JPS57201085A - Semiconductor radiation detector - Google Patents

Semiconductor radiation detector

Info

Publication number
JPS57201085A
JPS57201085A JP56085504A JP8550481A JPS57201085A JP S57201085 A JPS57201085 A JP S57201085A JP 56085504 A JP56085504 A JP 56085504A JP 8550481 A JP8550481 A JP 8550481A JP S57201085 A JPS57201085 A JP S57201085A
Authority
JP
Japan
Prior art keywords
region
depletion layer
relative resistance
semiconductor
sensitivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56085504A
Other languages
Japanese (ja)
Inventor
Kimii Sumino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FUJI DENKI SOUGOU KENKYUSHO KK
Fuji Electric Co Ltd
Original Assignee
FUJI DENKI SOUGOU KENKYUSHO KK
Fuji Electric Co Ltd
Fuji Electric Corporate Research and Development Ltd
Fuji Electric Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FUJI DENKI SOUGOU KENKYUSHO KK, Fuji Electric Co Ltd, Fuji Electric Corporate Research and Development Ltd, Fuji Electric Manufacturing Co Ltd filed Critical FUJI DENKI SOUGOU KENKYUSHO KK
Priority to JP56085504A priority Critical patent/JPS57201085A/en
Publication of JPS57201085A publication Critical patent/JPS57201085A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/115Devices sensitive to very short wavelength, e.g. X-rays, gamma-rays or corpuscular radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Measurement Of Radiation (AREA)
  • Light Receiving Elements (AREA)

Abstract

PURPOSE:To acquire a semiconductor radiation detector with no difference in sensitivity, even if there is a difference in relative resistance in semiconductor material, by providing a barrier where a semiconductor plate surrounding with an interval has the same conductivity with its inner region and the lower relative resistance. CONSTITUTION:A P(+) region 6 is provided to surround an N(+) layer of a P type silicon substrate 1. The P(+) region 6 is provided at a position where a depletion layer stops extending at the P(+) region 6, when voltage is reversed between P and N(+) layers. Namely, the depletion layer extends to as far as the P(+) region in the P region by VA application. Therefore, the depletion layer is not effected on extending, even if the relative resistance is higher. A constant depletion layer range is always formed, and there is no variation in sensitivity. Such a detector 11 is connected to a power supply 12 and converts current at the reception of incoming radiation into an output signal through an amplifier 13 by a signal processor 14.
JP56085504A 1981-06-03 1981-06-03 Semiconductor radiation detector Pending JPS57201085A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56085504A JPS57201085A (en) 1981-06-03 1981-06-03 Semiconductor radiation detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56085504A JPS57201085A (en) 1981-06-03 1981-06-03 Semiconductor radiation detector

Publications (1)

Publication Number Publication Date
JPS57201085A true JPS57201085A (en) 1982-12-09

Family

ID=13860756

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56085504A Pending JPS57201085A (en) 1981-06-03 1981-06-03 Semiconductor radiation detector

Country Status (1)

Country Link
JP (1) JPS57201085A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100545801B1 (en) * 1997-02-10 2006-04-21 필 팩토리 Electromagnetic radiation detectors, high sensitivity pixel structures using such detectors and methods of manufacturing such detectors.
JP2012054421A (en) * 2010-09-01 2012-03-15 Lapis Semiconductor Co Ltd Semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100545801B1 (en) * 1997-02-10 2006-04-21 필 팩토리 Electromagnetic radiation detectors, high sensitivity pixel structures using such detectors and methods of manufacturing such detectors.
JP2012054421A (en) * 2010-09-01 2012-03-15 Lapis Semiconductor Co Ltd Semiconductor device

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