DE69419331T2 - Dielektrisch isolierter bipolarer Transistor - Google Patents
Dielektrisch isolierter bipolarer TransistorInfo
- Publication number
- DE69419331T2 DE69419331T2 DE69419331T DE69419331T DE69419331T2 DE 69419331 T2 DE69419331 T2 DE 69419331T2 DE 69419331 T DE69419331 T DE 69419331T DE 69419331 T DE69419331 T DE 69419331T DE 69419331 T2 DE69419331 T2 DE 69419331T2
- Authority
- DE
- Germany
- Prior art keywords
- bipolar transistor
- dielectrically isolated
- isolated bipolar
- dielectrically
- transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/732—Vertical transistors
- H01L29/7322—Vertical transistors having emitter-base and base-collector junctions leaving at the same surface of the body, e.g. planar transistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76264—SOI together with lateral isolation, e.g. using local oxidation of silicon, or dielectric or polycristalline material refilled trench or air gap isolation regions, e.g. completely isolated semiconductor islands
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/763—Polycrystalline semiconductor regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76264—SOI together with lateral isolation, e.g. using local oxidation of silicon, or dielectric or polycristalline material refilled trench or air gap isolation regions, e.g. completely isolated semiconductor islands
- H01L21/76286—Lateral isolation by refilling of trenches with polycristalline material
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Bipolar Transistors (AREA)
- Element Separation (AREA)
- Bipolar Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04965793A JP3818673B2 (ja) | 1993-03-10 | 1993-03-10 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69419331D1 DE69419331D1 (de) | 1999-08-12 |
DE69419331T2 true DE69419331T2 (de) | 2000-04-13 |
Family
ID=12837261
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69419331T Expired - Lifetime DE69419331T2 (de) | 1993-03-10 | 1994-03-09 | Dielektrisch isolierter bipolarer Transistor |
Country Status (4)
Country | Link |
---|---|
US (1) | US5592015A (de) |
EP (1) | EP0615287B1 (de) |
JP (1) | JP3818673B2 (de) |
DE (1) | DE69419331T2 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6104078A (en) * | 1994-03-09 | 2000-08-15 | Denso Corporation | Design for a semiconductor device having elements isolated by insulating regions |
US6121552A (en) * | 1997-06-13 | 2000-09-19 | The Regents Of The University Of Caliofornia | Microfabricated high aspect ratio device with an electrical isolation trench |
US6362064B2 (en) | 1998-04-21 | 2002-03-26 | National Semiconductor Corporation | Elimination of walkout in high voltage trench isolated devices |
US6291875B1 (en) | 1998-06-24 | 2001-09-18 | Analog Devices Imi, Inc. | Microfabricated structures with electrical isolation and interconnections |
GB2344689A (en) * | 1998-12-07 | 2000-06-14 | Ericsson Telefon Ab L M | Analogue switch |
US6433401B1 (en) | 1999-04-06 | 2002-08-13 | Analog Devices Imi, Inc. | Microfabricated structures with trench-isolation using bonded-substrates and cavities |
JP4617527B2 (ja) | 1999-04-08 | 2011-01-26 | 株式会社デンソー | 回路装置 |
US6703679B1 (en) | 1999-08-31 | 2004-03-09 | Analog Devices, Imi, Inc. | Low-resistivity microelectromechanical structures with co-fabricated integrated circuit |
US6563193B1 (en) * | 1999-09-28 | 2003-05-13 | Kabushiki Kaisha Toshiba | Semiconductor device |
JP2002043319A (ja) * | 2000-07-19 | 2002-02-08 | Mitsubishi Electric Corp | 半導体装置 |
US6486043B1 (en) | 2000-08-31 | 2002-11-26 | International Business Machines Corporation | Method of forming dislocation filter in merged SOI and non-SOI chips |
US6768183B2 (en) * | 2001-04-20 | 2004-07-27 | Denso Corporation | Semiconductor device having bipolar transistors |
KR100854077B1 (ko) * | 2002-05-28 | 2008-08-25 | 페어차일드코리아반도체 주식회사 | 웨이퍼 본딩을 이용한 soi 기판 제조 방법과 이 soi기판을 사용한 상보형 고전압 바이폴라 트랜지스터 제조방법 |
JP4023276B2 (ja) | 2002-09-30 | 2007-12-19 | 株式会社デンソー | 駆動回路 |
DE102004022781A1 (de) * | 2004-05-08 | 2005-12-01 | X-Fab Semiconductor Foundries Ag | SOI-Scheiben mit MEMS-Strukturen und verfüllten Isolationsgräben definierten Querschnitts |
JP2008182109A (ja) * | 2007-01-25 | 2008-08-07 | Denso Corp | 点火コイル |
US7816759B2 (en) * | 2008-01-09 | 2010-10-19 | Infineon Technologies Ag | Integrated circuit including isolation regions substantially through substrate |
US8084811B2 (en) * | 2009-10-08 | 2011-12-27 | Monolithic Power Systems, Inc. | Power devices with super junctions and associated methods manufacturing |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3972061A (en) * | 1974-10-02 | 1976-07-27 | National Semiconductor Corporation | Monolithic lateral S.C.R. having reduced "on" resistance |
JPS5753944A (en) * | 1980-09-17 | 1982-03-31 | Hitachi Ltd | Semiconductor integrated circuit |
US4819052A (en) * | 1986-12-22 | 1989-04-04 | Texas Instruments Incorporated | Merged bipolar/CMOS technology using electrically active trench |
JP2979554B2 (ja) * | 1989-09-26 | 1999-11-15 | 株式会社デンソー | 半導体装置の製造方法 |
US5241211A (en) * | 1989-12-20 | 1993-08-31 | Nec Corporation | Semiconductor device |
EP0465961B1 (de) * | 1990-07-09 | 1995-08-09 | Sony Corporation | Halbleiteranordnung auf einem dielektrischen isolierten Substrat |
JP2748988B2 (ja) * | 1991-03-13 | 1998-05-13 | 三菱電機株式会社 | 半導体装置とその製造方法 |
JPH04317336A (ja) * | 1991-04-16 | 1992-11-09 | Toshiba Corp | 半導体装置およびその製造方法 |
JPH06268054A (ja) * | 1993-03-10 | 1994-09-22 | Nippondenso Co Ltd | 半導体装置 |
-
1993
- 1993-03-10 JP JP04965793A patent/JP3818673B2/ja not_active Expired - Lifetime
-
1994
- 1994-03-09 DE DE69419331T patent/DE69419331T2/de not_active Expired - Lifetime
- 1994-03-09 EP EP94103618A patent/EP0615287B1/de not_active Expired - Lifetime
-
1995
- 1995-10-26 US US08/547,740 patent/US5592015A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH06267966A (ja) | 1994-09-22 |
EP0615287A3 (de) | 1995-08-30 |
JP3818673B2 (ja) | 2006-09-06 |
EP0615287A2 (de) | 1994-09-14 |
DE69419331D1 (de) | 1999-08-12 |
EP0615287B1 (de) | 1999-07-07 |
US5592015A (en) | 1997-01-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |