DE69813519D1 - Interferometrisches system mit zwei wellenlängen, und lithographischer apparat versehen mit so einem system - Google Patents

Interferometrisches system mit zwei wellenlängen, und lithographischer apparat versehen mit so einem system

Info

Publication number
DE69813519D1
DE69813519D1 DE69813519T DE69813519T DE69813519D1 DE 69813519 D1 DE69813519 D1 DE 69813519D1 DE 69813519 T DE69813519 T DE 69813519T DE 69813519 T DE69813519 T DE 69813519T DE 69813519 D1 DE69813519 D1 DE 69813519D1
Authority
DE
Germany
Prior art keywords
wavelengths
lithographic apparatus
apparatus provide
interferometric
interferometric system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69813519T
Other languages
English (en)
Other versions
DE69813519T2 (de
Inventor
Der Werf Evert Van
Jos Belien
Cornelis Rijpers
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE69813519D1 publication Critical patent/DE69813519D1/de
Application granted granted Critical
Publication of DE69813519T2 publication Critical patent/DE69813519T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
DE69813519T 1997-12-22 1998-12-14 Interferometrisches system mit zwei wellenlängen, und lithographischer apparat versehen mit so einem system Expired - Fee Related DE69813519T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP97204065 1997-12-22
EP97204065 1997-12-22
PCT/IB1998/002015 WO1999032848A1 (en) 1997-12-22 1998-12-14 Interferometer system with two wavelengths, and lithographic apparatus provided with such a system

Publications (2)

Publication Number Publication Date
DE69813519D1 true DE69813519D1 (de) 2003-05-22
DE69813519T2 DE69813519T2 (de) 2004-04-01

Family

ID=8229109

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69813519T Expired - Fee Related DE69813519T2 (de) 1997-12-22 1998-12-14 Interferometrisches system mit zwei wellenlängen, und lithographischer apparat versehen mit so einem system

Country Status (7)

Country Link
US (1) US6122058A (de)
EP (1) EP0961914B1 (de)
JP (1) JP3774476B2 (de)
KR (1) KR100554886B1 (de)
DE (1) DE69813519T2 (de)
TW (1) TW367407B (de)
WO (1) WO1999032848A1 (de)

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WO1999045580A1 (fr) 1998-03-06 1999-09-10 Nikon Corporation Dispositif d'exposition et procede de fabrication de dispositif a semi-conducteurs
TWI231405B (en) * 1999-12-22 2005-04-21 Asml Netherlands Bv Lithographic projection apparatus, position detection device, and method of manufacturing a device using a lithographic projection apparatus
WO2002040976A2 (en) * 2000-11-20 2002-05-23 Koninklijke Philips Electronics N.V. Inspection of surfaces
US7433683B2 (en) * 2000-12-28 2008-10-07 Northstar Acquisitions, Llc System for fast macrodiversity switching in mobile wireless networks
US6778280B2 (en) 2001-07-06 2004-08-17 Zygo Corporation Interferometry system and method employing an angular difference in propagation between orthogonally polarized input beam components
AU2002320323A1 (en) * 2001-07-06 2003-01-21 Zygo Corporation Multi-axis interferometer
KR100674640B1 (ko) * 2001-08-14 2007-01-25 학교법인 청석학원 강유전성 액정 크리스탈을 이용한 광 스위치
US6500725B1 (en) 2001-09-06 2002-12-31 Taiwan Semiconductor Manufacturing Company, Ltd Microelectronic fabrication method providing alignment mark and isolation trench of identical depth
KR100468155B1 (ko) * 2002-06-27 2005-01-26 한국과학기술원 이종모드 헬륨-네온 레이저와 슈퍼 헤테로다인위상측정법을 이용한 헤테로다인 레이저 간섭계
KR100587368B1 (ko) * 2003-06-30 2006-06-08 엘지.필립스 엘시디 주식회사 Ｓｌｓ 결정화 장치
US7936443B2 (en) * 2006-05-09 2011-05-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8908144B2 (en) * 2006-09-27 2014-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7683300B2 (en) * 2006-10-17 2010-03-23 Asml Netherlands B.V. Using an interferometer as a high speed variable attenuator
JP5065668B2 (ja) * 2006-12-26 2012-11-07 オリンパス株式会社 顕微鏡法および顕微鏡
DE102008033942B3 (de) * 2008-07-18 2010-04-08 Luphos Gmbh Faseroptisches Mehrwellenlängeninterferometer (MWLI) zur absoluten Vermessung von Abständen und Topologien von Oberflächen in großem Arbeitsabstand
US9482755B2 (en) 2008-11-17 2016-11-01 Faro Technologies, Inc. Measurement system having air temperature compensation between a target and a laser tracker
JP5489658B2 (ja) * 2009-11-05 2014-05-14 キヤノン株式会社 計測装置
US9377885B2 (en) 2010-04-21 2016-06-28 Faro Technologies, Inc. Method and apparatus for locking onto a retroreflector with a laser tracker
US9772394B2 (en) 2010-04-21 2017-09-26 Faro Technologies, Inc. Method and apparatus for following an operator and locking onto a retroreflector with a laser tracker
US9400170B2 (en) 2010-04-21 2016-07-26 Faro Technologies, Inc. Automatic measurement of dimensional data within an acceptance region by a laser tracker
US8619265B2 (en) 2011-03-14 2013-12-31 Faro Technologies, Inc. Automatic measurement of dimensional data with a laser tracker
CN103403575B (zh) 2011-03-03 2015-09-16 法罗技术股份有限公司 靶标设备和方法
US9482529B2 (en) 2011-04-15 2016-11-01 Faro Technologies, Inc. Three-dimensional coordinate scanner and method of operation
US9164173B2 (en) 2011-04-15 2015-10-20 Faro Technologies, Inc. Laser tracker that uses a fiber-optic coupler and an achromatic launch to align and collimate two wavelengths of light
US9686532B2 (en) 2011-04-15 2017-06-20 Faro Technologies, Inc. System and method of acquiring three-dimensional coordinates using multiple coordinate measurement devices
GB2504890A (en) * 2011-04-15 2014-02-12 Faro Tech Inc Enhanced position detector in laser tracker
CN104094081A (zh) 2012-01-27 2014-10-08 法罗技术股份有限公司 利用条形码识别的检查方法
US9678350B2 (en) 2012-03-20 2017-06-13 Kla-Tencor Corporation Laser with integrated multi line or scanning beam capability
DE102012212663A1 (de) * 2012-07-19 2014-01-23 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie mit einer optischen Abstandsmessvorrichtung
CN103777476B (zh) * 2012-10-19 2016-01-27 上海微电子装备有限公司 一种离轴对准系统及对准方法
US9188430B2 (en) 2013-03-14 2015-11-17 Faro Technologies, Inc. Compensation of a structured light scanner that is tracked in six degrees-of-freedom
US9041914B2 (en) 2013-03-15 2015-05-26 Faro Technologies, Inc. Three-dimensional coordinate scanner and method of operation
US9395174B2 (en) 2014-06-27 2016-07-19 Faro Technologies, Inc. Determining retroreflector orientation by optimizing spatial fit
CN108592800B (zh) * 2018-05-02 2019-08-20 中国计量科学研究院 一种基于平面镜反射的激光外差干涉测量装置和方法
US11262191B1 (en) * 2018-07-12 2022-03-01 Onto Innovation Inc. On-axis dynamic interferometer and optical imaging systems employing the same

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NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
NL186353C (nl) * 1979-06-12 1990-11-01 Philips Nv Inrichting voor het afbeelden van een maskerpatroon op een substraat voorzien van een opto-elektronisch detektiestelsel voor het bepalen van een afwijking tussen het beeldvlak van een projektielenzenstelsel en het substraatvlak.
CH667373A5 (de) * 1985-05-22 1988-10-14 Bucher Guyer Ag Masch Verfahren zur klaerung von fluessigkeiten und anlage zur durchfuehrung desselben.
NL8600639A (nl) * 1986-03-12 1987-10-01 Asm Lithography Bv Werkwijze voor het ten opzichte van elkaar uitrichten van een masker en een substraat en inrichting voor het uitvoeren van de werkwijze.
NL8900991A (nl) * 1989-04-20 1990-11-16 Asm Lithography Bv Apparaat voor het afbeelden van een maskerpatroon op een substraat.
NL9001611A (nl) * 1990-07-16 1992-02-17 Asm Lithography Bv Apparaat voor het afbeelden van een maskerpatroon op een substraat.
NL9100215A (nl) * 1991-02-07 1992-09-01 Asm Lithography Bv Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.
US5838458A (en) * 1992-02-25 1998-11-17 Tsai; Irving Method and apparatus for linking designated portions of a received document image with an electronic address
EP0658811B1 (de) * 1993-12-13 1998-06-17 Carl Zeiss Beleuchtungseinrichtung für eine Projektions-Mikrolithographie-Belichtungsanlage
US5404222A (en) * 1994-01-14 1995-04-04 Sparta, Inc. Interferametric measuring system with air turbulence compensation
WO1997033205A1 (en) * 1996-03-06 1997-09-12 Philips Electronics N.V. Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
US5838485A (en) * 1996-08-20 1998-11-17 Zygo Corporation Superheterodyne interferometer and method for compensating the refractive index of air using electronic frequency multiplication
US5764362A (en) * 1996-08-20 1998-06-09 Zygo Corporation Superheterodyne method and apparatus for measuring the refractive index of air using multiple-pass interferometry
US5929990A (en) * 1997-03-19 1999-07-27 Litton Systems, Inc. Fabry-perot pressure sensing system with ratioed quadrature pulse detection

Also Published As

Publication number Publication date
KR100554886B1 (ko) 2006-02-24
EP0961914A1 (de) 1999-12-08
WO1999032848A1 (en) 1999-07-01
US6122058A (en) 2000-09-19
TW367407B (en) 1999-08-21
EP0961914B1 (de) 2003-04-16
DE69813519T2 (de) 2004-04-01
JP3774476B2 (ja) 2006-05-17
JP2001513204A (ja) 2001-08-28
KR20000075472A (ko) 2000-12-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee