ZA200407897B - Incorporable photoinitiator. - Google Patents
Incorporable photoinitiator.Info
- Publication number
- ZA200407897B ZA200407897B ZA200407897A ZA200407897A ZA200407897B ZA 200407897 B ZA200407897 B ZA 200407897B ZA 200407897 A ZA200407897 A ZA 200407897A ZA 200407897 A ZA200407897 A ZA 200407897A ZA 200407897 B ZA200407897 B ZA 200407897B
- Authority
- ZA
- South Africa
- Prior art keywords
- hydrogen
- independently
- c4alkyl
- phenylene
- branched
- Prior art date
Links
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 239000001257 hydrogen Substances 0.000 abstract 3
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 abstract 2
- 150000002431 hydrogen Chemical group 0.000 abstract 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 abstract 2
- -1 -C(R5)-CR6R7 Chemical group 0.000 abstract 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 229910006069 SO3H Inorganic materials 0.000 abstract 1
- 125000005569 butenylene group Chemical group 0.000 abstract 1
- 125000005622 butynylene group Chemical group 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000009472 formulation Methods 0.000 abstract 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 abstract 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 125000004957 naphthylene group Chemical group 0.000 abstract 1
- 125000000466 oxiranyl group Chemical group 0.000 abstract 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Epoxy Compounds (AREA)
- Holo Graphy (AREA)
- Liquid Crystal Substances (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Pens And Brushes (AREA)
- Plural Heterocyclic Compounds (AREA)
- Agricultural Chemicals And Associated Chemicals (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH7172002 | 2002-04-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA200407897B true ZA200407897B (en) | 2006-02-22 |
Family
ID=29256413
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA200407897A ZA200407897B (en) | 2002-04-26 | 2004-09-30 | Incorporable photoinitiator. |
Country Status (18)
Country | Link |
---|---|
US (1) | US7588880B2 (xx) |
EP (1) | EP1499645B1 (xx) |
JP (1) | JP4451137B2 (xx) |
KR (1) | KR100979660B1 (xx) |
CN (1) | CN1307207C (xx) |
AT (1) | ATE320452T1 (xx) |
AU (1) | AU2003233984A1 (xx) |
BR (1) | BR0309779B1 (xx) |
CA (1) | CA2483004A1 (xx) |
DE (1) | DE60304035T2 (xx) |
DK (1) | DK1499645T3 (xx) |
ES (1) | ES2259413T3 (xx) |
MX (1) | MXPA04010254A (xx) |
PL (1) | PL207511B1 (xx) |
RU (1) | RU2320641C2 (xx) |
TW (1) | TW200305582A (xx) |
WO (1) | WO2003091287A1 (xx) |
ZA (1) | ZA200407897B (xx) |
Families Citing this family (40)
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EP1763499B1 (en) * | 2004-04-19 | 2007-09-26 | CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement | New photoinitiators |
FR2871898B1 (fr) * | 2004-06-18 | 2006-09-08 | Alcatel Sa | Composant a fibre optique et fibre optique associee |
JP5421533B2 (ja) * | 2004-12-22 | 2014-02-19 | チバ ホールディング インコーポレーテッド | 強接着性コーティングの製造方法 |
US20070012208A1 (en) * | 2005-07-13 | 2007-01-18 | Byungwoo Cho | Offset printing system |
CN101523289A (zh) * | 2006-10-03 | 2009-09-02 | 西巴控股有限公司 | 包含苯甲酰甲酸酯型光引发剂的可光固化组合物 |
WO2008146847A1 (ja) * | 2007-05-30 | 2008-12-04 | Nissan Chemical Industries, Ltd. | 薄膜トランジスタ用ゲート絶縁膜形成剤 |
ITVA20070073A1 (it) * | 2007-09-17 | 2009-03-18 | Lamberti Spa | Fotoiniziatori per reticolazione indotta dalla luce |
US8632952B2 (en) * | 2007-11-20 | 2014-01-21 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive resin cured matter, photosensitive resin film, photosensitive resin film cured matter and optical waveguide obtained by using the same |
JP5192277B2 (ja) * | 2008-04-14 | 2013-05-08 | シャープ株式会社 | 固体撮像装置の製造方法 |
US8401353B2 (en) * | 2008-09-12 | 2013-03-19 | Draka Comteq B.V. | Optical fiber cable assembly |
US7970247B2 (en) * | 2008-09-12 | 2011-06-28 | Draka Comteq B.V. | Buffer tubes for mid-span storage |
RU2465888C1 (ru) * | 2008-11-11 | 2012-11-10 | Колгейт-Палмолив Компани | Композиция с красящим веществом для указания степени покрытия |
WO2010077132A1 (en) | 2008-12-31 | 2010-07-08 | Draka Comteq B.V. | Uvled apparatus for curing glass-fiber coatings |
DE102009001966A1 (de) | 2009-03-30 | 2010-10-07 | Evonik Röhm Gmbh | Beschichtungszusammensetzung,(Meth)acryl-Polymer und Monomermischung zur Herstellung des(Meth)acryl-Polymers |
US20100276059A1 (en) * | 2009-04-30 | 2010-11-04 | Dong Tian | UVV curable coating compositions and method for coating flooring and other substrates with same |
US8625945B1 (en) | 2009-05-13 | 2014-01-07 | Draka Comteq, B.V. | Low-shrink reduced-diameter dry buffer tubes |
US8625944B1 (en) | 2009-05-13 | 2014-01-07 | Draka Comteq, B.V. | Low-shrink reduced-diameter buffer tubes |
CN101811968B (zh) * | 2010-02-09 | 2014-07-30 | 深圳市有为化学技术有限公司 | 多官能团化苯甲酰甲酸羟基酮酯类化合物及含有该类化合物的光引发剂 |
DK2388239T3 (da) | 2010-05-20 | 2017-04-24 | Draka Comteq Bv | Hærdningsapparat, der anvender vinklede UV-LED'er |
US8871311B2 (en) | 2010-06-03 | 2014-10-28 | Draka Comteq, B.V. | Curing method employing UV sources that emit differing ranges of UV radiation |
EP2418183B1 (en) | 2010-08-10 | 2018-07-25 | Draka Comteq B.V. | Method for curing coated glass fibres providing increased UVLED intensitiy |
US9371308B2 (en) * | 2010-11-12 | 2016-06-21 | Coloplast A/S | Polymeric photoinitiators |
BR112014008234A2 (pt) * | 2011-10-06 | 2017-04-11 | Firmenich & Cie | látex fotolábil para a liberação de perfumes |
JP6139551B2 (ja) * | 2011-12-01 | 2017-05-31 | スリーエム イノベイティブ プロパティズ カンパニー | 一成分自己接着性歯科用組成物、その製造方法、及び使用 |
US8669281B1 (en) | 2013-03-14 | 2014-03-11 | Alkermes Pharma Ireland Limited | Prodrugs of fumarates and their use in treating various diseases |
ES2683355T3 (es) | 2013-03-14 | 2018-09-26 | Alkermes Pharma Ireland Limited | Profármacos de fumaratos y su uso en el tratamiento de diversas enfermedades |
AU2014345787B2 (en) * | 2013-11-05 | 2017-10-26 | Sika Technology Ag | Novel binding agent systems |
CN103709036B (zh) * | 2013-12-03 | 2015-07-29 | 天津久日化学股份有限公司 | 双官能团苯甲酰基甲酸羟基酮酯类化合物及含该类化合物的光引发剂 |
NZ723269A (en) | 2014-02-24 | 2017-04-28 | Alkermes Pharma Ireland Ltd | Sulfonamide and sulfinamide prodrugs of fumarates and their use in treating various diseases |
CN106133603A (zh) * | 2014-04-07 | 2016-11-16 | 巴斯夫欧洲公司 | 可光固化组合物在环境气氛中的可见光固化 |
CN106574142B (zh) * | 2014-08-17 | 2020-12-11 | 帝斯曼知识产权资产管理有限公司 | 用于光纤的可单色光化辐射固化的涂层 |
JP7118580B2 (ja) * | 2014-08-26 | 2022-08-16 | キヤノン株式会社 | 光硬化性組成物、これを用いた硬化物パターンの製造方法、光学部品の製造方法、回路基板の製造方法、およびインプリント用モールドの製造方法 |
CN104387576B (zh) * | 2014-11-19 | 2016-06-29 | 浙江皇马科技股份有限公司 | 一种缩水甘油醚基封端烯丙醇无规聚醚的制备方法 |
KR101685520B1 (ko) | 2014-12-10 | 2016-12-12 | 고오 가가쿠고교 가부시키가이샤 | 액상 솔더 레지스트 조성물 및 피복 프린트 배선판 |
WO2017079158A1 (en) * | 2015-11-03 | 2017-05-11 | 3D Systems, Incorporated | Biocompatible inks for 3d printing |
US20180033609A1 (en) * | 2016-07-28 | 2018-02-01 | QMAT, Inc. | Removal of non-cleaved/non-transferred material from donor substrate |
CN106905147A (zh) * | 2017-02-21 | 2017-06-30 | 怀化金鑫新材料有限公司 | 光引发剂苯甲酰甲酸二甘醇酯的合成新工艺 |
EP3597669A1 (en) | 2018-07-20 | 2020-01-22 | Clariant International Ltd | Photo-curable resin composition for 3d printing |
EP3597668A1 (en) | 2018-07-20 | 2020-01-22 | Clariant International Ltd | Photo-curable resin composition for 3d printing |
CN118027806B (zh) * | 2024-02-01 | 2024-08-09 | 江苏大自然智能家居有限公司 | 一种木地板用水性uv光固化涂料及其制备方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
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US3930868A (en) * | 1973-05-23 | 1976-01-06 | The Richardson Company | Light sensitive arylglyoxyacrylate compositions |
DE2443645A1 (de) * | 1974-09-12 | 1976-04-01 | Cassella Farbwerke Mainkur Ag | Modifizierter aminoplast, verfahren zu seiner herstellung und seine verwendung |
US4038164A (en) * | 1975-09-18 | 1977-07-26 | Stauffer Chemical Company | Photopolymerizable aryl and heterocyclic glyoxylate compositions and process |
US4024297A (en) * | 1976-02-02 | 1977-05-17 | Ppg Industries, Inc. | Actinic light polymerizable coating compositions |
DE2825955A1 (de) * | 1978-06-14 | 1980-01-03 | Bayer Ag | Arylglyoxyloyloxyalkylacrylate und ihre verwendung in photopolymerisierbaren bindemitteln |
US4279720A (en) | 1978-07-13 | 1981-07-21 | Ciba-Geigy Corporation | Photocurable composition |
US4229274A (en) * | 1979-02-26 | 1980-10-21 | Ppg Industries, Inc. | Ultraviolet light curable compositions for producing coatings of low gloss |
US4475999A (en) * | 1983-06-06 | 1984-10-09 | Stauffer Chemical Company | Sensitization of glyoxylate photoinitiators |
DE3512179A1 (de) * | 1985-04-03 | 1986-12-04 | Merck Patent Gmbh, 6100 Darmstadt | Fotoinitiatoren fuer die fotopolymerisation in waessrigen systemen |
DE3738567A1 (de) * | 1987-03-12 | 1988-09-22 | Merck Patent Gmbh | Coreaktive fotoinitiatoren |
TW328535B (en) * | 1993-07-02 | 1998-03-21 | Novartis Ag | Functional photoinitiators and their manufacture |
EP0849300A1 (de) * | 1996-12-19 | 1998-06-24 | Basf Aktiengesellschaft | Polyurethane mit kovalent gebundenen Photoinitiatoreinheiten |
WO1998033761A1 (en) * | 1997-01-30 | 1998-08-06 | Ciba Specialty Chemicals Holding Inc. | Non-volatile phenylglyoxalic esters |
DE19913353A1 (de) * | 1999-03-24 | 2000-09-28 | Basf Ag | Verwendung von Phenylglyoxalsäureestern als Photoinitiatoren |
DE10002089A1 (de) * | 2000-01-19 | 2001-07-26 | Basf Ag | Witterungsstabile, strahlungshärtbare Polyurethane |
WO2001098249A1 (de) * | 2000-06-23 | 2001-12-27 | Ciba Specialty Chemicals Holding Inc. | Verfahren zur herstellung von hydroxyphenylcarbonsäureestern |
TW557298B (en) * | 2000-08-14 | 2003-10-11 | Ciba Sc Holding Ag | A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings |
TWI244495B (en) * | 2000-08-14 | 2005-12-01 | Ciba Sc Holding Ag | Process for producing coatings siloxane photoinitiators |
CN100482694C (zh) * | 2002-04-19 | 2009-04-29 | 西巴特殊化学品控股有限公司 | 等离子体诱发的涂层固化 |
DE10223614A1 (de) * | 2002-05-27 | 2003-12-11 | Basf Ag | Strahlungshärtbare wässrige Dispersionen |
-
2003
- 2003-04-17 AT AT03727317T patent/ATE320452T1/de not_active IP Right Cessation
- 2003-04-17 CN CNB038093413A patent/CN1307207C/zh not_active Expired - Lifetime
- 2003-04-17 PL PL371516A patent/PL207511B1/pl unknown
- 2003-04-17 KR KR1020047017189A patent/KR100979660B1/ko not_active IP Right Cessation
- 2003-04-17 ES ES03727317T patent/ES2259413T3/es not_active Expired - Lifetime
- 2003-04-17 EP EP03727317A patent/EP1499645B1/en not_active Expired - Lifetime
- 2003-04-17 US US10/512,300 patent/US7588880B2/en not_active Expired - Lifetime
- 2003-04-17 WO PCT/EP2003/004035 patent/WO2003091287A1/en active IP Right Grant
- 2003-04-17 CA CA002483004A patent/CA2483004A1/en not_active Abandoned
- 2003-04-17 DE DE60304035T patent/DE60304035T2/de not_active Expired - Lifetime
- 2003-04-17 RU RU2004134570/04A patent/RU2320641C2/ru not_active IP Right Cessation
- 2003-04-17 JP JP2003587844A patent/JP4451137B2/ja not_active Expired - Lifetime
- 2003-04-17 DK DK03727317T patent/DK1499645T3/da active
- 2003-04-17 AU AU2003233984A patent/AU2003233984A1/en not_active Abandoned
- 2003-04-17 MX MXPA04010254A patent/MXPA04010254A/es active IP Right Grant
- 2003-04-17 BR BRPI0309779-0B1A patent/BR0309779B1/pt not_active IP Right Cessation
- 2003-04-25 TW TW092109781A patent/TW200305582A/zh unknown
-
2004
- 2004-09-30 ZA ZA200407897A patent/ZA200407897B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
RU2004134570A (ru) | 2005-07-20 |
DK1499645T3 (da) | 2006-07-17 |
CN1307207C (zh) | 2007-03-28 |
DE60304035T2 (de) | 2006-08-03 |
JP2005523923A (ja) | 2005-08-11 |
ATE320452T1 (de) | 2006-04-15 |
JP4451137B2 (ja) | 2010-04-14 |
TW200305582A (en) | 2003-11-01 |
WO2003091287A1 (en) | 2003-11-06 |
PL371516A1 (en) | 2005-06-27 |
BR0309779A (pt) | 2005-03-08 |
CA2483004A1 (en) | 2003-11-06 |
MXPA04010254A (es) | 2005-02-03 |
EP1499645B1 (en) | 2006-03-15 |
EP1499645A1 (en) | 2005-01-26 |
BR0309779B1 (pt) | 2013-06-25 |
DE60304035D1 (en) | 2006-05-11 |
AU2003233984A1 (en) | 2003-11-10 |
ES2259413T3 (es) | 2006-10-01 |
US7588880B2 (en) | 2009-09-15 |
CN1649905A (zh) | 2005-08-03 |
KR20040106395A (ko) | 2004-12-17 |
US20050228062A1 (en) | 2005-10-13 |
RU2320641C2 (ru) | 2008-03-27 |
PL207511B1 (pl) | 2010-12-31 |
KR100979660B1 (ko) | 2010-09-02 |
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