DE69619763D1 - Positiv arbeitende Photolockzusammensetzung und Photosensibilisatoren - Google Patents

Positiv arbeitende Photolockzusammensetzung und Photosensibilisatoren

Info

Publication number
DE69619763D1
DE69619763D1 DE69619763T DE69619763T DE69619763D1 DE 69619763 D1 DE69619763 D1 DE 69619763D1 DE 69619763 T DE69619763 T DE 69619763T DE 69619763 T DE69619763 T DE 69619763T DE 69619763 D1 DE69619763 D1 DE 69619763D1
Authority
DE
Germany
Prior art keywords
photolock
photosensitizers
composition
positive working
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69619763T
Other languages
English (en)
Other versions
DE69619763T2 (de
Inventor
Koji Ichikawa
Haruyoshi Osaki
Hiroki Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP27030595A external-priority patent/JP3834852B2/ja
Priority claimed from JP27029495A external-priority patent/JP3209058B2/ja
Priority claimed from JP27029795A external-priority patent/JP3855285B2/ja
Priority claimed from JP10122596A external-priority patent/JP3921698B2/ja
Priority claimed from JP10122696A external-priority patent/JP3921699B2/ja
Priority claimed from JP10122496A external-priority patent/JPH09286751A/ja
Priority claimed from JP10248596A external-priority patent/JP3921700B2/ja
Priority claimed from JP15971096A external-priority patent/JP3921709B2/ja
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of DE69619763D1 publication Critical patent/DE69619763D1/de
Application granted granted Critical
Publication of DE69619763T2 publication Critical patent/DE69619763T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/71—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/15—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with all hydroxy groups on non-condensed rings, e.g. phenylphenol
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/17—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings containing other rings in addition to the six-membered aromatic rings, e.g. cyclohexylphenol
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/16—Systems containing only non-condensed rings with a six-membered ring the ring being unsaturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00—Systems containing two condensed rings
    • C07C2602/02—Systems containing two condensed rings the rings having only two atoms in common
    • C07C2602/04—One of the condensed rings being a six-membered aromatic ring
    • C07C2602/10—One of the condensed rings being a six-membered aromatic ring the other ring being six-membered, e.g. tetraline

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69619763T 1995-10-18 1996-10-17 Positiv arbeitende Photolockzusammensetzung und Photosensibilisatoren Expired - Lifetime DE69619763T2 (de)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP27030595A JP3834852B2 (ja) 1995-10-18 1995-10-18 ペンタフェノール系化合物およびその用途
JP27029795A JP3855285B2 (ja) 1995-10-18 1995-10-18 ジメチロール化トリフェノール系化合物およびその製法
JP27029495A JP3209058B2 (ja) 1995-10-18 1995-10-18 ポジ型レジスト組成物
JP10122696A JP3921699B2 (ja) 1996-04-23 1996-04-23 ５核体ノボラック化合物およびその用途
JP10122496A JPH09286751A (ja) 1996-04-23 1996-04-23 ６核体ノボラック化合物およびその用途
JP10122596A JP3921698B2 (ja) 1996-04-23 1996-04-23 ペンタフェノール系化合物およびその用途
JP10248596A JP3921700B2 (ja) 1996-04-24 1996-04-24 ５核体ノボラック化合物およびそれの感光剤への使用
JP15971096A JP3921709B2 (ja) 1996-06-20 1996-06-20 ペンタフェノール系化合物およびその用途

Publications (2)

Publication Number Publication Date
DE69619763D1 true DE69619763D1 (de) 2002-04-18
DE69619763T2 DE69619763T2 (de) 2002-11-21

Family

ID=27572952

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69619763T Expired - Lifetime DE69619763T2 (de) 1995-10-18 1996-10-17 Positiv arbeitende Photolockzusammensetzung und Photosensibilisatoren

Country Status (4)

Country Link
US (1) US5866724A (de)
EP (1) EP0769485B1 (de)
KR (1) KR100499744B1 (de)
DE (1) DE69619763T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3652071B2 (ja) 1997-07-25 2005-05-25 東京応化工業株式会社 ノボラック樹脂前駆体およびノボラック樹脂の製造方法
DE60035482T2 (de) 1999-06-01 2008-04-17 Toray Industries, Inc. Positiv arbeitende lichtempfindliche polyimidvorstufen-zusammensetzung
US6492085B1 (en) 1999-08-10 2002-12-10 Tokyo Ohka Kogyo Co., Ltd. Positive photoresist composition and process and synthesizing polyphenol compound
JP3499165B2 (ja) 1999-09-27 2004-02-23 東京応化工業株式会社 ポジ型ホトレジスト組成物、感光性膜付基板、およびレジストパターンの形成方法
JP3901923B2 (ja) 2000-09-12 2007-04-04 東京応化工業株式会社 ポジ型ホトレジスト組成物
TWI263864B (en) * 2001-01-17 2006-10-11 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition
KR100846085B1 (ko) * 2001-10-31 2008-07-14 주식회사 동진쎄미켐 액정표시장치 회로용 포토레지스트 조성물
CN101158813B (zh) * 2006-10-08 2011-07-20 威海经济技术开发区天成化工有限公司 正性胶用光活性化合物及其感光配合物
CN101168509A (zh) * 2006-10-25 2008-04-30 住友化学株式会社 多元酚化合物和含有该化合物的化学放大型光刻胶组合物
JP2009091568A (ja) * 2007-09-20 2009-04-30 Sumitomo Chemical Co Ltd 高分子電解質組成物
KR101508910B1 (ko) * 2008-02-22 2015-04-21 스미또모 가가꾸 가부시키가이샤 폴리하이드릭 화합물 및 이를 함유하는 화학 증폭형 레지스트 조성물
TW201033735A (en) * 2008-12-11 2010-09-16 Sumitomo Chemical Co Resist composition
KR101632965B1 (ko) * 2008-12-29 2016-06-24 삼성디스플레이 주식회사 포토레지스트 조성물 및 박막 트랜지스터 기판의 제조 방법
JP2011180579A (ja) * 2010-02-04 2011-09-15 Sumitomo Chemical Co Ltd レジスト組成物
TW201141903A (en) * 2010-03-26 2011-12-01 Sumitomo Chemical Co Resin and photoresist composition containing the same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2552891B2 (ja) * 1988-01-26 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
WO1991003448A1 (en) * 1989-09-07 1991-03-21 Ocg Microelectronic Materials, Inc. Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions
JPH05204148A (ja) * 1992-01-27 1993-08-13 Sumitomo Chem Co Ltd レジスト組成物の製造方法
JP3094652B2 (ja) * 1992-05-18 2000-10-03 住友化学工業株式会社 ポジ型レジスト組成物
JP3466218B2 (ja) * 1992-06-04 2003-11-10 住友化学工業株式会社 ポジ型レジスト組成物
JP3275505B2 (ja) * 1993-12-02 2002-04-15 日本ゼオン株式会社 ポジ型レジスト組成物
WO1996020430A1 (fr) * 1994-12-28 1996-07-04 Nippon Zeon Co., Ltd. Composition de resist positif

Also Published As

Publication number Publication date
DE69619763T2 (de) 2002-11-21
KR100499744B1 (ko) 2005-09-14
EP0769485A1 (de) 1997-04-23
EP0769485B1 (de) 2002-03-13
KR970022549A (ko) 1997-05-30
US5866724A (en) 1999-02-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SUMITOMO CHEMICAL CO. LTD., TOKIO/TOKYO, JP