DE69830121D1 - Polierschlamm Spendevorrichtung - Google Patents
Polierschlamm SpendevorrichtungInfo
- Publication number
- DE69830121D1 DE69830121D1 DE69830121T DE69830121T DE69830121D1 DE 69830121 D1 DE69830121 D1 DE 69830121D1 DE 69830121 T DE69830121 T DE 69830121T DE 69830121 T DE69830121 T DE 69830121T DE 69830121 D1 DE69830121 D1 DE 69830121D1
- Authority
- DE
- Germany
- Prior art keywords
- polishing slurry
- slurry dispenser
- dispenser
- polishing
- slurry
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005498 polishing Methods 0.000 title 1
- 239000002002 slurry Substances 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31621797A JP3788550B2 (ja) | 1997-10-31 | 1997-10-31 | 砥液供給装置 |
JP31621697A JP3801325B2 (ja) | 1997-10-31 | 1997-10-31 | 研磨装置及び半導体ウエハの研磨方法 |
JP31621697 | 1997-10-31 | ||
JP31621797 | 1997-10-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69830121D1 true DE69830121D1 (de) | 2005-06-16 |
DE69830121T2 DE69830121T2 (de) | 2006-02-23 |
Family
ID=26568585
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69830121T Expired - Fee Related DE69830121T2 (de) | 1997-10-31 | 1998-10-29 | Polierschlamm Spendevorrichtung |
Country Status (5)
Country | Link |
---|---|
US (1) | US6293849B1 (de) |
EP (1) | EP0913233B1 (de) |
DE (1) | DE69830121T2 (de) |
SG (1) | SG75889A1 (de) |
TW (1) | TW416893B (de) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3538042B2 (ja) * | 1998-11-24 | 2004-06-14 | 松下電器産業株式会社 | スラリー供給装置及びスラリー供給方法 |
US6200202B1 (en) * | 1998-11-30 | 2001-03-13 | Seh America, Inc. | System and method for supplying slurry to a semiconductor processing machine |
JP2002170792A (ja) * | 2000-11-29 | 2002-06-14 | Mitsubishi Electric Corp | 研磨液供給装置及び研磨液供給方法、研磨装置及び研磨方法、並びに、半導体装置の製造方法 |
US6736154B2 (en) * | 2001-01-26 | 2004-05-18 | American Air Liquide, Inc. | Pressure vessel systems and methods for dispensing liquid chemical compositions |
US6606917B2 (en) * | 2001-11-26 | 2003-08-19 | Emerson Electric Co. | High purity coriolis mass flow controller |
US20030098069A1 (en) * | 2001-11-26 | 2003-05-29 | Sund Wesley E. | High purity fluid delivery system |
US7204679B2 (en) * | 2002-09-30 | 2007-04-17 | Emerson Electric Co. | Flow control system |
US6860723B2 (en) * | 2002-10-05 | 2005-03-01 | Taiwan Semiconductor Manufacturing Co., Ltd | Slurry flow control and monitor system for chemical mechanical polisher |
US6984166B2 (en) * | 2003-08-01 | 2006-01-10 | Chartered Semiconductor Manufacturing Ltd. | Zone polishing using variable slurry solid content |
US20080146119A1 (en) * | 2005-01-21 | 2008-06-19 | Tatsuya Sasaki | Substrate Polishing Method and Apparatus |
US7810674B2 (en) * | 2005-07-26 | 2010-10-12 | Millipore Corporation | Liquid dispensing system with enhanced mixing |
US7427227B2 (en) * | 2005-08-30 | 2008-09-23 | Denso Corporation | Method and apparatus for fluid polishing |
US7950547B2 (en) * | 2006-01-12 | 2011-05-31 | Millipore Corporation | Reservoir for liquid dispensing system with enhanced mixing |
WO2008005564A2 (en) | 2006-07-07 | 2008-01-10 | Hrp Manufacturing, Llc | Liquid food dispenser system and method |
KR20100017695A (ko) * | 2007-05-09 | 2010-02-16 | 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 | 재료 혼합과 분배를 위한 시스템 및 방법 |
TW200939335A (en) * | 2007-12-06 | 2009-09-16 | Advanced Tech Materials | Systems and methods for delivery of fluid-containing process material combinations |
US8561627B1 (en) * | 2008-09-26 | 2013-10-22 | Intermolecular, Inc. | Calibration of a chemical dispense system |
TW201210722A (en) * | 2010-09-03 | 2012-03-16 | Rexon Ind Corp Ltd | Tile cutter with a liquid level display |
US9770804B2 (en) | 2013-03-18 | 2017-09-26 | Versum Materials Us, Llc | Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture |
US9662761B2 (en) * | 2013-12-02 | 2017-05-30 | Ebara Corporation | Polishing apparatus |
CN103639889A (zh) * | 2013-12-05 | 2014-03-19 | 天津中环领先材料技术有限公司 | 一种用于无蜡抛光设备的配液供液装置及其使用方法 |
CN108284390B (zh) * | 2018-03-16 | 2023-07-18 | 湘潭大学 | 一种抛光液供给系统 |
CN108637913B (zh) * | 2018-06-06 | 2024-01-16 | 蚌埠国显科技有限公司 | 一种抛光机集中供液系统 |
CN112601720A (zh) | 2018-08-29 | 2021-04-02 | Mks仪器公司 | 臭氧水输送系统及其使用方法 |
CN110238708B (zh) * | 2019-06-20 | 2024-01-23 | 中国工程物理研究院激光聚变研究中心 | 一种磁流变抛光机床磁流变液循环系统 |
US11705354B2 (en) | 2020-07-10 | 2023-07-18 | Applied Materials, Inc. | Substrate handling systems |
CN113118964A (zh) * | 2021-04-23 | 2021-07-16 | 长鑫存储技术有限公司 | 化学机械研磨装置 |
CN115890459A (zh) * | 2022-12-30 | 2023-04-04 | 湖南科鑫泰电子有限公司 | 一种石英晶片抛光装置及抛光方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5417346A (en) * | 1990-09-17 | 1995-05-23 | Applied Chemical Solutions | Process and apparatus for electronic control of the transfer and delivery of high purity chemicals |
JPH0752045A (ja) | 1993-08-17 | 1995-02-28 | Ebara Corp | ポリッシング装置の砥液供給装置 |
US5658183A (en) * | 1993-08-25 | 1997-08-19 | Micron Technology, Inc. | System for real-time control of semiconductor wafer polishing including optical monitoring |
US5679059A (en) * | 1994-11-29 | 1997-10-21 | Ebara Corporation | Polishing aparatus and method |
JP2971714B2 (ja) | 1993-10-01 | 1999-11-08 | 住友金属工業株式会社 | 半導体基板の鏡面研磨方法 |
DE69529751D1 (de) * | 1994-07-19 | 2003-04-03 | Applied Chemical Solutions Hol | Vorrichtung und methode zur anwendung beim chemischen-mechanischen polieren |
JP2933488B2 (ja) * | 1994-08-10 | 1999-08-16 | 日本電気株式会社 | 研磨方法および研磨装置 |
JP3734289B2 (ja) * | 1995-01-24 | 2006-01-11 | 株式会社荏原製作所 | ポリッシング装置 |
JP3690837B2 (ja) * | 1995-05-02 | 2005-08-31 | 株式会社荏原製作所 | ポリッシング装置及び方法 |
US5665656A (en) * | 1995-05-17 | 1997-09-09 | National Semiconductor Corporation | Method and apparatus for polishing a semiconductor substrate wafer |
US5578529A (en) * | 1995-06-02 | 1996-11-26 | Motorola Inc. | Method for using rinse spray bar in chemical mechanical polishing |
JP3311203B2 (ja) * | 1995-06-13 | 2002-08-05 | 株式会社東芝 | 半導体装置の製造方法及び半導体製造装置、半導体ウェーハの化学的機械的ポリッシング方法 |
JP3678468B2 (ja) * | 1995-07-18 | 2005-08-03 | 株式会社荏原製作所 | ポリッシング装置 |
US5738574A (en) * | 1995-10-27 | 1998-04-14 | Applied Materials, Inc. | Continuous processing system for chemical mechanical polishing |
US5750440A (en) * | 1995-11-20 | 1998-05-12 | Motorola, Inc. | Apparatus and method for dynamically mixing slurry for chemical mechanical polishing |
US5762539A (en) * | 1996-02-27 | 1998-06-09 | Ebara Corporation | Apparatus for and method for polishing workpiece |
US5885134A (en) * | 1996-04-18 | 1999-03-23 | Ebara Corporation | Polishing apparatus |
US5823854A (en) * | 1996-05-28 | 1998-10-20 | Industrial Technology Research Institute | Chemical-mechanical polish (CMP) pad conditioner |
KR100202659B1 (ko) * | 1996-07-09 | 1999-06-15 | 구본준 | 반도체웨이퍼의 기계화학적 연마장치 |
US5785584A (en) * | 1996-08-30 | 1998-07-28 | International Business Machines Corporation | Planarizing apparatus with deflectable polishing pad |
JPH1076153A (ja) | 1996-09-05 | 1998-03-24 | Fujitsu Ltd | 液体自動供給装置及びその異常検出装置 |
-
1998
- 1998-10-29 US US09/181,993 patent/US6293849B1/en not_active Expired - Lifetime
- 1998-10-29 EP EP98120520A patent/EP0913233B1/de not_active Expired - Lifetime
- 1998-10-29 DE DE69830121T patent/DE69830121T2/de not_active Expired - Fee Related
- 1998-10-30 TW TW087118017A patent/TW416893B/zh not_active IP Right Cessation
- 1998-10-30 SG SG1998004391A patent/SG75889A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
SG75889A1 (en) | 2000-10-24 |
EP0913233A2 (de) | 1999-05-06 |
EP0913233A3 (de) | 2002-10-30 |
EP0913233B1 (de) | 2005-05-11 |
US6293849B1 (en) | 2001-09-25 |
DE69830121T2 (de) | 2006-02-23 |
TW416893B (en) | 2001-01-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |