DE69629080D1 - Akustische Oberflächenwellenanordnung und Verfahren zu ihrer Herstellung - Google Patents
Akustische Oberflächenwellenanordnung und Verfahren zu ihrer HerstellungInfo
- Publication number
- DE69629080D1 DE69629080D1 DE69629080T DE69629080T DE69629080D1 DE 69629080 D1 DE69629080 D1 DE 69629080D1 DE 69629080 T DE69629080 T DE 69629080T DE 69629080 T DE69629080 T DE 69629080T DE 69629080 D1 DE69629080 D1 DE 69629080D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacture
- acoustic wave
- surface acoustic
- wave device
- wave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6423—Means for obtaining a particular transfer characteristic
- H03H9/6433—Coupled resonator filters
- H03H9/6483—Ladder SAW filters
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02897—Means for compensation or elimination of undesirable effects of strain or mechanical damage, e.g. strain due to bending influence
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02929—Means for compensation or elimination of undesirable effects of ageing changes of characteristics, e.g. electro-acousto-migration
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
- H03H9/14538—Formation
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7224855A JPH0969748A (ja) | 1995-09-01 | 1995-09-01 | Sawデバイスおよびその製造方法 |
JP22485595 | 1995-09-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69629080D1 true DE69629080D1 (de) | 2003-08-21 |
DE69629080T2 DE69629080T2 (de) | 2004-02-12 |
Family
ID=16820229
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69629080T Expired - Lifetime DE69629080T2 (de) | 1995-09-01 | 1996-08-30 | Akustische Oberflächenwellenanordnung und Verfahren zu ihrer Herstellung |
Country Status (8)
Country | Link |
---|---|
US (1) | US5844347A (de) |
EP (2) | EP0762641B1 (de) |
JP (1) | JPH0969748A (de) |
KR (1) | KR100405931B1 (de) |
CN (1) | CN1157806C (de) |
DE (1) | DE69629080T2 (de) |
MY (1) | MY116670A (de) |
SG (1) | SG47173A1 (de) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9622654D0 (en) * | 1996-10-31 | 1997-01-08 | Flowers James E | Filters |
US6377138B1 (en) * | 1997-07-28 | 2002-04-23 | Kabushiki Kaisha Toshiba | Surface acoustic wave device with a layered conductive film and method of producing the same |
JPH1174751A (ja) * | 1997-08-28 | 1999-03-16 | Murata Mfg Co Ltd | 弾性表面波装置 |
US6297580B1 (en) | 1998-04-21 | 2001-10-02 | Matsushita Electric Industrial Co., Ltd. | Surface acoustic wave device and production method thereof and mobile communication equipment using it |
JP3266109B2 (ja) * | 1998-08-05 | 2002-03-18 | 株式会社村田製作所 | 電子デバイスの作製方法 |
JP3317273B2 (ja) * | 1998-08-25 | 2002-08-26 | 株式会社村田製作所 | 表面波共振子、フィルタ、共用器、通信機装置 |
JP3351402B2 (ja) * | 1999-04-28 | 2002-11-25 | 株式会社村田製作所 | 電子素子、弾性表面波素子、それらの実装方法、電子部品または弾性表面波装置の製造方法、および、弾性表面波装置 |
JP4352572B2 (ja) * | 2000-04-03 | 2009-10-28 | パナソニック株式会社 | アンテナ共用器 |
EP2458735A3 (de) * | 2000-10-23 | 2012-08-29 | Panasonic Corporation | Oberflächenwellenfilter |
JP3521864B2 (ja) | 2000-10-26 | 2004-04-26 | 株式会社村田製作所 | 弾性表面波素子 |
JP3445971B2 (ja) * | 2000-12-14 | 2003-09-16 | 富士通株式会社 | 弾性表面波素子 |
US6424238B1 (en) * | 2001-01-08 | 2002-07-23 | Motorola, Inc. | Acoustic wave filter and method of forming the same |
DE10206480B4 (de) * | 2001-02-16 | 2005-02-10 | Leibniz-Institut für Festkörper- und Werkstoffforschung e.V. | Akustisches Oberflächenwellenbauelement |
JP3926633B2 (ja) | 2001-06-22 | 2007-06-06 | 沖電気工業株式会社 | Sawデバイス及びその製造方法 |
US6965190B2 (en) * | 2001-09-12 | 2005-11-15 | Sanyo Electric Co., Ltd. | Surface acoustic wave device |
JP3735550B2 (ja) | 2001-09-21 | 2006-01-18 | Tdk株式会社 | 弾性表面波装置およびその製造方法 |
TW569530B (en) | 2001-10-03 | 2004-01-01 | Matsushita Electric Ind Co Ltd | Surface acoustic wave device and electronic components using the device |
JP3979279B2 (ja) * | 2001-12-28 | 2007-09-19 | 株式会社村田製作所 | 弾性表面波装置 |
JP3780947B2 (ja) * | 2002-01-18 | 2006-05-31 | 株式会社村田製作所 | 弾性表面波装置 |
US7148610B2 (en) * | 2002-02-01 | 2006-12-12 | Oc Oerlikon Balzers Ag | Surface acoustic wave device having improved performance and method of making the device |
DE10206369B4 (de) * | 2002-02-15 | 2012-12-27 | Epcos Ag | Elektrodenstruktur mit verbesserter Leistungsverträglichkeit und Verfahren zur Herstellung |
JP3841053B2 (ja) * | 2002-07-24 | 2006-11-01 | 株式会社村田製作所 | 弾性表面波装置及びその製造方法 |
DE10236003B4 (de) * | 2002-08-06 | 2013-12-24 | Epcos Ag | Verfahren zur Herstellung eines Bauelements mit leistungsverträglicher Elektrodenstruktur |
JP3938147B2 (ja) * | 2003-04-08 | 2007-06-27 | 住友金属鉱山株式会社 | タンタル酸リチウム基板およびその製造方法 |
US7141909B2 (en) | 2003-06-17 | 2006-11-28 | Murata Manufacturing Co., Ltd. | Surface acoustic wave device |
US20040256949A1 (en) * | 2003-06-17 | 2004-12-23 | Takuo Hada | Surface acoustic wave device |
US7888842B2 (en) * | 2004-02-13 | 2011-02-15 | University Of Maine System Board Of Trustees | Ultra-thin film electrodes and protective layer for high temperature device applications |
JP2005269606A (ja) * | 2004-02-18 | 2005-09-29 | Sanyo Electric Co Ltd | 弾性表面波素子及びこれを具えた弾性表面波フィルター |
DE102004058016B4 (de) * | 2004-12-01 | 2014-10-09 | Epcos Ag | Mit akustischen Oberflächenwellen arbeitendes Bauelement mit hoher Bandbreite |
US7737612B1 (en) | 2005-05-25 | 2010-06-15 | Maxim Integrated Products, Inc. | BAW resonator bi-layer top electrode with zero etch undercut |
US7600303B1 (en) * | 2006-05-25 | 2009-10-13 | Maxim Integrated Products, Inc. | BAW resonator bi-layer top electrode with zero etch undercut |
US7612488B1 (en) | 2007-01-16 | 2009-11-03 | Maxim Integrated Products, Inc. | Method to control BAW resonator top electrode edge during patterning |
WO2008108215A1 (ja) * | 2007-03-06 | 2008-09-12 | Murata Manufacturing Co., Ltd. | 弾性境界波装置 |
JP5252264B2 (ja) * | 2007-10-12 | 2013-07-31 | Smc株式会社 | 流体用積層構造体 |
JP2008125131A (ja) * | 2008-02-08 | 2008-05-29 | Murata Mfg Co Ltd | 表面波装置及びその製造方法 |
CN101369599B (zh) * | 2008-07-11 | 2011-02-16 | 北京大学 | 氮化镓基器件的欧姆接触及其制备方法 |
CN101382522B (zh) * | 2008-08-26 | 2011-01-26 | 北京中科飞鸿科技有限公司 | 用于气体检测的声表面波传感器芯片的制备方法 |
US7944750B1 (en) | 2008-10-22 | 2011-05-17 | Maxim Integrated Products, Inc. | Multi-programmable non-volatile memory cell |
US20110115019A1 (en) * | 2009-11-13 | 2011-05-19 | Maxim Integrated Products, Inc. | Cmos compatible low gate charge lateral mosfet |
US8987818B1 (en) | 2009-11-13 | 2015-03-24 | Maxim Integrated Products, Inc. | Integrated MOS power transistor with thin gate oxide and low gate charge |
US8969958B1 (en) | 2009-11-13 | 2015-03-03 | Maxim Integrated Products, Inc. | Integrated MOS power transistor with body extension region for poly field plate depletion assist |
US8963241B1 (en) | 2009-11-13 | 2015-02-24 | Maxim Integrated Products, Inc. | Integrated MOS power transistor with poly field plate extension for depletion assist |
US20110115018A1 (en) * | 2009-11-13 | 2011-05-19 | Maxim Integrated Products, Inc. | Mos power transistor |
US8946851B1 (en) | 2009-11-13 | 2015-02-03 | Maxim Integrated Products, Inc. | Integrated MOS power transistor with thin gate oxide and low gate charge |
US8630137B1 (en) | 2010-02-15 | 2014-01-14 | Maxim Integrated Products, Inc. | Dynamic trim method for non-volatile memory products |
AT509633A1 (de) * | 2010-03-29 | 2011-10-15 | Ctr Carinthian Tech Res Ag | Hochtemperaturbeständige, elektrisch leitfähige dünnschichten |
US10672748B1 (en) | 2010-06-02 | 2020-06-02 | Maxim Integrated Products, Inc. | Use of device assembly for a generalization of three-dimensional heterogeneous technologies integration |
US8349653B2 (en) | 2010-06-02 | 2013-01-08 | Maxim Integrated Products, Inc. | Use of device assembly for a generalization of three-dimensional metal interconnect technologies |
WO2012036178A1 (ja) * | 2010-09-17 | 2012-03-22 | 株式会社村田製作所 | 弾性波装置 |
CN108735825B (zh) * | 2017-04-13 | 2020-04-17 | 神华集团有限责任公司 | 太阳能电池背电极和太阳能电池及其制备方法 |
US11761077B2 (en) * | 2018-08-01 | 2023-09-19 | Medtronic Minimed, Inc. | Sputtering techniques for biosensors |
US11082029B2 (en) | 2018-09-28 | 2021-08-03 | Skyworks Solutions, Inc. | Acoustic wave device with multi-layer interdigital transducer electrode |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4445066A (en) * | 1982-06-30 | 1984-04-24 | Murata Manufacturing Co., Ltd. | Electrode structure for a zinc oxide thin film transducer |
US4477952A (en) * | 1983-04-04 | 1984-10-23 | General Electric Company | Piezoelectric crystal electrodes and method of manufacture |
CA1281810C (en) * | 1984-02-20 | 1991-03-19 | Stephen P. Rogerson | Mounting of saw devices |
JPS62272610A (ja) * | 1986-05-21 | 1987-11-26 | Hitachi Ltd | 弾性表面波素子 |
JP3039971B2 (ja) * | 1989-09-19 | 2000-05-08 | 株式会社日立製作所 | 接合型圧電装置及び製造方法並びに接合型圧電素子 |
JPH04288718A (ja) * | 1991-02-22 | 1992-10-13 | Seiko Epson Corp | 弾性表面波素子の電極構造 |
JP3379049B2 (ja) * | 1993-10-27 | 2003-02-17 | 富士通株式会社 | 表面弾性波素子とその製造方法 |
-
1995
- 1995-09-01 JP JP7224855A patent/JPH0969748A/ja active Pending
-
1996
- 1996-08-19 KR KR1019960034234A patent/KR100405931B1/ko not_active IP Right Cessation
- 1996-08-24 MY MYPI96003517A patent/MY116670A/en unknown
- 1996-08-26 SG SG1996010543A patent/SG47173A1/en unknown
- 1996-08-29 US US08/704,209 patent/US5844347A/en not_active Expired - Lifetime
- 1996-08-30 DE DE69629080T patent/DE69629080T2/de not_active Expired - Lifetime
- 1996-08-30 EP EP96113958A patent/EP0762641B1/de not_active Expired - Lifetime
- 1996-08-30 CN CNB961119691A patent/CN1157806C/zh not_active Expired - Lifetime
- 1996-08-30 EP EP03002066A patent/EP1315296A1/de not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
KR100405931B1 (ko) | 2004-04-14 |
DE69629080T2 (de) | 2004-02-12 |
US5844347A (en) | 1998-12-01 |
EP1315296A1 (de) | 2003-05-28 |
SG47173A1 (en) | 1998-03-20 |
CN1149205A (zh) | 1997-05-07 |
MY116670A (en) | 2004-03-31 |
EP0762641B1 (de) | 2003-07-16 |
CN1157806C (zh) | 2004-07-14 |
JPH0969748A (ja) | 1997-03-11 |
EP0762641A1 (de) | 1997-03-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: PANASONIC CORP., KADOMA, OSAKA, JP |
|
8320 | Willingness to grant licences declared (paragraph 23) |