DE69611004T2 - Verfahren zur Herstellung von Silicaglas für Photolithographie - Google Patents

Verfahren zur Herstellung von Silicaglas für Photolithographie

Info

Publication number
DE69611004T2
DE69611004T2 DE69611004T DE69611004T DE69611004T2 DE 69611004 T2 DE69611004 T2 DE 69611004T2 DE 69611004 T DE69611004 T DE 69611004T DE 69611004 T DE69611004 T DE 69611004T DE 69611004 T2 DE69611004 T2 DE 69611004T2
Authority
DE
Germany
Prior art keywords
photolithography
production
silica glass
silica
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69611004T
Other languages
English (en)
Other versions
DE69611004D1 (de
Inventor
Hiroyuki Hiraiwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=13423672&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69611004(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE69611004D1 publication Critical patent/DE69611004D1/de
Application granted granted Critical
Publication of DE69611004T2 publication Critical patent/DE69611004T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C03B19/1423—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Surface Treatment Of Glass (AREA)
DE69611004T 1995-03-28 1996-03-28 Verfahren zur Herstellung von Silicaglas für Photolithographie Expired - Lifetime DE69611004T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7070165A JP3064857B2 (ja) 1995-03-28 1995-03-28 光リソグラフィー用光学部材および合成石英ガラスの製造方法

Publications (2)

Publication Number Publication Date
DE69611004D1 DE69611004D1 (de) 2000-12-28
DE69611004T2 true DE69611004T2 (de) 2001-04-12

Family

ID=13423672

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69611004T Expired - Lifetime DE69611004T2 (de) 1995-03-28 1996-03-28 Verfahren zur Herstellung von Silicaglas für Photolithographie

Country Status (5)

Country Link
US (1) US6189339B1 (de)
EP (2) EP0968969B1 (de)
JP (1) JP3064857B2 (de)
KR (1) KR960035164A (de)
DE (1) DE69611004T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017100242A1 (de) * 2017-01-09 2018-07-12 Schott Ag Verfahren zur Herstellung einer Glaskeramik-Kochfläche mit lokal erhöhter Transmission und verfahrensgemäß herstellbare Glaskeramik-Kochfläche

Families Citing this family (34)

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US6442973B1 (en) 1995-01-06 2002-09-03 Nikon Corporation Synthetic silica glass and its manufacturing method
JPH11209134A (ja) * 1998-01-23 1999-08-03 Nikon Corp 合成石英ガラスおよびその製造方法
EP0964832B1 (de) 1997-03-07 2001-05-23 Schott ML GMBH Vorform aus synthetischem kieselglas und vorrichtung zu ihrer herstellung
US6319634B1 (en) 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6682859B2 (en) 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
US6265115B1 (en) * 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
US6649268B1 (en) * 1999-03-10 2003-11-18 Nikon Corporation Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
JP3627907B2 (ja) * 1999-05-21 2005-03-09 信越化学工業株式会社 フォトマスク用合成石英ガラス基板の製造方法
JP2001010833A (ja) * 1999-06-21 2001-01-16 Nikon Corp 石英ガラス部材
JP2001021744A (ja) 1999-07-07 2001-01-26 Shin Etsu Chem Co Ltd 光導波路基板の製造方法
US6732546B1 (en) * 1999-08-12 2004-05-11 Nikon Corporation Product method of synthetic silica glass and thermal treatment apparatus
JP2003511339A (ja) 1999-10-14 2003-03-25 カール−ツァイス−シュティフトゥング 光学的に均一かつストリークを含まない大口径石英ガラス体の製造装置
US6410192B1 (en) 1999-11-15 2002-06-25 Corning Incorporated Photolithography method, photolithography mask blanks, and method of making
US6710930B2 (en) 1999-12-01 2004-03-23 Nikon Corporation Illumination optical system and method of making exposure apparatus
KR100803417B1 (ko) * 2000-08-17 2008-02-13 마츠시타 덴끼 산교 가부시키가이샤 광실장기판의 제조방법
US6776006B2 (en) * 2000-10-13 2004-08-17 Corning Incorporated Method to avoid striae in EUV lithography mirrors
US6598429B1 (en) * 2000-11-17 2003-07-29 Beamtek, Inc. Method for fabricating gradient-index rods and rod arrays
EP1219571B1 (de) * 2000-12-26 2012-04-18 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung einem Element aus Quarzglas
US6761951B2 (en) 2001-12-11 2004-07-13 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass blank
JP4158009B2 (ja) * 2001-12-11 2008-10-01 信越化学工業株式会社 合成石英ガラスインゴット及び合成石英ガラスの製造方法
EP1596424B1 (de) * 2003-02-17 2016-11-02 Nikon Corporation Belichtungsvorrichtung und verfahren zur musterbelichtung
JP2004284886A (ja) * 2003-03-24 2004-10-14 Shin Etsu Chem Co Ltd 合成石英ガラス製造用バーナー
US7777430B2 (en) * 2003-09-12 2010-08-17 Terralux, Inc. Light emitting diode replacement lamp
ATE521580T1 (de) * 2004-07-02 2011-09-15 Nikon Corp Verfahren zum formen von quarzglas
DE102004044654B4 (de) * 2004-09-15 2010-01-28 Airbus Deutschland Gmbh Brennstoffzellensystem und seine Verwendung
JP4569779B2 (ja) 2006-09-07 2010-10-27 信越化学工業株式会社 合成石英ガラスインゴット及び合成石英ガラス部材の製造方法
DE102009033497A1 (de) * 2009-07-15 2011-01-20 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus synthetischen Quarz und Verfahren zur Herstellung des Bauteils
CN103429542A (zh) * 2011-03-02 2013-12-04 株式会社尼康 光学用陶瓷材料的热处理装置、光学用陶瓷材料的热处理方法、合成石英玻璃的热处理方法、光学系统的制造方法、及曝光装置的制造方法
CN104703929B (zh) * 2012-09-18 2017-03-22 株式会社尼康 SiO2‑TiO2系玻璃的制造方法和由该玻璃构成的光掩模基板的制造方法
JP6241276B2 (ja) * 2013-01-22 2017-12-06 信越化学工業株式会社 Ｅｕｖリソグラフィ用部材の製造方法
US20190146129A1 (en) * 2016-07-29 2019-05-16 Faraday&Future Inc. Light directing filters
CN113443820A (zh) * 2021-07-03 2021-09-28 四川神光石英科技有限公司 用于石英玻璃渗氢工艺的料架、反应釜及装置

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JPS58147708A (ja) 1982-02-26 1983-09-02 Nippon Kogaku Kk <Nikon> 照明用光学装置
US4666273A (en) 1983-10-05 1987-05-19 Nippon Kogaku K. K. Automatic magnification correcting system in a projection optical apparatus
JPH0776099B2 (ja) 1987-07-16 1995-08-16 信越石英株式会社 石英ガラス部材の製造方法
US5253110A (en) 1988-12-22 1993-10-12 Nikon Corporation Illumination optical arrangement
US5325230A (en) * 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
JP2830492B2 (ja) 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
DE69219445T2 (de) * 1991-06-29 1997-08-07 Shinetsu Quartz Prod Synthetisches optisches element aus quarzglas für excimer-laser und seine herstellung
JP2588447B2 (ja) * 1991-06-29 1997-03-05 信越石英株式会社 エキシマレーザー用石英ガラス部材の製造方法
US5236486A (en) * 1991-10-24 1993-08-17 Lightpath Technologies, Inc. Shaped gradient fabrication in lenses by molding from axial gradient
JP2814795B2 (ja) 1991-10-25 1998-10-27 株式会社ニコン 石英ガラスの製造方法
US5333035A (en) 1992-05-15 1994-07-26 Nikon Corporation Exposing method
JP3374413B2 (ja) 1992-07-20 2003-02-04 株式会社ニコン 投影露光装置、投影露光方法、並びに集積回路製造方法
JP3120647B2 (ja) 1993-12-27 2000-12-25 株式会社ニコン 石英ガラスの製造方法及びそれにより製造された石英ガラス
JP2814867B2 (ja) * 1993-02-10 1998-10-27 株式会社ニコン 石英ガラスの製造方法
JP3520541B2 (ja) 1993-12-27 2004-04-19 株式会社ニコン 石英ガラス製バーナー、これを用いて製造される石英ガラス、石英ガラスバーナーを用いた石英ガラスの製造方法
JPH07333407A (ja) 1994-06-09 1995-12-22 Fujikura Ltd ロッドレンズとその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017100242A1 (de) * 2017-01-09 2018-07-12 Schott Ag Verfahren zur Herstellung einer Glaskeramik-Kochfläche mit lokal erhöhter Transmission und verfahrensgemäß herstellbare Glaskeramik-Kochfläche

Also Published As

Publication number Publication date
EP0968969B1 (de) 2011-10-05
JPH08262201A (ja) 1996-10-11
KR960035164A (ko) 1996-10-24
DE69611004D1 (de) 2000-12-28
US6189339B1 (en) 2001-02-20
EP0735006B1 (de) 2000-11-22
EP0968969A2 (de) 2000-01-05
JP3064857B2 (ja) 2000-07-12
EP0968969A3 (de) 2003-01-22
EP0735006A1 (de) 1996-10-02

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Legal Events

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