DE69430976D1 - Rastereletronenmikroskop und Bilderzeugungsverfahren mittels solchen Mikroskop - Google Patents

Rastereletronenmikroskop und Bilderzeugungsverfahren mittels solchen Mikroskop

Info

Publication number
DE69430976D1
DE69430976D1 DE69430976T DE69430976T DE69430976D1 DE 69430976 D1 DE69430976 D1 DE 69430976D1 DE 69430976 T DE69430976 T DE 69430976T DE 69430976 T DE69430976 T DE 69430976T DE 69430976 D1 DE69430976 D1 DE 69430976D1
Authority
DE
Germany
Prior art keywords
microscope
scanning electron
imaging method
electron microscope
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69430976T
Other languages
English (en)
Other versions
DE69430976T2 (de
Inventor
Shigeru Kawamata
Susumu Ozasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi Science Systems Ltd
Original Assignee
Hitachi Ltd
Hitachi Science Systems Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17552467&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69430976(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hitachi Ltd, Hitachi Science Systems Ltd filed Critical Hitachi Ltd
Publication of DE69430976D1 publication Critical patent/DE69430976D1/de
Application granted granted Critical
Publication of DE69430976T2 publication Critical patent/DE69430976T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69430976T 1993-11-04 1994-10-27 Rastereletronenmikroskop und Bilderzeugungsverfahren mittels solchen Mikroskop Expired - Fee Related DE69430976T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27522693A JP3230911B2 (ja) 1993-11-04 1993-11-04 走査電子顕微鏡及びその画像形成方法

Publications (2)

Publication Number Publication Date
DE69430976D1 true DE69430976D1 (de) 2002-08-22
DE69430976T2 DE69430976T2 (de) 2003-03-27

Family

ID=17552467

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69430976T Expired - Fee Related DE69430976T2 (de) 1993-11-04 1994-10-27 Rastereletronenmikroskop und Bilderzeugungsverfahren mittels solchen Mikroskop

Country Status (4)

Country Link
US (1) US5523567A (de)
EP (1) EP0653774B1 (de)
JP (1) JP3230911B2 (de)
DE (1) DE69430976T2 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09306414A (ja) * 1996-05-15 1997-11-28 Advantest Corp 走査型電子顕微鏡を備えた電子ビーム露光装置
JP2000357481A (ja) * 1999-06-14 2000-12-26 Jeol Ltd 走査型荷電粒子ビーム装置における試料像観察方法
US6661007B1 (en) * 2000-10-26 2003-12-09 General Phosphorix Llc Method of diagnosing magnification, linearity and stability of scanning electron microscope
US6864493B2 (en) * 2001-05-30 2005-03-08 Hitachi, Ltd. Charged particle beam alignment method and charged particle beam apparatus
JP2004063468A (ja) * 2003-08-11 2004-02-26 Hitachi Ltd 走査電子顕微鏡
JP4901196B2 (ja) * 2005-07-29 2012-03-21 株式会社日立ハイテクノロジーズ 画像形成方法、及び荷電粒子線装置
JP5129509B2 (ja) 2007-05-14 2013-01-30 株式会社日立ハイテクノロジーズ 透過型電子顕微鏡及び撮影方法
JP5408852B2 (ja) 2007-08-09 2014-02-05 株式会社日立ハイテクノロジーズ パターン測定装置
JP4951496B2 (ja) * 2007-12-26 2012-06-13 株式会社日立ハイテクノロジーズ 画像生成方法及びその画像生成装置
JP5066056B2 (ja) * 2008-10-31 2012-11-07 株式会社日立ハイテクノロジーズ 試料観察方法、及び電子顕微鏡
JP4982544B2 (ja) * 2009-09-30 2012-07-25 株式会社日立ハイテクノロジーズ 合成画像形成方法及び画像形成装置
WO2017090100A1 (ja) 2015-11-25 2017-06-01 株式会社日立ハイテクノロジーズ 荷電粒子線装置、荷電粒子線装置を用いた観察方法、及び、プログラム
WO2017090204A1 (ja) 2015-11-27 2017-06-01 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び荷電粒子線装置における画像処理方法
KR101865398B1 (ko) * 2016-06-28 2018-06-07 (주)새론테크놀로지 전자 현미경의 고속 전자빔 주사 신호 발생 장치 및 방법
US11631602B2 (en) 2020-06-26 2023-04-18 Kla Corporation Enabling scanning electron microscope imaging while preventing sample damage on sensitive layers used in semiconductor manufacturing processes
FR3128779B1 (fr) 2021-11-02 2024-03-01 Commissariat Energie Atomique Structure de metrologie

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59163548A (ja) * 1983-03-09 1984-09-14 Central Res Inst Of Electric Power Ind 電子線回折像の自動分析方法
JP2760786B2 (ja) * 1987-03-18 1998-06-04 株式会社日立製作所 走査電子顕微鏡およびその試料台移動方法
JPH06105605B2 (ja) * 1987-09-11 1994-12-21 株式会社日立製作所 電子顕微鏡の像観察装置
JPH01102841A (ja) * 1987-10-14 1989-04-20 Toshiba Corp 画像形成方法
US5250933A (en) * 1989-03-02 1993-10-05 Hewlett-Packard Company Method and apparatus for the simultaneous display of one or more selected images
JPH0823048B2 (ja) * 1990-07-18 1996-03-06 住友金属工業株式会社 焼付硬化性と加工性に優れた熱延鋼板の製造方法
JP2869827B2 (ja) * 1991-09-17 1999-03-10 株式会社日立製作所 走査電子顕微鏡

Also Published As

Publication number Publication date
JP3230911B2 (ja) 2001-11-19
US5523567A (en) 1996-06-04
EP0653774B1 (de) 2002-07-17
DE69430976T2 (de) 2003-03-27
JPH07130319A (ja) 1995-05-19
EP0653774A1 (de) 1995-05-17

Similar Documents

Publication Publication Date Title
DE69432399D1 (de) Rasterelektronenmikroskop
DE69332995D1 (de) Raster-Elektronenmikroskop
DE69334284D1 (de) Rasterelektronenmikroskop
DE69638126D1 (de) Rasterelektronenmikroskop
DE69317847D1 (de) Raster-Elektronenmikroskop
DE69611739D1 (de) Rasterelektronenmikroskop
DE69430976D1 (de) Rastereletronenmikroskop und Bilderzeugungsverfahren mittels solchen Mikroskop
EP0442630A3 (en) Combined scanning electron and scanning tunnelling microscope apparatus and method
DE69133256D1 (de) Rasterelekronenmikroskop und Bilderzeugungsverfahren
DE69230414D1 (de) Rastermikroskop und Betriebsverfahren eines solchen Rastermikroskops
DE69526688D1 (de) Hochauflösungs-Rasterelektronenspektroskopie mit Bilderzeugung
DE69840533D1 (de) Rasterelektronenmikroskop
DE69027702D1 (de) Elektronenstrahllithographiemaschine und Bildwiedergabeapparat
DE69727112D1 (de) Elektronenstrahl-Belichtungsgerät und Belichtungsverfahren
DE4497968T1 (de) Abbildungsverfahren und Abbildungseinrichtung
DE69736449D1 (de) Abtastvorrichtung, Herstellungsverfahren derselben und Rasterabtastmikroskop
DE69416363D1 (de) Abbildendes festkörperbauteil und herstellungsverfahren dafür
SG74599A1 (en) Portable high resolution scanning electron microscope column using permanent magnet electron lenses
EP0756206A3 (de) Abtastbelichtungsapparat und Belichtungsverfahren unter Verwendung desselben
GB8916474D0 (en) Scanning electron microscope
EP0697602A3 (de) Hochauflosender Squid-Mikroskop mit 3-Achsabtastung
DE69838893D1 (de) Mikroskopsystem mit Elektronenmikroskop und Rastersondenmikroskop
DE69624192D1 (de) Rasterelektronenmikroskop
AU6269596A (en) Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes
GB9003958D0 (en) Scanning electron microscopy

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee