Active
- 2014-08-07 SG SG11201600756UA patent/SG11201600756UA/en unknown
- 2014-08-07 SG SG10201807764RA patent/SG10201807764RA/en unknown
- 2014-08-07 CN CN201480055929.2A patent/CN105658574B/zh active Active
- 2014-08-07 CA CA2919271A patent/CA2919271C/en active Active
- 2014-08-07 WO PCT/GB2014/052423 patent/WO2015022500A1/en active Application Filing
- 2014-08-07 JP JP2016533949A patent/JP6434978B2/ja active Active
-
2016
- 2016-01-24 IL IL243747A patent/IL243747B/en active IP Right Grant
-
2018
- 2018-05-14 AU AU2018203346A patent/AU2018203346B2/en active Active
- 2018-10-07 IL IL262174A patent/IL262174B/en active IP Right Grant
- 2018-11-09 JP JP2018211595A patent/JP6831054B2/ja active Active
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