DE69635725D1 - Verkleinerndes optisches Ringfeldsystem mit hoher numerischer Apertur - Google Patents

Verkleinerndes optisches Ringfeldsystem mit hoher numerischer Apertur

Info

Publication number
DE69635725D1
DE69635725D1 DE69635725T DE69635725T DE69635725D1 DE 69635725 D1 DE69635725 D1 DE 69635725D1 DE 69635725 T DE69635725 T DE 69635725T DE 69635725 T DE69635725 T DE 69635725T DE 69635725 D1 DE69635725 D1 DE 69635725D1
Authority
DE
Germany
Prior art keywords
numerical aperture
field system
high numerical
optical ring
reducing optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69635725T
Other languages
English (en)
Other versions
DE69635725T2 (de
Inventor
David M Williamson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
ASML Holding NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of DE69635725D1 publication Critical patent/DE69635725D1/de
Application granted granted Critical
Publication of DE69635725T2 publication Critical patent/DE69635725T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69635725T 1995-12-12 1996-11-18 Verkleinerndes optisches Ringfeldsystem mit hoher numerischer Apertur Expired - Fee Related DE69635725T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US571081 1995-12-12
US08/571,081 US5815310A (en) 1995-12-12 1995-12-12 High numerical aperture ring field optical reduction system

Publications (2)

Publication Number Publication Date
DE69635725D1 true DE69635725D1 (de) 2006-04-06
DE69635725T2 DE69635725T2 (de) 2006-07-13

Family

ID=24282269

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69635725T Expired - Fee Related DE69635725T2 (de) 1995-12-12 1996-11-18 Verkleinerndes optisches Ringfeldsystem mit hoher numerischer Apertur

Country Status (6)

Country Link
US (1) US5815310A (de)
EP (1) EP0779528B1 (de)
JP (1) JP4070257B2 (de)
KR (1) KR100451339B1 (de)
CA (1) CA2192604A1 (de)
DE (1) DE69635725T2 (de)

Families Citing this family (132)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6157498A (en) 1996-06-19 2000-12-05 Nikon Corporation Dual-imaging optical system
US5956192A (en) * 1997-09-18 1999-09-21 Svg Lithography Systems, Inc. Four mirror EUV projection optics
US6081578A (en) * 1997-11-07 2000-06-27 U.S. Philips Corporation Three-mirror system for lithographic projection, and projection apparatus comprising such a mirror system
US6199991B1 (en) 1997-11-13 2001-03-13 U.S. Philips Corporation Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
DE59801613D1 (de) * 1997-12-21 2001-11-08 Contraves Space Ag Zuerich Vorrichtung zur gerichteten Abstrahlung und zum gerichteten Empfang modulierter Lichtwellen
US6226346B1 (en) 1998-06-09 2001-05-01 The Regents Of The University Of California Reflective optical imaging systems with balanced distortion
US5973826A (en) * 1998-02-20 1999-10-26 Regents Of The University Of California Reflective optical imaging system with balanced distortion
US6014252A (en) * 1998-02-20 2000-01-11 The Regents Of The University Of California Reflective optical imaging system
ATE464946T1 (de) * 1998-02-23 2010-05-15 Wisconsin Alumni Res Found Verfahren und vorrichtung zur synthese von dan- sonderanordnungen
JP4238390B2 (ja) 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
WO1999052004A1 (fr) * 1998-04-07 1999-10-14 Nikon Corporation Appareil et procede d'exposition a projection, et systeme optique reflechissant a refraction
US20070030948A1 (en) * 1998-05-05 2007-02-08 Carl Zeiss Smt Ag Illumination system with field mirrors for producing uniform scanning energy
US7126137B2 (en) * 1998-05-05 2006-10-24 Carl Zeiss Smt Ag Illumination system with field mirrors for producing uniform scanning energy
US6255661B1 (en) * 1998-05-06 2001-07-03 U.S. Philips Corporation Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US6396067B1 (en) * 1998-05-06 2002-05-28 Koninklijke Philips Electronics N.V. Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
JPH11345761A (ja) 1998-05-29 1999-12-14 Nikon Corp 走査型露光装置
US6577443B2 (en) * 1998-05-30 2003-06-10 Carl-Zeiss Stiftung Reduction objective for extreme ultraviolet lithography
US6072852A (en) * 1998-06-09 2000-06-06 The Regents Of The University Of California High numerical aperture projection system for extreme ultraviolet projection lithography
US6142641A (en) * 1998-06-18 2000-11-07 Ultratech Stepper, Inc. Four-mirror extreme ultraviolet (EUV) lithography projection system
US6213610B1 (en) 1998-09-21 2001-04-10 Nikon Corporation Catoptric reduction projection optical system and exposure apparatus and method using same
US6109756A (en) * 1998-09-21 2000-08-29 Nikon Corporation Catoptric reduction projection optical system
JP2000100694A (ja) 1998-09-22 2000-04-07 Nikon Corp 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法
US6368763B2 (en) 1998-11-23 2002-04-09 U.S. Philips Corporation Method of detecting aberrations of an optical imaging system
US6248486B1 (en) * 1998-11-23 2001-06-19 U.S. Philips Corporation Method of detecting aberrations of an optical imaging system
KR20000034967A (ko) 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
US6635914B2 (en) * 2000-09-08 2003-10-21 Axon Technologies Corp. Microelectronic programmable device and methods of forming and programming the same
JP2002532895A (ja) 1998-12-14 2002-10-02 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Ｅｕｖ照射システム
US6280906B1 (en) 1998-12-22 2001-08-28 U.S. Philips Corporation Method of imaging a mask pattern on a substrate by means of EUV radiation, and apparatus and mask for performing the method
US6573978B1 (en) * 1999-01-26 2003-06-03 Mcguire, Jr. James P. EUV condenser with non-imaging optics
US6195201B1 (en) 1999-01-27 2001-02-27 Svg Lithography Systems, Inc. Reflective fly's eye condenser for EUV lithography
US6600552B2 (en) 1999-02-15 2003-07-29 Carl-Zeiss Smt Ag Microlithography reduction objective and projection exposure apparatus
USRE42118E1 (en) * 1999-02-15 2011-02-08 Carl-Zeiss-Smt Ag Projection system for EUV lithography
US6985210B2 (en) * 1999-02-15 2006-01-10 Carl Zeiss Smt Ag Projection system for EUV lithography
US7151592B2 (en) * 1999-02-15 2006-12-19 Carl Zeiss Smt Ag Projection system for EUV lithography
EP1035445B1 (de) * 1999-02-15 2007-01-31 Carl Zeiss SMT AG Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
DE19948240A1 (de) * 1999-02-15 2000-08-24 Zeiss Carl Fa Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
DE19910724A1 (de) 1999-03-11 2000-09-14 Zeiss Carl Fa Mikrolithographie-Projektionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
US6033079A (en) 1999-03-15 2000-03-07 Hudyma; Russell High numerical aperture ring field projection system for extreme ultraviolet lithography
US6188513B1 (en) 1999-03-15 2001-02-13 Russell Hudyma High numerical aperture ring field projection system for extreme ultraviolet lithography
US6361176B1 (en) 1999-07-09 2002-03-26 Nikon Corporation Reflection reduction projection optical system
DE10029938A1 (de) 1999-07-09 2001-07-05 Zeiss Carl Optisches System für das Vakuum-Ultraviolett
JP4717974B2 (ja) * 1999-07-13 2011-07-06 株式会社ニコン 反射屈折光学系及び該光学系を備える投影露光装置
JP3770542B2 (ja) 1999-07-22 2006-04-26 コーニング インコーポレイテッド 遠紫外軟ｘ線投影リソグラフィー法およびマスク装置
JP2001110709A (ja) 1999-10-08 2001-04-20 Nikon Corp 多層膜反射鏡及び露光装置ならびに集積回路の製造方法。
EP1093021A3 (de) 1999-10-15 2004-06-30 Nikon Corporation Projektionsbelichtungssystem sowie ein solches System benutzendes Gerät und Verfahren
US6538257B2 (en) 1999-12-23 2003-03-25 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, and extremely short-wave radiation source unit
US6304630B1 (en) 1999-12-24 2001-10-16 U.S. Philips Corporation Method of generating EUV radiation, method of manufacturing a device by means of said radiation, EUV radiation source unit, and lithographic projection apparatus provided with such a radiation source unit
TW502559B (en) 1999-12-24 2002-09-11 Koninkl Philips Electronics Nv Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
WO2002044786A2 (en) * 2000-11-28 2002-06-06 Carl Zeiss Smt Ag Catadioptric projection system for 157 nm lithography
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
US6867913B2 (en) 2000-02-14 2005-03-15 Carl Zeiss Smt Ag 6-mirror microlithography projection objective
JP2001228401A (ja) * 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
AU2001250017A1 (en) 2000-03-03 2001-09-17 Dun And Bradstreet, Inc. Facilitating a transaction in electronic commerce
DE10016176A1 (de) 2000-03-31 2001-10-04 Zeiss Carl Mikrolithographisches Beleuchtungssystem und Mikrolithographische Projektionsbelichtungsanlage damit
US6648483B1 (en) * 2000-07-07 2003-11-18 Umax Data Systems, Inc. Concave mirror optical system for scanner
US6776006B2 (en) 2000-10-13 2004-08-17 Corning Incorporated Method to avoid striae in EUV lithography mirrors
EP1327172A1 (de) * 2000-10-20 2003-07-16 Carl Zeiss 8-spiegel-mikrolithographie-projektionsobjektiv
DE10052289A1 (de) 2000-10-20 2002-04-25 Zeiss Carl 8-Spiegel-Mikrolithographie-Projektionsobjektiv
JP4245286B2 (ja) * 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
EP1679550A1 (de) * 2000-11-07 2006-07-12 ASML Netherlands B.V. Lithografische Vorrichtung und Herstellungsverfahren dafür
TW573234B (en) 2000-11-07 2004-01-21 Asml Netherlands Bv Lithographic projection apparatus and integrated circuit device manufacturing method
JP2004516500A (ja) * 2000-12-12 2004-06-03 カール ツァイス エスエムテー アーゲー Ｅｕｖリソグラフィ用の投影系
EP1615076A1 (de) * 2001-01-09 2006-01-11 Carl Zeiss SMT AG Projektionssystem für die extrem-ultraviolettlithographie
KR100831706B1 (ko) * 2001-01-09 2008-05-22 칼 짜이스 에스엠티 에이지 극자외선 리소그라피를 위한 투영시스템
JP4320970B2 (ja) 2001-04-11 2009-08-26 株式会社ニコン 多層膜反射鏡の製造方法
JP2003015040A (ja) * 2001-07-04 2003-01-15 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2003045782A (ja) * 2001-07-31 2003-02-14 Canon Inc 反射型縮小投影光学系及びそれを用いた露光装置
DE50208750D1 (de) 2001-08-01 2007-01-04 Zeiss Carl Smt Ag Reflektives Projektionsobjektiv für EUV-Photolithographie
DE10139177A1 (de) * 2001-08-16 2003-02-27 Zeiss Carl Objektiv mit Pupillenobskuration
JP4134544B2 (ja) * 2001-10-01 2008-08-20 株式会社ニコン 結像光学系および露光装置
US6563907B1 (en) 2001-12-07 2003-05-13 Euv Llc Radiation source with shaped emission
KR100452852B1 (ko) * 2002-01-09 2004-10-14 삼성전자주식회사 확대 광학계 및 그것을 갖는 화상형성 장치
JP2003233002A (ja) * 2002-02-07 2003-08-22 Canon Inc 反射型投影光学系、露光装置及びデバイス製造方法
JP2003241049A (ja) * 2002-02-22 2003-08-27 Nikon Corp 光学素子保持方法、光学素子研磨加工方法及び光学素子成膜方法
US6912042B2 (en) * 2002-03-28 2005-06-28 Carl Zeiss Smt Ag 6-mirror projection objective with few lenses
US20030234993A1 (en) * 2002-06-21 2003-12-25 Hazelton Andrew J. Adaptive optic off-axis metrology
US6989922B2 (en) * 2002-06-21 2006-01-24 Nikon Corporation Deformable mirror actuation system
US20030235682A1 (en) * 2002-06-21 2003-12-25 Sogard Michael R. Method and device for controlling thermal distortion in elements of a lithography system
JP2004031808A (ja) * 2002-06-27 2004-01-29 Nikon Corp 露光装置の投影光学系、該投影光学系を備えた露光装置及び該露光装置を用いた露光方法
US6840638B2 (en) * 2002-07-03 2005-01-11 Nikon Corporation Deformable mirror with passive and active actuators
JP2004158786A (ja) 2002-11-08 2004-06-03 Canon Inc 投影光学系及び露光装置
JP2004252358A (ja) * 2003-02-21 2004-09-09 Canon Inc 反射型投影光学系及び露光装置
JP2004325649A (ja) 2003-04-23 2004-11-18 Canon Inc 反射型投影光学系、露光装置及びデバイスの製造方法
KR101481935B1 (ko) 2003-05-06 2015-01-14 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US7348575B2 (en) * 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
CN1307456C (zh) 2003-05-23 2007-03-28 佳能株式会社 投影光学系统、曝光装置及器件的制造方法
JP4378109B2 (ja) 2003-05-30 2009-12-02 キヤノン株式会社 露光装置、投影光学系、デバイスの製造方法
US7291878B2 (en) * 2003-06-03 2007-11-06 Hitachi Global Storage Technologies Netherlands B.V. Ultra low-cost solid-state memory
US7085075B2 (en) 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
US7554649B2 (en) 2003-09-02 2009-06-30 Canon Kabushiki Kaisha Projection optical system, exposure apparatus and device fabricating method
EP1513019B1 (de) 2003-09-02 2012-07-25 Canon Kabushiki Kaisha Optisches Projektionssystem, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
JP2005172988A (ja) * 2003-12-09 2005-06-30 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP2007516613A (ja) * 2003-12-15 2007-06-21 カール・ツアイス・エスエムテイ・アーゲー 少なくとも１つの液体レンズを備えるマイクロリソグラフィー投影対物レンズとしての対物レンズ
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
JP2005189247A (ja) * 2003-12-24 2005-07-14 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP5420821B2 (ja) * 2004-01-14 2014-02-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射屈折投影対物レンズ
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US20080151364A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US7522335B2 (en) * 2004-03-29 2009-04-21 Intel Corporation Broad-angle multilayer mirror design
US7712905B2 (en) 2004-04-08 2010-05-11 Carl Zeiss Smt Ag Imaging system with mirror group
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
TW200622304A (en) * 2004-11-05 2006-07-01 Nikon Corp Projection optical system and exposure device with it
DE102005042005A1 (de) * 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
US7283210B2 (en) * 2005-03-22 2007-10-16 Nikon Corporation Image shift optic for optical system
US7508527B2 (en) 2005-04-11 2009-03-24 Zetetic Institute Apparatus and method of in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry
WO2006119977A1 (en) * 2005-05-13 2006-11-16 Carl Zeiss Smt Ag A six-mirror euv projection system with low incidence angles
EP1883783A2 (de) 2005-05-18 2008-02-06 Zetetic Institute Vorrichtung und verfahren für in-situ- und ex-situ-messungen eines optischen systemreflexes
WO2007016502A2 (en) * 2005-08-02 2007-02-08 Wisconsin Alumni Research Foundation Synthesis of arrays of oligonucleotides and other chain molecules
WO2007031271A1 (en) 2005-09-13 2007-03-22 Carl Zeiss Smt Ag Microlithography projection optical system, method for manufacturing a device and method to design an optical surface
WO2007093433A1 (de) 2006-02-17 2007-08-23 Carl Zeiss Smt Ag Beleuchtungssystem für die mikro-lithographie, projektionsbelichtungsanlage mit einem derartigen beleuchtungssystem
JP2007258625A (ja) * 2006-03-27 2007-10-04 Nikon Corp 露光装置及びレチクル
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
EP2005249A1 (de) * 2006-04-07 2008-12-24 Carl Zeiss SMT AG Optisches mikrolithographie-projektionssystem und verfahren zur herstellung einer entsprechenden vorrichtung
DE102007023411A1 (de) * 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
US20080175349A1 (en) * 2007-01-16 2008-07-24 Optical Research Associates Maskless euv projection optics
DE102007019570A1 (de) 2007-04-25 2008-10-30 Carl Zeiss Smt Ag Spiegelanordnung, Kontaktierungsanordnung und optisches System
WO2009053023A2 (en) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Imaging optical system and projection exposure apparatus for microlithography comprising an imaging optical system of this type
WO2009107510A1 (ja) * 2008-02-29 2009-09-03 株式会社ニコン 投影光学系、露光装置、およびデバイス製造方法
DE102009008644A1 (de) * 2009-02-12 2010-11-18 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithografie mit einer derartigen abbildenden Optik
KR101388330B1 (ko) * 2009-03-06 2014-04-22 칼 짜이스 에스엠티 게엠베하 이미징 광학기기 및 이러한 유형의 이미징 광학기기를 갖는 마이크로리소그래피용 투영 노광 설비
DE102011080437A1 (de) 2010-09-30 2012-04-05 Carl Zeiss Smt Gmbh Abbildendes optisches System für die Mikrolithographie
DE102011003302A1 (de) * 2011-01-28 2012-08-02 Carl Zeiss Smt Gmbh Vergrößerte abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik
CN102402135B (zh) * 2011-12-07 2013-06-05 北京理工大学 一种极紫外光刻投影物镜设计方法
DE102012208793A1 (de) 2012-05-25 2013-11-28 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithographie mit einer derartigen abbildenden Optik
WO2014019617A1 (en) * 2012-08-01 2014-02-06 Carl Zeiss Smt Gmbh Imaging optical unit for a projection exposure apparatus
DE102012218558A1 (de) 2012-10-11 2013-08-29 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithographie mit einer derartigen abbildenden Optik
CN103901593B (zh) * 2014-04-04 2016-01-13 北京理工大学 一种离轴无遮拦极紫外投影光刻物镜
DE102015221983A1 (de) * 2015-11-09 2017-05-11 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik
CN112230411B (zh) * 2020-10-26 2022-08-09 长光卫星技术有限公司 一种折反式离轴大视场成像光学系统
CN113900241B (zh) * 2021-10-18 2023-06-30 中国科学院光电技术研究所 一种集成式共用次镜的宽光谱双视场离轴光学系统

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4241390A (en) * 1978-02-06 1980-12-23 The Perkin-Elmer Corporation System for illuminating an annular field
US4226501A (en) * 1978-10-12 1980-10-07 The Perkin-Elmer Corporation Four mirror unobscurred anastigmatic telescope with all spherical surfaces
US4701035A (en) * 1984-08-14 1987-10-20 Canon Kabushiki Kaisha Reflection optical system
EP0252734B1 (de) * 1986-07-11 2000-05-03 Canon Kabushiki Kaisha Verkleinerndes Projektionsbelichtungssystem des Reflexionstyps für Röntgenstrahlung
US4747678A (en) * 1986-12-17 1988-05-31 The Perkin-Elmer Corporation Optical relay system with magnification
US5071240A (en) * 1989-09-14 1991-12-10 Nikon Corporation Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
US5063586A (en) * 1989-10-13 1991-11-05 At&T Bell Laboratories Apparatus for semiconductor lithography
US5315629A (en) * 1990-10-10 1994-05-24 At&T Bell Laboratories Ringfield lithography

Also Published As

Publication number Publication date
JPH09211332A (ja) 1997-08-15
EP0779528A3 (de) 1999-12-22
JP4070257B2 (ja) 2008-04-02
KR100451339B1 (ko) 2005-04-28
EP0779528A2 (de) 1997-06-18
DE69635725T2 (de) 2006-07-13
US5815310A (en) 1998-09-29
EP0779528B1 (de) 2006-01-11
CA2192604A1 (en) 1997-06-13
KR970048693A (ko) 1997-07-29

Similar Documents

Publication Publication Date Title
DE69635725D1 (de) Verkleinerndes optisches Ringfeldsystem mit hoher numerischer Apertur
DE69332924D1 (de) Verkleinerndes katadioptrisches System mit hoher numerischer Apertur
DE69310974D1 (de) Eingebautes optisches Eichsystem
DE69230945D1 (de) Faseroptisches verbindungssystem
DE69232018T2 (de) Optisches Spiegelsystem mit mehreren gleichzeitigen Beobachtungsfunktionen
DE69132083D1 (de) Optisches system
NO974664D0 (no) Optisk multikanalsystem
DE69725492D1 (de) Kleines optisches System mit variabler Vergrösserung
DE69627165T2 (de) Optisches uebertragungssystem
DE69609085T2 (de) Sichtsystem mit mehreren brennpunkten
DE69618645D1 (de) Leichtes interventionssystem
DE59606851D1 (de) Aktives optisches strommess-system
DE69431626T2 (de) Lichtleitfaser-Kommunikationssystem
DE69326001D1 (de) Optisches nachrichtenübertragungssystem
DE69416439T2 (de) Optisches Bildaufnahmesystem
DE69324879T2 (de) Optisches Übertragungssystem
NO911589D0 (no) Angivelsessystem for optisk fiber.
DE69619304T2 (de) Objektivlinsensystem
DE69311653D1 (de) Optisches Sensorsystem
DE4335283B8 (de) Variolinsensystem
NL1003871A1 (nl) Zoomlensstelsel met grote zoomverhouding.
DE29507262U1 (de) Optisches Mastleuchtensystem
DE69420365D1 (de) Mehrfachoptisches Sensorsystem
DE69421929D1 (de) Optisches system
DE69635665D1 (de) Optisches übertragungssystem

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee