DE69841754D1 - Detektor für elektromagnetische Strahlung, diesen verwendende Pixelstruktur mit hoher Empfindlichkeit und Verfahren zu seiner Herstellung - Google Patents
Detektor für elektromagnetische Strahlung, diesen verwendende Pixelstruktur mit hoher Empfindlichkeit und Verfahren zu seiner HerstellungInfo
- Publication number
- DE69841754D1 DE69841754D1 DE69841754T DE69841754T DE69841754D1 DE 69841754 D1 DE69841754 D1 DE 69841754D1 DE 69841754 T DE69841754 T DE 69841754T DE 69841754 T DE69841754 T DE 69841754T DE 69841754 D1 DE69841754 D1 DE 69841754D1
- Authority
- DE
- Germany
- Prior art keywords
- same
- manufacturing
- electromagnetic radiation
- high sensitivity
- radiation detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005670 electromagnetic radiation Effects 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000035945 sensitivity Effects 0.000 title 1
- 239000004065 semiconductor Substances 0.000 abstract 4
- 230000005855 radiation Effects 0.000 abstract 3
- 230000004888 barrier function Effects 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 239000002800 charge carrier Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
- Measurement Of Radiation (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3753197P | 1997-02-10 | 1997-02-10 | |
EP97870084A EP0883187A1 (de) | 1997-06-04 | 1997-06-04 | Detektor für elektromagnetische Strahlung, Pixelstruktur mit höher Empfindlichkeit mit Verwendung dieses Detektors und Verfahren zu dessen Herstellung |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69841754D1 true DE69841754D1 (de) | 2010-08-19 |
Family
ID=26148244
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69841754T Expired - Lifetime DE69841754D1 (de) | 1997-02-10 | 1998-02-06 | Detektor für elektromagnetische Strahlung, diesen verwendende Pixelstruktur mit hoher Empfindlichkeit und Verfahren zu seiner Herstellung |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0858111B1 (de) |
JP (1) | JP4053651B2 (de) |
KR (1) | KR100545801B1 (de) |
AT (1) | ATE473520T1 (de) |
DE (1) | DE69841754D1 (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6815791B1 (en) | 1997-02-10 | 2004-11-09 | Fillfactory | Buried, fully depletable, high fill factor photodiodes |
US8063963B2 (en) | 1998-02-09 | 2011-11-22 | On Semiconductor Image Sensor | Imaging device having a pixel structure with high dynamic range read-out signal |
US7106373B1 (en) | 1998-02-09 | 2006-09-12 | Cypress Semiconductor Corporation (Belgium) Bvba | Method for increasing dynamic range of a pixel by multiple incomplete reset |
EP1109229A3 (de) * | 1999-12-14 | 2008-03-26 | Fillfactory N.V. | Vergrabene und vollständig verarmbare Photodiode mit hohem Füllfaktor |
EP1620895B1 (de) * | 2003-05-08 | 2016-03-02 | The Science and Technology Facilities Council | Sensor zur detektion von beschleunigten teilchen und hochenergiestrahlung |
DE60318214T2 (de) | 2003-11-21 | 2008-12-18 | Carestream Health, Inc., Rochester | Zahnärztliches Röntgengerät |
WO2006056086A1 (fr) * | 2004-11-25 | 2006-06-01 | Waeny Martin | Capteur optoelectronique a haute dynamique et faible bruit d’offset |
US7750958B1 (en) | 2005-03-28 | 2010-07-06 | Cypress Semiconductor Corporation | Pixel structure |
US7808022B1 (en) | 2005-03-28 | 2010-10-05 | Cypress Semiconductor Corporation | Cross talk reduction |
JP5387212B2 (ja) * | 2009-07-31 | 2014-01-15 | 富士通セミコンダクター株式会社 | 半導体装置及びその製造方法 |
KR101304094B1 (ko) * | 2012-05-23 | 2013-09-05 | 서울대학교산학협력단 | 플래시 메모리의 구조를 이용한 전자파 측정 장치 및 이를 이용한 전자파 측정 방법 |
JP6381135B2 (ja) * | 2015-04-21 | 2018-08-29 | マイクロシグナル株式会社 | 光電変換素子 |
JP2018156984A (ja) * | 2017-03-15 | 2018-10-04 | 株式会社東芝 | 光検出素子 |
JP2022039524A (ja) * | 2020-08-28 | 2022-03-10 | 株式会社東芝 | 半導体装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57193073A (en) * | 1981-05-22 | 1982-11-27 | Fuji Electric Co Ltd | Semiconductor radioactive ray detector |
JPS57201085A (en) * | 1981-06-03 | 1982-12-09 | Fuji Electric Corp Res & Dev Ltd | Semiconductor radiation detector |
DE4209536C3 (de) * | 1992-03-24 | 2000-10-05 | Stuttgart Mikroelektronik | Bildzelle für einen Bildaufnehmer-Chip |
US5933190A (en) * | 1995-04-18 | 1999-08-03 | Imec Vzw | Pixel structure, image sensor using such pixel structure and corresponding peripheral circuitry |
US5614744A (en) * | 1995-08-04 | 1997-03-25 | National Semiconductor Corporation | CMOS-based, low leakage active pixel array with anti-blooming isolation |
-
1998
- 1998-02-06 DE DE69841754T patent/DE69841754D1/de not_active Expired - Lifetime
- 1998-02-06 EP EP98870025A patent/EP0858111B1/de not_active Expired - Lifetime
- 1998-02-06 AT AT98870025T patent/ATE473520T1/de not_active IP Right Cessation
- 1998-02-09 JP JP06757598A patent/JP4053651B2/ja not_active Expired - Lifetime
- 1998-02-09 KR KR1019980003639A patent/KR100545801B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0858111A1 (de) | 1998-08-12 |
JPH1131839A (ja) | 1999-02-02 |
JP4053651B2 (ja) | 2008-02-27 |
KR19980071190A (ko) | 1998-10-26 |
KR100545801B1 (ko) | 2006-04-21 |
ATE473520T1 (de) | 2010-07-15 |
EP0858111B1 (de) | 2010-07-07 |
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