DK1499645T3 - Fotoinitiator som kan inkorporeres - Google Patents
Fotoinitiator som kan inkorporeresInfo
- Publication number
- DK1499645T3 DK1499645T3 DK03727317T DK03727317T DK1499645T3 DK 1499645 T3 DK1499645 T3 DK 1499645T3 DK 03727317 T DK03727317 T DK 03727317T DK 03727317 T DK03727317 T DK 03727317T DK 1499645 T3 DK1499645 T3 DK 1499645T3
- Authority
- DK
- Denmark
- Prior art keywords
- incorporated
- hydrogen
- independently
- photo initiator
- c4alkyl
- Prior art date
Links
- 239000003999 initiator Substances 0.000 title 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 239000001257 hydrogen Substances 0.000 abstract 3
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 abstract 2
- 150000002431 hydrogen Chemical group 0.000 abstract 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 abstract 2
- -1 -C(R5)-CR6R7 Chemical group 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 229910006069 SO3H Inorganic materials 0.000 abstract 1
- 125000005569 butenylene group Chemical group 0.000 abstract 1
- 125000005622 butynylene group Chemical group 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000009472 formulation Methods 0.000 abstract 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 abstract 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 125000004957 naphthylene group Chemical group 0.000 abstract 1
- 125000000466 oxiranyl group Chemical group 0.000 abstract 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Holo Graphy (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Liquid Crystal Substances (AREA)
- Pens And Brushes (AREA)
- Epoxy Compounds (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
- Plural Heterocyclic Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH7172002 | 2002-04-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
DK1499645T3 true DK1499645T3 (da) | 2006-07-17 |
Family
ID=29256413
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK03727317T DK1499645T3 (da) | 2002-04-26 | 2003-04-17 | Fotoinitiator som kan inkorporeres |
Country Status (18)
Country | Link |
---|---|
US (1) | US7588880B2 (ru) |
EP (1) | EP1499645B1 (ru) |
JP (1) | JP4451137B2 (ru) |
KR (1) | KR100979660B1 (ru) |
CN (1) | CN1307207C (ru) |
AT (1) | ATE320452T1 (ru) |
AU (1) | AU2003233984A1 (ru) |
BR (1) | BR0309779B1 (ru) |
CA (1) | CA2483004A1 (ru) |
DE (1) | DE60304035T2 (ru) |
DK (1) | DK1499645T3 (ru) |
ES (1) | ES2259413T3 (ru) |
MX (1) | MXPA04010254A (ru) |
PL (1) | PL207511B1 (ru) |
RU (1) | RU2320641C2 (ru) |
TW (1) | TW200305582A (ru) |
WO (1) | WO2003091287A1 (ru) |
ZA (1) | ZA200407897B (ru) |
Families Citing this family (39)
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---|---|---|---|---|
JP5000482B2 (ja) | 2004-04-19 | 2012-08-15 | チバ ホールディング インコーポレーテッド | 新規光開始剤 |
FR2871898B1 (fr) * | 2004-06-18 | 2006-09-08 | Alcatel Sa | Composant a fibre optique et fibre optique associee |
US8414982B2 (en) * | 2004-12-22 | 2013-04-09 | Basf Se | Process for the production of strongly adherent coatings |
US20070012208A1 (en) * | 2005-07-13 | 2007-01-18 | Byungwoo Cho | Offset printing system |
EP2069866A2 (en) * | 2006-10-03 | 2009-06-17 | Ciba Holding Inc. | Photocurable compositions |
CN101681929B (zh) * | 2007-05-30 | 2011-10-19 | 日产化学工业株式会社 | 薄膜晶体管用栅极绝缘膜形成剂 |
ITVA20070073A1 (it) * | 2007-09-17 | 2009-03-18 | Lamberti Spa | Fotoiniziatori per reticolazione indotta dalla luce |
WO2009066638A1 (ja) * | 2007-11-20 | 2009-05-28 | Hitachi Chemical Company, Ltd. | 感光性樹脂組成物、感光性樹脂硬化物、感光性樹脂フィルム、感光性樹脂フィルム硬化物及びこれらを用いて得られる光導波路 |
JP5192277B2 (ja) * | 2008-04-14 | 2013-05-08 | シャープ株式会社 | 固体撮像装置の製造方法 |
US7970247B2 (en) * | 2008-09-12 | 2011-06-28 | Draka Comteq B.V. | Buffer tubes for mid-span storage |
US8401353B2 (en) * | 2008-09-12 | 2013-03-19 | Draka Comteq B.V. | Optical fiber cable assembly |
RU2465888C1 (ru) * | 2008-11-11 | 2012-11-10 | Колгейт-Палмолив Компани | Композиция с красящим веществом для указания степени покрытия |
WO2010077132A1 (en) | 2008-12-31 | 2010-07-08 | Draka Comteq B.V. | Uvled apparatus for curing glass-fiber coatings |
DE102009001966A1 (de) | 2009-03-30 | 2010-10-07 | Evonik Röhm Gmbh | Beschichtungszusammensetzung,(Meth)acryl-Polymer und Monomermischung zur Herstellung des(Meth)acryl-Polymers |
CN102459381A (zh) * | 2009-04-30 | 2012-05-16 | 阿姆斯特郎世界工业公司 | Uvv可固化的涂料组合物和使用其来涂覆地板和其他基材的方法 |
US8625944B1 (en) | 2009-05-13 | 2014-01-07 | Draka Comteq, B.V. | Low-shrink reduced-diameter buffer tubes |
US8625945B1 (en) | 2009-05-13 | 2014-01-07 | Draka Comteq, B.V. | Low-shrink reduced-diameter dry buffer tubes |
CN101811968B (zh) * | 2010-02-09 | 2014-07-30 | 深圳市有为化学技术有限公司 | 多官能团化苯甲酰甲酸羟基酮酯类化合物及含有该类化合物的光引发剂 |
EP2388239B1 (en) | 2010-05-20 | 2017-02-15 | Draka Comteq B.V. | Curing apparatus employing angled UV-LEDs |
US8871311B2 (en) | 2010-06-03 | 2014-10-28 | Draka Comteq, B.V. | Curing method employing UV sources that emit differing ranges of UV radiation |
EP2418183B1 (en) | 2010-08-10 | 2018-07-25 | Draka Comteq B.V. | Method for curing coated glass fibres providing increased UVLED intensitiy |
RU2584165C2 (ru) * | 2010-11-12 | 2016-05-20 | Колопласт А/С | Новые полимерные фотоинициаторы |
CN103857707B (zh) * | 2011-10-06 | 2016-04-13 | 弗门尼舍有限公司 | 用于释放香料的光不稳定胶乳 |
US9132069B2 (en) * | 2011-12-01 | 2015-09-15 | 3M Innovative Properties Company | One component self-adhesive dental composition, process of production and use thereof |
US8669281B1 (en) | 2013-03-14 | 2014-03-11 | Alkermes Pharma Ireland Limited | Prodrugs of fumarates and their use in treating various diseases |
NZ723459A (en) | 2013-03-14 | 2017-12-22 | Alkermes Pharma Ireland Ltd | Prodrugs of fumarates and their use in treating various diseases |
WO2015067478A1 (de) * | 2013-11-05 | 2015-05-14 | Construction Research & Technology Gmbh | Neue bindemittelsysteme |
CN103709036B (zh) * | 2013-12-03 | 2015-07-29 | 天津久日化学股份有限公司 | 双官能团苯甲酰基甲酸羟基酮酯类化合物及含该类化合物的光引发剂 |
WO2015127450A1 (en) | 2014-02-24 | 2015-08-27 | Alkermes Pharma Ireland Limited | Sulfonamide and sulfinamide prodrugs of fumarates and their use in treating various diseases |
JP2017518394A (ja) * | 2014-04-07 | 2017-07-06 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | 周囲雰囲気下で可視光硬化性である光硬化性組成物 |
BR112017002974B1 (pt) * | 2014-08-17 | 2023-04-04 | Covestro (Netherlands) B.V | Método de revestimento de uma fibra óptica, composição líquida curável por radiação para o revestimento de uma fibra óptica e a referida fibra ótica |
JP7118580B2 (ja) * | 2014-08-26 | 2022-08-16 | キヤノン株式会社 | 光硬化性組成物、これを用いた硬化物パターンの製造方法、光学部品の製造方法、回路基板の製造方法、およびインプリント用モールドの製造方法 |
CN104387576B (zh) * | 2014-11-19 | 2016-06-29 | 浙江皇马科技股份有限公司 | 一种缩水甘油醚基封端烯丙醇无规聚醚的制备方法 |
EP3054350B1 (en) * | 2014-12-10 | 2018-04-11 | Goo Chemical Co., Ltd. | Liquid solder resist composition and coated printed wiring board |
WO2017079158A1 (en) * | 2015-11-03 | 2017-05-11 | 3D Systems, Incorporated | Biocompatible inks for 3d printing |
US20180033609A1 (en) * | 2016-07-28 | 2018-02-01 | QMAT, Inc. | Removal of non-cleaved/non-transferred material from donor substrate |
CN106905147A (zh) * | 2017-02-21 | 2017-06-30 | 怀化金鑫新材料有限公司 | 光引发剂苯甲酰甲酸二甘醇酯的合成新工艺 |
EP3597668A1 (en) | 2018-07-20 | 2020-01-22 | Clariant International Ltd | Photo-curable resin composition for 3d printing |
EP3597669A1 (en) | 2018-07-20 | 2020-01-22 | Clariant International Ltd | Photo-curable resin composition for 3d printing |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3930868A (en) * | 1973-05-23 | 1976-01-06 | The Richardson Company | Light sensitive arylglyoxyacrylate compositions |
DE2443645A1 (de) * | 1974-09-12 | 1976-04-01 | Cassella Farbwerke Mainkur Ag | Modifizierter aminoplast, verfahren zu seiner herstellung und seine verwendung |
US4038164A (en) * | 1975-09-18 | 1977-07-26 | Stauffer Chemical Company | Photopolymerizable aryl and heterocyclic glyoxylate compositions and process |
US4024297A (en) * | 1976-02-02 | 1977-05-17 | Ppg Industries, Inc. | Actinic light polymerizable coating compositions |
DE2825955A1 (de) * | 1978-06-14 | 1980-01-03 | Bayer Ag | Arylglyoxyloyloxyalkylacrylate und ihre verwendung in photopolymerisierbaren bindemitteln |
US4279720A (en) * | 1978-07-13 | 1981-07-21 | Ciba-Geigy Corporation | Photocurable composition |
US4229274A (en) * | 1979-02-26 | 1980-10-21 | Ppg Industries, Inc. | Ultraviolet light curable compositions for producing coatings of low gloss |
US4475999A (en) * | 1983-06-06 | 1984-10-09 | Stauffer Chemical Company | Sensitization of glyoxylate photoinitiators |
DE3512179A1 (de) * | 1985-04-03 | 1986-12-04 | Merck Patent Gmbh, 6100 Darmstadt | Fotoinitiatoren fuer die fotopolymerisation in waessrigen systemen |
DE3738567A1 (de) * | 1987-03-12 | 1988-09-22 | Merck Patent Gmbh | Coreaktive fotoinitiatoren |
TW328535B (en) * | 1993-07-02 | 1998-03-21 | Novartis Ag | Functional photoinitiators and their manufacture |
EP0849300A1 (de) * | 1996-12-19 | 1998-06-24 | Basf Aktiengesellschaft | Polyurethane mit kovalent gebundenen Photoinitiatoreinheiten |
EP0956280B1 (en) * | 1997-01-30 | 2002-10-30 | Ciba SC Holding AG | Non-volatile phenylglyoxalic esters |
DE19913353A1 (de) * | 1999-03-24 | 2000-09-28 | Basf Ag | Verwendung von Phenylglyoxalsäureestern als Photoinitiatoren |
DE10002089A1 (de) * | 2000-01-19 | 2001-07-26 | Basf Ag | Witterungsstabile, strahlungshärtbare Polyurethane |
KR100813185B1 (ko) * | 2000-06-23 | 2008-03-17 | 시바 스폐셜티 케미칼스 홀딩 인코포레이티드 | 히드록시페닐 카르복시산 에스테르의 제조방법 |
TW557298B (en) * | 2000-08-14 | 2003-10-11 | Ciba Sc Holding Ag | A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings |
TWI244495B (en) * | 2000-08-14 | 2005-12-01 | Ciba Sc Holding Ag | Process for producing coatings siloxane photoinitiators |
CN100482694C (zh) * | 2002-04-19 | 2009-04-29 | 西巴特殊化学品控股有限公司 | 等离子体诱发的涂层固化 |
DE10223614A1 (de) * | 2002-05-27 | 2003-12-11 | Basf Ag | Strahlungshärtbare wässrige Dispersionen |
-
2003
- 2003-04-17 RU RU2004134570/04A patent/RU2320641C2/ru not_active IP Right Cessation
- 2003-04-17 US US10/512,300 patent/US7588880B2/en not_active Expired - Lifetime
- 2003-04-17 ES ES03727317T patent/ES2259413T3/es not_active Expired - Lifetime
- 2003-04-17 WO PCT/EP2003/004035 patent/WO2003091287A1/en active IP Right Grant
- 2003-04-17 JP JP2003587844A patent/JP4451137B2/ja not_active Expired - Lifetime
- 2003-04-17 PL PL371516A patent/PL207511B1/pl unknown
- 2003-04-17 MX MXPA04010254A patent/MXPA04010254A/es active IP Right Grant
- 2003-04-17 AU AU2003233984A patent/AU2003233984A1/en not_active Abandoned
- 2003-04-17 DK DK03727317T patent/DK1499645T3/da active
- 2003-04-17 EP EP03727317A patent/EP1499645B1/en not_active Expired - Lifetime
- 2003-04-17 CN CNB038093413A patent/CN1307207C/zh not_active Expired - Lifetime
- 2003-04-17 DE DE60304035T patent/DE60304035T2/de not_active Expired - Lifetime
- 2003-04-17 BR BRPI0309779-0B1A patent/BR0309779B1/pt not_active IP Right Cessation
- 2003-04-17 KR KR1020047017189A patent/KR100979660B1/ko not_active IP Right Cessation
- 2003-04-17 AT AT03727317T patent/ATE320452T1/de not_active IP Right Cessation
- 2003-04-17 CA CA002483004A patent/CA2483004A1/en not_active Abandoned
- 2003-04-25 TW TW092109781A patent/TW200305582A/zh unknown
-
2004
- 2004-09-30 ZA ZA200407897A patent/ZA200407897B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
MXPA04010254A (es) | 2005-02-03 |
PL207511B1 (pl) | 2010-12-31 |
US7588880B2 (en) | 2009-09-15 |
ES2259413T3 (es) | 2006-10-01 |
PL371516A1 (en) | 2005-06-27 |
AU2003233984A1 (en) | 2003-11-10 |
EP1499645B1 (en) | 2006-03-15 |
KR100979660B1 (ko) | 2010-09-02 |
ZA200407897B (en) | 2006-02-22 |
BR0309779B1 (pt) | 2013-06-25 |
RU2004134570A (ru) | 2005-07-20 |
BR0309779A (pt) | 2005-03-08 |
TW200305582A (en) | 2003-11-01 |
KR20040106395A (ko) | 2004-12-17 |
JP2005523923A (ja) | 2005-08-11 |
JP4451137B2 (ja) | 2010-04-14 |
CN1649905A (zh) | 2005-08-03 |
EP1499645A1 (en) | 2005-01-26 |
DE60304035T2 (de) | 2006-08-03 |
DE60304035D1 (en) | 2006-05-11 |
CA2483004A1 (en) | 2003-11-06 |
US20050228062A1 (en) | 2005-10-13 |
WO2003091287A1 (en) | 2003-11-06 |
ATE320452T1 (de) | 2006-04-15 |
CN1307207C (zh) | 2007-03-28 |
RU2320641C2 (ru) | 2008-03-27 |
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