DE69936057D1 - Verfahren und anordnung zur herstellung von höckern - Google Patents

Verfahren und anordnung zur herstellung von höckern

Info

Publication number
DE69936057D1
DE69936057D1 DE69936057T DE69936057T DE69936057D1 DE 69936057 D1 DE69936057 D1 DE 69936057D1 DE 69936057 T DE69936057 T DE 69936057T DE 69936057 T DE69936057 T DE 69936057T DE 69936057 D1 DE69936057 D1 DE 69936057D1
Authority
DE
Germany
Prior art keywords
heeds
producing
arrangement
producing heeds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69936057T
Other languages
English (en)
Other versions
DE69936057T2 (de
Inventor
Makoto Imanishi
Shoriki Narita
Masahiko Iketani
Shinji Kanayama
Takaharu Mae
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP17308698A external-priority patent/JP3626595B2/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69936057D1 publication Critical patent/DE69936057D1/de
Publication of DE69936057T2 publication Critical patent/DE69936057T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Wire Bonding (AREA)
DE69936057T 1998-06-19 1999-06-17 Verfahren und anordnung zur herstellung von höckern Expired - Fee Related DE69936057T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP17308698A JP3626595B2 (ja) 1998-05-08 1998-06-19 バンプ形成方法及びバンプ形成装置
JP17308698 1998-06-19
PCT/JP1999/003224 WO1999066547A1 (en) 1998-06-19 1999-06-17 Method and device for forming bump

Publications (2)

Publication Number Publication Date
DE69936057D1 true DE69936057D1 (de) 2007-06-21
DE69936057T2 DE69936057T2 (de) 2008-01-10

Family

ID=15953952

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69936057T Expired - Fee Related DE69936057T2 (de) 1998-06-19 1999-06-17 Verfahren und anordnung zur herstellung von höckern

Country Status (6)

Country Link
US (3) US6787391B1 (de)
EP (1) EP1098362B1 (de)
CN (1) CN1155068C (de)
DE (1) DE69936057T2 (de)
TW (1) TW412816B (de)
WO (1) WO1999066547A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW412816B (en) * 1998-06-19 2000-11-21 Matsushita Electric Ind Co Ltd Bump-forming apparatus and bump-forming method
JP4456234B2 (ja) * 2000-07-04 2010-04-28 パナソニック株式会社 バンプ形成方法
US20050127144A1 (en) * 2003-12-10 2005-06-16 Atuhito Mochida Method of mounting a semiconductor laser component on a submount
US7431192B2 (en) * 2005-01-04 2008-10-07 Kulicke And Soffa Industries, Inc. Wire bonding apparatus
JP2007180456A (ja) * 2005-12-28 2007-07-12 Toyota Industries Corp 半田付け方法及び半導体モジュールの製造方法
WO2008032755A1 (en) * 2006-09-11 2008-03-20 Panasonic Corporation Electronic component placing apparatus and electronic component mounting method
JP5091296B2 (ja) * 2010-10-18 2012-12-05 東京エレクトロン株式会社 接合装置
US8870051B2 (en) * 2012-05-03 2014-10-28 International Business Machines Corporation Flip chip assembly apparatus employing a warpage-suppressor assembly
EP4269019A3 (de) * 2017-04-04 2024-02-21 Kulicke and Soffa Industries, Inc. Ultraschallschweisssystem und verfahren zum betrieb eines ultraschallschweisssystems
KR102647685B1 (ko) * 2018-09-18 2024-03-18 삼성디스플레이 주식회사 발광물질의 안정성 평가장치 및 평가방법

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4024560A (en) * 1975-09-04 1977-05-17 Westinghouse Electric Corporation Pyroelectric-field effect electromagnetic radiation detector
US4518848A (en) * 1981-05-15 1985-05-21 Gca Corporation Apparatus for baking resist on semiconductor wafers
US4507078A (en) * 1983-03-28 1985-03-26 Silicon Valley Group, Inc. Wafer handling apparatus and method
US4846623A (en) 1986-10-08 1989-07-11 Dainippon Screen Mfg. Co., Ltd. Wafer transferring device
JPS6412555U (de) 1987-07-10 1989-01-23
JP2704309B2 (ja) * 1990-06-12 1998-01-26 大日本スクリーン製造株式会社 基板処理装置及び基板の熱処理方法
JPH05226407A (ja) * 1991-11-12 1993-09-03 Nec Corp 半導体装置の製造方法及び製造装置
JPH06204316A (ja) * 1992-12-28 1994-07-22 Mitsubishi Electric Corp 耐熱ロボットハンド
JPH06232132A (ja) 1993-02-02 1994-08-19 Toshiba Corp バンプ形成装置
JPH07153763A (ja) * 1993-11-26 1995-06-16 Sumitomo Electric Ind Ltd 回路基板のバンプの製造方法
US5588827A (en) * 1993-12-17 1996-12-31 Brooks Automation Inc. Passive gas substrate thermal conditioning apparatus and method
US5665639A (en) * 1994-02-23 1997-09-09 Cypress Semiconductor Corp. Process for manufacturing a semiconductor device bump electrode using a rapid thermal anneal
JP3415283B2 (ja) 1994-08-31 2003-06-09 株式会社東芝 バンプ形成装置、バンプ形成方法および半導体素子の製造方法
TW297910B (de) 1995-02-02 1997-02-11 Tokyo Electron Co Ltd
JP3983831B2 (ja) * 1995-05-30 2007-09-26 シグマメルテック株式会社 基板ベーキング装置及び基板ベーキング方法
JP2675771B2 (ja) 1995-07-14 1997-11-12 株式会社テンヨー 紐の切断トリック手品具
JPH09289241A (ja) * 1996-04-22 1997-11-04 Shinkawa Ltd ウェーハ搬送装置
US5905302A (en) * 1996-11-18 1999-05-18 Applied Materials, Inc. Loadlock cassette with wafer support rails
JP3330037B2 (ja) * 1996-11-29 2002-09-30 富士通株式会社 チップ部品の接合方法および装置
US6053398A (en) * 1996-12-06 2000-04-25 The Furukawa Electric Co., Ltd. Solder bump forming method, solder bump forming apparatus, head unit for use therein and soldering method using the head unit
US6544377B1 (en) * 1997-11-20 2003-04-08 Matsushita Electric Industrial Co., Ltd. Heating and pressurizing apparatus for use in mounting electronic components, and apparatus and method for mounting electronic components
DE19753761A1 (de) * 1997-12-04 1999-06-17 Bosch Gmbh Robert Wischblatt
JP4190611B2 (ja) * 1998-03-13 2008-12-03 パナソニック株式会社 部品装着方法、及び部品装着装置
TW412817B (en) * 1998-06-19 2000-11-21 Matsushita Electric Ind Co Ltd A bump bonding apparatus and method
TW412816B (en) * 1998-06-19 2000-11-21 Matsushita Electric Ind Co Ltd Bump-forming apparatus and bump-forming method
CN1144278C (zh) * 1998-09-01 2004-03-31 松下电器产业株式会社 压点焊接的判定装置与方法及半导体部件制造装置与方法
JP4371497B2 (ja) * 1999-10-19 2009-11-25 パナソニック株式会社 バンプボンディング用加熱装置

Also Published As

Publication number Publication date
TW412816B (en) 2000-11-21
DE69936057T2 (de) 2008-01-10
EP1098362B1 (de) 2007-05-09
CN1306674A (zh) 2001-08-01
CN1155068C (zh) 2004-06-23
WO1999066547A1 (en) 1999-12-23
US20080179378A1 (en) 2008-07-31
EP1098362A4 (de) 2003-08-13
US6787391B1 (en) 2004-09-07
US7387229B2 (en) 2008-06-17
US20040149803A1 (en) 2004-08-05
EP1098362A1 (de) 2001-05-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PANASONIC CORP., KADOMA, OSAKA, JP

8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee