DE69834413D1 - Elektronenstrahlmikroskop mit verwendung von elektronenstrahlmustern - Google Patents

Elektronenstrahlmikroskop mit verwendung von elektronenstrahlmustern

Info

Publication number
DE69834413D1
DE69834413D1 DE69834413T DE69834413T DE69834413D1 DE 69834413 D1 DE69834413 D1 DE 69834413D1 DE 69834413 T DE69834413 T DE 69834413T DE 69834413 T DE69834413 T DE 69834413T DE 69834413 D1 DE69834413 D1 DE 69834413D1
Authority
DE
Germany
Prior art keywords
electron beam
microscope
pattern
beam pattern
beam microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69834413T
Other languages
English (en)
Other versions
DE69834413T2 (de
Inventor
W Baum
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Intevac Inc
Original Assignee
Intevac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intevac Inc filed Critical Intevac Inc
Application granted granted Critical
Publication of DE69834413D1 publication Critical patent/DE69834413D1/de
Publication of DE69834413T2 publication Critical patent/DE69834413T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06333—Photo emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31779—Lithography by projection from patterned photocathode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
DE69834413T 1997-10-01 1998-09-18 Elektronenstrahlmikroskop mit verwendung von elektronenstrahlmustern Expired - Lifetime DE69834413T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/942,334 US6005247A (en) 1997-10-01 1997-10-01 Electron beam microscope using electron beam patterns
US942334 1997-10-01
PCT/US1998/019615 WO1999017332A1 (en) 1997-10-01 1998-09-18 Electron beam microscope using electron beam patterns

Publications (2)

Publication Number Publication Date
DE69834413D1 true DE69834413D1 (de) 2006-06-08
DE69834413T2 DE69834413T2 (de) 2006-10-19

Family

ID=25477943

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69834413T Expired - Lifetime DE69834413T2 (de) 1997-10-01 1998-09-18 Elektronenstrahlmikroskop mit verwendung von elektronenstrahlmustern

Country Status (7)

Country Link
US (1) US6005247A (de)
EP (1) EP1019942B1 (de)
JP (1) JP2003525514A (de)
AU (1) AU9401098A (de)
DE (1) DE69834413T2 (de)
IL (1) IL135115A (de)
WO (1) WO1999017332A1 (de)

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US6528801B1 (en) * 1998-11-04 2003-03-04 The Research Foundation Of State University Of New York Method and apparatus for detecting radiation
GB9916804D0 (en) * 1999-07-16 1999-09-22 Shah Jitendra S Scanning beam instruments
US6583413B1 (en) * 1999-09-01 2003-06-24 Hitachi, Ltd. Method of inspecting a circuit pattern and inspecting instrument
WO2001026134A1 (en) * 1999-09-30 2001-04-12 Etec Systems, Inc. Array of multiple charged particle beamlet emitting columns
US6828574B1 (en) * 2000-08-08 2004-12-07 Applied Materials, Inc. Modulator driven photocathode electron beam generator
US20030178583A1 (en) * 2000-09-18 2003-09-25 Kampherbeek Bert Jan Field emission photo-cathode array for lithography system and lithography system provided with such an array
US6946655B2 (en) * 2001-11-07 2005-09-20 Applied Materials, Inc. Spot grid array electron imaging system
US6744226B2 (en) * 2002-09-30 2004-06-01 Duly Research Inc. Photoelectron linear accelerator for producing a low emittance polarized electron beam
JP2006504136A (ja) * 2002-10-21 2006-02-02 ナノインク インコーポレーティッド ナノメートル・スケール設計構造、その製造方法および装置、マスク修復、強化、および製造への適用
US6847164B2 (en) * 2002-12-10 2005-01-25 Applied Matrials, Inc. Current-stabilizing illumination of photocathode electron beam source
TWI287940B (en) * 2003-04-01 2007-10-01 Cabot Microelectronics Corp Electron source and method for making same
US7447298B2 (en) * 2003-04-01 2008-11-04 Cabot Microelectronics Corporation Decontamination and sterilization system using large area x-ray source
US7279686B2 (en) * 2003-07-08 2007-10-09 Biomed Solutions, Llc Integrated sub-nanometer-scale electron beam systems
EP1760762B1 (de) * 2005-09-06 2012-02-01 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Vorrichtung und Verfahren zur Auswahl einer Emissionsfläche einer Emissionsstruktur
WO2010019968A2 (en) * 2008-08-15 2010-02-18 John Ruffell Systems and methods for scanning a beam of charged particles
WO2010042629A2 (en) * 2008-10-09 2010-04-15 California Institute Of Technology 4d imaging in an ultrafast electron microscope
DE102009015341A1 (de) * 2009-03-27 2010-10-07 Carl Zeiss Ag Verfahren und Vorrichtungen zur optischen Untersuchung von Proben
US8321422B1 (en) 2009-04-23 2012-11-27 Google Inc. Fast covariance matrix generation
US8396325B1 (en) 2009-04-27 2013-03-12 Google Inc. Image enhancement through discrete patch optimization
US8611695B1 (en) 2009-04-27 2013-12-17 Google Inc. Large scale patch search
US8391634B1 (en) * 2009-04-28 2013-03-05 Google Inc. Illumination estimation for images
US8385662B1 (en) 2009-04-30 2013-02-26 Google Inc. Principal component analysis based seed generation for clustering analysis
US8798393B2 (en) 2010-12-01 2014-08-05 Google Inc. Removing illumination variation from images
US8487556B2 (en) * 2011-03-08 2013-07-16 Duly Research Inc. Ultra-high vacuum photoelectron linear accelerator
JP5386544B2 (ja) * 2011-06-07 2014-01-15 株式会社アドバンテスト 電子ビーム露光装置及び電子ビーム露光方法
US8938119B1 (en) 2012-05-01 2015-01-20 Google Inc. Facade illumination removal
US8907280B1 (en) * 2012-09-19 2014-12-09 Sandia Corporation Fast electron microscopy via compressive sensing
JP5808021B2 (ja) * 2013-07-16 2015-11-10 国立大学法人名古屋大学 電子親和力の低下処理装置に用いられる活性化容器及びキット、該キットを含む電子親和力の低下処理装置、フォトカソード電子ビーム源、並びに、フォトカソード電子ビーム源を含む電子銃、自由電子レーザー加速器、透過型電子顕微鏡、走査型電子顕微鏡、電子線ホログラフィー顕微鏡、電子線描画装置、電子線回折装置及び電子線検査装置
JP6251525B2 (ja) * 2013-09-13 2017-12-20 株式会社日立ハイテクノロジーズ 荷電粒子線装置
WO2017168554A1 (ja) 2016-03-29 2017-10-05 株式会社日立ハイテクノロジーズ 電子顕微鏡
DE112018007279B4 (de) 2018-05-21 2024-03-21 Hitachi High-Tech Corporation Elektronenstrahl-Anwendungsgerät
US10714295B2 (en) * 2018-09-18 2020-07-14 Kla-Tencor Corporation Metal encapsulated photocathode electron emitter
US11784022B2 (en) 2019-01-28 2023-10-10 Hitachi High-Tech Corporation Electron beam apparatus
WO2021084684A1 (ja) * 2019-10-31 2021-05-06 株式会社日立ハイテク 電子銃および電子線応用装置
EP4102535A1 (de) * 2021-06-08 2022-12-14 ASML Netherlands B.V. Ladungsteilchenvorrichtung und -verfahren
WO2022258271A1 (en) * 2021-06-08 2022-12-15 Asml Netherlands B.V. Charged particle apparatus and method

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Publication number Priority date Publication date Assignee Title
US4460831A (en) * 1981-11-30 1984-07-17 Thermo Electron Corporation Laser stimulated high current density photoelectron generator and method of manufacture
US4820927A (en) * 1985-06-28 1989-04-11 Control Data Corporation Electron beam source employing a photo-emitter cathode
US4906894A (en) * 1986-06-19 1990-03-06 Canon Kabushiki Kaisha Photoelectron beam converting device and method of driving the same
US4970392A (en) * 1990-01-17 1990-11-13 Thermo Electron Corporation Stably emitting demountable photoelectron generator
US5039862A (en) * 1990-02-20 1991-08-13 Smith Donald O Switched electron beam source employing a common photo-emitter cathode and method of operation
US5557105A (en) * 1991-06-10 1996-09-17 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
US5587832A (en) * 1993-10-20 1996-12-24 Biophysica Technologies, Inc. Spatially light modulated confocal microscope and method
US5684360A (en) * 1995-07-10 1997-11-04 Intevac, Inc. Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas
JP3331127B2 (ja) * 1995-08-22 2002-10-07 株式会社東芝 マスク欠陥修正装置および修正方法

Also Published As

Publication number Publication date
DE69834413T2 (de) 2006-10-19
EP1019942A4 (de) 2001-09-26
US6005247A (en) 1999-12-21
AU9401098A (en) 1999-04-23
EP1019942A1 (de) 2000-07-19
IL135115A (en) 2003-12-10
WO1999017332A1 (en) 1999-04-08
EP1019942B1 (de) 2006-05-03
IL135115A0 (en) 2001-05-20
JP2003525514A (ja) 2003-08-26

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