DE69823461T2 - Flüssigkeitsausstosskopf, Herstellungsverfahren des Flüssigkeitsausstosskopfes, Kassette mit diesem Flüssigkeitsausstosskopf und Flüssigkeitsausstossvorrichtung - Google Patents
Flüssigkeitsausstosskopf, Herstellungsverfahren des Flüssigkeitsausstosskopfes, Kassette mit diesem Flüssigkeitsausstosskopf und Flüssigkeitsausstossvorrichtung Download PDFInfo
- Publication number
- DE69823461T2 DE69823461T2 DE69823461T DE69823461T DE69823461T2 DE 69823461 T2 DE69823461 T2 DE 69823461T2 DE 69823461 T DE69823461 T DE 69823461T DE 69823461 T DE69823461 T DE 69823461T DE 69823461 T2 DE69823461 T2 DE 69823461T2
- Authority
- DE
- Germany
- Prior art keywords
- liquid
- gap
- forming
- substrate
- liquid ejection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000007788 liquid Substances 0.000 title claims description 247
- 238000004519 manufacturing process Methods 0.000 title claims description 37
- 239000000758 substrate Substances 0.000 claims description 75
- 238000010438 heat treatment Methods 0.000 claims description 50
- 239000000463 material Substances 0.000 claims description 47
- 239000010410 layer Substances 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 23
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 15
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 15
- 239000012530 fluid Substances 0.000 claims description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 13
- 239000010703 silicon Substances 0.000 claims description 13
- 229910052710 silicon Inorganic materials 0.000 claims description 13
- 238000005530 etching Methods 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 239000011241 protective layer Substances 0.000 claims description 9
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 229910052715 tantalum Inorganic materials 0.000 claims description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 6
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 5
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 5
- 238000000059 patterning Methods 0.000 claims description 3
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 3
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims 1
- 230000008018 melting Effects 0.000 claims 1
- 239000010408 film Substances 0.000 description 48
- ORQBXQOJMQIAOY-UHFFFAOYSA-N nobelium Chemical compound [No] ORQBXQOJMQIAOY-UHFFFAOYSA-N 0.000 description 9
- 238000010276 construction Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 238000011144 upstream manufacturing Methods 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 5
- 239000002210 silicon-based material Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 238000007599 discharging Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000009825 accumulation Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000010985 leather Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 239000002023 wood Substances 0.000 description 3
- 238000009835 boiling Methods 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000004753 textile Substances 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 1
- 235000017491 Bambusa tulda Nutrition 0.000 description 1
- 241001330002 Bambuseae Species 0.000 description 1
- 241000283690 Bos taurus Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 235000002918 Fraxinus excelsior Nutrition 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- PBZHKWVYRQRZQC-UHFFFAOYSA-N [Si+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O Chemical compound [Si+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PBZHKWVYRQRZQC-UHFFFAOYSA-N 0.000 description 1
- RVSGESPTHDDNTH-UHFFFAOYSA-N alumane;tantalum Chemical compound [AlH3].[Ta] RVSGESPTHDDNTH-UHFFFAOYSA-N 0.000 description 1
- 239000002956 ash Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000002649 leather substitute Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- OYLRFHLPEAGKJU-UHFFFAOYSA-N phosphane silicic acid Chemical compound P.[Si](O)(O)(O)O OYLRFHLPEAGKJU-UHFFFAOYSA-N 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000011120 plywood Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 239000012858 resilient material Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14032—Structure of the pressure chamber
- B41J2/14048—Movable member in the chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1604—Production of bubble jet print heads of the edge shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1643—Manufacturing processes thin film formation thin film formation by plating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33610597 | 1997-12-05 | ||
| JP33610597 | 1997-12-05 | ||
| JP34607498 | 1998-12-04 | ||
| JP34607498A JP3927711B2 (ja) | 1997-12-05 | 1998-12-04 | 液体吐出ヘッドの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69823461D1 DE69823461D1 (de) | 2004-06-03 |
| DE69823461T2 true DE69823461T2 (de) | 2005-04-14 |
Family
ID=26575359
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69823461T Expired - Fee Related DE69823461T2 (de) | 1997-12-05 | 1998-12-04 | Flüssigkeitsausstosskopf, Herstellungsverfahren des Flüssigkeitsausstosskopfes, Kassette mit diesem Flüssigkeitsausstosskopf und Flüssigkeitsausstossvorrichtung |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6196667B1 (enExample) |
| EP (1) | EP0920996B1 (enExample) |
| JP (1) | JP3927711B2 (enExample) |
| DE (1) | DE69823461T2 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6886915B2 (en) * | 1999-10-19 | 2005-05-03 | Silverbrook Research Pty Ltd | Fluid supply mechanism for a printhead |
| US6378993B1 (en) | 1998-12-03 | 2002-04-30 | Canon Kabushiki Kaisha | Liquid discharge head, producing method therefor and liquid discharge apparatus |
| AUPQ130399A0 (en) * | 1999-06-30 | 1999-07-22 | Silverbrook Research Pty Ltd | A method and apparatus (IJ47V9) |
| AUPQ130899A0 (en) * | 1999-06-30 | 1999-07-22 | Silverbrook Research Pty Ltd | A method and apparatus (IJ47V12) |
| AUPQ131099A0 (en) * | 1999-06-30 | 1999-07-22 | Silverbrook Research Pty Ltd | A method and apparatus (IJ47V8) |
| US6435661B1 (en) | 1999-09-03 | 2002-08-20 | Canon Kabushiki Kaisha | Liquid discharge head, liquid discharge method and liquid discharge apparatus |
| JP3584193B2 (ja) | 2000-02-15 | 2004-11-04 | キヤノン株式会社 | 液体吐出ヘッド、液体吐出装置及び前記液体吐出ヘッドの製造方法 |
| US6435670B1 (en) | 2000-02-15 | 2002-08-20 | Canon Kabushiki Kaisha | Liquid discharge head, liquid discharge method, liquid discharge apparatus, recovery method for liquid discharge head, and fluid structure body |
| US6834423B2 (en) | 2000-07-31 | 2004-12-28 | Canon Kabushiki Kaisha | Method of manufacturing a liquid discharge head |
| JP4095368B2 (ja) | 2001-08-10 | 2008-06-04 | キヤノン株式会社 | インクジェット記録ヘッドの作成方法 |
| JP2003311982A (ja) * | 2002-04-23 | 2003-11-06 | Canon Inc | 液体吐出ヘッド |
| CN1968815B (zh) * | 2004-06-28 | 2013-05-01 | 佳能株式会社 | 排液头制造方法，和使用该方法得到的排液头 |
| JP4459037B2 (ja) * | 2004-12-01 | 2010-04-28 | キヤノン株式会社 | 液体吐出ヘッド |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1127227A (en) | 1977-10-03 | 1982-07-06 | Ichiro Endo | Liquid jet recording process and apparatus therefor |
| US4611219A (en) | 1981-12-29 | 1986-09-09 | Canon Kabushiki Kaisha | Liquid-jetting head |
| JPS6159911A (ja) | 1984-08-30 | 1986-03-27 | Nec Corp | 切換スイツチ回路 |
| JPS6159914A (ja) | 1984-08-31 | 1986-03-27 | Fujitsu Ltd | デイジタル圧縮装置 |
| US5479197A (en) | 1991-07-11 | 1995-12-26 | Canon Kabushiki Kaisha | Head for recording apparatus |
| JP3342279B2 (ja) | 1995-01-13 | 2002-11-05 | キヤノン株式会社 | 液体吐出方法、液体吐出ヘッドおよび該液体吐出ヘッドの製造方法 |
| TW312658B (enExample) * | 1995-01-13 | 1997-08-11 | Canon Kk | |
| JP3706671B2 (ja) * | 1995-04-14 | 2005-10-12 | キヤノン株式会社 | 液体吐出ヘッド、液体吐出ヘッドを用いたヘッドカートリッジ、液体吐出装置、および液体吐出方法 |
| DE69626879T2 (de) * | 1995-04-26 | 2004-02-05 | Canon K.K. | Flüssigkeitsausstosskopf, Flüssigkeitsausstossgerät und Flüssigkeitsausstossverfahren |
| US6154237A (en) * | 1995-12-05 | 2000-11-28 | Canon Kabushiki Kaisha | Liquid ejecting method, liquid ejecting head and liquid ejecting apparatus in which motion of a movable member is controlled |
| US5880752A (en) * | 1996-05-09 | 1999-03-09 | Hewlett-Packard Company | Print system for ink-jet pens |
| JP3542460B2 (ja) * | 1996-06-07 | 2004-07-14 | キヤノン株式会社 | 液体吐出方法及び液体吐出装置 |
-
1998
- 1998-12-04 DE DE69823461T patent/DE69823461T2/de not_active Expired - Fee Related
- 1998-12-04 EP EP98123169A patent/EP0920996B1/en not_active Expired - Lifetime
- 1998-12-04 JP JP34607498A patent/JP3927711B2/ja not_active Expired - Fee Related
- 1998-12-07 US US09/206,279 patent/US6196667B1/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US6196667B1 (en) | 2001-03-06 |
| DE69823461D1 (de) | 2004-06-03 |
| EP0920996A2 (en) | 1999-06-09 |
| EP0920996A3 (en) | 2000-07-05 |
| EP0920996B1 (en) | 2004-04-28 |
| JP3927711B2 (ja) | 2007-06-13 |
| JPH11235827A (ja) | 1999-08-31 |
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| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |