DE69704998D1 - Ausrichtungsvorrichtung und lithographischer apparat mit einer solchen vorrichtung - Google Patents

Ausrichtungsvorrichtung und lithographischer apparat mit einer solchen vorrichtung

Info

Publication number
DE69704998D1
DE69704998D1 DE69704998T DE69704998T DE69704998D1 DE 69704998 D1 DE69704998 D1 DE 69704998D1 DE 69704998 T DE69704998 T DE 69704998T DE 69704998 T DE69704998 T DE 69704998T DE 69704998 D1 DE69704998 D1 DE 69704998D1
Authority
DE
Germany
Prior art keywords
lithographic apparatus
alignment
alignment device
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69704998T
Other languages
English (en)
Other versions
DE69704998T2 (de
Inventor
Peter Dirksen
Der Werf Evert Van
Gawein Tenner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE69704998D1 publication Critical patent/DE69704998D1/de
Publication of DE69704998T2 publication Critical patent/DE69704998T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/5442—Marks applied to semiconductor devices or parts comprising non digital, non alphanumeric information, e.g. symbols
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69704998T 1996-03-15 1997-02-27 Ausrichtungsvorrichtung und lithographischer apparat mit einer solchen vorrichtung Expired - Fee Related DE69704998T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP96200725 1996-03-15
PCT/IB1997/000170 WO1997035234A1 (en) 1996-03-15 1997-02-27 Alignment device and lithographic apparatus provided with such a device

Publications (2)

Publication Number Publication Date
DE69704998D1 true DE69704998D1 (de) 2001-07-05
DE69704998T2 DE69704998T2 (de) 2001-09-27

Family

ID=8223790

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69704998T Expired - Fee Related DE69704998T2 (de) 1996-03-15 1997-02-27 Ausrichtungsvorrichtung und lithographischer apparat mit einer solchen vorrichtung

Country Status (6)

Country Link
US (1) US5917604A (de)
EP (1) EP0826165B1 (de)
JP (1) JP4023695B2 (de)
DE (1) DE69704998T2 (de)
TW (1) TW385377B (de)
WO (1) WO1997035234A1 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090273634A1 (en) * 1997-07-15 2009-11-05 Silverbrook Research Pty Ltd Printhead Integrated Circuit With Thin Nozzle Layer
US7246881B2 (en) * 1997-07-15 2007-07-24 Silverbrook Research Pty Ltd Printhead assembly arrangement for a wide format pagewidth inkjet printer
US6160622A (en) * 1997-12-29 2000-12-12 Asm Lithography, B.V. Alignment device and lithographic apparatus comprising such a device
US6417922B1 (en) 1997-12-29 2002-07-09 Asml Netherlands B.V. Alignment device and lithographic apparatus comprising such a device
US6377337B1 (en) * 1998-05-02 2002-04-23 Canon Kabushiki Kaisha Projection exposure apparatus
DE19830438A1 (de) * 1998-07-08 2000-01-13 Zeiss Carl Fa Verfahren zur Dekontamination von Mikrolithographie-Projektionsbelichtungsanlagen
US6061606A (en) 1998-08-25 2000-05-09 International Business Machines Corporation Geometric phase analysis for mask alignment
DE19949009A1 (de) 1999-10-11 2001-04-12 Zeiss Carl Fa Verfahren und Vorrichtung zum gegenseitigen Ausrichten eines in einer Maske gebildeten Maskenmusters und eines Substrates
TWI282909B (en) * 1999-12-23 2007-06-21 Asml Netherlands Bv Lithographic apparatus and a method for manufacturing a device
EP1111473A3 (de) * 1999-12-23 2004-04-21 ASML Netherlands B.V. Lithographischer Apparat mit Vakuumkammer und interferometrischem Ausrichtungssystem
JP4414535B2 (ja) * 2000-01-13 2010-02-10 進 野田 半導体装置の製造方法
TW522287B (en) * 2000-01-14 2003-03-01 Asml Netherlands Bv Lithographic projection apparatus, method of calibrating a lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured thereby
US6766211B1 (en) * 2000-10-03 2004-07-20 International Business Machines Corporation Structure and method for amplifying target overlay errors using the synthesized beat signal between interleaved arrays of differing periodicity
US7009704B1 (en) * 2000-10-26 2006-03-07 Kla-Tencor Technologies Corporation Overlay error detection
KR100500469B1 (ko) * 2001-01-12 2005-07-12 삼성전자주식회사 정렬마크와 이를 이용하는 노광정렬시스템 및 그 정렬방법
US6904201B1 (en) * 2001-05-09 2005-06-07 Intel Corporation Phase-controlled fiber Bragg gratings and manufacturing methods
KR100391983B1 (ko) * 2001-07-03 2003-07-22 삼성전자주식회사 반도체 노광 장비의 정렬 시스템
CN100337089C (zh) * 2002-09-20 2007-09-12 Asml荷兰有限公司 器件检验
SG138445A1 (en) * 2003-02-14 2008-01-28 Asml Netherlands Bv Device and method for wafer alignment with reduced tilt sensitivity
EP1450211A3 (de) * 2003-02-14 2009-04-15 ASML Netherlands B.V. Vorrichtung und Verfahren zum Ausrichten von Wafern mit verringerter Empfindlichkeit auf Knippneigung
US7573580B2 (en) * 2003-11-17 2009-08-11 Asml Holding N.V. Optical position measuring system and method using a low coherence light source
US7288779B2 (en) 2003-12-17 2007-10-30 Asml Netherlands B.V. Method for position determination, method for overlay optimization, and lithographic projection apparatus
US7433018B2 (en) * 2005-12-27 2008-10-07 Asml Netherlands B.V. Pattern alignment method and lithographic apparatus
CN100456142C (zh) * 2006-10-18 2009-01-28 上海微电子装备有限公司 一种对准标记及其制造方法
US9625811B2 (en) * 2009-12-18 2017-04-18 Asml Netherlands B.V. Imprint lithography
CN102566338B (zh) * 2010-12-28 2013-11-13 上海微电子装备有限公司 光刻对准系统中对对准位置进行修正的方法
NL2014956A (en) * 2014-07-16 2016-04-12 Asml Netherlands Bv Lithographic Method and Apparatus.
NL2017710A (en) 2015-11-30 2017-06-07 Asml Netherlands Bv Lithographic Method and Apparatus
NL2018651A (en) 2016-05-04 2017-11-07 Asml Netherlands Bv Lithographic method and apparatus
CN111505914B (zh) * 2019-01-31 2021-06-25 上海微电子装备（集团）股份有限公司 光学对准装置及光刻系统

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
NL8600639A (nl) * 1986-03-12 1987-10-01 Asm Lithography Bv Werkwijze voor het ten opzichte van elkaar uitrichten van een masker en een substraat en inrichting voor het uitvoeren van de werkwijze.
NL8900991A (nl) * 1989-04-20 1990-11-16 Asm Lithography Bv Apparaat voor het afbeelden van een maskerpatroon op een substraat.
NL9001611A (nl) * 1990-07-16 1992-02-17 Asm Lithography Bv Apparaat voor het afbeelden van een maskerpatroon op een substraat.

Also Published As

Publication number Publication date
US5917604A (en) 1999-06-29
EP0826165B1 (de) 2001-05-30
JPH11505673A (ja) 1999-05-21
EP0826165A1 (de) 1998-03-04
DE69704998T2 (de) 2001-09-27
TW385377B (en) 2000-03-21
JP4023695B2 (ja) 2007-12-19
WO1997035234A1 (en) 1997-09-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee