DE69611004D1 - Verfahren zur Herstellung von Silicaglas für Photolithographie - Google Patents
Verfahren zur Herstellung von Silicaglas für PhotolithographieInfo
- Publication number
- DE69611004D1 DE69611004D1 DE69611004T DE69611004T DE69611004D1 DE 69611004 D1 DE69611004 D1 DE 69611004D1 DE 69611004 T DE69611004 T DE 69611004T DE 69611004 T DE69611004 T DE 69611004T DE 69611004 D1 DE69611004 D1 DE 69611004D1
- Authority
- DE
- Germany
- Prior art keywords
- photolithography
- production
- silica glass
- silica
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
- C03B19/1423—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Glass Melting And Manufacturing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7070165A JP3064857B2 (ja) | 1995-03-28 | 1995-03-28 | 光リソグラフィー用光学部材および合成石英ガラスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69611004D1 true DE69611004D1 (de) | 2000-12-28 |
DE69611004T2 DE69611004T2 (de) | 2001-04-12 |
Family
ID=13423672
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69611004T Expired - Lifetime DE69611004T2 (de) | 1995-03-28 | 1996-03-28 | Verfahren zur Herstellung von Silicaglas für Photolithographie |
Country Status (5)
Country | Link |
---|---|
US (1) | US6189339B1 (de) |
EP (2) | EP0735006B1 (de) |
JP (1) | JP3064857B2 (de) |
KR (1) | KR960035164A (de) |
DE (1) | DE69611004T2 (de) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6442973B1 (en) | 1995-01-06 | 2002-09-03 | Nikon Corporation | Synthetic silica glass and its manufacturing method |
JPH11209134A (ja) * | 1998-01-23 | 1999-08-03 | Nikon Corp | 合成石英ガラスおよびその製造方法 |
JP4189441B2 (ja) | 1997-03-07 | 2008-12-03 | ショット アクチエンゲゼルシャフト | 合成石英ガラス製プリフォームおよびその製造装置 |
US6682859B2 (en) | 1999-02-12 | 2004-01-27 | Corning Incorporated | Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass |
US6783898B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Projection lithography photomask blanks, preforms and method of making |
US6242136B1 (en) | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
US6265115B1 (en) | 1999-03-15 | 2001-07-24 | Corning Incorporated | Projection lithography photomask blanks, preforms and methods of making |
US6319634B1 (en) | 1999-03-12 | 2001-11-20 | Corning Incorporated | Projection lithography photomasks and methods of making |
US6649268B1 (en) * | 1999-03-10 | 2003-11-18 | Nikon Corporation | Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member |
JP3627907B2 (ja) * | 1999-05-21 | 2005-03-09 | 信越化学工業株式会社 | フォトマスク用合成石英ガラス基板の製造方法 |
JP2001010833A (ja) | 1999-06-21 | 2001-01-16 | Nikon Corp | 石英ガラス部材 |
JP2001021744A (ja) | 1999-07-07 | 2001-01-26 | Shin Etsu Chem Co Ltd | 光導波路基板の製造方法 |
EP1134197B1 (de) * | 1999-08-12 | 2014-05-07 | Nikon Corporation | Verfahren zur herstellung von synthetischem, glasförmigem siliciumdioxid |
WO2001027044A1 (de) | 1999-10-14 | 2001-04-19 | Schott Glas | Anordnung zur erzeugung optisch homogener, schlierenfreier quarzglaskörper durch flammenhydrolyse |
US6410192B1 (en) | 1999-11-15 | 2002-06-25 | Corning Incorporated | Photolithography method, photolithography mask blanks, and method of making |
US6710930B2 (en) | 1999-12-01 | 2004-03-23 | Nikon Corporation | Illumination optical system and method of making exposure apparatus |
WO2002014917A1 (fr) * | 2000-08-17 | 2002-02-21 | Matsushita Electric Industrial Co., Ltd. | Plaque de montage optique, module optique, emetteur/recepteur optique, systeme emetteur/recepteur optique et procede de fabrication de plaque de montage optique |
US6776006B2 (en) * | 2000-10-13 | 2004-08-17 | Corning Incorporated | Method to avoid striae in EUV lithography mirrors |
US6598429B1 (en) * | 2000-11-17 | 2003-07-29 | Beamtek, Inc. | Method for fabricating gradient-index rods and rod arrays |
EP1219571B1 (de) * | 2000-12-26 | 2012-04-18 | Shin-Etsu Chemical Co., Ltd. | Verfahren zur Herstellung einem Element aus Quarzglas |
JP4158009B2 (ja) * | 2001-12-11 | 2008-10-01 | 信越化学工業株式会社 | 合成石英ガラスインゴット及び合成石英ガラスの製造方法 |
US6761951B2 (en) | 2001-12-11 | 2004-07-13 | Shin-Etsu Chemical Co., Ltd. | Synthetic quartz glass blank |
JP4370581B2 (ja) * | 2003-02-17 | 2009-11-25 | 株式会社ニコン | 露光装置及び露光装置用光学部材 |
JP2004284886A (ja) * | 2003-03-24 | 2004-10-14 | Shin Etsu Chem Co Ltd | 合成石英ガラス製造用バーナー |
US7777430B2 (en) * | 2003-09-12 | 2010-08-17 | Terralux, Inc. | Light emitting diode replacement lamp |
MX2007000362A (es) * | 2004-07-02 | 2007-03-26 | Nippon Kogaku Kk | Metodo para moldear vidrio de silice. |
DE102004044654B4 (de) * | 2004-09-15 | 2010-01-28 | Airbus Deutschland Gmbh | Brennstoffzellensystem und seine Verwendung |
JP4569779B2 (ja) * | 2006-09-07 | 2010-10-27 | 信越化学工業株式会社 | 合成石英ガラスインゴット及び合成石英ガラス部材の製造方法 |
DE102009033497A1 (de) | 2009-07-15 | 2011-01-20 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus synthetischen Quarz und Verfahren zur Herstellung des Bauteils |
EP2682373B1 (de) * | 2011-03-02 | 2019-05-01 | Nikon Corporation | Wärmebehandlungsvorrichtung für keramische materialien für optische zwecke, wärmebehandlungsverfahren für keramische materialien für optische zwecke, verfahren zur herstellung eines optischen systems und einer belichtungsvorrichtung |
KR20150058211A (ko) * | 2012-09-18 | 2015-05-28 | 가부시키가이샤 니콘 | SiO₂―TiO₂계 유리의 제조 방법 및 그 유리로 이루어지는 포토마스크 기판의 제조 방법 |
JP6241276B2 (ja) * | 2013-01-22 | 2017-12-06 | 信越化学工業株式会社 | Euvリソグラフィ用部材の製造方法 |
US20190146129A1 (en) * | 2016-07-29 | 2019-05-16 | Faraday&Future Inc. | Light directing filters |
DE102017100242A1 (de) * | 2017-01-09 | 2018-07-12 | Schott Ag | Verfahren zur Herstellung einer Glaskeramik-Kochfläche mit lokal erhöhter Transmission und verfahrensgemäß herstellbare Glaskeramik-Kochfläche |
CN113443820A (zh) * | 2021-07-03 | 2021-09-28 | 四川神光石英科技有限公司 | 用于石英玻璃渗氢工艺的料架、反应釜及装置 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58147708A (ja) | 1982-02-26 | 1983-09-02 | Nippon Kogaku Kk <Nikon> | 照明用光学装置 |
US4666273A (en) | 1983-10-05 | 1987-05-19 | Nippon Kogaku K. K. | Automatic magnification correcting system in a projection optical apparatus |
JPH0776099B2 (ja) | 1987-07-16 | 1995-08-16 | 信越石英株式会社 | 石英ガラス部材の製造方法 |
US5253110A (en) | 1988-12-22 | 1993-10-12 | Nikon Corporation | Illumination optical arrangement |
US5325230A (en) * | 1989-06-09 | 1994-06-28 | Shin-Etsu Quartz Products Co., Ltd. | Optical members and blanks of synthetic silica glass and method for their production |
JP2830492B2 (ja) | 1991-03-06 | 1998-12-02 | 株式会社ニコン | 投影露光装置及び投影露光方法 |
EP0546196B1 (de) * | 1991-06-29 | 1997-05-02 | Shin-Etsu Quartz Products Co., Ltd. | Synthetisches optisches element aus quarzglas für excimer-laser und seine herstellung |
JP2588447B2 (ja) * | 1991-06-29 | 1997-03-05 | 信越石英株式会社 | エキシマレーザー用石英ガラス部材の製造方法 |
US5236486A (en) * | 1991-10-24 | 1993-08-17 | Lightpath Technologies, Inc. | Shaped gradient fabrication in lenses by molding from axial gradient |
JP2814795B2 (ja) | 1991-10-25 | 1998-10-27 | 株式会社ニコン | 石英ガラスの製造方法 |
US5333035A (en) | 1992-05-15 | 1994-07-26 | Nikon Corporation | Exposing method |
JP3374413B2 (ja) | 1992-07-20 | 2003-02-04 | 株式会社ニコン | 投影露光装置、投影露光方法、並びに集積回路製造方法 |
JP3120647B2 (ja) | 1993-12-27 | 2000-12-25 | 株式会社ニコン | 石英ガラスの製造方法及びそれにより製造された石英ガラス |
JP2814867B2 (ja) | 1993-02-10 | 1998-10-27 | 株式会社ニコン | 石英ガラスの製造方法 |
JP3520541B2 (ja) | 1993-12-27 | 2004-04-19 | 株式会社ニコン | 石英ガラス製バーナー、これを用いて製造される石英ガラス、石英ガラスバーナーを用いた石英ガラスの製造方法 |
JPH07333407A (ja) | 1994-06-09 | 1995-12-22 | Fujikura Ltd | ロッドレンズとその製造方法 |
-
1995
- 1995-03-28 JP JP7070165A patent/JP3064857B2/ja not_active Expired - Lifetime
-
1996
- 1996-03-20 KR KR1019960007490A patent/KR960035164A/ko active Search and Examination
- 1996-03-28 EP EP96104958A patent/EP0735006B1/de not_active Expired - Lifetime
- 1996-03-28 US US08/623,601 patent/US6189339B1/en not_active Expired - Lifetime
- 1996-03-28 DE DE69611004T patent/DE69611004T2/de not_active Expired - Lifetime
- 1996-03-28 EP EP99118092A patent/EP0968969B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0968969B1 (de) | 2011-10-05 |
EP0968969A3 (de) | 2003-01-22 |
EP0968969A2 (de) | 2000-01-05 |
JP3064857B2 (ja) | 2000-07-12 |
KR960035164A (ko) | 1996-10-24 |
DE69611004T2 (de) | 2001-04-12 |
US6189339B1 (en) | 2001-02-20 |
EP0735006B1 (de) | 2000-11-22 |
EP0735006A1 (de) | 1996-10-02 |
JPH08262201A (ja) | 1996-10-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |