DE69522920D1 - Integrierte Leistungsschaltung - Google Patents
Integrierte LeistungsschaltungInfo
- Publication number
- DE69522920D1 DE69522920D1 DE69522920T DE69522920T DE69522920D1 DE 69522920 D1 DE69522920 D1 DE 69522920D1 DE 69522920 T DE69522920 T DE 69522920T DE 69522920 T DE69522920 T DE 69522920T DE 69522920 D1 DE69522920 D1 DE 69522920D1
- Authority
- DE
- Germany
- Prior art keywords
- power circuit
- integrated power
- metallisation
- rear face
- active layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000001465 metallisation Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/761—PN junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/0814—Diodes only
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9416011A FR2729008B1 (fr) | 1994-12-30 | 1994-12-30 | Circuit integre de puissance |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69522920D1 true DE69522920D1 (de) | 2001-10-31 |
DE69522920T2 DE69522920T2 (de) | 2002-06-13 |
Family
ID=9470525
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69522920T Expired - Fee Related DE69522920T2 (de) | 1994-12-30 | 1995-12-27 | Integrierte Leistungsschaltung |
Country Status (12)
Country | Link |
---|---|
US (3) | US6075277A (de) |
EP (1) | EP0721218B1 (de) |
JP (1) | JP2671886B2 (de) |
KR (1) | KR100197912B1 (de) |
CN (1) | CN1051643C (de) |
AT (1) | ATE206246T1 (de) |
CA (1) | CA2166228C (de) |
CZ (1) | CZ290986B6 (de) |
DE (1) | DE69522920T2 (de) |
FR (1) | FR2729008B1 (de) |
PL (1) | PL177994B1 (de) |
TW (1) | TW290714B (de) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6411155B2 (en) | 1994-12-30 | 2002-06-25 | Sgs-Thomson Microelectronics S.A. | Power integrated circuit |
FR2729008B1 (fr) | 1994-12-30 | 1997-03-21 | Sgs Thomson Microelectronics | Circuit integre de puissance |
FR2753006B1 (fr) * | 1996-08-27 | 1998-11-27 | Sgs Thomson Microelectronics | Pont redresseur protege monolithique |
FR2764112B1 (fr) * | 1997-05-28 | 1999-08-13 | Sgs Thomson Microelectronics | Mur d'isolement entre composants de puissance |
DE19842882A1 (de) * | 1998-09-18 | 2000-03-30 | Siemens Ag | Verfahren zum Herstellen eines Dotierungsgebiets |
FR2773265B1 (fr) | 1997-12-30 | 2000-03-10 | Sgs Thomson Microelectronics | Circuit de protection d'interface d'abonnes |
US6104045A (en) * | 1998-05-13 | 2000-08-15 | Micron Technology, Inc. | High density planar SRAM cell using bipolar latch-up and gated diode breakdown |
FR2783353A1 (fr) * | 1998-09-16 | 2000-03-17 | St Microelectronics Sa | Mur d'isolement entre composants de puissance |
FR2800513B1 (fr) | 1999-11-03 | 2002-03-29 | St Microelectronics Sa | Detecteur d'etat de composant de puissance |
FR2808621B1 (fr) * | 2000-05-05 | 2002-07-19 | St Microelectronics Sa | Composant monolithique a commande unique pour un pont mixte |
FR2818805B1 (fr) * | 2000-12-21 | 2003-04-04 | St Microelectronics Sa | Commutateur statique bidirectionnel sensible |
FR2818806B1 (fr) | 2000-12-21 | 2003-03-21 | St Microelectronics Sa | Commutateur electronique bidirectionnel bistable a commande par implusions |
FR2819102B1 (fr) * | 2000-12-29 | 2003-04-04 | St Microelectronics Sa | Commutateur electronique bidirectionnel bistable a commande par impulsions |
CN1321457C (zh) * | 2001-11-07 | 2007-06-13 | 新电元件工业株式会社 | 浪涌保护半导体装置 |
FR2834128B1 (fr) * | 2001-12-21 | 2005-03-04 | St Microelectronics Sa | Dispositif de protection bidirectionnel a faible capacite |
FR2834385A1 (fr) * | 2001-12-28 | 2003-07-04 | St Microelectronics Sa | Commutateur statique bidirectionnel sensible dans les quadrants q4 et q1 |
US6849492B2 (en) * | 2002-07-08 | 2005-02-01 | Micron Technology, Inc. | Method for forming standard voltage threshold and low voltage threshold MOSFET devices |
US7622753B2 (en) * | 2005-08-31 | 2009-11-24 | Stmicroelectronics S.A. | Ignition circuit |
US7489488B2 (en) | 2005-10-19 | 2009-02-10 | Littelfuse, Inc. | Integrated circuit providing overvoltage protection for low voltage lines |
US20080012099A1 (en) * | 2006-07-11 | 2008-01-17 | Shing Yeh | Electronic assembly and manufacturing method having a reduced need for wire bonds |
AT506361B1 (de) * | 2008-02-07 | 2012-06-15 | Siemens Ag | Thyristorbrückenschaltung |
US7907381B2 (en) * | 2008-03-12 | 2011-03-15 | Zarlink Semiconductor (Us) Inc. | Protection circuit for a subscriber line interface circuit |
US8513722B2 (en) | 2010-03-02 | 2013-08-20 | Micron Technology, Inc. | Floating body cell structures, devices including same, and methods for forming same |
US9608119B2 (en) | 2010-03-02 | 2017-03-28 | Micron Technology, Inc. | Semiconductor-metal-on-insulator structures, methods of forming such structures, and semiconductor devices including such structures |
US8507966B2 (en) | 2010-03-02 | 2013-08-13 | Micron Technology, Inc. | Semiconductor cells, arrays, devices and systems having a buried conductive line and methods for forming the same |
US8288795B2 (en) | 2010-03-02 | 2012-10-16 | Micron Technology, Inc. | Thyristor based memory cells, devices and systems including the same and methods for forming the same |
US9646869B2 (en) | 2010-03-02 | 2017-05-09 | Micron Technology, Inc. | Semiconductor devices including a diode structure over a conductive strap and methods of forming such semiconductor devices |
US8598621B2 (en) | 2011-02-11 | 2013-12-03 | Micron Technology, Inc. | Memory cells, memory arrays, methods of forming memory cells, and methods of forming a shared doped semiconductor region of a vertically oriented thyristor and a vertically oriented access transistor |
US8952418B2 (en) | 2011-03-01 | 2015-02-10 | Micron Technology, Inc. | Gated bipolar junction transistors |
US8519431B2 (en) * | 2011-03-08 | 2013-08-27 | Micron Technology, Inc. | Thyristors |
US8772848B2 (en) | 2011-07-26 | 2014-07-08 | Micron Technology, Inc. | Circuit structures, memory circuitry, and methods |
FR2981200B1 (fr) * | 2011-10-10 | 2017-01-13 | Centre Nat De La Rech Scient (Cnrs) | Cellule monolithique de circuit integre et notamment cellule de commutation monolithique |
WO2014008415A1 (en) | 2012-07-05 | 2014-01-09 | Littelfuse, Inc. | Crowbar device for voltage transient circuit protection |
US8664690B1 (en) * | 2012-11-15 | 2014-03-04 | Macronix International Co., Ltd. | Bi-directional triode thyristor for high voltage electrostatic discharge protection |
CN103137646A (zh) * | 2013-03-15 | 2013-06-05 | 中国科学院微电子研究所 | 用于双极型阻变存储器交叉阵列集成方式的选通器件单元 |
US9070790B2 (en) * | 2013-08-29 | 2015-06-30 | Infineon Technologies Ag | Vertical semiconductor device and method of manufacturing thereof |
US9224738B1 (en) | 2014-08-18 | 2015-12-29 | Micron Technology, Inc. | Methods of forming an array of gated devices |
US9209187B1 (en) | 2014-08-18 | 2015-12-08 | Micron Technology, Inc. | Methods of forming an array of gated devices |
US9673054B2 (en) | 2014-08-18 | 2017-06-06 | Micron Technology, Inc. | Array of gated devices and methods of forming an array of gated devices |
US20180263594A1 (en) * | 2015-09-29 | 2018-09-20 | Sony Corporation | Semiconductor device, ultrasonic image pickup device, semiconductor device manufacturing method, and ultrasonic imaging system |
US10032937B2 (en) * | 2016-11-11 | 2018-07-24 | Semiconductor Components Industries, Llc | Monolithic series switching semiconductor device having low-resistance substrate contact structure and method |
WO2020243875A1 (en) * | 2019-06-03 | 2020-12-10 | Littelfuse Semiconductor (Wuxi) Co., Ltd. | Integrated mult-device chip and package |
US11158759B1 (en) * | 2020-04-16 | 2021-10-26 | International Business Machines Corporation | Chip carrier integrating power harvesting and regulation diodes and fabrication thereof |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3246206A (en) * | 1965-02-25 | 1966-04-12 | Gen Electric | Voltage surge protector |
JPS5127985B2 (de) * | 1971-10-01 | 1976-08-16 | ||
FR2335957A1 (fr) * | 1975-12-17 | 1977-07-15 | Radiotechnique Compelec | Dispositif semiconducteur monolithique comprenant un pont de redressement |
FR2377132A1 (fr) * | 1977-01-11 | 1978-08-04 | Labo Cent Telecommunicat | Dispositif de protection pour joncteur electronique |
JPS5548962A (en) * | 1978-10-04 | 1980-04-08 | Hitachi Ltd | Semiconductor switch |
JPS5951743B2 (ja) * | 1978-11-08 | 1984-12-15 | 株式会社日立製作所 | 半導体集積装置 |
US4278985A (en) * | 1980-04-14 | 1981-07-14 | Gte Laboratories Incorporated | Monolithic integrated circuit structure incorporating Schottky contact diode bridge rectifier |
DE3421185A1 (de) * | 1984-06-07 | 1985-12-12 | Brown, Boveri & Cie Ag, 6800 Mannheim | Leistungshalbleiterschaltung |
JPH0666402B2 (ja) * | 1985-12-12 | 1994-08-24 | 三菱電機株式会社 | 半導体集積回路装置の入力保護回路 |
JPS6365641A (ja) * | 1986-09-05 | 1988-03-24 | Nec Corp | 半導体集積回路 |
JP2788269B2 (ja) * | 1988-02-08 | 1998-08-20 | 株式会社東芝 | 半導体装置およびその製造方法 |
US5070382A (en) * | 1989-08-18 | 1991-12-03 | Motorola, Inc. | Semiconductor structure for high power integrated circuits |
US5306942A (en) * | 1989-10-11 | 1994-04-26 | Nippondenso Co., Ltd. | Semiconductor device having a shield which is maintained at a reference potential |
FR2670340B1 (fr) * | 1990-12-07 | 1993-03-12 | Sgs Thomson Microelectronics | Circuit de protection a faible capacite. |
GB2256743A (en) * | 1991-06-11 | 1992-12-16 | Texas Instruments Ltd | A semiconductor component for transient voltage limiting |
DE69207410T2 (de) * | 1992-09-18 | 1996-08-29 | Cons Ric Microelettronica | Monolithisch integrierte Brückenschaltung mit Transistoren und entsprechendes Herstellungsverfahren |
FR2697674B1 (fr) * | 1992-10-29 | 1995-01-13 | Sgs Thomson Microelectronics | Thyristor et assemblage de thyristors à cathode commune. |
US5817546A (en) * | 1994-06-23 | 1998-10-06 | Stmicroelectronics S.R.L. | Process of making a MOS-technology power device |
FR2729008B1 (fr) | 1994-12-30 | 1997-03-21 | Sgs Thomson Microelectronics | Circuit integre de puissance |
-
1994
- 1994-12-30 FR FR9416011A patent/FR2729008B1/fr not_active Expired - Fee Related
-
1995
- 1995-12-20 PL PL95311942A patent/PL177994B1/pl unknown
- 1995-12-22 US US08/577,209 patent/US6075277A/en not_active Expired - Lifetime
- 1995-12-27 JP JP7351322A patent/JP2671886B2/ja not_active Expired - Lifetime
- 1995-12-27 EP EP95410150A patent/EP0721218B1/de not_active Expired - Lifetime
- 1995-12-27 AT AT95410150T patent/ATE206246T1/de not_active IP Right Cessation
- 1995-12-27 DE DE69522920T patent/DE69522920T2/de not_active Expired - Fee Related
- 1995-12-28 CA CA002166228A patent/CA2166228C/en not_active Expired - Fee Related
- 1995-12-29 TW TW084114153A patent/TW290714B/zh active
- 1995-12-29 CN CN95121733A patent/CN1051643C/zh not_active Expired - Lifetime
- 1995-12-29 KR KR1019950067406A patent/KR100197912B1/ko not_active IP Right Cessation
-
1996
- 1996-01-02 CZ CZ19969A patent/CZ290986B6/cs not_active IP Right Cessation
-
1997
- 1997-11-17 US US08/971,850 patent/US6017778A/en not_active Expired - Lifetime
-
1999
- 1999-08-12 US US09/373,464 patent/US6580142B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR100197912B1 (ko) | 1999-07-01 |
PL311942A1 (en) | 1996-07-08 |
TW290714B (de) | 1996-11-11 |
EP0721218B1 (de) | 2001-09-26 |
PL177994B1 (pl) | 2000-02-29 |
US6580142B1 (en) | 2003-06-17 |
KR960026988A (ko) | 1996-07-22 |
US6075277A (en) | 2000-06-13 |
JP2671886B2 (ja) | 1997-11-05 |
CZ290986B6 (cs) | 2002-11-13 |
JPH08241862A (ja) | 1996-09-17 |
FR2729008B1 (fr) | 1997-03-21 |
FR2729008A1 (fr) | 1996-07-05 |
EP0721218A1 (de) | 1996-07-10 |
US6017778A (en) | 2000-01-25 |
CN1051643C (zh) | 2000-04-19 |
DE69522920T2 (de) | 2002-06-13 |
CA2166228C (en) | 2000-12-12 |
CZ996A3 (en) | 1997-07-16 |
CA2166228A1 (en) | 1996-07-01 |
CN1131823A (zh) | 1996-09-25 |
ATE206246T1 (de) | 2001-10-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |