DE69610035T2 - Siliziumthyristor für esd-schutz - Google Patents
Siliziumthyristor für esd-schutzInfo
- Publication number
- DE69610035T2 DE69610035T2 DE69610035T DE69610035T DE69610035T2 DE 69610035 T2 DE69610035 T2 DE 69610035T2 DE 69610035 T DE69610035 T DE 69610035T DE 69610035 T DE69610035 T DE 69610035T DE 69610035 T2 DE69610035 T2 DE 69610035T2
- Authority
- DE
- Germany
- Prior art keywords
- esd protection
- silicon thyristor
- thyristor
- silicon
- esd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/74—Thyristor-type devices, e.g. having four-zone regenerative action
- H01L29/7436—Lateral thyristors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0259—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using bipolar transistors as protective elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/74—Thyristor-type devices, e.g. having four-zone regenerative action
- H01L29/7404—Thyristor-type devices, e.g. having four-zone regenerative action structurally associated with at least one other device
- H01L29/7412—Thyristor-type devices, e.g. having four-zone regenerative action structurally associated with at least one other device the device being a diode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/87—Thyristor diodes, e.g. Shockley diodes, break-over diodes
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Thyristors (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/374,135 US5602404A (en) | 1995-01-18 | 1995-01-18 | Low voltage triggering silicon controlled rectifier structures for ESD protection |
PCT/US1996/000223 WO1996022614A1 (en) | 1995-01-18 | 1996-01-03 | Silicon controlled rectifier for esd protection |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69610035D1 DE69610035D1 (de) | 2000-10-05 |
DE69610035T2 true DE69610035T2 (de) | 2001-04-05 |
Family
ID=23475456
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69610035T Expired - Lifetime DE69610035T2 (de) | 1995-01-18 | 1996-01-03 | Siliziumthyristor für esd-schutz |
Country Status (5)
Country | Link |
---|---|
US (1) | US5602404A (de) |
EP (1) | EP0750793B1 (de) |
KR (1) | KR100305238B1 (de) |
DE (1) | DE69610035T2 (de) |
WO (1) | WO1996022614A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10348446A1 (de) * | 2003-10-14 | 2005-06-02 | Zentrum Mikroelektronik Dresden Ag | Anordnung für eine ESD-Schutzschaltung |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2850801B2 (ja) * | 1995-07-28 | 1999-01-27 | 日本電気株式会社 | 半導体素子 |
US5856214A (en) * | 1996-03-04 | 1999-01-05 | Winbond Electronics Corp. | Method of fabricating a low voltage zener-triggered SCR for ESD protection in integrated circuits |
US5808343A (en) * | 1996-09-20 | 1998-09-15 | Integrated Device Technology, Inc. | Input structure for digital integrated circuits |
US5814865A (en) * | 1996-10-31 | 1998-09-29 | Texas Instruments Incorporated | Bimodal ESD protection for DRAM power supplies and SCRs for DRAMs and logic circuits |
US5780905A (en) * | 1996-12-17 | 1998-07-14 | Texas Instruments Incorporated | Asymmetrical, bidirectional triggering ESD structure |
US5825600A (en) * | 1997-04-25 | 1998-10-20 | Cypress Semiconductor Corp. | Fast turn-on silicon controlled rectifier (SCR) for electrostatic discharge (ESD) protection |
US6049119A (en) * | 1998-05-01 | 2000-04-11 | Motorola, Inc. | Protection circuit for a semiconductor device |
US7327541B1 (en) | 1998-06-19 | 2008-02-05 | National Semiconductor Corporation | Operation of dual-directional electrostatic discharge protection device |
US6365924B1 (en) | 1998-06-19 | 2002-04-02 | National Semiconductor Corporation | Dual direction over-voltage and over-current IC protection device and its cell structure |
JP4256544B2 (ja) * | 1998-08-25 | 2009-04-22 | シャープ株式会社 | 半導体集積回路の静電気保護装置、その製造方法および静電気保護装置を用いた静電気保護回路 |
US6015993A (en) | 1998-08-31 | 2000-01-18 | International Business Machines Corporation | Semiconductor diode with depleted polysilicon gate structure and method |
KR100275757B1 (ko) | 1998-08-31 | 2001-01-15 | 김덕중 | 반도체 정류 소자 및 이를 제조하는 방법 |
US6501137B1 (en) * | 1998-12-30 | 2002-12-31 | Winbond Electronics Corp. | Electrostatic discharge protection circuit triggered by PNP bipolar action |
KR100518526B1 (ko) * | 1999-02-25 | 2005-10-04 | 삼성전자주식회사 | 사이리스터의 트리거 전류를 이용한 정전하 방전회로 |
EP1058308B8 (de) * | 1999-06-01 | 2010-04-07 | Imec | ESD-Schutz-Bauteil für mittlere Triggerspannung |
US20040207020A1 (en) * | 1999-09-14 | 2004-10-21 | Shiao-Chien Chen | CMOS silicon-control-rectifier (SCR) structure for electrostatic discharge (ESD) protection |
JP2001358227A (ja) * | 2000-04-26 | 2001-12-26 | Sharp Corp | 出力段の静電気放電保護のための少量ドープされたレジスタの使用 |
US6493199B1 (en) * | 2000-10-26 | 2002-12-10 | Winbond Electronics Corporation | Vertical zener-triggered SCR structure for ESD protection in integrated circuits |
US6850397B2 (en) * | 2000-11-06 | 2005-02-01 | Sarnoff Corporation | Silicon controlled rectifier electrostatic discharge protection device for power supply lines with powerdown mode of operation |
EP1348236B1 (de) * | 2000-11-06 | 2007-08-15 | Sarnoff Corporation | Schutzvorrichtung gegen elektrostatische Entladung mit gesteuertem Siliziumgleichrichter mit externem On-Chip-Triggern und kompakten inneren Abmessungen für schnelles Triggern |
US6498357B2 (en) * | 2001-02-09 | 2002-12-24 | United Microelectronics Corp. | Lateral SCR device for on-chip ESD protection in shallow-trench-isolation CMOS process |
US7589944B2 (en) * | 2001-03-16 | 2009-09-15 | Sofics Bvba | Electrostatic discharge protection structures for high speed technologies with mixed and ultra-low voltage supplies |
US6576959B2 (en) * | 2001-04-10 | 2003-06-10 | Texas Instruments Incorporated | Device and method of low voltage SCR protection for high voltage failsafe ESD applications |
US6507090B1 (en) * | 2001-12-03 | 2003-01-14 | Nano Silicon Pte. Ltd. | Fully silicide cascaded linked electrostatic discharge protection |
CN100401512C (zh) * | 2002-03-26 | 2008-07-09 | 华邦电子股份有限公司 | 利用硅控整流器的静电放电保护电路 |
US6784029B1 (en) * | 2002-04-12 | 2004-08-31 | National Semiconductor Corporation | Bi-directional ESD protection structure for BiCMOS technology |
US6777721B1 (en) * | 2002-11-14 | 2004-08-17 | Altera Corporation | SCR device for ESD protection |
US6864537B1 (en) | 2003-01-03 | 2005-03-08 | Micrel, Incorporated | Thick gate oxide transistor and electrostatic discharge protection utilizing thick gate oxide transistors |
US6861711B2 (en) * | 2003-01-03 | 2005-03-01 | Micrel, Incorporated | Thick gate oxide transistor and electrostatic discharge protection utilizing thick gate oxide transistors |
US6888710B2 (en) * | 2003-01-03 | 2005-05-03 | Micrel, Incorporated | Insulated gate bipolar transistor and electrostatic discharge cell protection utilizing insulated gate bipolar transistors |
US7193251B1 (en) * | 2003-01-09 | 2007-03-20 | National Semiconductor Corporation | ESD protection cluster and method of providing multi-port ESD protection |
KR100504203B1 (ko) * | 2003-03-20 | 2005-07-28 | 매그나칩 반도체 유한회사 | 반도체장치의 보호소자 |
JP4176564B2 (ja) * | 2003-06-23 | 2008-11-05 | 株式会社東芝 | ウェハ移載装置及びこれを用いた半導体装置の製造方法 |
US6989572B2 (en) | 2003-07-09 | 2006-01-24 | Semiconductor Components Industries, L.L.C. | Symmetrical high frequency SCR structure |
US20050275029A1 (en) * | 2004-06-15 | 2005-12-15 | Jeffrey Watt | Fast turn-on and low-capacitance SCR ESD protection |
JP2006080160A (ja) * | 2004-09-07 | 2006-03-23 | Toshiba Corp | 静電保護回路 |
US7408754B1 (en) | 2004-11-18 | 2008-08-05 | Altera Corporation | Fast trigger ESD device for protection of integrated circuits |
DE102005019305B4 (de) * | 2005-04-26 | 2010-04-22 | Infineon Technologies Ag | ESD-Schutzstruktur mit Diodenreihenschaltung und Halbleiterschaltung mit derselben |
US7659558B1 (en) | 2005-09-23 | 2010-02-09 | Cypress Semiconductor Corporation | Silicon controlled rectifier electrostatic discharge clamp for a high voltage laterally diffused MOS transistor |
US7838937B1 (en) | 2005-09-23 | 2010-11-23 | Cypress Semiconductor Corporation | Circuits providing ESD protection to high voltage laterally diffused metal oxide semiconductor (LDMOS) transistors |
CN100454540C (zh) * | 2005-12-19 | 2009-01-21 | 厦门大学 | 半导体开关器件 |
US8129788B1 (en) | 2006-01-24 | 2012-03-06 | Cypress Semiconductor Corporation | Capacitor triggered silicon controlled rectifier |
US7768068B1 (en) | 2006-06-05 | 2010-08-03 | Cypress Semiconductor Corporation | Drain extended MOS transistor with increased breakdown voltage |
US7940499B2 (en) * | 2006-09-15 | 2011-05-10 | Semiconductor Components Industries, Llc | Multi-pad shared current dissipation with heterogenic current protection structures |
US7456441B2 (en) * | 2006-09-15 | 2008-11-25 | Semiconductor Components Industries, Llc | Single well excess current dissipation circuit |
US7601990B2 (en) | 2006-10-25 | 2009-10-13 | Delphi Technologies, Inc. | Method and apparatus for electrostatic discharge protection having a stable breakdown voltage and low snapback voltage |
JP4695622B2 (ja) | 2007-05-02 | 2011-06-08 | 株式会社東芝 | 半導体装置 |
US8737027B1 (en) | 2007-07-27 | 2014-05-27 | Cypress Semiconductor Corporation | ESD protection device with charge collections regions |
US7919817B2 (en) * | 2008-05-16 | 2011-04-05 | Alpha & Omega Semiconductor Ltd. | Electrostatic discharge (ESD) protection applying high voltage lightly doped drain (LDD) CMOS technologies |
CN102157519B (zh) * | 2011-01-28 | 2015-05-20 | 上海华虹宏力半导体制造有限公司 | 硅控整流器 |
JP5431379B2 (ja) * | 2011-02-03 | 2014-03-05 | シャープ株式会社 | ダイオード保護回路、lnb、およびアンテナシステム |
EP2763171B1 (de) * | 2011-09-29 | 2017-10-25 | CSMC Technologies Fab1 Co., Ltd. | Schutzvorrichtung für elektrostatische entladung |
US8492866B1 (en) | 2012-01-09 | 2013-07-23 | International Business Machines Corporation | Isolated Zener diode |
US9018673B2 (en) | 2012-08-31 | 2015-04-28 | Freescale Semiconductor Inc. | Zener diode device and fabrication |
US9704849B2 (en) | 2013-10-18 | 2017-07-11 | Nxp Usa, Inc. | Electrostatic discharge protection device structures and methods of manufacture |
US9099487B2 (en) * | 2013-12-05 | 2015-08-04 | Freescale Semiconductor Inc. | Zener diode devices and related fabrication methods |
US9337266B2 (en) * | 2014-09-30 | 2016-05-10 | Micron Technology, Inc. | Methods and apparatuses including an active area of a tap intersected by a boundary of a well |
EP3116027A1 (de) | 2015-07-10 | 2017-01-11 | Nxp B.V. | Vorrichtung für elektrostatischen entladungsschutz mit einem siliciumgesteuerten gleichrichter |
US10121777B2 (en) * | 2016-04-25 | 2018-11-06 | Novatek Microelectronics Corp. | Silicon controlled rectifier |
US10679991B2 (en) | 2018-10-12 | 2020-06-09 | Micron Technology, Inc. | Methods and apparatuses including a boundary of a well beneath an active area of a tap |
US10580765B1 (en) * | 2018-12-02 | 2020-03-03 | Nanya Technology Corporation | Semiconductor structure for electrostatic discharge protection |
CN112510033A (zh) * | 2020-10-14 | 2021-03-16 | 上海华力微电子有限公司 | 一种硅控整流器及其制造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL272752A (de) * | 1960-12-20 | |||
JPS5310285A (en) * | 1976-07-15 | 1978-01-30 | Mitsubishi Electric Corp | Reverse conducting thyristor |
JPS5568859A (en) * | 1978-11-17 | 1980-05-23 | Hitachi Ltd | Method of winding two pole multilayer winding in groove-less armature |
SE423946B (sv) * | 1980-10-08 | 1982-06-14 | Asea Ab | Tyristor anordnad for sjelvtendning |
IT1212767B (it) * | 1983-07-29 | 1989-11-30 | Ates Componenti Elettron | Soppressore di sovratensioni a semiconduttore con tensione d'innesco predeterminabile con precisione. |
US5285100A (en) * | 1988-07-22 | 1994-02-08 | Texas Instruments Incorporated | Semiconductor switching device |
GB2221088B (en) * | 1988-07-22 | 1992-02-26 | Texas Instruments Ltd | A semiconductor switching device |
US5276350A (en) * | 1991-02-07 | 1994-01-04 | National Semiconductor Corporation | Low reverse junction breakdown voltage zener diode for electrostatic discharge protection of integrated circuits |
US5225702A (en) * | 1991-12-05 | 1993-07-06 | Texas Instruments Incorporated | Silicon controlled rectifier structure for electrostatic discharge protection |
US5343053A (en) * | 1993-05-21 | 1994-08-30 | David Sarnoff Research Center Inc. | SCR electrostatic discharge protection for integrated circuits |
US5401485A (en) * | 1994-03-15 | 1995-03-28 | Shell Oil Company | Reduction of residual chloride in iron oxides |
-
1995
- 1995-01-18 US US08/374,135 patent/US5602404A/en not_active Expired - Lifetime
-
1996
- 1996-01-03 EP EP96901630A patent/EP0750793B1/de not_active Expired - Lifetime
- 1996-01-03 KR KR1019960705178A patent/KR100305238B1/ko not_active IP Right Cessation
- 1996-01-03 WO PCT/US1996/000223 patent/WO1996022614A1/en active IP Right Grant
- 1996-01-03 DE DE69610035T patent/DE69610035T2/de not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10348446A1 (de) * | 2003-10-14 | 2005-06-02 | Zentrum Mikroelektronik Dresden Ag | Anordnung für eine ESD-Schutzschaltung |
DE10348446B4 (de) * | 2003-10-14 | 2011-12-15 | Zentrum Mikroelektronik Dresden Ag | Anordnung für eine ESD-Schutzschaltung |
Also Published As
Publication number | Publication date |
---|---|
KR100305238B1 (ko) | 2001-09-24 |
DE69610035D1 (de) | 2000-10-05 |
US5602404A (en) | 1997-02-11 |
EP0750793A1 (de) | 1997-01-02 |
WO1996022614A1 (en) | 1996-07-25 |
EP0750793B1 (de) | 2000-08-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |