US5774013A
(en)
*
|
1995-11-30 |
1998-06-30 |
Rockwell Semiconductor Systems, Inc. |
Dual source for constant and PTAT current
|
SE515345C2
(sv)
*
|
1996-05-07 |
2001-07-16 |
Ericsson Telefon Ab L M |
Temperaturberoende strömalstring
|
EP0915407B1
(de)
*
|
1997-11-05 |
2009-03-04 |
STMicroelectronics S.r.l. |
Temperaturkorrelierter Spannungsgeneratorschaltkreis und zugehöriger Spannungsregler für die Speisung einer Speicherzelle mit einer einzigen Stromversorgung, insbesondere vom FLASH-Typ
|
US6262618B1
(en)
*
|
1999-01-12 |
2001-07-17 |
International Rectifier Corporation |
Shoot-through prevention circuit for motor controller integrated circuit gate driver
|
JP3954245B2
(ja)
*
|
1999-07-22 |
2007-08-08 |
株式会社東芝 |
電圧発生回路
|
JP4212767B2
(ja)
|
2000-12-21 |
2009-01-21 |
旭化成エレクトロニクス株式会社 |
高速電流スイッチ回路および高周波電流源
|
JP4833455B2
(ja)
*
|
2001-08-28 |
2011-12-07 |
株式会社リコー |
定電圧発生回路および半導体装置
|
US6879214B2
(en)
*
|
2002-09-20 |
2005-04-12 |
Triquint Semiconductor, Inc. |
Bias circuit with controlled temperature dependence
|
US6836160B2
(en)
*
|
2002-11-19 |
2004-12-28 |
Intersil Americas Inc. |
Modified Brokaw cell-based circuit for generating output current that varies linearly with temperature
|
US6831504B1
(en)
|
2003-03-27 |
2004-12-14 |
National Semiconductor Corporation |
Constant temperature coefficient self-regulating CMOS current source
|
US7296247B1
(en)
*
|
2004-08-17 |
2007-11-13 |
Xilinx, Inc. |
Method and apparatus to improve pass transistor performance
|
US7116158B2
(en)
*
|
2004-10-05 |
2006-10-03 |
Texas Instruments Incorporated |
Bandgap reference circuit for ultra-low current applications
|
US20060132223A1
(en)
*
|
2004-12-22 |
2006-06-22 |
Cherek Brian J |
Temperature-stable voltage reference circuit
|
US7598822B2
(en)
*
|
2005-04-07 |
2009-10-06 |
Texas Instruments Incorporated |
Process, supply, and temperature insensitive integrated time reference circuit
|
US7215185B2
(en)
*
|
2005-05-26 |
2007-05-08 |
Texas Instruments Incorporated |
Threshold voltage extraction for producing a ramp signal with reduced process sensitivity
|
US7411436B2
(en)
*
|
2006-02-28 |
2008-08-12 |
Cornell Research Foundation, Inc. |
Self-timed thermally-aware circuits and methods of use thereof
|
US7798703B2
(en)
|
2007-05-09 |
2010-09-21 |
Infineon Technologies Ag |
Apparatus and method for measuring local surface temperature of semiconductor device
|
US7719341B2
(en)
*
|
2007-10-25 |
2010-05-18 |
Atmel Corporation |
MOS resistor with second or higher order compensation
|
JP4901703B2
(ja)
*
|
2007-11-28 |
2012-03-21 |
株式会社東芝 |
温度補償回路
|
KR101465598B1
(ko)
*
|
2008-06-05 |
2014-12-15 |
삼성전자주식회사 |
기준 전압 발생 장치 및 방법
|
JP2010021435A
(ja)
*
|
2008-07-11 |
2010-01-28 |
Panasonic Corp |
Mosトランジスタ抵抗器、フィルタおよび集積回路
|
US8022744B2
(en)
*
|
2008-10-03 |
2011-09-20 |
Cambridge Semiconductor Limited |
Signal generator
|
JP5107272B2
(ja)
|
2009-01-15 |
2012-12-26 |
株式会社東芝 |
温度補償回路
|
US8044740B2
(en)
*
|
2009-09-03 |
2011-10-25 |
S3C, Inc. |
Temperature compensated RC oscillator for signal conditioning ASIC using source bulk voltage of MOSFET
|
US8273617B2
(en)
|
2009-09-30 |
2012-09-25 |
Suvolta, Inc. |
Electronic devices and systems, and methods for making and using the same
|
US8421162B2
(en)
|
2009-09-30 |
2013-04-16 |
Suvolta, Inc. |
Advanced transistors with punch through suppression
|
US8188785B2
(en)
|
2010-02-04 |
2012-05-29 |
Semiconductor Components Industries, Llc |
Mixed-mode circuits and methods of producing a reference current and a reference voltage
|
US8878511B2
(en)
*
|
2010-02-04 |
2014-11-04 |
Semiconductor Components Industries, Llc |
Current-mode programmable reference circuits and methods therefor
|
US8680840B2
(en)
*
|
2010-02-11 |
2014-03-25 |
Semiconductor Components Industries, Llc |
Circuits and methods of producing a reference current or voltage
|
US8530286B2
(en)
|
2010-04-12 |
2013-09-10 |
Suvolta, Inc. |
Low power semiconductor transistor structure and method of fabrication thereof
|
US8569128B2
(en)
|
2010-06-21 |
2013-10-29 |
Suvolta, Inc. |
Semiconductor structure and method of fabrication thereof with mixed metal types
|
US8759872B2
(en)
|
2010-06-22 |
2014-06-24 |
Suvolta, Inc. |
Transistor with threshold voltage set notch and method of fabrication thereof
|
US8404551B2
(en)
|
2010-12-03 |
2013-03-26 |
Suvolta, Inc. |
Source/drain extension control for advanced transistors
|
US8461875B1
(en)
|
2011-02-18 |
2013-06-11 |
Suvolta, Inc. |
Digital circuits having improved transistors, and methods therefor
|
US8525271B2
(en)
|
2011-03-03 |
2013-09-03 |
Suvolta, Inc. |
Semiconductor structure with improved channel stack and method for fabrication thereof
|
US8400219B2
(en)
|
2011-03-24 |
2013-03-19 |
Suvolta, Inc. |
Analog circuits having improved transistors, and methods therefor
|
US8748270B1
(en)
|
2011-03-30 |
2014-06-10 |
Suvolta, Inc. |
Process for manufacturing an improved analog transistor
|
US8999861B1
(en)
|
2011-05-11 |
2015-04-07 |
Suvolta, Inc. |
Semiconductor structure with substitutional boron and method for fabrication thereof
|
US8796048B1
(en)
|
2011-05-11 |
2014-08-05 |
Suvolta, Inc. |
Monitoring and measurement of thin film layers
|
US8811068B1
(en)
|
2011-05-13 |
2014-08-19 |
Suvolta, Inc. |
Integrated circuit devices and methods
|
US8569156B1
(en)
|
2011-05-16 |
2013-10-29 |
Suvolta, Inc. |
Reducing or eliminating pre-amorphization in transistor manufacture
|
US8735987B1
(en)
|
2011-06-06 |
2014-05-27 |
Suvolta, Inc. |
CMOS gate stack structures and processes
|
US8995204B2
(en)
|
2011-06-23 |
2015-03-31 |
Suvolta, Inc. |
Circuit devices and methods having adjustable transistor body bias
|
US8629016B1
(en)
|
2011-07-26 |
2014-01-14 |
Suvolta, Inc. |
Multiple transistor types formed in a common epitaxial layer by differential out-diffusion from a doped underlayer
|
US8748986B1
(en)
|
2011-08-05 |
2014-06-10 |
Suvolta, Inc. |
Electronic device with controlled threshold voltage
|
WO2013022753A2
(en)
|
2011-08-05 |
2013-02-14 |
Suvolta, Inc. |
Semiconductor devices having fin structures and fabrication methods thereof
|
US8614128B1
(en)
|
2011-08-23 |
2013-12-24 |
Suvolta, Inc. |
CMOS structures and processes based on selective thinning
|
US8645878B1
(en)
|
2011-08-23 |
2014-02-04 |
Suvolta, Inc. |
Porting a circuit design from a first semiconductor process to a second semiconductor process
|
US8713511B1
(en)
|
2011-09-16 |
2014-04-29 |
Suvolta, Inc. |
Tools and methods for yield-aware semiconductor manufacturing process target generation
|
US9236466B1
(en)
|
2011-10-07 |
2016-01-12 |
Mie Fujitsu Semiconductor Limited |
Analog circuits having improved insulated gate transistors, and methods therefor
|
US8895327B1
(en)
|
2011-12-09 |
2014-11-25 |
Suvolta, Inc. |
Tipless transistors, short-tip transistors, and methods and circuits therefor
|
US8819603B1
(en)
|
2011-12-15 |
2014-08-26 |
Suvolta, Inc. |
Memory circuits and methods of making and designing the same
|
US8883600B1
(en)
|
2011-12-22 |
2014-11-11 |
Suvolta, Inc. |
Transistor having reduced junction leakage and methods of forming thereof
|
US8599623B1
(en)
|
2011-12-23 |
2013-12-03 |
Suvolta, Inc. |
Circuits and methods for measuring circuit elements in an integrated circuit device
|
US8970289B1
(en)
|
2012-01-23 |
2015-03-03 |
Suvolta, Inc. |
Circuits and devices for generating bi-directional body bias voltages, and methods therefor
|
US8877619B1
(en)
|
2012-01-23 |
2014-11-04 |
Suvolta, Inc. |
Process for manufacture of integrated circuits with different channel doping transistor architectures and devices therefrom
|
US9093550B1
(en)
|
2012-01-31 |
2015-07-28 |
Mie Fujitsu Semiconductor Limited |
Integrated circuits having a plurality of high-K metal gate FETs with various combinations of channel foundation structure and gate stack structure and methods of making same
|
US9406567B1
(en)
|
2012-02-28 |
2016-08-02 |
Mie Fujitsu Semiconductor Limited |
Method for fabricating multiple transistor devices on a substrate with varying threshold voltages
|
US8863064B1
(en)
|
2012-03-23 |
2014-10-14 |
Suvolta, Inc. |
SRAM cell layout structure and devices therefrom
|
US9299698B2
(en)
|
2012-06-27 |
2016-03-29 |
Mie Fujitsu Semiconductor Limited |
Semiconductor structure with multiple transistors having various threshold voltages
|
US8637955B1
(en)
|
2012-08-31 |
2014-01-28 |
Suvolta, Inc. |
Semiconductor structure with reduced junction leakage and method of fabrication thereof
|
US9112057B1
(en)
|
2012-09-18 |
2015-08-18 |
Mie Fujitsu Semiconductor Limited |
Semiconductor devices with dopant migration suppression and method of fabrication thereof
|
US9041126B2
(en)
|
2012-09-21 |
2015-05-26 |
Mie Fujitsu Semiconductor Limited |
Deeply depleted MOS transistors having a screening layer and methods thereof
|
JP2016500927A
(ja)
|
2012-10-31 |
2016-01-14 |
三重富士通セミコンダクター株式会社 |
低変動トランジスタ・ペリフェラル回路を備えるdram型デバイス、及び関連する方法
|
US8816754B1
(en)
|
2012-11-02 |
2014-08-26 |
Suvolta, Inc. |
Body bias circuits and methods
|
US9093997B1
(en)
|
2012-11-15 |
2015-07-28 |
Mie Fujitsu Semiconductor Limited |
Slew based process and bias monitors and related methods
|
KR20140071176A
(ko)
*
|
2012-12-03 |
2014-06-11 |
현대자동차주식회사 |
전류 발생 회로
|
US9070477B1
(en)
|
2012-12-12 |
2015-06-30 |
Mie Fujitsu Semiconductor Limited |
Bit interleaved low voltage static random access memory (SRAM) and related methods
|
US9112484B1
(en)
|
2012-12-20 |
2015-08-18 |
Mie Fujitsu Semiconductor Limited |
Integrated circuit process and bias monitors and related methods
|
US9268885B1
(en)
|
2013-02-28 |
2016-02-23 |
Mie Fujitsu Semiconductor Limited |
Integrated circuit device methods and models with predicted device metric variations
|
US9299801B1
(en)
|
2013-03-14 |
2016-03-29 |
Mie Fujitsu Semiconductor Limited |
Method for fabricating a transistor device with a tuned dopant profile
|
US9478571B1
(en)
|
2013-05-24 |
2016-10-25 |
Mie Fujitsu Semiconductor Limited |
Buried channel deeply depleted channel transistor
|
US9710006B2
(en)
|
2014-07-25 |
2017-07-18 |
Mie Fujitsu Semiconductor Limited |
Power up body bias circuits and methods
|
US9319013B2
(en)
|
2014-08-19 |
2016-04-19 |
Mie Fujitsu Semiconductor Limited |
Operational amplifier input offset correction with transistor threshold voltage adjustment
|
JP6328849B2
(ja)
|
2014-10-22 |
2018-05-23 |
株式会社村田製作所 |
擬似抵抗回路及び電荷検出回路
|
JP6185632B2
(ja)
*
|
2016-08-23 |
2017-08-23 |
ルネサスエレクトロニクス株式会社 |
電圧発生回路を備える半導体装置
|
US10222816B1
(en)
*
|
2016-09-09 |
2019-03-05 |
Marvell Israel (M.I.S.L) Ltd. |
Compensated source-follower based current source
|
JP7075172B2
(ja)
*
|
2017-06-01 |
2022-05-25 |
エイブリック株式会社 |
基準電圧回路及び半導体装置
|