DE69611632D1 - Planare Isolation für integrierte Schaltungen - Google Patents
Planare Isolation für integrierte SchaltungenInfo
- Publication number
- DE69611632D1 DE69611632D1 DE69611632T DE69611632T DE69611632D1 DE 69611632 D1 DE69611632 D1 DE 69611632D1 DE 69611632 T DE69611632 T DE 69611632T DE 69611632 T DE69611632 T DE 69611632T DE 69611632 D1 DE69611632 D1 DE 69611632D1
- Authority
- DE
- Germany
- Prior art keywords
- integrated circuits
- planar insulation
- planar
- insulation
- circuits
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Element Separation (AREA)
- Local Oxidation Of Silicon (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9506266A FR2734403B1 (fr) | 1995-05-19 | 1995-05-19 | Isolement plan dans des circuits integres |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69611632D1 true DE69611632D1 (de) | 2001-03-01 |
DE69611632T2 DE69611632T2 (de) | 2001-08-16 |
Family
ID=9479395
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69611632T Expired - Fee Related DE69611632T2 (de) | 1995-05-19 | 1996-05-15 | Planare Isolation für integrierte Schaltungen |
Country Status (5)
Country | Link |
---|---|
US (2) | US5736451A (de) |
EP (1) | EP0743678B1 (de) |
JP (1) | JPH08330299A (de) |
DE (1) | DE69611632T2 (de) |
FR (1) | FR2734403B1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5895257A (en) * | 1996-08-01 | 1999-04-20 | Taiwan Semiconductor Manfacturing Company, Ltd. | LOCOS field oxide and field oxide process using silicon nitride spacers |
US5923991A (en) * | 1996-11-05 | 1999-07-13 | International Business Machines Corporation | Methods to prevent divot formation in shallow trench isolation areas |
US5897356A (en) * | 1997-02-27 | 1999-04-27 | Micron Technology, Inc. | Methods of forming field oxide and active area regions on a semiconductive substrate |
JP3751469B2 (ja) * | 1999-04-26 | 2006-03-01 | 沖電気工業株式会社 | Soi構造の半導体装置の製造方法 |
US6440818B1 (en) * | 2001-04-10 | 2002-08-27 | United Microelectronics Corp. | Method of reducing leakage current of a semiconductor wafer |
JP4054557B2 (ja) * | 2001-10-10 | 2008-02-27 | 沖電気工業株式会社 | 半導体素子の製造方法 |
US6960510B2 (en) * | 2002-07-01 | 2005-11-01 | International Business Machines Corporation | Method of making sub-lithographic features |
JP2005332996A (ja) * | 2004-05-20 | 2005-12-02 | Oki Electric Ind Co Ltd | 半導体装置、及びその製造方法 |
US7851362B2 (en) | 2008-02-11 | 2010-12-14 | Infineon Technologies Ag | Method for reducing an unevenness of a surface and method for making a semiconductor device |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61226942A (ja) * | 1985-04-01 | 1986-10-08 | Matsushita Electronics Corp | 半導体集積回路の素子間分離方法 |
NL8501720A (nl) * | 1985-06-14 | 1987-01-02 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij een siliciumplak plaatselijk wordt voorzien van veldoxide met kanaalonderbreker. |
JPH01220467A (ja) * | 1988-02-29 | 1989-09-04 | Nec Corp | 半導体集積回路装置 |
US5118641A (en) * | 1990-09-13 | 1992-06-02 | Micron Technology, Inc. | Methods for reducing encroachment of the field oxide into the active area on a silicon integrated circuit |
US5372951A (en) * | 1993-10-01 | 1994-12-13 | Advanced Micro Devices, Inc. | Method of making a semiconductor having selectively enhanced field oxide areas |
US5374585A (en) * | 1994-05-09 | 1994-12-20 | Motorola, Inc. | Process for forming field isolation |
US5554560A (en) * | 1994-09-30 | 1996-09-10 | United Microelectronics Corporation | Method for forming a planar field oxide (fox) on substrates for integrated circuit |
US6008526A (en) * | 1995-05-30 | 1999-12-28 | Samsung Electronics Co., Ltd. | Device isolation layer for a semiconductor device |
-
1995
- 1995-05-19 FR FR9506266A patent/FR2734403B1/fr not_active Expired - Fee Related
-
1996
- 1996-05-15 EP EP96410054A patent/EP0743678B1/de not_active Expired - Lifetime
- 1996-05-15 DE DE69611632T patent/DE69611632T2/de not_active Expired - Fee Related
- 1996-05-17 US US08/649,248 patent/US5736451A/en not_active Expired - Lifetime
- 1996-05-20 JP JP8147895A patent/JPH08330299A/ja not_active Withdrawn
-
1998
- 1998-04-01 US US09/053,405 patent/US6525393B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0743678A1 (de) | 1996-11-20 |
JPH08330299A (ja) | 1996-12-13 |
FR2734403B1 (fr) | 1997-08-01 |
FR2734403A1 (fr) | 1996-11-22 |
DE69611632T2 (de) | 2001-08-16 |
US5736451A (en) | 1998-04-07 |
EP0743678B1 (de) | 2001-01-24 |
US6525393B1 (en) | 2003-02-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8339 | Ceased/non-payment of the annual fee |