DE69938806D1 - Solarzelle mit Vertiefungen im Substrat und deren Herstellungsverfahren - Google Patents

Solarzelle mit Vertiefungen im Substrat und deren Herstellungsverfahren

Info

Publication number
DE69938806D1
DE69938806D1 DE69938806T DE69938806T DE69938806D1 DE 69938806 D1 DE69938806 D1 DE 69938806D1 DE 69938806 T DE69938806 T DE 69938806T DE 69938806 T DE69938806 T DE 69938806T DE 69938806 D1 DE69938806 D1 DE 69938806D1
Authority
DE
Germany
Prior art keywords
recesses
substrate
solar cell
production process
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69938806T
Other languages
English (en)
Inventor
Kazuyo Nakamura
Kenzo Kawano
Hidetoshi Washio
Yoshifumi Tonomura
Kunio Kamimura
Hideyuki Ueyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Application granted granted Critical
Publication of DE69938806D1 publication Critical patent/DE69938806D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
    • H01L31/068Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0236Special surface textures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0236Special surface textures
    • H01L31/02363Special surface textures of the semiconductor body itself, e.g. textured active layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604Chemical etching
    • H01L21/30608Anisotropic liquid etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/308Chemical or electrical treatment, e.g. electrolytic etching using masks
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/544Solar cells from Group III-V materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product
DE69938806T 1998-07-03 1999-07-01 Solarzelle mit Vertiefungen im Substrat und deren Herstellungsverfahren Expired - Lifetime DE69938806D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10188361A JP2000022185A (ja) 1998-07-03 1998-07-03 太陽電池セル及びその製造方法

Publications (1)

Publication Number Publication Date
DE69938806D1 true DE69938806D1 (de) 2008-07-10

Family

ID=16222285

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69938806T Expired - Lifetime DE69938806D1 (de) 1998-07-03 1999-07-01 Solarzelle mit Vertiefungen im Substrat und deren Herstellungsverfahren

Country Status (4)

Country Link
US (1) US6127623A (de)
EP (1) EP0969519B1 (de)
JP (1) JP2000022185A (de)
DE (1) DE69938806D1 (de)

Families Citing this family (91)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3619053B2 (ja) * 1999-05-21 2005-02-09 キヤノン株式会社 光電変換装置の製造方法
US6329296B1 (en) * 2000-08-09 2001-12-11 Sandia Corporation Metal catalyst technique for texturing silicon solar cells
AUPR174800A0 (en) * 2000-11-29 2000-12-21 Australian National University, The Semiconductor processing
JP2004518663A (ja) * 2000-12-18 2004-06-24 トラスティーズ オブ プリンストン ユニバーシティ 非対称なパルスフィールド電気泳動を使用した巨大分子の分画
JP4713752B2 (ja) * 2000-12-28 2011-06-29 財団法人国際科学振興財団 半導体装置およびその製造方法
CA2370731A1 (en) * 2001-02-07 2002-08-07 Ebara Corporation Solar cell and method of manufacturing same
EP1461834A4 (de) * 2001-11-29 2010-06-09 Origin Energy Solar Pty Ltd Halbleiter-texturierungsprozess
US6660928B1 (en) 2002-04-02 2003-12-09 Essential Research, Inc. Multi-junction photovoltaic cell
JP2004319800A (ja) * 2003-04-17 2004-11-11 Canon Inc 太陽電池モジュール
WO2005013378A1 (en) * 2003-08-01 2005-02-10 Grenzone Pte Ltd An improved thin-film photovoltaic module
US7431857B2 (en) * 2003-08-15 2008-10-07 Applied Materials, Inc. Plasma generation and control using a dual frequency RF source
JP2005150614A (ja) * 2003-11-19 2005-06-09 Sharp Corp 太陽電池及びその製造方法
US20050148198A1 (en) * 2004-01-05 2005-07-07 Technion Research & Development Foundation Ltd. Texturing a semiconductor material using negative potential dissolution (NPD)
US9508886B2 (en) 2007-10-06 2016-11-29 Solexel, Inc. Method for making a crystalline silicon solar cell substrate utilizing flat top laser beam
US8399331B2 (en) 2007-10-06 2013-03-19 Solexel Laser processing for high-efficiency thin crystalline silicon solar cell fabrication
US8420435B2 (en) * 2009-05-05 2013-04-16 Solexel, Inc. Ion implantation fabrication process for thin-film crystalline silicon solar cells
US8048789B2 (en) * 2005-04-26 2011-11-01 Northwestern University Mesoscale pyramids, arrays and methods of preparation
DE102005027799B4 (de) * 2005-06-16 2007-09-27 Saint-Gobain Glass Deutschland Gmbh Verfahren zum Herstellen einer transparenten Scheibe mit einer Oberflächenstruktur und Vorrichtung zum Durchführen des Verfahrens
US8816191B2 (en) * 2005-11-29 2014-08-26 Banpil Photonics, Inc. High efficiency photovoltaic cells and manufacturing thereof
US10873045B2 (en) * 2005-11-29 2020-12-22 Banpil Photonics, Inc. High efficiency photovoltaic cells and manufacturing thereof
US20080264477A1 (en) * 2006-10-09 2008-10-30 Soltaix, Inc. Methods for manufacturing three-dimensional thin-film solar cells
US7999174B2 (en) * 2006-10-09 2011-08-16 Solexel, Inc. Solar module structures and assembly methods for three-dimensional thin-film solar cells
US20100304521A1 (en) * 2006-10-09 2010-12-02 Solexel, Inc. Shadow Mask Methods For Manufacturing Three-Dimensional Thin-Film Solar Cells
US8193076B2 (en) 2006-10-09 2012-06-05 Solexel, Inc. Method for releasing a thin semiconductor substrate from a reusable template
US8937243B2 (en) * 2006-10-09 2015-01-20 Solexel, Inc. Structures and methods for high-efficiency pyramidal three-dimensional solar cells
US8035028B2 (en) * 2006-10-09 2011-10-11 Solexel, Inc. Pyramidal three-dimensional thin-film solar cells
US8293558B2 (en) * 2006-10-09 2012-10-23 Solexel, Inc. Method for releasing a thin-film substrate
US8084684B2 (en) 2006-10-09 2011-12-27 Solexel, Inc. Three-dimensional thin-film solar cells
US7808082B2 (en) * 2006-11-14 2010-10-05 International Business Machines Corporation Structure and method for dual surface orientations for CMOS transistors
ITMI20070056A1 (it) * 2007-01-17 2008-07-18 Consiglio Nazionale Ricerche Substrato semiconduttore adatto alla realizzazione di dispositivi elettronici e-o optoelettronici e relativo processo di fabbricazione
KR100855682B1 (ko) * 2007-04-16 2008-09-03 고려대학교 산학협력단 태양전지의 실리콘 표면 텍스쳐링 방법
WO2009026240A1 (en) * 2007-08-17 2009-02-26 Solexel, Inc. Methods for liquid transfer coating of three-dimensional substrates
TWI467778B (zh) * 2008-03-13 2015-01-01 Nat Univ Tsing Hua A solar cell with a deep etched hole
EP2278632A4 (de) * 2008-04-30 2013-11-27 Mitsubishi Electric Corp Photovoltaikanordnung und verfahren zu ihrer herstellung
US20100144080A1 (en) * 2008-06-02 2010-06-10 Solexel, Inc. Method and apparatus to transfer coat uneven surface
US7851698B2 (en) * 2008-06-12 2010-12-14 Sunpower Corporation Trench process and structure for backside contact solar cells with polysilicon doped regions
US20220209037A1 (en) * 2008-06-12 2022-06-30 Sunpower Corporation Trench process and structure for backside contact solar cells with polysilicon doped regions
EP2159851A1 (de) * 2008-09-01 2010-03-03 Université de Neuchâtel Verfahren zur Beschränkung des epitaxialen Wachstums in einer fotoelektrischen Vorrichtung mit Heteroübergängen und eine solche fotoelektrische Vorrichtung
FR2935842A1 (fr) * 2008-09-05 2010-03-12 Commissariat Energie Atomique Procede de realisation d'un substrat photovoltaique texture
US7820472B2 (en) * 2008-11-13 2010-10-26 Applied Materials, Inc. Method of forming front contacts to a silicon solar cell without patterning
EP2356675B1 (de) * 2008-11-13 2016-06-01 Solexel, Inc. Dreidimensionale Dünnschichtsolarzelle und deren Herstellungsverfahren
US8288195B2 (en) * 2008-11-13 2012-10-16 Solexel, Inc. Method for fabricating a three-dimensional thin-film semiconductor substrate from a template
EP2371006A4 (de) * 2008-11-26 2013-05-01 Solexel Inc Trunkierte pyramidenstruktren für durchsichtige solarzellen
US9076642B2 (en) 2009-01-15 2015-07-07 Solexel, Inc. High-Throughput batch porous silicon manufacturing equipment design and processing methods
WO2010083422A1 (en) * 2009-01-15 2010-07-22 Solexel, Inc. Porous silicon electro-etching system and method
US8906218B2 (en) 2010-05-05 2014-12-09 Solexel, Inc. Apparatus and methods for uniformly forming porous semiconductor on a substrate
JP5029921B2 (ja) * 2009-01-19 2012-09-19 シャープ株式会社 太陽電池セルの製造方法
MY162405A (en) * 2009-02-06 2017-06-15 Solexel Inc Trench Formation Method For Releasing A Thin-Film Substrate From A Reusable Semiconductor Template
JP5185157B2 (ja) * 2009-02-25 2013-04-17 浜松ホトニクス株式会社 フォトダイオードの製造方法及びフォトダイオード
TWI402993B (zh) * 2009-03-04 2013-07-21 Ind Tech Res Inst 光電轉換元件與製造方法
US8828517B2 (en) 2009-03-23 2014-09-09 Solexel, Inc. Structure and method for improving solar cell efficiency and mechanical strength
CN102427971B (zh) * 2009-04-14 2015-01-07 速力斯公司 高效外延化学气相沉积(cvd)反应器
US9099584B2 (en) * 2009-04-24 2015-08-04 Solexel, Inc. Integrated three-dimensional and planar metallization structure for thin film solar cells
MY165969A (en) 2009-05-05 2018-05-18 Solexel Inc High-productivity porous semiconductor manufacturing equipment
US9318644B2 (en) 2009-05-05 2016-04-19 Solexel, Inc. Ion implantation and annealing for thin film crystalline solar cells
CN101894870B (zh) * 2009-05-18 2012-06-27 财团法人工业技术研究院 光电转换元件及其制造方法
US8445314B2 (en) * 2009-05-22 2013-05-21 Solexel, Inc. Method of creating reusable template for detachable thin film substrate
US8551866B2 (en) * 2009-05-29 2013-10-08 Solexel, Inc. Three-dimensional thin-film semiconductor substrate with through-holes and methods of manufacturing
US20120097239A1 (en) * 2009-07-14 2012-04-26 Mitsubishi Electric Corporation Method for roughening substrate surface, method for manufacturing photovoltaic device, and photovoltaic device
US8574949B2 (en) * 2009-09-20 2013-11-05 Intermolecular, Inc. Methods of building crystalline silicon solar cells for use in combinatorial screening
US20130167915A1 (en) 2009-12-09 2013-07-04 Solexel, Inc. High-efficiency photovoltaic back-contact solar cell structures and manufacturing methods using three-dimensional semiconductor absorbers
CN102844883B (zh) 2010-02-12 2016-01-20 速力斯公司 用于制造光电池和微电子器件的半导体衬底的双面可重复使用的模板
TW201133905A (en) * 2010-03-30 2011-10-01 E Ton Solar Tech Co Ltd Method of forming solar cell
JP5866765B2 (ja) * 2010-04-28 2016-02-17 ソニー株式会社 導電性素子およびその製造方法、配線素子、情報入力装置、表示装置、ならびに電子機器
FR2959599B1 (fr) * 2010-04-28 2013-12-20 Commissariat Energie Atomique Dispositif et procede de texturation mecanique d'une plaquette de silicium destinee a constituer une cellule photovoltaique, plaquette de silicium obtenue
WO2011156657A2 (en) 2010-06-09 2011-12-15 Solexel, Inc. High productivity thin film deposition method and system
US9991407B1 (en) * 2010-06-22 2018-06-05 Banpil Photonics Inc. Process for creating high efficiency photovoltaic cells
US8563351B2 (en) * 2010-06-25 2013-10-22 Taiwan Semiconductor Manufacturing Co., Ltd. Method for manufacturing photovoltaic device
US20120021555A1 (en) * 2010-07-23 2012-01-26 Taiwan Semiconductor Manufacturing Company, Ltd. Photovoltaic cell texturization
MY158500A (en) 2010-08-05 2016-10-14 Solexel Inc Backplane reinforcement and interconnects for solar cells
TWI412145B (zh) * 2010-08-16 2013-10-11 Univ Nat Sun Yat Sen 具異質結構之矽基太陽能電池及其製造方法
JP5640854B2 (ja) * 2011-03-25 2014-12-17 ソニー株式会社 導電性素子およびその製造方法、配線素子、情報入力装置、表示装置、電子機器、ならびに原盤
US20120291840A1 (en) * 2011-05-18 2012-11-22 Glenn Eric Kohnke Patterned textured glass compatible with laser scribing
US9748414B2 (en) 2011-05-20 2017-08-29 Arthur R. Zingher Self-activated front surface bias for a solar cell
TWI453927B (zh) 2011-06-29 2014-09-21 Ind Tech Res Inst 多重反射結構以及光電元件
KR101334590B1 (ko) * 2011-11-23 2013-11-29 한국세라믹기술원 태양전지용 기판의 제조방법
US8841161B2 (en) * 2012-02-05 2014-09-23 GTAT.Corporation Method for forming flexible solar cells
US8916954B2 (en) 2012-02-05 2014-12-23 Gtat Corporation Multi-layer metal support
JP5777798B2 (ja) * 2012-03-12 2015-09-09 三菱電機株式会社 太陽電池セルの製造方法
JP5554359B2 (ja) * 2012-03-28 2014-07-23 三菱電機株式会社 基板の粗面化方法、太陽電池の製造方法および太陽電池、太陽電池モジュール
CN102683439A (zh) * 2012-05-04 2012-09-19 友达光电股份有限公司 光学抗反射结构、其制法以及包含其的太阳能电池
US8940580B2 (en) * 2012-06-28 2015-01-27 International Business Machines Corporation Textured multi-junction solar cell and fabrication method
US9105775B2 (en) 2012-06-28 2015-08-11 International Business Machines Corporation Textured multi-junction solar cell and fabrication method
US8785294B2 (en) 2012-07-26 2014-07-22 Gtat Corporation Silicon carbide lamina
TWI550886B (zh) * 2015-07-10 2016-09-21 國立屏東科技大學 矽基板表面粗糙化方法
WO2017033261A1 (ja) * 2015-08-24 2017-03-02 株式会社高揚 ソーラーパネル及びその表面構造
CN105261665A (zh) * 2015-11-12 2016-01-20 杭州电子科技大学 一种具有高效陷光结构的晶体硅太阳能电池及其制备方法
CN111640810B (zh) * 2019-03-01 2023-06-06 中国科学院物理研究所 具有锥形绒面的压花玻璃和太阳能电池组件
US11670725B2 (en) * 2020-02-25 2023-06-06 Taiwan Semiconductor Manufacturing Company, Ltd. Image sensor with absorption enhancement structure
CN112466967B (zh) * 2020-11-23 2023-08-22 浙江晶科能源有限公司 一种选择性发射极太阳能电池及其制备方法
CN113540269B (zh) * 2021-09-14 2022-04-12 浙江晶科能源有限公司 太阳能电池及其制备方法、光伏组件

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4135950A (en) * 1975-09-22 1979-01-23 Communications Satellite Corporation Radiation hardened solar cell
US3985579A (en) * 1975-11-26 1976-10-12 The United States Of America As Represented By The Secretary Of The Air Force Rib and channel vertical multijunction solar cell
DE2952431A1 (de) * 1979-12-27 1981-07-02 Solarex Corp., 14001 Rockville, Md. Solarzelle und verfahren zu ihrer herstellung
US5024953A (en) * 1988-03-22 1991-06-18 Hitachi, Ltd. Method for producing opto-electric transducing element
JPH03276682A (ja) * 1990-03-26 1991-12-06 Sharp Corp 半導体装置
US5067985A (en) * 1990-06-08 1991-11-26 The United States Of America As Represented By The Secretary Of The Air Force Back-contact vertical-junction solar cell and method
US5248621A (en) * 1990-10-23 1993-09-28 Canon Kabushiki Kaisha Method for producing solar cell devices of crystalline material
US5098482A (en) * 1990-11-07 1992-03-24 Solarex Corporation Vertical junction solar cell
DE4234471C1 (de) * 1992-10-13 1994-01-20 Fraunhofer Ges Forschung Vorrichtung zur Absorption infraroter Strahlung
US5306646A (en) * 1992-12-23 1994-04-26 Martin Marietta Energy Systems, Inc. Method for producing textured substrates for thin-film photovoltaic cells
EP0742959B1 (de) * 1993-07-29 2001-11-14 Gerhard Willeke Verfahren zur Herstellung einer Solarzelle, sowie nach diesem verfahren hergestellte Solarzelle
JP3079870B2 (ja) * 1993-11-19 2000-08-21 トヨタ自動車株式会社 逆ピラミッド型テクスチャーの形成方法
US5792280A (en) * 1994-05-09 1998-08-11 Sandia Corporation Method for fabricating silicon cells
IT1281359B1 (it) * 1995-09-26 1998-02-18 Fiat Ricerche Superficie anti-riflettente a rugosita' predeterminata, particolarmente per plance di autoveicoli

Also Published As

Publication number Publication date
JP2000022185A (ja) 2000-01-21
EP0969519A2 (de) 2000-01-05
EP0969519B1 (de) 2008-05-28
US6127623A (en) 2000-10-03
EP0969519A3 (de) 2000-11-08

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