DE69939044D1 - Verfahren zur Regelung des Brechungsindexes eines PVD-Films - Google Patents

Verfahren zur Regelung des Brechungsindexes eines PVD-Films

Info

Publication number
DE69939044D1
DE69939044D1 DE69939044T DE69939044T DE69939044D1 DE 69939044 D1 DE69939044 D1 DE 69939044D1 DE 69939044 T DE69939044 T DE 69939044T DE 69939044 T DE69939044 T DE 69939044T DE 69939044 D1 DE69939044 D1 DE 69939044D1
Authority
DE
Germany
Prior art keywords
controlling
refractive index
pvd film
pvd
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69939044T
Other languages
English (en)
Inventor
Masato Yoshikawa
Shingo Ohno
Sho Kumagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bridgestone Corp
Original Assignee
Bridgestone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP29004998A external-priority patent/JP4178339B2/ja
Priority claimed from JP10290050A external-priority patent/JP2000104163A/ja
Priority claimed from JP29004898A external-priority patent/JP4174638B2/ja
Priority claimed from JP10290047A external-priority patent/JP2000104161A/ja
Application filed by Bridgestone Corp filed Critical Bridgestone Corp
Application granted granted Critical
Publication of DE69939044D1 publication Critical patent/DE69939044D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0084—Producing gradient compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
DE69939044T 1998-09-28 1999-09-28 Verfahren zur Regelung des Brechungsindexes eines PVD-Films Expired - Lifetime DE69939044D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP29004998A JP4178339B2 (ja) 1998-09-28 1998-09-28 スパッタ積層膜の作製方法
JP10290050A JP2000104163A (ja) 1998-09-28 1998-09-28 ドライプレーティング積層膜の作製方法
JP29004898A JP4174638B2 (ja) 1998-09-28 1998-09-28 スパッタ皮膜の屈折率コントロール方法
JP10290047A JP2000104161A (ja) 1998-09-28 1998-09-28 ドライプレーティング皮膜の屈折率コントロール方法

Publications (1)

Publication Number Publication Date
DE69939044D1 true DE69939044D1 (de) 2008-08-21

Family

ID=27479521

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69939044T Expired - Lifetime DE69939044D1 (de) 1998-09-28 1999-09-28 Verfahren zur Regelung des Brechungsindexes eines PVD-Films

Country Status (3)

Country Link
US (2) US6666958B1 (de)
EP (1) EP0992604B1 (de)
DE (1) DE69939044D1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1437609A4 (de) * 2001-10-18 2004-11-17 Bridgestone Corp Optisches element und herstellungsverfahren dafür und bandpassfilter, nah-infrarot-sperrfilter und antireflexfilm
US7203031B2 (en) * 2001-12-17 2007-04-10 Neomax Co., Ltd. Substrate for thin-film magnetic head and method of manufacturing the substrate
TWI259525B (en) * 2002-03-29 2006-08-01 Ritek Corp Method of fabricating multi-layer mirror
US20030228475A1 (en) * 2002-04-18 2003-12-11 Minoru Komada Barrier film and laminated material, container for wrapping and image display medium using the same, and manufacturing method for barrier film
US7147759B2 (en) * 2002-09-30 2006-12-12 Zond, Inc. High-power pulsed magnetron sputtering
SE0402644D0 (sv) * 2004-11-02 2004-11-02 Biocell Ab Method and apparatus for producing electric discharges
US20060278521A1 (en) * 2005-06-14 2006-12-14 Stowell Michael W System and method for controlling ion density and energy using modulated power signals
US8864958B2 (en) * 2007-03-13 2014-10-21 Jds Uniphase Corporation Method and sputter-deposition system for depositing a layer composed of a mixture of materials and having a predetermined refractive index
KR20090052174A (ko) * 2007-11-20 2009-05-25 아이시스(주) 확산박막 증착 방법 및 장치
JP2010177029A (ja) * 2009-01-29 2010-08-12 Canon Inc 電子放出素子の製造方法及び硼化ランタン膜の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4517217A (en) 1980-09-09 1985-05-14 Westinghouse Electric Corp. Protective coating means for articles such as gold-plated jewelry and wristwatch components
JPS63113507A (ja) * 1986-10-31 1988-05-18 Hitachi Ltd 光導波路およびその製造法
US5346600A (en) * 1992-08-14 1994-09-13 Hughes Aircraft Company Plasma-enhanced magnetron-sputtered deposition of materials
WO1995020060A1 (en) 1994-01-21 1995-07-27 The Carborundum Company Silicon carbide sputtering target
US5480695A (en) * 1994-08-10 1996-01-02 Tenhover; Michael A. Ceramic substrates and magnetic data storage components prepared therefrom

Also Published As

Publication number Publication date
EP0992604A3 (de) 2002-07-03
US6666958B1 (en) 2003-12-23
US6921465B2 (en) 2005-07-26
US20040040836A1 (en) 2004-03-04
EP0992604A2 (de) 2000-04-12
EP0992604B1 (de) 2008-07-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition