DE69529359D1 - Fotoempfindliches Aufzeichnungsmaterial, fotoempfindliches Aufzeichnungselement und Verfahren zur Herstellung eines Hologrammes mit diesem Element - Google Patents

Fotoempfindliches Aufzeichnungsmaterial, fotoempfindliches Aufzeichnungselement und Verfahren zur Herstellung eines Hologrammes mit diesem Element

Info

Publication number
DE69529359D1
DE69529359D1 DE69529359T DE69529359T DE69529359D1 DE 69529359 D1 DE69529359 D1 DE 69529359D1 DE 69529359 T DE69529359 T DE 69529359T DE 69529359 T DE69529359 T DE 69529359T DE 69529359 D1 DE69529359 D1 DE 69529359D1
Authority
DE
Germany
Prior art keywords
photosensitive recording
hologram
producing
recording material
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69529359T
Other languages
English (en)
Other versions
DE69529359T2 (de
Inventor
Yasushi Ohe
Hiromitsu Ito
Madoka Yasuike
Yasumasa Toba
Miki Shikano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP04674294A external-priority patent/JP3389669B2/ja
Priority claimed from JP14979694A external-priority patent/JP3180566B2/ja
Priority claimed from JP6149797A external-priority patent/JPH0816079A/ja
Priority claimed from JP14979894A external-priority patent/JP3161230B2/ja
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Application granted granted Critical
Publication of DE69529359D1 publication Critical patent/DE69529359D1/de
Publication of DE69529359T2 publication Critical patent/DE69529359T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Holo Graphy (AREA)
  • Epoxy Resins (AREA)
DE69529359T 1994-03-17 1995-03-16 Fotoempfindliches Aufzeichnungsmaterial, fotoempfindliches Aufzeichnungselement und Verfahren zur Herstellung eines Hologrammes mit diesem Element Expired - Fee Related DE69529359T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP04674294A JP3389669B2 (ja) 1994-03-17 1994-03-17 ホログラム感光性記録材料およびホログラム感光性記録媒体並びにそれを用いたホログラム製造方法
JP14979694A JP3180566B2 (ja) 1994-06-30 1994-06-30 ホログラム感光性記録材料およびホログラム感光性記録媒体並びにそれを用いたホログラム製造方法
JP6149797A JPH0816079A (ja) 1994-06-30 1994-06-30 ホログラム感光性記録材料およびホログラム感光性記録媒体
JP14979894A JP3161230B2 (ja) 1994-06-30 1994-06-30 ホログラム感光性記録材料およびホログラム感光性記録媒体

Publications (2)

Publication Number Publication Date
DE69529359D1 true DE69529359D1 (de) 2003-02-20
DE69529359T2 DE69529359T2 (de) 2003-09-04

Family

ID=27461925

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69529359T Expired - Fee Related DE69529359T2 (de) 1994-03-17 1995-03-16 Fotoempfindliches Aufzeichnungsmaterial, fotoempfindliches Aufzeichnungselement und Verfahren zur Herstellung eines Hologrammes mit diesem Element

Country Status (5)

Country Link
US (1) US5698345A (de)
EP (1) EP0672953B1 (de)
KR (1) KR100296083B1 (de)
AU (1) AU684891B2 (de)
DE (1) DE69529359T2 (de)

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US20030157414A1 (en) * 1997-11-13 2003-08-21 Pradeep K. Dhal Holographic medium and process for use thereof
US6103454A (en) * 1998-03-24 2000-08-15 Lucent Technologies Inc. Recording medium and process for forming medium
US6482551B1 (en) * 1998-03-24 2002-11-19 Inphase Technologies Optical article and process for forming article
US6322933B1 (en) 1999-01-12 2001-11-27 Siros Technologies, Inc. Volumetric track definition for data storage media used to record data by selective alteration of a format hologram
US6627354B1 (en) * 1999-03-01 2003-09-30 Lucent Technologies Inc. Photorecording medium, process for fabricating medium, and process for holography using medium
US6322931B1 (en) * 1999-07-29 2001-11-27 Siros Technologies, Inc. Method and apparatus for optical data storage using non-linear heating by excited state absorption for the alteration of pre-formatted holographic gratings
US6310850B1 (en) 1999-07-29 2001-10-30 Siros Technologies, Inc. Method and apparatus for optical data storage and/or retrieval by selective alteration of a holographic storage medium
US6512606B1 (en) 1999-07-29 2003-01-28 Siros Technologies, Inc. Optical storage media and method for optical data storage via local changes in reflectivity of a format grating
AU3023301A (en) * 2000-02-08 2001-08-20 Vantico Ag Liquid, radiation-curable composition, especially for stereolithography
US6710900B1 (en) * 2000-10-23 2004-03-23 Zebra Imaging, Inc. Holograms exposed and processed on plastic substrates
WO2003102693A1 (en) 2002-05-29 2003-12-11 Inphase Technologies, Inc. High reflective index photoactive compound for optical applications
JP2005527867A (ja) * 2002-05-29 2005-09-15 インフェイズ テクノロジーズ インコーポレイテッド アルミニウム塩化合物と不斉アクリレート化合物を含むホログラフィックデータ記録媒体
FR2840269B1 (fr) * 2002-05-30 2005-01-28 Plastic Omnium Cie Piece de style et vehicule automobile comportant une telle piece de style
US7024065B2 (en) * 2002-07-09 2006-04-04 Lucent Technologies Inc. Optical waveguide device and method of manufacture therefor
KR100523295B1 (ko) * 2003-01-10 2005-10-24 한국화학연구원 광중합성 조성물 및 이로부터 제조된 광중합성 막
EP1612623A4 (de) * 2003-04-09 2007-04-04 Konica Minolta Med & Graphic Holographisches aufzeichnungsmedium und aufzeichnungsverfahren damit
US20050233246A1 (en) * 2004-04-16 2005-10-20 Eugene Boden Novel optical storage materials, methods of making the storage materials, and methods for storing and reading data
US20060008735A1 (en) * 2004-07-09 2006-01-12 Jsr Corporation Radiation sensitive resin composition for forming microlens
JP2008523453A (ja) * 2004-12-14 2008-07-03 ダッチ ポリマー インスティテュート 有孔性ホログラフィック膜
JP4257295B2 (ja) * 2005-01-07 2009-04-22 日東電工株式会社 光屈折率変調重合体組成物、ホログラム記録材料および屈折率制御方法
JP4633562B2 (ja) * 2005-07-06 2011-02-16 大日本印刷株式会社 体積型ホログラム感光性組成物
US20070248890A1 (en) * 2006-04-20 2007-10-25 Inphase Technologies, Inc. Index Contrasting-Photoactive Polymerizable Materials, and Articles and Methods Using Same
US20080057328A1 (en) * 2006-06-27 2008-03-06 Rentzepis Peter M Coating system for piracy-protected optical medium
JP4197721B2 (ja) * 2006-12-18 2008-12-17 株式会社東芝 ホログラム記録媒体およびその製造方法
US20080241706A1 (en) * 2007-03-30 2008-10-02 Industrial Technology Research Institute Holographic data storage medium and fabrication method thereof
JP2009047922A (ja) * 2007-08-20 2009-03-05 Toshiba Corp ホログラム記録媒体および光情報記録再生装置
JP2009216766A (ja) * 2008-03-07 2009-09-24 Toshiba Corp ホログラム記録媒体
EP2243622A3 (de) * 2009-04-22 2015-06-03 Canon Kabushiki Kaisha Verfahren zur Herstellung eines optischen Teils
EP2895922B1 (de) 2012-09-17 2018-04-18 Basf Se Sicherheitselemente und verfahren zu ihrer herstellung
JP7219654B2 (ja) * 2019-03-28 2023-02-08 東京応化工業株式会社 組成物及び絶縁部の形成方法

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Also Published As

Publication number Publication date
DE69529359T2 (de) 2003-09-04
EP0672953B1 (de) 2003-01-15
EP0672953A3 (de) 1996-03-27
US5698345A (en) 1997-12-16
AU1484895A (en) 1995-09-28
EP0672953A2 (de) 1995-09-20
AU684891B2 (en) 1998-01-08
KR100296083B1 (ko) 2001-11-05
KR950033734A (ko) 1995-12-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee