DE69731170D1 - Verbesserungen an oder in Bezug auf Halbleiteranordnungen - Google Patents

Verbesserungen an oder in Bezug auf Halbleiteranordnungen

Info

Publication number
DE69731170D1
DE69731170D1 DE1997631170 DE69731170T DE69731170D1 DE 69731170 D1 DE69731170 D1 DE 69731170D1 DE 1997631170 DE1997631170 DE 1997631170 DE 69731170 T DE69731170 T DE 69731170T DE 69731170 D1 DE69731170 D1 DE 69731170D1
Authority
DE
Germany
Prior art keywords
relation
semiconductor devices
semiconductor
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE1997631170
Other languages
English (en)
Other versions
DE69731170T2 (de
Inventor
Cetin Kaya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Application granted granted Critical
Publication of DE69731170D1 publication Critical patent/DE69731170D1/de
Publication of DE69731170T2 publication Critical patent/DE69731170T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B41/00Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0416Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a single floating gate transistor and no select transistor, e.g. UV EPROM
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation
    • H01L29/7884Programmable transistors with only two possible levels of programmation charging by hot carrier injection
    • H01L29/7885Hot carrier injection from the channel

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Non-Volatile Memory (AREA)
  • Semiconductor Memories (AREA)
  • Read Only Memory (AREA)
DE69731170T 1996-12-13 1997-12-12 Verbesserungen an oder in Bezug auf Halbleiteranordnungen Expired - Lifetime DE69731170T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US3284796P 1996-12-13 1996-12-13
US32847P 1996-12-13

Publications (2)

Publication Number Publication Date
DE69731170D1 true DE69731170D1 (de) 2004-11-18
DE69731170T2 DE69731170T2 (de) 2006-02-02

Family

ID=21867141

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69731170T Expired - Lifetime DE69731170T2 (de) 1996-12-13 1997-12-12 Verbesserungen an oder in Bezug auf Halbleiteranordnungen

Country Status (5)

Country Link
EP (1) EP0848384B1 (de)
JP (1) JP4229996B2 (de)
KR (1) KR19980064091A (de)
DE (1) DE69731170T2 (de)
TW (1) TW434843B (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5898633A (en) * 1997-05-21 1999-04-27 Motorola, Inc. Circuit and method of limiting leakage current in a memory circuit
JP4622902B2 (ja) 2006-03-17 2011-02-02 セイコーエプソン株式会社 不揮発性半導体記憶装置
KR100830589B1 (ko) 2007-04-17 2008-05-22 삼성전자주식회사 워드 라인으로 음의 고전압을 전달할 수 있는 고전압스위치를 갖는 플래시 메모리 장치

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5243559A (en) * 1990-12-12 1993-09-07 Nippon Steel Corporation Semiconductor memory device
JP3152762B2 (ja) * 1992-10-06 2001-04-03 富士通株式会社 不揮発性半導体記憶装置
JP3417630B2 (ja) * 1993-12-17 2003-06-16 株式会社日立製作所 半導体集積回路装置とフラッシュメモリ及び不揮発性記憶装置
US5457652A (en) * 1994-04-01 1995-10-10 National Semiconductor Corporation Low voltage EEPROM
US5491657A (en) * 1995-02-24 1996-02-13 Advanced Micro Devices, Inc. Method for bulk (or byte) charging and discharging an array of flash EEPROM memory cells

Also Published As

Publication number Publication date
DE69731170T2 (de) 2006-02-02
EP0848384B1 (de) 2004-10-13
JPH10178115A (ja) 1998-06-30
KR19980064091A (ko) 1998-10-07
EP0848384A3 (de) 1999-08-11
JP4229996B2 (ja) 2009-02-25
TW434843B (en) 2001-05-16
EP0848384A2 (de) 1998-06-17

Similar Documents

Publication Publication Date Title
DE69722542D1 (de) Verbesserungen an oder in Bezug auf Halbleiteranordnungen
DE69531085D1 (de) Verbesserungen in, an oder in Bezug auf Halbleiteranordnungen
DE69531571D1 (de) Verbesserungen in Bezug auf Halbleitervorrichtungen
DE69734542D1 (de) Verbesserungen an Halbleiter-Einrichtungen
ATE381353T1 (de) Verbesserungen in oder an kontrastmitteln
DE69636589D1 (de) Verbesserungen in oder in Beziehung auf integrierte Schaltungen
DE69739683D1 (de) Verbesserungen in oder sich beziehend auf einer atm-vermittlungsstelle
ATE238072T1 (de) Verbesserungen an (oder im bezug auf) kontrastmittel
NO984472L (no) Forbedringer i eller vedr°rende innkapsling
DE69739460D1 (de) Verbesserungen in oder sich beziehend auf einer atm-vermittlungsstelle
DE69526630D1 (de) Verbesserungen in oder in Beziehung auf integrierte Schaltungen
DE69514305T2 (de) Verbesserungen in oder bezüglich mikroelektrischen Anordnungen
DE69635236D1 (de) Verbesserungen an Halbleiteranordnungen
DE69838866D1 (de) Verbesserungen in oder mit Bezug auf Kryostatsystemen
DE69739652D1 (de) Verbesserungen in oder sich beziehend auf einer atm-vermittlungsstelle
DE69717054T2 (de) Verbesserungen an oder bezüglich integrierten Schaltungen
DE69724499D1 (de) Verbesserungen für oder in Bezug auf Halbleiterspeicheranordnungen
DE69621107T2 (de) Verbesserungen in oder in Bezug auf Halbleiterchiptrennung
DE69614866T2 (de) Verbesserungen in oder in beziehung auf drehwiderstandvorrichtungen
DE69735980D1 (de) Halbleiteranordnung in Halbleiter-Schaltungsstruktur
DE69321966T2 (de) Leistungs-Halbleiterbauelement
DE69721376D1 (de) Verbesserungen in oder in Bezug auf Halbleiteranordnungen
DE69429220D1 (de) Leistungsberechnungsvorrichtung
DE69731170D1 (de) Verbesserungen an oder in Bezug auf Halbleiteranordnungen
DE69531089D1 (de) Verbesserungen an oder in Bezug auf halbleitende Anordnungen

Legal Events

Date Code Title Description
8364 No opposition during term of opposition