DE865860C - Lichtempfindliche Schichten fuer die photomechanische Reproduktion - Google Patents
Lichtempfindliche Schichten fuer die photomechanische ReproduktionInfo
- Publication number
- DE865860C DE865860C DEK7867A DEK0007867A DE865860C DE 865860 C DE865860 C DE 865860C DE K7867 A DEK7867 A DE K7867A DE K0007867 A DEK0007867 A DE K0007867A DE 865860 C DE865860 C DE 865860C
- Authority
- DE
- Germany
- Prior art keywords
- solution
- water
- light
- layer
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007859 condensation product Substances 0.000 claims description 12
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims description 10
- 229920001568 phenolic resin Polymers 0.000 claims description 7
- 150000002148 esters Chemical class 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 150000003460 sulfonic acids Chemical class 0.000 claims description 2
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 claims 1
- 239000000243 solution Substances 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 11
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 8
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 239000001488 sodium phosphate Substances 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 5
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 5
- 235000019801 trisodium phosphate Nutrition 0.000 description 5
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 150000003459 sulfonic acid esters Chemical class 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- XTHPWXDJESJLNJ-UHFFFAOYSA-N chlorosulfonic acid Substances OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 230000033458 reproduction Effects 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- KEQGZUUPPQEDPF-UHFFFAOYSA-N 1,3-dichloro-5,5-dimethylimidazolidine-2,4-dione Chemical compound CC1(C)N(Cl)C(=O)N(Cl)C1=O KEQGZUUPPQEDPF-UHFFFAOYSA-N 0.000 description 2
- RNHDAKUGFHSZEV-UHFFFAOYSA-N 1,4-dioxane;hydrate Chemical compound O.C1COCCO1 RNHDAKUGFHSZEV-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- -1 sulfo- Chemical class 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- ITYXXSSJBOAGAR-UHFFFAOYSA-N 1-(methylamino)-4-(4-methylanilino)anthracene-9,10-dione Chemical compound C1=2C(=O)C3=CC=CC=C3C(=O)C=2C(NC)=CC=C1NC1=CC=C(C)C=C1 ITYXXSSJBOAGAR-UHFFFAOYSA-N 0.000 description 1
- 102000009027 Albumins Human genes 0.000 description 1
- 108010088751 Albumins Proteins 0.000 description 1
- 235000009161 Espostoa lanata Nutrition 0.000 description 1
- 240000001624 Espostoa lanata Species 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 101100462438 Mus musculus Otulin gene Proteins 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000007868 Raney catalyst Substances 0.000 description 1
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 1
- 229910000564 Raney nickel Inorganic materials 0.000 description 1
- PZXQDLXKWDYGMK-UHFFFAOYSA-N S(=O)(=O)(O)Cl.[N-]=[N+]=[N-].[N-]=[N+]=[N-] Chemical class S(=O)(=O)(O)Cl.[N-]=[N+]=[N-].[N-]=[N+]=[N-] PZXQDLXKWDYGMK-UHFFFAOYSA-N 0.000 description 1
- 229920001800 Shellac Polymers 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 150000008043 acidic salts Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000007853 buffer solution Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 229910000397 disodium phosphate Inorganic materials 0.000 description 1
- 235000019800 disodium phosphate Nutrition 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000012452 mother liquor Substances 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- IJRVLVIFMRWJRQ-UHFFFAOYSA-N nitric acid zinc Chemical compound [Zn].O[N+]([O-])=O IJRVLVIFMRWJRQ-UHFFFAOYSA-N 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- CDVLCTOFEIEUDH-UHFFFAOYSA-K tetrasodium;phosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])([O-])=O CDVLCTOFEIEUDH-UHFFFAOYSA-K 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| BE506677D BE506677A (en, 2012) | 1950-10-31 | ||
| DEK7867A DE865860C (de) | 1950-10-31 | 1950-10-31 | Lichtempfindliche Schichten fuer die photomechanische Reproduktion |
| AT175151D AT175151B (de) | 1950-10-31 | 1951-10-17 | Lichtempfindliche Schichten für die photomechanische Reproduktion |
| GB24905/51A GB711626A (en) | 1950-10-31 | 1951-10-24 | Improvements in processes and materials for photo-mechanical reproduction |
| NL164940A NL78779C (en, 2012) | 1950-10-31 | 1951-10-25 | |
| FR1044248D FR1044248A (fr) | 1950-10-31 | 1951-10-29 | Couches photosensibles pour la reproduction photomécanique |
| CH300348D CH300348A (de) | 1950-10-31 | 1951-10-29 | Lichtempfindliche Schicht für die photomechanische Reproduktion. |
| US715224A US3046120A (en) | 1950-10-31 | 1958-02-14 | Light-sensitive layers for photomechanical reproduction |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK7867A DE865860C (de) | 1950-10-31 | 1950-10-31 | Lichtempfindliche Schichten fuer die photomechanische Reproduktion |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE865860C true DE865860C (de) | 1953-02-05 |
Family
ID=7211722
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DEK7867A Expired DE865860C (de) | 1950-10-31 | 1950-10-31 | Lichtempfindliche Schichten fuer die photomechanische Reproduktion |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3046120A (en, 2012) |
| AT (1) | AT175151B (en, 2012) |
| BE (1) | BE506677A (en, 2012) |
| CH (1) | CH300348A (en, 2012) |
| DE (1) | DE865860C (en, 2012) |
| FR (1) | FR1044248A (en, 2012) |
| GB (1) | GB711626A (en, 2012) |
| NL (1) | NL78779C (en, 2012) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE938233C (de) * | 1953-03-11 | 1956-01-26 | Kalle & Co Ag | Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen |
| US3046120A (en) * | 1950-10-31 | 1962-07-24 | Azoplate Corp | Light-sensitive layers for photomechanical reproduction |
| DE1134887B (de) * | 1959-07-29 | 1962-08-16 | Kalle Ag | Kopierschichten zur Herstellung von Druckformen auf photomechanischem Wege |
| DE1195166B (de) * | 1959-09-04 | 1965-06-16 | Kalle Ag | Auf Metallunterlagen haftende, aetzfaehige Kopierschichten |
| DE1258270B (de) * | 1961-12-04 | 1968-01-04 | Ferrania Spa | Elektrophotographisches Verfahren zur Herstellung von Bildern oder Druckformen |
| DE1522478B1 (de) * | 1965-12-17 | 1971-07-29 | Polychrome Corp | Vorsensibilisierte, positiv arbeitende Flachdruckplatte |
| US4168978A (en) | 1976-11-24 | 1979-09-25 | Claus Koenig K.G. | Transfer foil |
| EP0363571A1 (de) * | 1988-07-04 | 1990-04-18 | Hoechst Aktiengesellschaft | 1,2-Naphthochinon-2-diazid-sulfonsäureamide und lichtempfindliche Gemische, die diese enthalten |
Families Citing this family (95)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2871119A (en) * | 1955-02-21 | 1959-01-27 | Dietzgen Co Eugene | Diazotype reproduction material and method |
| NL220474A (en, 2012) * | 1956-09-25 | |||
| US3175908A (en) * | 1959-07-29 | 1965-03-30 | Kalle Ag | Production of relief printing plates |
| BE594235A (en, 2012) * | 1959-08-29 | |||
| NL267572A (en, 2012) * | 1960-07-29 | |||
| US3149972A (en) * | 1960-08-16 | 1964-09-22 | Gen Aniline & Film Corp | Diazo and resinous coupler printing plates for photomechanical reproduction |
| NL138044C (en, 2012) * | 1961-07-28 | |||
| US3635709A (en) * | 1966-12-15 | 1972-01-18 | Polychrome Corp | Light-sensitive lithographic plate |
| ZA6801224B (en, 2012) * | 1967-03-08 | |||
| US3837860A (en) * | 1969-06-16 | 1974-09-24 | L Roos | PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS |
| US3647443A (en) * | 1969-09-12 | 1972-03-07 | Eastman Kodak Co | Light-sensitive quinone diazide polymers and polymer compositions |
| JPS4924361B1 (en, 2012) * | 1970-11-21 | 1974-06-22 | ||
| US4193797A (en) * | 1971-03-22 | 1980-03-18 | E. I. Dupont De Nemours And Company | Method for making photoresists |
| US4139384A (en) * | 1974-02-21 | 1979-02-13 | Fuji Photo Film Co., Ltd. | Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate |
| JPS5645127B2 (en, 2012) * | 1974-02-25 | 1981-10-24 | ||
| US4123279A (en) * | 1974-03-25 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinonediazide containing planographic printing plate |
| US4191573A (en) * | 1974-10-09 | 1980-03-04 | Fuji Photo Film Co., Ltd. | Photosensitive positive image forming process with two photo-sensitive layers |
| CA1085212A (en) * | 1975-05-27 | 1980-09-09 | Ronald H. Engebrecht | Use of volatile carboxylic acids in improved photoresists containing quinone diazides |
| US4040891A (en) * | 1976-06-30 | 1977-08-09 | Ibm Corporation | Etching process utilizing the same positive photoresist layer for two etching steps |
| JPS549619A (en) * | 1977-06-23 | 1979-01-24 | Oji Paper Co | Photosensitive composition |
| GB2034911B (en) * | 1978-10-26 | 1983-02-09 | Toray Industries | Dry planographic printing plate |
| JPS561044A (en) * | 1979-06-16 | 1981-01-08 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| JPS561045A (en) * | 1979-06-16 | 1981-01-08 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| US4260673A (en) * | 1979-09-05 | 1981-04-07 | Minnesota Mining And Manufacturing Company | Single sheet color proofing system |
| DE3043967A1 (de) * | 1980-11-21 | 1982-06-24 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
| DE3100077A1 (de) | 1981-01-03 | 1982-08-05 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters |
| US4529682A (en) * | 1981-06-22 | 1985-07-16 | Philip A. Hunt Chemical Corporation | Positive photoresist composition with cresol-formaldehyde novolak resins |
| US4587196A (en) * | 1981-06-22 | 1986-05-06 | Philip A. Hunt Chemical Corporation | Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide |
| DE3127754A1 (de) * | 1981-07-14 | 1983-02-03 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
| US4600684A (en) * | 1983-02-10 | 1986-07-15 | Oki Electric Industry Co., Ltd. | Process for forming a negative resist using high energy beam |
| US4609615A (en) * | 1983-03-31 | 1986-09-02 | Oki Electric Industry Co., Ltd. | Process for forming pattern with negative resist using quinone diazide compound |
| JPS6032045A (ja) * | 1983-08-01 | 1985-02-19 | Sanyo Kokusaku Pulp Co Ltd | 多色画像形成材料およびその画像形成方法 |
| GB8430377D0 (en) * | 1984-12-01 | 1985-01-09 | Ciba Geigy Ag | Modified phenolic resins |
| GB8505402D0 (en) * | 1985-03-02 | 1985-04-03 | Ciba Geigy Ag | Modified phenolic resins |
| EP0199303B1 (en) * | 1985-04-18 | 1992-06-24 | Oki Electric Industry Company, Limited | Method of forming a photoresist pattern |
| EP0225464A3 (en) * | 1985-12-10 | 1989-06-07 | International Business Machines Corporation | Composite resist structures |
| DE3629122A1 (de) * | 1986-08-27 | 1988-03-10 | Hoechst Ag | Verfahren zur herstellung eines o-naphthochinondiazidsulfonsaeureesters und diesen enthaltendes lichtempfindliches gemisch |
| US4871644A (en) * | 1986-10-01 | 1989-10-03 | Ciba-Geigy Corporation | Photoresist compositions with a bis-benzotriazole |
| US4777109A (en) * | 1987-05-11 | 1988-10-11 | Robert Gumbinner | RF plasma treated photosensitive lithographic printing plates |
| US5037720A (en) * | 1987-07-21 | 1991-08-06 | Hoechst Celanese Corporation | Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use |
| GB8729510D0 (en) * | 1987-12-18 | 1988-02-03 | Ucb Sa | Photosensitive compositions containing phenolic resins & diazoquinone compounds |
| US5272026A (en) * | 1987-12-18 | 1993-12-21 | Ucb S.A. | Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article |
| US5238771A (en) * | 1988-05-31 | 1993-08-24 | Konica Corporation | Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive |
| DE68928903T2 (de) * | 1988-10-03 | 1999-08-12 | Konica Corp., Tokio/Tokyo | Lichtempfindliche Zusammensetzung |
| US5753406A (en) * | 1988-10-18 | 1998-05-19 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition |
| US5356758A (en) * | 1988-12-28 | 1994-10-18 | Texas Instruments Incorporated | Method and apparatus for positively patterning a surface-sensitive resist on a semiconductor wafer |
| DE69029104T2 (de) | 1989-07-12 | 1997-03-20 | Fuji Photo Film Co Ltd | Polysiloxane und positiv arbeitende Resistmasse |
| DE69129955T2 (de) * | 1990-05-02 | 1998-12-24 | Mitsubishi Chemical Corp., Tokio/Tokyo | Photolackzusammensetzung |
| JP2639853B2 (ja) * | 1990-05-18 | 1997-08-13 | 富士写真フイルム株式会社 | 新規キノンジアジド化合物及びそれを含有する感光性組成物 |
| US5395727A (en) * | 1990-06-05 | 1995-03-07 | Sumitomo Chemical Company, Limited | Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol |
| US5145763A (en) * | 1990-06-29 | 1992-09-08 | Ocg Microelectronic Materials, Inc. | Positive photoresist composition |
| JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
| JP3503839B2 (ja) | 1994-05-25 | 2004-03-08 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
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Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE506677A (en, 2012) * | 1950-10-31 |
-
0
- BE BE506677D patent/BE506677A/xx unknown
-
1950
- 1950-10-31 DE DEK7867A patent/DE865860C/de not_active Expired
-
1951
- 1951-10-17 AT AT175151D patent/AT175151B/de active
- 1951-10-24 GB GB24905/51A patent/GB711626A/en not_active Expired
- 1951-10-25 NL NL164940A patent/NL78779C/xx active
- 1951-10-29 CH CH300348D patent/CH300348A/de unknown
- 1951-10-29 FR FR1044248D patent/FR1044248A/fr not_active Expired
-
1958
- 1958-02-14 US US715224A patent/US3046120A/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3046120A (en) * | 1950-10-31 | 1962-07-24 | Azoplate Corp | Light-sensitive layers for photomechanical reproduction |
| DE938233C (de) * | 1953-03-11 | 1956-01-26 | Kalle & Co Ag | Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen |
| DE1134887B (de) * | 1959-07-29 | 1962-08-16 | Kalle Ag | Kopierschichten zur Herstellung von Druckformen auf photomechanischem Wege |
| DE1195166B (de) * | 1959-09-04 | 1965-06-16 | Kalle Ag | Auf Metallunterlagen haftende, aetzfaehige Kopierschichten |
| DE1258270B (de) * | 1961-12-04 | 1968-01-04 | Ferrania Spa | Elektrophotographisches Verfahren zur Herstellung von Bildern oder Druckformen |
| DE1522478B1 (de) * | 1965-12-17 | 1971-07-29 | Polychrome Corp | Vorsensibilisierte, positiv arbeitende Flachdruckplatte |
| US4168978A (en) | 1976-11-24 | 1979-09-25 | Claus Koenig K.G. | Transfer foil |
| EP0363571A1 (de) * | 1988-07-04 | 1990-04-18 | Hoechst Aktiengesellschaft | 1,2-Naphthochinon-2-diazid-sulfonsäureamide und lichtempfindliche Gemische, die diese enthalten |
Also Published As
| Publication number | Publication date |
|---|---|
| FR1044248A (fr) | 1953-11-16 |
| AT175151B (de) | 1953-06-10 |
| CH300348A (de) | 1954-07-31 |
| GB711626A (en) | 1954-07-07 |
| NL78779C (en, 2012) | 1955-03-15 |
| US3046120A (en) | 1962-07-24 |
| BE506677A (en, 2012) |
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