DE69500131T2 - Positive Resistzusammensetzung - Google Patents

Positive Resistzusammensetzung

Info

Publication number
DE69500131T2
DE69500131T2 DE69500131T DE69500131T DE69500131T2 DE 69500131 T2 DE69500131 T2 DE 69500131T2 DE 69500131 T DE69500131 T DE 69500131T DE 69500131 T DE69500131 T DE 69500131T DE 69500131 T2 DE69500131 T2 DE 69500131T2
Authority
DE
Germany
Prior art keywords
resist composition
positive resist
positive
composition
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69500131T
Other languages
English (en)
Other versions
DE69500131D1 (de
Inventor
Mitsuru Sato
Kazuyuki Nitta
Akiyoshi Yamazaki
Etsuko Iguchi
Yoshika Sakai
Kazufumi Sato
Toshimasa Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP6286168A external-priority patent/JP2960656B2/ja
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Application granted granted Critical
Publication of DE69500131D1 publication Critical patent/DE69500131D1/de
Publication of DE69500131T2 publication Critical patent/DE69500131T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
DE69500131T 1994-04-25 1995-04-25 Positive Resistzusammensetzung Expired - Lifetime DE69500131T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP10749294 1994-04-25
JP13244994 1994-05-24
JP28616994 1994-10-27
JP6286168A JP2960656B2 (ja) 1994-04-25 1994-10-27 ポジ型レジスト組成物
JP2892595 1995-01-26

Publications (2)

Publication Number Publication Date
DE69500131D1 DE69500131D1 (de) 1997-02-27
DE69500131T2 true DE69500131T2 (de) 1997-07-31

Family

ID=27521085

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69500131T Expired - Lifetime DE69500131T2 (de) 1994-04-25 1995-04-25 Positive Resistzusammensetzung

Country Status (4)

Country Link
EP (1) EP0679951B1 (de)
KR (1) KR0152009B1 (de)
DE (1) DE69500131T2 (de)
TW (1) TW394861B (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0780732B1 (de) * 1995-12-21 2003-07-09 Wako Pure Chemical Industries Ltd Polymerzusammensetzung und Rezistmaterial
ATE199985T1 (de) * 1996-02-09 2001-04-15 Wako Pure Chem Ind Ltd Polymer und resistmaterial
JP3206440B2 (ja) * 1996-06-28 2001-09-10 信越化学工業株式会社 化学増幅ポジ型レジスト材料
EP0819982A1 (de) * 1996-07-18 1998-01-21 Olin Microelectronic Chemicals, Inc. Strahlungsempfindliche Zusammensetzung
JP3679206B2 (ja) * 1996-09-20 2005-08-03 東京応化工業株式会社 ポジ型レジスト組成物、それを用いた多層レジスト材料及びレジストパターン形成方法
TW546540B (en) 1997-04-30 2003-08-11 Wako Pure Chem Ind Ltd An agent for reducing the substrate dependence of resist and a resist composition
US6284427B1 (en) 1997-09-22 2001-09-04 Clariant Finance (Bvi) Limited Process for preparing resists
KR100489576B1 (ko) * 1997-10-08 2005-12-21 신에쓰 가가꾸 고교 가부시끼가이샤 레지스트 재료 및 패턴 형성 방법
US6103447A (en) * 1998-02-25 2000-08-15 International Business Machines Corp. Approach to formulating irradiation sensitive positive resists
US6303263B1 (en) 1998-02-25 2001-10-16 International Business Machines Machines Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups
DE69915928T2 (de) * 1998-05-19 2005-04-14 Jsr Corp. Diazodisulfonverbindung und strahlungsempfindliche Harzzusammensetzung
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
KR100620439B1 (ko) * 2005-01-17 2006-09-11 삼성전자주식회사 감광성 폴리머, 이를 포함하는 포토레지스트 조성물 및이를 이용한 포토레지스트 패턴 형성 방법
WO2011104127A1 (en) 2010-02-24 2011-09-01 Basf Se Latent acids and their use
WO2016124493A1 (en) 2015-02-02 2016-08-11 Basf Se Latent acids and their use
CN110128365B (zh) * 2019-05-10 2023-07-07 福建泓光半导体材料有限公司 一种抗蚀剂下层膜单体和组合物及图案形成方法
CN110105301B (zh) * 2019-05-10 2023-06-27 福建泓光半导体材料有限公司 一种抗蚀剂下层膜单体和组合物及图案形成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3030672B2 (ja) * 1991-06-18 2000-04-10 和光純薬工業株式会社 新規なレジスト材料及びパタ−ン形成方法
EP0588544A3 (en) * 1992-09-14 1994-09-28 Wako Pure Chem Ind Ltd Fine pattern forming material and pattern formation process

Also Published As

Publication number Publication date
KR950029860A (ko) 1995-11-24
EP0679951A1 (de) 1995-11-02
KR0152009B1 (ko) 1998-10-01
EP0679951B1 (de) 1997-01-15
DE69500131D1 (de) 1997-02-27
TW394861B (en) 2000-06-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

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